[b,e]-condensed with two six-membered carbocyclic rings

Industry

CPC
C07D327/08

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Parent Industries

CCHEMISTRY METALLURGY C07Organic chemistry C07DHETEROCYCLIC COMPOUNDS C07D327/00Heterocyclic compounds containing rings having oxygen and sulfur atoms as the only ring hetero atoms

Current Industry

C07D327/08[b,e]-condensed with two six-membered carbocyclic rings

Industries

Patents Grantslast 30 patents

Information Patent Grant
Salt, quencher, resist composition and method for producing resist...
- Patent number 12,105,419
- Issue date Oct 1, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,886,113
- Issue date Jan 30, 2024
- FUJIFILM Corporation
- Keita Kato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 11,782,342
- Issue date Oct 10, 2023
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 11,773,059
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Organic compound, organic electroluminescent device and electronic...
- Patent number 11,492,314
- Issue date Nov 8, 2022
- Shaanxi Lighte Optoelectronics Material Co., Ltd.
- Linnan Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 11,221,557
- Issue date Jan 11, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium compound, resist composition, and patterning process
- Patent number 11,215,926
- Issue date Jan 4, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Flow battery that includes liquid containing mediator
- Patent number 11,211,618
- Issue date Dec 28, 2021
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Honami Nariyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cationic photoinitiator and preparation method and use thereof
- Patent number 10,995,082
- Issue date May 4, 2021
- Changzhou Tronly New Electronic Materials Co., Ltd.
- Xiaochun Qian
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,838,300
- Issue date Nov 17, 2020
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,809,617
- Issue date Oct 20, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 10,802,399
- Issue date Oct 13, 2020
- FUJIFILM Corporation
- Ryo Nishio
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 10,761,424
- Issue date Sep 1, 2020
- FUJIFILM Corporation
- Ryo Nishio
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polycyclic glyoxylates as photoinitiators
- Patent number 10,597,515
- Issue date Mar 24, 2020
- IGM GROUP B.V.
- Peter Nesvadba
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound for organic optoelectronic device, organic light emitting...
- Patent number 10,522,761
- Issue date Dec 31, 2019
- Samsung SDI Co., Ltd.
- Dong-Wan Ryu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,295,904
- Issue date May 21, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,160,721
- Issue date Dec 25, 2018
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polycyclic photoinitiators
- Patent number 10,113,075
- Issue date Oct 30, 2018
- IGM Malta Limited
- Peter Nesvadba
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Spirobifluorene derivative-based materials for electronic devices
- Patent number 10,032,989
- Issue date Jul 24, 2018
- Merck Patent GmbH
- Jochen Pfister
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 9,958,775
- Issue date May 1, 2018
- FUJIFILM Corporation
- Takuya Tsuruta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, active light sensitive or radiation sensitive resin compo...
- Patent number 9,904,167
- Issue date Feb 27, 2018
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, polymer compound, resist composition, and patterning process
- Patent number 9,897,916
- Issue date Feb 20, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, resist composition and resist pattern forming process
- Patent number 9,604,921
- Issue date Mar 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator and resist composition
- Patent number 9,405,187
- Issue date Aug 2, 2016
- Sumitomo Chemical Company, Limited
- Takashi Hiraoka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound for organic optoelectronic device, organic light-emitting...
- Patent number 9,368,733
- Issue date Jun 14, 2016
- Samsung SDI Co., Ltd.
- Dong-Wan Ryu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonated aromatic compounds
- Patent number 9,150,506
- Issue date Oct 6, 2015
- E I du Pont de Nemours and Company
- Justin W. Chan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, photoresist composition, and method for producing photoresist...
- Patent number 9,051,247
- Issue date Jun 9, 2015
- Sumitomo Chemical Company, Limited
- Yukako Anryu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic-ray—or radiation-sensitive resin composition and method of...
- Patent number 8,962,233
- Issue date Feb 24, 2015
- FUJIFILM Corporation
- Takeshi Kawabata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, resist composition and method for producing resist pattern
- Patent number 8,921,028
- Issue date Dec 30, 2014
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method and compositions for treating amyloid-related diseases
- Patent number 8,835,654
- Issue date Sep 16, 2014
- BHI Limited Partnership
- Xianqi Kong
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240377733
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20240361688
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20240337927
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20240280900
- Publication date Aug 22, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Onium Salt, Resist Composition, And Patterning Process
- Publication number 20240184199
- Publication date Jun 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240176236
- Publication date May 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
OPTICALLY ACTIVE DEVICES
- Publication number 20240117092
- Publication date Apr 11, 2024
- Lars DOBELMANN-MARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Onium Salt, Resist Composition, And Patterning Process
- Publication number 20240036466
- Publication date Feb 1, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel Sulfonium Salt, Resist Composition, And Patterning Process
- Publication number 20230418158
- Publication date Dec 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUNDS AND METHODS TO TARGET GLUCOSE-STIMULATED PHOSPHOHISTIDINE...
- Publication number 20230416209
- Publication date Dec 28, 2023
- Health Research, Inc.
- Steven HOCHWALD
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20230236501
- Publication date Jul 27, 2023
- JSR Corporation
- Natsuko Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230205083
- Publication date Jun 29, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20230161243
- Publication date May 25, 2023
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Na/K-ATPase LIGANDS AND USE THEREOF FOR TREATMENT OF CANCER
- Publication number 20230130102
- Publication date Apr 27, 2023
- Marshall University Research Corporation
- Zijian XIE
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20220350243
- Publication date Nov 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANIC COMPOUND, ORGANIC ELECTROLUMINESCENT DEVICE AND ELECTRONIC...
- Publication number 20220220049
- Publication date Jul 14, 2022
- Shaanxi Lighte Optoelectronics Material Co., Ltd.
- Linnan MA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...
- Publication number 20220113626
- Publication date Apr 14, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20220107561
- Publication date Apr 7, 2022
- FUJIFILM CORPORATION
- Keiyu OU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220107559
- Publication date Apr 7, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...
- Publication number 20210179554
- Publication date Jun 17, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200393756
- Publication date Dec 17, 2020
- FUJIFILM CORPORATION
- Keita KATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20200363720
- Publication date Nov 19, 2020
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20190361345
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL CATIONIC PHOTOINITIATOR AND PREPARATION METHOD AND USE THEREOF
- Publication number 20190218199
- Publication date Jul 18, 2019
- CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD
- Xiaochun Qian
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20190155155
- Publication date May 23, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLOW BATTERY THAT INCLUDES LIQUID CONTAINING MEDIATOR
- Publication number 20180366747
- Publication date Dec 20, 2018
- Panasonic Intellectual Property Management Co., Ltd.
- HONAMI NARIYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20180364571
- Publication date Dec 20, 2018
- FUJIFILM CORPORATION
- Ryo NISHIO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SPIROBIFLUORENE DERIVATIVE-BASED MATERIALS FOR ELECTRONIC DEVICES
- Publication number 20180026188
- Publication date Jan 25, 2018
- Merck Patent GmbH
- Jochen PFISTER
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20170351177
- Publication date Dec 7, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYCYCLIC PHOTOINITIATORS
- Publication number 20170240755
- Publication date Aug 24, 2017
- IGM Mailta Limited
- Peter Nesvadba
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

[b,e]-condensed with two six-membered carbocyclic rings

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Salt, quencher, resist composition and method for producing resist...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Salt and photoresist composition containing the same

Onium salt, chemically amplified negative resist composition, and p...

Organic compound, organic electroluminescent device and electronic...

Resist composition, method of forming resist pattern, compound, and...

Sulfonium compound, resist composition, and patterning process

Flow battery that includes liquid containing mediator

Cationic photoinitiator and preparation method and use thereof

Salt and photoresist composition containing the same

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Polycyclic glyoxylates as photoinitiators

Compound for organic optoelectronic device, organic light emitting...

Resist composition and patterning process

Salt and photoresist composition containing the same

Polycyclic photoinitiators

Spirobifluorene derivative-based materials for electronic devices

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Compound, active light sensitive or radiation sensitive resin compo...

Compound, polymer compound, resist composition, and patterning process

Sulfonium salt, resist composition and resist pattern forming process

Salt, acid generator and resist composition

Compound for organic optoelectronic device, organic light-emitting...

Sulfonated aromatic compounds

Salt, photoresist composition, and method for producing photoresist...

Actinic-ray—or radiation-sensitive resin composition and method of...

Salt, resist composition and method for producing resist pattern

Method and compositions for treating amyloid-related diseases

Patents Applicationslast 30 patents

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

Onium Salt, Resist Composition, And Patterning Process

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

OPTICALLY ACTIVE DEVICES

Onium Salt, Resist Composition, And Patterning Process

Novel Sulfonium Salt, Resist Composition, And Patterning Process

COMPOUNDS AND METHODS TO TARGET GLUCOSE-STIMULATED PHOSPHOHISTIDINE...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

Na/K-ATPase LIGANDS AND USE THEREOF FOR TREATMENT OF CANCER

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ORGANIC COMPOUND, ORGANIC ELECTROLUMINESCENT DEVICE AND ELECTRONIC...

ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

NOVEL CATIONIC PHOTOINITIATOR AND PREPARATION METHOD AND USE THEREOF

RESIST COMPOSITION AND PATTERNING PROCESS

FLOW BATTERY THAT INCLUDES LIQUID CONTAINING MEDIATOR

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

SPIROBIFLUORENE DERIVATIVE-BASED MATERIALS FOR ELECTRONIC DEVICES

RESIST COMPOSITION AND PATTERNING PROCESS

POLYCYCLIC PHOTOINITIATORS