Baffles

Industry

CPC
H01J37/32633

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32633Baffles

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Baffle implementation for improving bottom purge gas flow uniformity
- Patent number 12,183,553
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution plate with UV blocker
- Patent number 12,130,561
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber and exhaust liner system therefor
- Patent number 12,110,585
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Naman Apurva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Turbomolecular pump and cathode assembly for etching reactor
- Patent number 12,106,946
- Issue date Oct 1, 2024
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High conductance inner shield for process chamber
- Patent number 12,100,577
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide preclean chamber with improved selectivity and flow con...
- Patent number 12,100,576
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,068,139
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Shin Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Baffle unit and substrate processing apparatus
- Patent number 12,062,527
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Jun Young Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,948,778
- Issue date Apr 2, 2024
- Kokusai Electric Corporation
- Hidehiro Yanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and plasma processing apparatus
- Patent number 11,881,410
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Yasutaka Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faceplate having blocked center hole
- Patent number 11,814,716
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Fang Ruan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,804,366
- Issue date Oct 31, 2023
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing equipment
- Patent number 11,804,367
- Issue date Oct 31, 2023
- Samsung Electronics Co., Ltd.
- Seok Hwan Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, electrostatic attraction method, and e...
- Patent number 11,764,038
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,756,769
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Takashi Tohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion filter using aperture plate with plurality of zones
- Patent number 11,747,494
- Issue date Sep 5, 2023
- Plasma-Therm LLC
- Leslie Michael Lea
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,742,183
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Ryuji Hisatomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for conducting plasma surface treatment, board treatment...
- Patent number 11,728,142
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Junyoung Oh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interconnect structures and methods and apparatuses for forming the...
- Patent number 11,694,899
- Issue date Jul 4, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Hsu Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Baffle plate for controlling wafer uniformity and methods for makin...
- Patent number 11,615,946
- Issue date Mar 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jr-Sheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of fabricating semiconductor...
- Patent number 11,538,660
- Issue date Dec 27, 2022
- Samsung Electronics Co., Ltd.
- Yoong Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component for use in plasma processing apparatus, plasma processing...
- Patent number 11,473,182
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Koji Mitsuhashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced cathodic ARC source for ARC plasma deposition
- Patent number 11,466,360
- Issue date Oct 11, 2022
- Veeco Instruments Inc.
- Boris L. Druz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Uniform pumping dual-station vacuum processor
- Patent number 11,387,084
- Issue date Jul 12, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yuejun Gong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch chamber and method of plasma etching
- Patent number 11,387,079
- Issue date Jul 12, 2022
- EVATEC AG
- Frantisek Balon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,348,768
- Issue date May 31, 2022
- Tokyo Electron Limited
- Yuki Hosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exhaust device for processing apparatus provided with multiple blades
- Patent number 11,315,770
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bearing device and plasma processing apparatus
- Patent number 11,282,680
- Issue date Mar 22, 2022
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Hao Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing device having opening enabling gas to communicate betwee...
- Patent number 11,251,025
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Jun Yamashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 11,239,060
- Issue date Feb 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA SHIELD ASSEMBLY AND PLASMA PROCESSING APPARATUS INCLUDING TH...
- Publication number 20240420928
- Publication date Dec 19, 2024
- SAMSUNG DISPLAY CO., LTD.
- Eun Chan LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTO...
- Publication number 20240412953
- Publication date Dec 12, 2024
- LAM RESEARCH CORPORATION
- Bradley Taylor Streng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240371609
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TURBOMOLECULAR PUMP AND CATHODE ASSEMBLY FOR ETCHING REACTOR
- Publication number 20240355596
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240234100
- Publication date Jul 11, 2024
- SEMES CO., LTD.
- Je Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SUBSTRATE TREATMENT APPARATUS
- Publication number 20240234101
- Publication date Jul 11, 2024
- INNOVATION FOR CREATIVE DEVICES CO., LTD.
- Buil JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240212989
- Publication date Jun 27, 2024
- Kokusai Electric Corporation
- Hidehiro YANAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL CHOKE PLATE
- Publication number 20240186121
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Vellaichamy Nagappan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240136157
- Publication date Apr 25, 2024
- SEMES CO., LTD.
- Je Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CLEANING METHOD
- Publication number 20240120185
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Kazuki TSUCHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD USING TH...
- Publication number 20240087856
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Jiwon Son
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240071731
- Publication date Feb 29, 2024
- Linco Technology Co., Ltd.
- Yi-Yuan HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240062998
- Publication date Feb 22, 2024
- PSK INC.
- Jin Woo PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240047184
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESS APPARATUS AND SUBSTRATE PROCESS METHOD USING THE...
- Publication number 20240021413
- Publication date Jan 18, 2024
- Samsung Electronics Co., Ltd.
- JAEHYUN PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR
- Publication number 20230369024
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230369021
- Publication date Nov 16, 2023
- SEMES CO., LTD.
- Yoon Seok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CONDUCTING PLASMA SURFACE TREATMENT, BOARD TREATMENT...
- Publication number 20230343560
- Publication date Oct 26, 2023
- New Power Plasma Co., Ltd.
- Junyoung Oh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS-DELIVERY ASSEMBLY AND REACTOR SYSTEM INCLUDING SAME
- Publication number 20230326722
- Publication date Oct 12, 2023
- ASM IP HOLDING B.V.
- Thomas Fitzgerald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230317425
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Ryoya ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Interconnect Structures and Methods and Apparatuses for Forming the...
- Publication number 20230317459
- Publication date Oct 5, 2023
- Taiwan Semiconductor Manufacturing Co, LTD.
- Chun-Hsu Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOVABLE DISK WITH APERTURE FOR ETCH CONTROL
- Publication number 20230245865
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Chih-Min LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, A...
- Publication number 20230245864
- Publication date Aug 3, 2023
- Samsung Electronics Co., Ltd.
- HAKYOUNG KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION APPARATUS AND METHOD OF CLEANSING THE SAME
- Publication number 20230227971
- Publication date Jul 20, 2023
- SAMSUNG DISPLAY CO., LTD.
- JONGBUN HAN
- B08 - CLEANING
Information Patent Application
ION SOURCE BAFFLE, ION ETCHING MACHINE, AND USAGE METHOD THEREFOR
- Publication number 20230207250
- Publication date Jun 29, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, A...
- Publication number 20230187185
- Publication date Jun 15, 2023
- Samsung Electronics Co., Ltd.
- SUMIN PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF MANUFACTURING DISPLAY DEVICE
- Publication number 20230162951
- Publication date May 25, 2023
- SAMSUNG DISPLAY CO., LTD.
- Daesoo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING METHOD AND CHAMBER CLEANING METHOD
- Publication number 20230130652
- Publication date Apr 27, 2023
- SEMES CO., LTD.
- Won Seok LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC PROCESSING CHAMBER BAFFLE
- Publication number 20230113063
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Udit S. Kotagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20230056750
- Publication date Feb 23, 2023
- Tokyo Electron Limited
- Katsutoshi ISHIGAMI
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Baffle implementation for improving bottom purge gas flow uniformity

Gas distribution plate with UV blocker

Process chamber and exhaust liner system therefor

Turbomolecular pump and cathode assembly for etching reactor

High conductance inner shield for process chamber

Metal oxide preclean chamber with improved selectivity and flow con...

Plasma processing apparatus

Baffle unit and substrate processing apparatus

Substrate processing apparatus, method of manufacturing semiconduct...

Substrate processing apparatus and plasma processing apparatus

Faceplate having blocked center hole

Plasma processing apparatus

Plasma processing equipment

Plasma processing apparatus, electrostatic attraction method, and e...

Plasma processing apparatus

Ion filter using aperture plate with plurality of zones

Plasma processing apparatus and control method

Apparatus for conducting plasma surface treatment, board treatment...

Interconnect structures and methods and apparatuses for forming the...

Baffle plate for controlling wafer uniformity and methods for makin...

Plasma processing apparatus and method of fabricating semiconductor...

Component for use in plasma processing apparatus, plasma processing...

Enhanced cathodic ARC source for ARC plasma deposition

Uniform pumping dual-station vacuum processor

Plasma etch chamber and method of plasma etching

Plasma processing apparatus

Exhaust device for processing apparatus provided with multiple blades

Bearing device and plasma processing apparatus

Processing device having opening enabling gas to communicate betwee...

Ion beam etching chamber with etching by-product redistributor

Patents Applicationslast 30 patents

PLASMA SHIELD ASSEMBLY AND PLASMA PROCESSING APPARATUS INCLUDING TH...

APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTO...

PLASMA PROCESSING APPARATUS

TURBOMOLECULAR PUMP AND CATHODE ASSEMBLY FOR ETCHING REACTOR

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA SUBSTRATE TREATMENT APPARATUS

SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICON...

THERMAL CHOKE PLATE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND CLEANING METHOD

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD USING TH...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESS APPARATUS AND SUBSTRATE PROCESS METHOD USING THE...

ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

APPARATUS FOR CONDUCTING PLASMA SURFACE TREATMENT, BOARD TREATMENT...

GAS-DELIVERY ASSEMBLY AND REACTOR SYSTEM INCLUDING SAME

PLASMA PROCESSING APPARATUS

Interconnect Structures and Methods and Apparatuses for Forming the...

MOVABLE DISK WITH APERTURE FOR ETCH CONTROL

PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, A...

DEPOSITION APPARATUS AND METHOD OF CLEANSING THE SAME

ION SOURCE BAFFLE, ION ETCHING MACHINE, AND USAGE METHOD THEREFOR

PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, A...

APPARATUS AND METHOD OF MANUFACTURING DISPLAY DEVICE

SUBSTRATE TREATING METHOD AND CHAMBER CLEANING METHOD

DYNAMIC PROCESSING CHAMBER BAFFLE

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD