Astigmatism

Industry

CPC
H01J2237/1532

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1532Astigmatism

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,211,669
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of determining aberrations in images obtained b...
- Patent number 12,183,540
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Yifeng Shao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of image-forming multi-electron beams
- Patent number 12,165,831
- Issue date Dec 10, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to correct first order astigmatism and first order distortio...
- Patent number 12,106,933
- Issue date Oct 1, 2024
- FEI Company
- Jan Stopka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement and correction of optical aberrations in charged partic...
- Patent number 11,990,315
- Issue date May 21, 2024
- FEI Company
- Erik Franken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron optical module for providing an off-axial electron beam wi...
- Patent number 11,804,357
- Issue date Oct 31, 2023
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,798,783
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and method of adjusti...
- Patent number 11,740,546
- Issue date Aug 29, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,688,580
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector and multiple electron beam irradiation apparatus
- Patent number 11,605,523
- Issue date Mar 14, 2023
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration corrector and multiple electron beam irradiation apparatus
- Patent number 11,574,793
- Issue date Feb 7, 2023
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system for adjusting the current of individual partic...
- Patent number 11,562,880
- Issue date Jan 24, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus
- Patent number 11,538,655
- Issue date Dec 27, 2022
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam profiles for analytic equipment configuration
- Patent number 11,508,549
- Issue date Nov 22, 2022
- FEI Company
- Herman Carlo Floresca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam irradiation apparatus and multi-charged...
- Patent number 11,417,495
- Issue date Aug 16, 2022
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,398,368
- Issue date Jul 26, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for compensating dispersion of a beam separator...
- Patent number 11,328,894
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for measuring energy spectrum of backscattered...
- Patent number 11,322,332
- Issue date May 3, 2022
- TASMIT, INC.
- Makoto Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection device
- Patent number 11,276,551
- Issue date Mar 15, 2022
- Hitachi, Ltd.
- Atsuko Shintani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode assembly, electronic apparatus/device using the same, and...
- Patent number 11,257,659
- Issue date Feb 22, 2022
- BORRIES PTE. LTD.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,251,018
- Issue date Feb 15, 2022
- HITACHI HIGH-TECH CORPORATION
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam irradiation device
- Patent number 11,239,042
- Issue date Feb 1, 2022
- HITACHI HIGH-TECH CORPORATION
- Akira Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning transmission electron microscope and aberration correction...
- Patent number 11,087,951
- Issue date Aug 10, 2021
- Jeol Ltd.
- Shigeyuki Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical apparatus and particle beam system
- Patent number 11,087,949
- Issue date Aug 10, 2021
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,043,354
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of aberration measurement and electron microscope
- Patent number 10,886,099
- Issue date Jan 5, 2021
- Jeol Ltd.
- Yuji Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus
- Patent number 10,879,032
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for focus adjustment of a multi-beam scanning ele...
- Patent number 10,861,671
- Issue date Dec 8, 2020
- KLA Corporation
- Doug K. Masnaghetti
- G02 - OPTICS
Information Patent Grant
Beam irradiation device
- Patent number 10,832,886
- Issue date Nov 10, 2020
- HITACHI HIGH-TECH CORPORATION
- Akira Ikegami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR OPERATING A PARTICLE BEAM MICROSCOPE
- Publication number 20250006455
- Publication date Jan 2, 2025
- CARL ZEISS MICROSCOPY GMBH
- Bjoern Gamm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240420915
- Publication date Dec 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Mihiro TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME
- Publication number 20240412407
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Junghee Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS
- Publication number 20240412944
- Publication date Dec 12, 2024
- KLA Corporation
- Weijie Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
- Publication number 20240355577
- Publication date Oct 24, 2024
- Eldico Scientific AG
- Gunther STEINFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope, Aberration Correction Method, And Imaging Method
- Publication number 20240274402
- Publication date Aug 15, 2024
- JEOL Ltd.
- Motofumi Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GLOBAL AND LOCAL OPTIMIZATION OF IMAGING RESOLUTION IN A...
- Publication number 20240274398
- Publication date Aug 15, 2024
- Carl Zeiss MultiSEM GmbH
- Christof Riedesel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS
- Publication number 20240096586
- Publication date Mar 21, 2024
- KLA Corporation
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC MULTIPOLE DEVICE, CHARGED PARTICLE BEAM APPARATUS, AND MET...
- Publication number 20240087837
- Publication date Mar 14, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DIRECTING CHARGED PARTICLE BEAM TOWARDS A...
- Publication number 20230326706
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT AND CORRECTION OF OPTICAL ABERRATIONS IN CHARGED PARTIC...
- Publication number 20230274908
- Publication date Aug 31, 2023
- FEI Company
- Erik Franken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aberration Corrector and Electron Microscope
- Publication number 20230253181
- Publication date Aug 10, 2023
- JEOL Ltd.
- Shigeyuki Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC MIRROR CHROMATIC ABERRATION CORRECTORS
- Publication number 20230215682
- Publication date Jul 6, 2023
- FEI Company
- Alexander HENSTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATION, METH...
- Publication number 20230170181
- Publication date Jun 1, 2023
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR CONTROLLING CHARGED PA...
- Publication number 20230113759
- Publication date Apr 13, 2023
- Hitachi High-Tech Corporation
- Shingo HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON OPTICAL MODULE FOR PROVIDING AN OFF-AXIAL ELECTRON BEAM WI...
- Publication number 20230101108
- Publication date Mar 30, 2023
- FEI Company
- Ali MOHAMMADI-GHEIDARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM INSPECTION APPARATUS, MULTIPOLE ARRAY CONTROL M...
- Publication number 20230091222
- Publication date Mar 23, 2023
- NuFlare Technology, Inc.
- Yuichi MAEKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230054632
- Publication date Feb 23, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM HAVING A MULTI-POLE LENS SEQUENCE FOR INDEPEND...
- Publication number 20220415604
- Publication date Dec 29, 2022
- Carl Zeiss MultiSEM GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and methods of determining aberrations in images obtained b...
- Publication number 20220328282
- Publication date Oct 13, 2022
- ASML NETHERLANDS B.V.
- Yifeng SHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO CORRECT FIRST ORDER ASTIGMATISM AND FIRST ORDER DISTORTIO...
- Publication number 20220328284
- Publication date Oct 13, 2022
- FEI Company
- Jan Stopka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF ADJUSTI...
- Publication number 20220299861
- Publication date Sep 22, 2022
- NuFlare Technology, Inc.
- Tsubasa NANAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR COMPENSATING DISPERSION OF A BEAM SEPARATOR...
- Publication number 20220262594
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20210391138
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND MULTI-CHARGED...
- Publication number 20210319974
- Publication date Oct 14, 2021
- NuFlare Technology, Inc.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20210272770
- Publication date Sep 2, 2021
- Hitachi High-Tech Corporation
- Yasunari SOHDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING SAME
- Publication number 20210217577
- Publication date Jul 15, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM FOR ADJUSTING THE CURRENT OF INDIVIDUAL PARTIC...
- Publication number 20210210303
- Publication date Jul 8, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS

Astigmatism

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multiple charged-particle beam apparatus with low crosstalk

Systems and methods of determining aberrations in images obtained b...

Method and system of image-forming multi-electron beams

Method to correct first order astigmatism and first order distortio...

Measurement and correction of optical aberrations in charged partic...

Charged particle assessment tool, inspection method

Electron optical module for providing an off-axial electron beam wi...

Charged particle assessment tool, inspection method

Multi charged particle beam writing apparatus and method of adjusti...

Apparatus of plural charged-particle beams

Aberration corrector and multiple electron beam irradiation apparatus

Aberration corrector and multiple electron beam irradiation apparatus

Particle beam system for adjusting the current of individual partic...

Multi-beam inspection apparatus

Particle beam profiles for analytic equipment configuration

Multi-charged particle beam irradiation apparatus and multi-charged...

Apparatus of plural charged-particle beams

Systems and methods for compensating dispersion of a beam separator...

Apparatus and method for measuring energy spectrum of backscattered...

Inspection device

Electrode assembly, electronic apparatus/device using the same, and...

Scanning electron microscope

Beam irradiation device

Scanning transmission electron microscope and aberration correction...

Particle-optical apparatus and particle beam system

Apparatus of plural charged-particle beams

Method of aberration measurement and electron microscope

Multi-beam inspection apparatus

Method and system for focus adjustment of a multi-beam scanning ele...

Beam irradiation device

Patents Applicationslast 30 patents

METHOD FOR OPERATING A PARTICLE BEAM MICROSCOPE

CHARGED PARTICLE BEAM DEVICE

SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME

AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS

CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

Method for Determining Focal Properties in a Target Beam Field of a...

Electron Microscope, Aberration Correction Method, And Imaging Method

METHOD OF GLOBAL AND LOCAL OPTIMIZATION OF IMAGING RESOLUTION IN A...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS

MAGNETIC MULTIPOLE DEVICE, CHARGED PARTICLE BEAM APPARATUS, AND MET...

APPARATUS AND METHOD FOR DIRECTING CHARGED PARTICLE BEAM TOWARDS A...

MEASUREMENT AND CORRECTION OF OPTICAL ABERRATIONS IN CHARGED PARTIC...

Aberration Corrector and Electron Microscope

ELECTROSTATIC MIRROR CHROMATIC ABERRATION CORRECTORS

MULTIPLE PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATION, METH...

CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR CONTROLLING CHARGED PA...

ELECTRON OPTICAL MODULE FOR PROVIDING AN OFF-AXIAL ELECTRON BEAM WI...

MULTI-ELECTRON BEAM INSPECTION APPARATUS, MULTIPOLE ARRAY CONTROL M...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

PARTICLE BEAM SYSTEM HAVING A MULTI-POLE LENS SEQUENCE FOR INDEPEND...

Systems and methods of determining aberrations in images obtained b...

METHOD TO CORRECT FIRST ORDER ASTIGMATISM AND FIRST ORDER DISTORTIO...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF ADJUSTI...

SYSTEMS AND METHODS FOR COMPENSATING DISPERSION OF A BEAM SEPARATOR...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTI-CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND MULTI-CHARGED...

Scanning Electron Microscope

MULTI-BEAM PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING SAME

PARTICLE BEAM SYSTEM FOR ADJUSTING THE CURRENT OF INDIVIDUAL PARTIC...