Beam blanking

Industry

CPC
H01J2237/043

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/043Beam blanking

Industries

Patents Grantslast 30 patents

Information Patent Grant
Drawing apparatus and deflector
- Patent number 12,009,174
- Issue date Jun 11, 2024
- NuFlare Technology, Inc.
- Kazuhiro Kishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RFSOI semiconductor structures including a nitrogen-doped charge-tr...
- Patent number 11,984,477
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,908,659
- Issue date Feb 20, 2024
- NuFlare Technology, Inc.
- Toshiki Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking aperture array unit
- Patent number 11,837,429
- Issue date Dec 5, 2023
- NuFlare Technology, Inc.
- Shuji Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,804,356
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam adjustment method, multi charged partic...
- Patent number 11,804,360
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aperture array with integrated current measurement
- Patent number 11,791,132
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 11,756,766
- Issue date Sep 12, 2023
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Charged particle blocking element, exposure apparatus comprising su...
- Patent number 11,728,123
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, multi-charged-particle beam writing apparatus...
- Patent number 11,721,520
- Issue date Aug 8, 2023
- NuFlare Technology, Inc.
- Kei Obara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma block with integrated cooling
- Patent number 11,710,630
- Issue date Jul 25, 2023
- Applied Materials, Inc.
- Tanmay P. Gurjar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron beam irradiation apparatus and electron beam irradiation m...
- Patent number 11,664,191
- Issue date May 30, 2023
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam adjustment method, charged particle beam draw...
- Patent number 11,658,002
- Issue date May 23, 2023
- NuFlare Technology, Inc.
- Ryoichi Kakehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple electron beam writing apparatus and multiple electron beam...
- Patent number 11,621,140
- Issue date Apr 4, 2023
- NuFlare Technology, Inc.
- Kota Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fill pattern to enhance ebeam process margin
- Patent number 11,581,162
- Issue date Feb 14, 2023
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple-charged particle-beam irradiation apparatus and multiple-c...
- Patent number 11,574,797
- Issue date Feb 7, 2023
- NuFlare Technology, Inc.
- Mitsuhiro Okazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling operation of electron emission source, elect...
- Patent number 11,562,878
- Issue date Jan 24, 2023
- NuFlare Technology, Inc.
- Nobuo Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing apparatus
- Patent number 11,387,075
- Issue date Jul 12, 2022
- Oxford Instruments Nanotechnology Tools, Ltd.
- Michael Cooke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RFSOI semiconductor structures including a nitrogen-doped charge-tr...
- Patent number 11,362,176
- Issue date Jun 14, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating on dielectric insert of a resonant RF cavity
- Patent number 11,328,892
- Issue date May 10, 2022
- FEI Company
- Erik Rene Kieft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital detector, apparatus of charged-particle beam such as electr...
- Patent number 11,328,898
- Issue date May 10, 2022
- BORRIES PTE. LTD.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,289,304
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 11,276,558
- Issue date Mar 15, 2022
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus and multi-charged par...
- Patent number 11,270,865
- Issue date Mar 8, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operating method of plasma processi...
- Patent number 11,244,803
- Issue date Feb 8, 2022
- HITACHI HIGH-TECH CORPORATION
- Keisuke Akinaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,217,423
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus
- Patent number 11,217,428
- Issue date Jan 4, 2022
- NuFlare Technology, Inc.
- Mitsuhiro Okazawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS
- Publication number 20240297010
- Publication date Sep 5, 2024
- NuFlare Technology, Inc.
- Eita FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...
- Publication number 20240282550
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...
- Publication number 20240274659
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL
- Publication number 20240203687
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- Gero Storeck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTI-BEAM PARTICLE MICROSCOPE WITH FAST CLO...
- Publication number 20240128048
- Publication date Apr 18, 2024
- Carl Zeiss MultiSEM GmbH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE BEAM SYSTEM WITH ANISOTROPIC FILTERING...
- Publication number 20240128051
- Publication date Apr 18, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20240071711
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM DETECTOR, MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, A...
- Publication number 20240071714
- Publication date Feb 29, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240029999
- Publication date Jan 25, 2024
- NuFlare Technology, Inc.
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE...
- Publication number 20240013999
- Publication date Jan 11, 2024
- NuFlare Technology, Inc.
- Toshiki KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...
- Publication number 20230402253
- Publication date Dec 14, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...
- Publication number 20230335366
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing System and Charged Particle Beam Apparatus
- Publication number 20230314128
- Publication date Oct 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Masaya GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITI...
- Publication number 20230260748
- Publication date Aug 17, 2023
- NuFlare Technology, Inc.
- Kota IWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...
- Publication number 20230260749
- Publication date Aug 17, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ESTIMATING CATHODE LIFETIME OF ELECTRON GUN, AND ELECTRO...
- Publication number 20230154720
- Publication date May 18, 2023
- NuFlare Technology, Inc.
- Nobuo MIYAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS
- Publication number 20230111566
- Publication date Apr 13, 2023
- NuFlare Technology, Inc.
- Eita FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM
- Publication number 20230086984
- Publication date Mar 23, 2023
- ASML NETHERLANDS B.V.
- Te-Yu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...
- Publication number 20230081240
- Publication date Mar 16, 2023
- NuFlare Technology, Inc.
- Ryosuke UEBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...
- Publication number 20230055778
- Publication date Feb 23, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-MODAL OPERATIONS FOR MULTI-BEAM INSPECTION SYSTEM
- Publication number 20230019113
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Martinus Gerardus Johannes Maria MAASSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20220399181
- Publication date Dec 15, 2022
- NuFlare Technology, Inc.
- Toshiki KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY UNIT
- Publication number 20220392731
- Publication date Dec 8, 2022
- NuFlare Technology, Inc.
- Shuji YOSHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS SURFACE MONITORING
- Publication number 20220380896
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20220319807
- Publication date Oct 6, 2022
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...
- Publication number 20220320277
- Publication date Oct 6, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta WU
- H01 - BASIC ELECTRIC ELEMENTS

Beam blanking

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Drawing apparatus and deflector

RFSOI semiconductor structures including a nitrogen-doped charge-tr...

Beam grid layout

Multi charged particle beam writing apparatus

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Blanking aperture array unit

Apparatus using multiple beams of charged particles

Multi charged particle beam adjustment method, multi charged partic...

Aperture array with integrated current measurement

Charged particle beam writing apparatus and charged particle beam w...

Method and system for the removal and/or avoidance of contamination...

Charged particle blocking element, exposure apparatus comprising su...

Semiconductor device, multi-charged-particle beam writing apparatus...

Plasma block with integrated cooling

Electron beam irradiation apparatus and electron beam irradiation m...

Charged particle beam adjustment method, charged particle beam draw...

Multiple electron beam writing apparatus and multiple electron beam...

Fill pattern to enhance ebeam process margin

Multiple-charged particle-beam irradiation apparatus and multiple-c...

Method for controlling operation of electron emission source, elect...

Surface processing apparatus

RFSOI semiconductor structures including a nitrogen-doped charge-tr...

Coating on dielectric insert of a resonant RF cavity

Digital detector, apparatus of charged-particle beam such as electr...

Apparatus using multiple beams of charged particles

Exposure apparatus and exposure method, lithography method, and dev...

Multi-charged particle beam writing apparatus and multi-charged par...

Plasma processing apparatus and operating method of plasma processi...

Apparatus of plural charged-particle beams

Multi charged particle beam writing apparatus

Patents Applicationslast 30 patents

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

Method for Determining Focal Properties in a Target Beam Field of a...

CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS

BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING AP...

RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL

METHOD FOR OPERATING A MULTI-BEAM PARTICLE MICROSCOPE WITH FAST CLO...

MULTI-BEAM CHARGED PARTICLE BEAM SYSTEM WITH ANISOTROPIC FILTERING...

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

BEAM DETECTOR, MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, A...

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE...

MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...

Multi-Beam Pattern Definition Device

CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...

Processing System and Charged Particle Beam Apparatus

MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITI...

OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...

METHOD FOR ESTIMATING CATHODE LIFETIME OF ELECTRON GUN, AND ELECTRO...

CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS

BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM

MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...

MULTI-MODAL OPERATIONS FOR MULTI-BEAM INSPECTION SYSTEM

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

BLANKING APERTURE ARRAY UNIT

SEMICONDUCTOR PROCESS SURFACE MONITORING

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...