Auger spectrometers

Industry

CPC
H01J2237/2511

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2511Auger spectrometers

Industries

Patents Grantslast 30 patents

Information Patent Grant
Auger electron microscope and analysis method
- Patent number 11,391,682
- Issue date Jul 19, 2022
- Jeol Ltd.
- Kenichi Tsutsumi
- G01 - MEASURING TESTING
Information Patent Grant
Background reduction system including louver
- Patent number 8,633,457
- Issue date Jan 21, 2014
- KLA-Tencor Corporation
- Mehran Nasser-Ghodsi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for material analysis of a microscopic element
- Patent number 8,546,756
- Issue date Oct 1, 2013
- Applied Materials Israel, Ltd.
- Dmitry Shur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mirror energy filter for electron beam apparatus
- Patent number 8,334,508
- Issue date Dec 18, 2012
- Electron Optica, Inc.
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ differential spectroscopy
- Patent number 8,283,631
- Issue date Oct 9, 2012
- KLA-Tencor Corporation
- Mehdi Vaez-Iravani
- G01 - MEASURING TESTING
Information Patent Grant
Auger electron spectrometer with applied magnetic field at target s...
- Patent number 7,755,042
- Issue date Jul 13, 2010
- KLA-Tencor Corporation
- Gabor D. Toth
- G01 - MEASURING TESTING
Information Patent Grant
Determining layer thickness using photoelectron spectroscopy
- Patent number 7,420,163
- Issue date Sep 2, 2008
- ReVera Incorporated
- Bruno Schueler
- G01 - MEASURING TESTING
Information Patent Grant
Scanning electron microscope with curved axes
- Patent number 7,205,542
- Issue date Apr 17, 2007
- KLA-Tencor Technologies Corporation
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method for sample to be analyzed
- Patent number 6,826,971
- Issue date Dec 7, 2004
- Renesas Technology Corp.
- Yukinori Hirose
- G01 - MEASURING TESTING
Information Patent Grant
Particle-optical apparatus involving detection of Auger electronics
- Patent number 6,455,848
- Issue date Sep 24, 2002
- Koninkijke Philips Electronics N.V.
- Marcellinus Petrus Carolus Michael Krijn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and similar instruments
- Patent number 6,448,555
- Issue date Sep 10, 2002
- Jeol Ltd.
- Fumio Hosokawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for analyzing microscopic area
- Patent number 6,060,707
- Issue date May 9, 2000
- Sharp Kabushiki Kaisha
- Norito Fujihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analytical method of auger electron spectroscopy for insulating sample
- Patent number 5,889,282
- Issue date Mar 30, 1999
- Samsung Electronics Co., Ltd.
- Hee Seok Yang
- G01 - MEASURING TESTING
Information Patent Grant
Auger electron spectroscopy
- Patent number 5,381,003
- Issue date Jan 10, 1995
- Agency of Industrial Science and Technology
- Ryoichi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for locating target area for electron microana...
- Patent number 5,118,941
- Issue date Jun 2, 1992
- The Perkin-Elmer Corporation
- Paul E. Larson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Charged Particle Beam Device and Image Acquisition Method
- Publication number 20230402252
- Publication date Dec 14, 2023
- JEOL Ltd.
- Nobuyuki Ikeo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230307206
- Publication date Sep 28, 2023
- JEOL Ltd.
- Kenichi Tsutsumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Auger Electron Microscope and Analysis Method
- Publication number 20210255124
- Publication date Aug 19, 2021
- JEOL Ltd.
- Kenichi Tsutsumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKGROUND REDUCTION SYSTEM INCLUDING LOUVER
- Publication number 20130001417
- Publication date Jan 3, 2013
- KLA-Tencor Corporation
- Mehran Nasser-Ghodsi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR MATERIAL ANALYSYS OF A MICROSCOPIC ELEMENT
- Publication number 20110024622
- Publication date Feb 3, 2011
- Dmitry Shur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPHERICAL ABERRATION CORRECTION DECELERATING LENS, SPHERICAL ABERRA...
- Publication number 20100001202
- Publication date Jan 7, 2010
- Hiroyuki Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Differential Spectroscopy
- Publication number 20090278044
- Publication date Nov 12, 2009
- KLA-Tencor Corporation
- Mehdi Vaez-Iravani
- G01 - MEASURING TESTING
Information Patent Application
Electron Spectroscope With Emission Induced By A Monochromatic Elec...
- Publication number 20070210249
- Publication date Sep 13, 2007
- STMicroelectronics S.r.I
- Stefano Giovanni Alberici
- G01 - MEASURING TESTING
Information Patent Application
Determining layer thickness using photoelectron spectroscopy
- Publication number 20060243904
- Publication date Nov 2, 2006
- Bruno Schueler
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DEFECT ROOT CAUSE ANALYSIS
- Publication number 20050049836
- Publication date Mar 3, 2005
- Long-Hui Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication method for sample to be analyzed
- Publication number 20030097888
- Publication date May 29, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Yukinori Hirose
- G01 - MEASURING TESTING

Auger spectrometers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Auger electron microscope and analysis method

Background reduction system including louver

System and method for material analysis of a microscopic element

Mirror energy filter for electron beam apparatus

In-situ differential spectroscopy

Auger electron spectrometer with applied magnetic field at target s...

Determining layer thickness using photoelectron spectroscopy

Scanning electron microscope with curved axes

Fabrication method for sample to be analyzed

Particle-optical apparatus involving detection of Auger electronics

Electron microscope and similar instruments

Apparatus and method for analyzing microscopic area

Analytical method of auger electron spectroscopy for insulating sample

Auger electron spectroscopy

Apparatus and method for locating target area for electron microana...

Patents Applicationslast 30 patents

Charged Particle Beam Device and Image Acquisition Method

Charged Particle Beam Apparatus

Auger Electron Microscope and Analysis Method

BACKGROUND REDUCTION SYSTEM INCLUDING LOUVER

SYSTEM AND METHOD FOR MATERIAL ANALYSYS OF A MICROSCOPIC ELEMENT

SPHERICAL ABERRATION CORRECTION DECELERATING LENS, SPHERICAL ABERRA...

In-Situ Differential Spectroscopy

Electron Spectroscope With Emission Induced By A Monochromatic Elec...

Determining layer thickness using photoelectron spectroscopy

METHOD OF DEFECT ROOT CAUSE ANALYSIS

Fabrication method for sample to be analyzed