Beam diameter

Industry

CPC
H01J2237/30477

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/30477Beam diameter

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and techniques for beam mapping in ion beam system
- Patent number 10,431,421
- Issue date Oct 1, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Eric D. Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ beam current monitoring and control in scanned ion implanta...
- Patent number 10,395,889
- Issue date Aug 27, 2019
- Axcelis Technologies, Inc.
- Alfred Mike Halling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assessment and calibration of a high energy beam
- Patent number 10,388,486
- Issue date Aug 20, 2019
- Howmedica Osteonics Corp.
- Lewis Mullen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 10,217,607
- Issue date Feb 26, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assessment and calibration of a high energy beam
- Patent number 10,049,852
- Issue date Aug 14, 2018
- Howmedica Osteonics Corp.
- Lewis Mullen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam dimension control for ion implantation process and apparat...
- Patent number 9,805,913
- Issue date Oct 31, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lower dose rate ion implantation using a wider ion beam
- Patent number 9,748,072
- Issue date Aug 29, 2017
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and ion implantation apparatus
- Patent number 9,646,837
- Issue date May 9, 2017
- SEN CORPORATION
- Shiro Ninomiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus
- Patent number 9,520,265
- Issue date Dec 13, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Takanori Yagita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Current regulation method of multiple beams
- Patent number 9,455,123
- Issue date Sep 27, 2016
- NuFlare Technology, Inc.
- Kenichi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for spot size measurement at wafer level using a knife edge...
- Patent number 9,240,306
- Issue date Jan 19, 2016
- Mapper Lithography IP B.V.
- Jan Andries Meijer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion beam dimension control for ion implantation process and apparat...
- Patent number 9,070,534
- Issue date Jun 30, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus
- Patent number 8,692,218
- Issue date Apr 8, 2014
- Canon Kabushiki Kaisha
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for improved uniformity control with dynamic b...
- Patent number 8,653,486
- Issue date Feb 18, 2014
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion beam apparatus and method employing magnetic scanning
- Patent number 8,436,326
- Issue date May 7, 2013
- Semequip, Inc.
- Hilton F. Glavish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved uniformity control with dynamic b...
- Patent number 8,421,039
- Issue date Apr 16, 2013
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle source with automated tip formation
- Patent number 8,330,130
- Issue date Dec 11, 2012
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for multi-pass correction of substrate defects
- Patent number 8,293,126
- Issue date Oct 23, 2012
- TEL Epion Inc.
- Ruairidh MacCrimmon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam apparatus and method for ion implantation
- Patent number 8,110,820
- Issue date Feb 7, 2012
- SemEquip, Inc.
- Hilton F. Glavish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling beam current uniformity in an...
- Patent number 8,003,956
- Issue date Aug 23, 2011
- Varian Semiconductor Equipment Associates, Inc.
- D. Jeffrey Lischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam profile measurement
- Patent number 7,875,860
- Issue date Jan 25, 2011
- The Boeing Company
- Jason Andrew Koehn
- G01 - MEASURING TESTING
Information Patent Grant
Ion beam apparatus and method employing magnetic scanning
- Patent number 7,851,773
- Issue date Dec 14, 2010
- Semiquip, Inc.
- Hilton F. Glavish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implant uniformity control
- Patent number 7,820,988
- Issue date Oct 26, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting apparatus
- Patent number 7,759,658
- Issue date Jul 20, 2010
- Nissin Ion Equipment Co., Ltd.
- Yoshiki Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and method of converging/shaping ion bea...
- Patent number 7,755,067
- Issue date Jul 13, 2010
- Sen Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and method for implanting a wafer
- Patent number 7,750,323
- Issue date Jul 6, 2010
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for ion beam profiling
- Patent number 7,701,230
- Issue date Apr 20, 2010
- Axcelis Technologies, Inc.
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus
- Patent number 7,692,166
- Issue date Apr 6, 2010
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic beam deflection scanner and beam deflection scanning...
- Patent number 7,687,782
- Issue date Mar 30, 2010
- SEN Corporation, an SHI and Axcelis Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and polishing system using the same
- Patent number 7,567,026
- Issue date Jul 28, 2009
- Hon Hai Precision Industry Co., Ltd.
- Ga-Lane Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...
- Publication number 20240203684
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- David Disterheft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...
- Publication number 20230386785
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Milling Sample
- Publication number 20230197401
- Publication date Jun 22, 2023
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM
- Publication number 20200027698
- Publication date Jan 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Eric D. Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSESSMENT AND CALIBRATION OF A HIGH ENERGY BEAM
- Publication number 20180308657
- Publication date Oct 25, 2018
- Howmedica Osteonics Corp.
- Lewis Mullen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20180068829
- Publication date Mar 8, 2018
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM DIMENSION CONTROL FOR ION IMPLANTATION PROCESS AND APPARAT...
- Publication number 20150270103
- Publication date Sep 24, 2015
- Taiwan Semiconductor Manufacturing Co., LTD
- Chih-Hong HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CURRENT REGULATION METHOD OF MULTIPLE BEAMS
- Publication number 20140265827
- Publication date Sep 18, 2014
- NuFlare Technology, Inc.
- Kenichi SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM DIMENSION CONTROL FOR ION IMPLANTATION PROCESS AND APPARAT...
- Publication number 20130295753
- Publication date Nov 7, 2013
- Taiwan Semiconductor Manufacturing Co., LTD
- Chih-Hong HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS
- Publication number 20130157390
- Publication date Jun 20, 2013
- SEN Corporation
- Shiro NINOMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR IMPROVED UNIFORMITY CONTROL WITH DYNAMIC B...
- Publication number 20130099131
- Publication date Apr 25, 2013
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Method and Apparatus for Improved Uniformity Control with Dynamic B...
- Publication number 20120248324
- Publication date Oct 4, 2012
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING
- Publication number 20110089321
- Publication date Apr 21, 2011
- SemEquip, Inc.
- Hilton F. Glavish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD
- Publication number 20110053088
- Publication date Mar 3, 2011
- FUJIFILM CORPORATION
- Toshihiro USA
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN...
- Publication number 20100084582
- Publication date Apr 8, 2010
- Varian Semiconductor Equipment Associates, Inc.
- D. Jeffrey LISCHER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLANT UNIFORMITY CONTROL
- Publication number 20100084581
- Publication date Apr 8, 2010
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam profile measurement
- Publication number 20100072392
- Publication date Mar 25, 2010
- The Boeing Company
- Jason Andrew Koehn
- G01 - MEASURING TESTING
Information Patent Application
ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING
- Publication number 20090261248
- Publication date Oct 22, 2009
- Hilton F. Glavish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTING APPARATUS
- Publication number 20090256082
- Publication date Oct 15, 2009
- NISSIN ION EQUIPMENT CO., LTD.
- Yoshiki Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM APPARATUS AND METHOD FOR ION IMPLANTATION
- Publication number 20090206270
- Publication date Aug 20, 2009
- SEMEQUIP, INC.
- Hilton F. Glayish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE WITH AUTOMATED TIP FORMATION
- Publication number 20090121160
- Publication date May 14, 2009
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Dieter Winkler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MULTI-PASS CORRECTION OF SUBSTRATE DEFECTS
- Publication number 20090084759
- Publication date Apr 2, 2009
- TEL Epion Inc.
- Ruairidh MacCRIMMON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR ASSIGNING A BEAM INTENSITY PROFILE TO A G...
- Publication number 20090001282
- Publication date Jan 1, 2009
- TOKYO ELECTRON LIMITED
- Nicolaus J. Hofmeester
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR ION BEAM PROFILING
- Publication number 20080265866
- Publication date Oct 30, 2008
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Implantation Apparatus and Method of Converging/Shaping Ion Bea...
- Publication number 20080251734
- Publication date Oct 16, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROFILER
- Publication number 20080073553
- Publication date Mar 27, 2008
- IBIS TECHNOLOGY CORPORATION
- Julian G. Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS
- Publication number 20080067402
- Publication date Mar 20, 2008
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electrostatic beam deflection scanner and beam deflection scanning...
- Publication number 20080067404
- Publication date Mar 20, 2008
- SEN Corporation, an SHI and AXCELIS Company
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT OF CRITICAL DIMENSION AND QUANTIFICATION OF ELECTRON BE...
- Publication number 20080067373
- Publication date Mar 20, 2008
- International Business Machines Corporation
- Lin Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS
- Publication number 20080067403
- Publication date Mar 20, 2008
- Masato Muraki
- B82 - NANO-TECHNOLOGY

Beam diameter

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and techniques for beam mapping in ion beam system

In situ beam current monitoring and control in scanned ion implanta...

Assessment and calibration of a high energy beam

Ion implantation apparatus and ion implantation method

Assessment and calibration of a high energy beam

Ion beam dimension control for ion implantation process and apparat...

Lower dose rate ion implantation using a wider ion beam

Ion implantation method and ion implantation apparatus

Ion implantation apparatus

Current regulation method of multiple beams

Device for spot size measurement at wafer level using a knife edge...

Ion beam dimension control for ion implantation process and apparat...

Charged particle beam exposure apparatus

Method and apparatus for improved uniformity control with dynamic b...

Ion beam apparatus and method employing magnetic scanning

Method and apparatus for improved uniformity control with dynamic b...

Charged particle source with automated tip formation

Method and system for multi-pass correction of substrate defects

Ion beam apparatus and method for ion implantation

Method and apparatus for controlling beam current uniformity in an...

Charged particle beam profile measurement

Ion beam apparatus and method employing magnetic scanning

Implant uniformity control

Ion implanting apparatus

Ion implantation apparatus and method of converging/shaping ion bea...

Ion implanter and method for implanting a wafer

Method and system for ion beam profiling

Charged particle beam exposure apparatus

Electrostatic beam deflection scanner and beam deflection scanning...

Ion source and polishing system using the same

Patents Applicationslast 30 patents

METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...

SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...

Apparatus and Method for Milling Sample

APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM

ASSESSMENT AND CALIBRATION OF A HIGH ENERGY BEAM

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

ION BEAM DIMENSION CONTROL FOR ION IMPLANTATION PROCESS AND APPARAT...

CURRENT REGULATION METHOD OF MULTIPLE BEAMS

ION BEAM DIMENSION CONTROL FOR ION IMPLANTATION PROCESS AND APPARAT...

ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS

METHOD AND APPARATUS FOR IMPROVED UNIFORMITY CONTROL WITH DYNAMIC B...

Method and Apparatus for Improved Uniformity Control with Dynamic B...

ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING

ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD

METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN...

IMPLANT UNIFORMITY CONTROL

Charged particle beam profile measurement

ION BEAM APPARATUS AND METHOD EMPLOYING MAGNETIC SCANNING

ION IMPLANTING APPARATUS

ION BEAM APPARATUS AND METHOD FOR ION IMPLANTATION

CHARGED PARTICLE SOURCE WITH AUTOMATED TIP FORMATION

METHOD AND SYSTEM FOR MULTI-PASS CORRECTION OF SUBSTRATE DEFECTS

METHODS AND APPARATUS FOR ASSIGNING A BEAM INTENSITY PROFILE TO A G...

METHOD AND SYSTEM FOR ION BEAM PROFILING

Ion Implantation Apparatus and Method of Converging/Shaping Ion Bea...

ION BEAM PROFILER

CHARGED PARTICLE BEAM EXPOSURE APPARATUS

Electrostatic beam deflection scanner and beam deflection scanning...

MEASUREMENT OF CRITICAL DIMENSION AND QUANTIFICATION OF ELECTRON BE...

CHARGED PARTICLE BEAM EXPOSURE APPARATUS