Beam current control or regulation circuits

Industry

CPC
H01J37/243

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/243Beam current control or regulation circuits

Industries

Patents Grantslast 30 patents

Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arbitrary electron dose waveforms for electron microscopy
- Patent number 12,080,514
- Issue date Sep 3, 2024
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Ruth Shewmon Bloom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and power supply device
- Patent number 11,810,752
- Issue date Nov 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture array with integrated current measurement
- Patent number 11,791,132
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arbitrary electron dose waveforms for electron microscopy
- Patent number 11,728,128
- Issue date Aug 15, 2023
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Ruth Shewmon Bloom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam etch
- Patent number 11,646,171
- Issue date May 9, 2023
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of mixing upstream and downstream current measurements for i...
- Patent number 11,646,175
- Issue date May 9, 2023
- Axcelis Technologies, Inc.
- James DeLuca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for reduction of particle contamination by bia...
- Patent number 11,600,464
- Issue date Mar 7, 2023
- Advanced Ion Beam Technology, Inc.
- Shao-Yu Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam profiling system and related methods
- Patent number 11,598,890
- Issue date Mar 7, 2023
- Battelle Energy Alliance, LLC
- Chase N. Taylor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for adjusting focal point position
- Patent number 11,501,944
- Issue date Nov 15, 2022
- Shanghai United Imaging Healthcare Co., Ltd.
- Yanfeng Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arbitrary electron dose waveforms for electron microscopy
- Patent number 11,476,082
- Issue date Oct 18, 2022
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Ruth Shewmon Bloom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic filter providing reduced particle generation
- Patent number 11,437,215
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam etch
- Patent number 11,227,741
- Issue date Jan 18, 2022
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 11,127,566
- Issue date Sep 21, 2021
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring apparatus and method of setting observation condition
- Patent number 11,043,358
- Issue date Jun 22, 2021
- HITACHI HIGH-TECH CORPORATION
- Ryoko Araki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for determining, using, and indicating ion be...
- Patent number 11,004,656
- Issue date May 11, 2021
- Gatan, Inc.
- John Andrew Hunt
- G01 - MEASURING TESTING
Information Patent Grant
Device for generating a source current of charge carriers
- Patent number 10,957,510
- Issue date Mar 23, 2021
- Ketek GmbH
- Felix Düsberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for measuring ion beam current, sample preparation appara...
- Patent number 10,861,672
- Issue date Dec 8, 2020
- Jeol Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method to monitor glitch energy
- Patent number 10,770,261
- Issue date Sep 8, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Larry G. Nelson
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and system for adjusting focal point position
- Patent number 10,679,817
- Issue date Jun 9, 2020
- Shanghai United Imaging Healthcare Co., Ltd.
- Yanfeng Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray system and method of inspecting X-ray tube
- Patent number 10,614,996
- Issue date Apr 7, 2020
- Canon Electron Tubes & Devices Co., Ltd.
- Tetsuya Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron energy loss spectroscopy with adjustable energy resolution
- Patent number 10,522,323
- Issue date Dec 31, 2019
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 10,460,909
- Issue date Oct 29, 2019
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Emission noise correction of a charged particle source
- Patent number 10,453,647
- Issue date Oct 22, 2019
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 10,381,192
- Issue date Aug 13, 2019
- TOSHIBA MEMORY CORPORATION
- Tsuyoshi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device and ion milling method
- Patent number 10,332,722
- Issue date Jun 25, 2019
- Hitachi High-Technologies Corporation
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Safety dose interlock for charged particle beams
- Patent number 10,300,304
- Issue date May 28, 2019
- Pyramid Technical Consultants Inc.
- William P. Nett
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Ion milling apparatus and ion milling method
- Patent number 10,192,710
- Issue date Jan 29, 2019
- Hitachi High-Technologies Corporation
- Yuki Tani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor plasma antenna apparatus
- Patent number 10,147,583
- Issue date Dec 4, 2018
- Electronics and Telecommunications Research Institute
- Young Kyun Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus, and multi charged pa...
- Patent number 10,134,562
- Issue date Nov 20, 2018
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR ADJUSTING BEAM CURRENT USING A FEEDBACK LOOP...
- Publication number 20240312758
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Zheng FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL
- Publication number 20240203687
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- Gero Storeck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTI-BEAM PARTICLE MICROSCOPE WITH FAST CLO...
- Publication number 20240128048
- Publication date Apr 18, 2024
- Carl Zeiss MultiSEM GmbH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM INSPECTION
- Publication number 20240120173
- Publication date Apr 11, 2024
- VueReal Inc.
- Gholamreza CHAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20240120174
- Publication date Apr 11, 2024
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus and Report Creation Method
- Publication number 20230420214
- Publication date Dec 28, 2023
- Hitachi High-Tech Corporation
- Ryo KOMATSUZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY
- Publication number 20230411112
- Publication date Dec 21, 2023
- Integrated Dynamic Electron Solutions, Inc.
- Ruth Shewmon BLOOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM GENERATION
- Publication number 20230178326
- Publication date Jun 8, 2023
- MICROCHIP TECHNOLOGY INCORPORATED
- Hyunwook Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ESTIMATING CATHODE LIFETIME OF ELECTRON GUN, AND ELECTRO...
- Publication number 20230154720
- Publication date May 18, 2023
- NuFlare Technology, Inc.
- Nobuo MIYAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM CURRENT ADJUSTMENT FOR CHARGED-PARTICLE INSPECTION SYSTEM
- Publication number 20230028799
- Publication date Jan 26, 2023
- ASML NETHERLANDS B.V.
- Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DEFECT INSPECTION USING VOLTAGE CONTRAST IN A...
- Publication number 20230012946
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY
- Publication number 20220406561
- Publication date Dec 22, 2022
- Integrated Dynamic Electron Solutions, Inc.
- Ruth Shewmon BLOOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY
- Publication number 20220336185
- Publication date Oct 20, 2022
- Integrated Dynamic Electron Solutions, Inc.
- Ruth Shewmon BLOOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ION BEAM DEPOSITION AND ETCH
- Publication number 20220189727
- Publication date Jun 16, 2022
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Ion Beam Etch
- Publication number 20220084779
- Publication date Mar 17, 2022
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND POWER SUPPLY DEVICE
- Publication number 20220068595
- Publication date Mar 3, 2022
- HITACHI HIGH-TECH CORPORATION
- Wen Li
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION
- Publication number 20210183609
- Publication date Jun 17, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR REDUCTION OF PARTICLE CONTAMINATION BY BIA...
- Publication number 20210104378
- Publication date Apr 8, 2021
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Shao-Yu HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20200328060
- Publication date Oct 15, 2020
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT
- Publication number 20200312619
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING FOCAL POINT POSITION
- Publication number 20200303151
- Publication date Sep 24, 2020
- Shanghai United Imaging Healthcare Co., Ltd.
- Yanfeng DU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Measuring Ion Beam Current, Sample Preparation Appara...
- Publication number 20200266028
- Publication date Aug 20, 2020
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR GENERATING A MULTIPLICITY OF PARTICLE BEAMS, AND MULT...
- Publication number 20200211810
- Publication date Jul 2, 2020
- CARL ZEISS MICROSCOPY GMBH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device For Generating a Source Current of Charge Carriers
- Publication number 20200144015
- Publication date May 7, 2020
- KETEK GmbH
- Felix Düsberg
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MEASURING APPARATUS AND METHOD OF SETTING OBSERVATION CONDITION
- Publication number 20200111638
- Publication date Apr 9, 2020
- Hitachi High-Technologies Corporation
- Ryoko ARAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Ion Beam Etch
- Publication number 20190341221
- Publication date Nov 7, 2019
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON ENERGY LOSS SPECTROSCOPY WITH ADJUSTABLE ENERGY RESOLUTION
- Publication number 20190311880
- Publication date Oct 10, 2019
- FEI Company
- Peter Christiaan TIEMEIJER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System And Method To Monitor Glitch Energy
- Publication number 20190189390
- Publication date Jun 20, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Larry G. Nelson
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20190074158
- Publication date Mar 7, 2019
- Toshiba Memory Corporation
- Tsuyoshi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING FOCAL POINT POSITION
- Publication number 20180358198
- Publication date Dec 13, 2018
- Shanghai United Imaging Healthcare Co., Ltd.
- Yanfeng DU
- H01 - BASIC ELECTRIC ELEMENTS

Beam current control or regulation circuits

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Scanning ion beam deposition and etch

Arbitrary electron dose waveforms for electron microscopy

Charged particle beam device and power supply device

Aperture array with integrated current measurement

Arbitrary electron dose waveforms for electron microscopy

Scanning ion beam etch

Method of mixing upstream and downstream current measurements for i...

Apparatus and method for reduction of particle contamination by bia...

Ion beam profiling system and related methods

Method and system for adjusting focal point position

Arbitrary electron dose waveforms for electron microscopy

Electrostatic filter providing reduced particle generation

Scanning ion beam etch

Multi charged particle beam writing apparatus and multi charged par...

Measuring apparatus and method of setting observation condition

Methods and apparatus for determining, using, and indicating ion be...

Device for generating a source current of charge carriers

Apparatus for measuring ion beam current, sample preparation appara...

System and method to monitor glitch energy

Method and system for adjusting focal point position

X-ray system and method of inspecting X-ray tube

Electron energy loss spectroscopy with adjustable energy resolution

Charged particle beam writing method and charged particle beam writ...

Emission noise correction of a charged particle source

Ion implantation apparatus and ion implantation method

Ion milling device and ion milling method

Safety dose interlock for charged particle beams

Ion milling apparatus and ion milling method

Semiconductor plasma antenna apparatus

Multi charged particle beam writing apparatus, and multi charged pa...

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR ADJUSTING BEAM CURRENT USING A FEEDBACK LOOP...

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL

METHOD FOR OPERATING A MULTI-BEAM PARTICLE MICROSCOPE WITH FAST CLO...

EBEAM INSPECTION

Ion Milling Device

Charged Particle Beam Apparatus and Report Creation Method

ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY

CHARGED PARTICLE BEAM GENERATION

METHOD FOR ESTIMATING CATHODE LIFETIME OF ELECTRON GUN, AND ELECTRO...

BEAM CURRENT ADJUSTMENT FOR CHARGED-PARTICLE INSPECTION SYSTEM

SYSTEM AND METHOD FOR DEFECT INSPECTION USING VOLTAGE CONTRAST IN A...

ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY

ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY

SCANNING ION BEAM DEPOSITION AND ETCH

Scanning Ion Beam Etch

CHARGED PARTICLE BEAM DEVICE AND POWER SUPPLY DEVICE

ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION

APPARATUS AND METHOD FOR REDUCTION OF PARTICLE CONTAMINATION BY BIA...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT

METHOD AND SYSTEM FOR ADJUSTING FOCAL POINT POSITION

Apparatus for Measuring Ion Beam Current, Sample Preparation Appara...

APPARATUS FOR GENERATING A MULTIPLICITY OF PARTICLE BEAMS, AND MULT...

Device For Generating a Source Current of Charge Carriers

MEASURING APPARATUS AND METHOD OF SETTING OBSERVATION CONDITION

Scanning Ion Beam Etch

ELECTRON ENERGY LOSS SPECTROSCOPY WITH ADJUSTABLE ENERGY RESOLUTION

System And Method To Monitor Glitch Energy

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

METHOD AND SYSTEM FOR ADJUSTING FOCAL POINT POSITION