Beam forming

Industry

CPC
H01J2237/083

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/083Beam forming

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charge carrier generation source
- Patent number 12,211,663
- Issue date Jan 28, 2025
- SCIA SYSTEMS GMBH
- Enrico Loos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam source, surface processing apparatus and surf...
- Patent number 12,125,664
- Issue date Oct 22, 2024
- Oxford Instruments Nanotechnology Tools Limited
- David Pearson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion extraction assembly having variable electrode thickness for bea...
- Patent number 12,125,680
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 12,080,515
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automatic adjustment method and automatic adjustment device of beam...
- Patent number 11,955,309
- Issue date Apr 9, 2024
- United Microelectronics Corp.
- Zheng-Yang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,688,580
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 11,355,314
- Issue date Jun 7, 2022
- Canon Anelva Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 11,302,514
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation system and source bushing thereof
- Patent number 11,282,673
- Issue date Mar 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ying-Chieh Meng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and system including extraction optics having movable blo...
- Patent number 11,270,864
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extraction apparatus and system for high throughput ion beam proces...
- Patent number 11,127,556
- Issue date Sep 21, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,107,657
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical apparatus and particle beam system
- Patent number 11,087,949
- Issue date Aug 10, 2021
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source
- Patent number 11,075,053
- Issue date Jul 27, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,043,354
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam apparatus including slit structure for extracting ion beam
- Patent number 10,916,403
- Issue date Feb 9, 2021
- Samsung Electronics Co., Ltd.
- Jongchul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 10,879,040
- Issue date Dec 29, 2020
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Beam position monitors for medical radiation machines
- Patent number 10,879,028
- Issue date Dec 29, 2020
- Varian Medical Systems, Inc.
- Mark E. Trail
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Charged particle beam system and method
- Patent number 10,854,421
- Issue date Dec 1, 2020
- Carl Zeiss Microscopy GmbH
- Daniela Donhauser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electron beam device
- Patent number 10,854,424
- Issue date Dec 1, 2020
- Kabushiki Kaisha Toshiba
- Hideto Furuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion implantation system and source bushing thereof
- Patent number 10,784,079
- Issue date Sep 22, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ying-Chieh Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical apparatus and particle beam system
- Patent number 10,755,889
- Issue date Aug 25, 2020
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,643,820
- Issue date May 5, 2020
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical generator and molecular beam epitaxy apparatus
- Patent number 10,577,719
- Issue date Mar 3, 2020
- National University Corporation Nagoya University
- Masaru Hori
- C30 - CRYSTAL GROWTH
Information Patent Grant
Ion source and ion implantation apparatus
- Patent number 10,573,490
- Issue date Feb 25, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,573,487
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam spot optimization
- Patent number 10,529,529
- Issue date Jan 7, 2020
- Moxtek, Inc.
- Dustin Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam generation for transmission electron microscope
- Patent number 10,529,536
- Issue date Jan 7, 2020
- Technische Universiteit Eindhoven
- Otger Jan Luiten
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250112023
- Publication date Apr 3, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...
- Publication number 20240212967
- Publication date Jun 27, 2024
- PHOTO ELECTRON SOUL INC.
- Tomohiro NISHITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...
- Publication number 20230260749
- Publication date Aug 17, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Milling Sample
- Publication number 20230197401
- Publication date Jun 22, 2023
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE ANALYSIS SYSTEM COMPRISING A PULSED ELECTRON SOURCE
- Publication number 20230170176
- Publication date Jun 1, 2023
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Daniel COMPARAT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION ASSEMBLY HAVING VARIABLE ELECTRODE THICKNESS FOR BEA...
- Publication number 20230125435
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTIC...
- Publication number 20230065475
- Publication date Mar 2, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGE CARRIER GENERATION SOURCE
- Publication number 20220406559
- Publication date Dec 22, 2022
- SCIA SYSTEMS GMBH
- Enrico Loos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATIC ADJUSTMENT METHOD AND AUTOMATIC ADJUSTMENT DEVICE OF BEAM...
- Publication number 20220384139
- Publication date Dec 1, 2022
- United Microelectronics Corp.
- Zheng-Yang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20220262598
- Publication date Aug 18, 2022
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS
- Publication number 20220246395
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURF...
- Publication number 20220216027
- Publication date Jul 7, 2022
- Oxford Instruments Nanotechnology Tools Limited
- David PEARSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20220148851
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE
- Publication number 20220068589
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20210391138
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND SYSTEM INCLUDING EXTRACTION OPTICS HAVING MOVABLE BLO...
- Publication number 20210305001
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20210104377
- Publication date Apr 8, 2021
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20200388464
- Publication date Dec 10, 2020
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE-OPTICAL APPARATUS AND PARTICLE BEAM SYSTEM
- Publication number 20200381206
- Publication date Dec 3, 2020
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM AND SOURCE BUSHING THEREOF
- Publication number 20200381210
- Publication date Dec 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ying-Chieh MENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20200286705
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM DEVICE
- Publication number 20200279717
- Publication date Sep 3, 2020
- Kabushiki Kaisha Toshiba
- Hideto FURUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURF...
- Publication number 20200176214
- Publication date Jun 4, 2020
- Oxford Instruments Nanotechnology Tools Limited
- David PEARSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE
- Publication number 20200126753
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM AND SOURCE BUSHING THEREOF
- Publication number 20200098544
- Publication date Mar 26, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ying-Chieh MENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS
- Publication number 20200051779
- Publication date Feb 13, 2020
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE AND ION IMPLANTATION APPARATUS
- Publication number 20190326089
- Publication date Oct 24, 2019
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE USING AN ION BEAM AND APPARATUS FO...
- Publication number 20190272979
- Publication date Sep 5, 2019
- Samsung Electronics Co., Ltd.
- Yil-Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190259573
- Publication date Aug 22, 2019
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS

Beam forming

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charge carrier generation source

Charged particle beam source, surface processing apparatus and surf...

Ion extraction assembly having variable electrode thickness for bea...

Ion beam processing apparatus, electrode assembly, and method of cl...

Apparatus of plural charged-particle beams

Apparatus for multiple charged-particle beams

Automatic adjustment method and automatic adjustment device of beam...

Apparatus of plural charged-particle beams

Ion beam processing apparatus, electrode assembly, and method of cl...

Apparatus for multiple charged-particle beams

Ion implantation system and source bushing thereof

Apparatus and system including extraction optics having movable blo...

Extraction apparatus and system for high throughput ion beam proces...

Apparatus of plural charged-particle beams

Particle-optical apparatus and particle beam system

Charged particle source

Apparatus of plural charged-particle beams

Ion beam apparatus including slit structure for extracting ion beam

Ion beam processing apparatus, electrode assembly, and method of cl...

Beam position monitors for medical radiation machines

Charged particle beam system and method

Multi-electron beam device

Ion implantation system and source bushing thereof

Particle-optical apparatus and particle beam system

Apparatus of plural charged-particle beams

Radical generator and molecular beam epitaxy apparatus

Ion source and ion implantation apparatus

Apparatus of plural charged-particle beams

Electron-beam spot optimization

Electron beam generation for transmission electron microscope

Patents Applicationslast 30 patents

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...

OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...

Apparatus and Method for Milling Sample

SURFACE ANALYSIS SYSTEM COMPRISING A PULSED ELECTRON SOURCE

ION EXTRACTION ASSEMBLY HAVING VARIABLE ELECTRODE THICKNESS FOR BEA...

PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTIC...

CHARGE CARRIER GENERATION SOURCE

AUTOMATIC ADJUSTMENT METHOD AND AUTOMATIC ADJUSTMENT DEVICE OF BEAM...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS

CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURF...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

CHARGED PARTICLE SOURCE

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

APPARATUS AND SYSTEM INCLUDING EXTRACTION OPTICS HAVING MOVABLE BLO...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

PARTICLE-OPTICAL APPARATUS AND PARTICLE BEAM SYSTEM

ION IMPLANTATION SYSTEM AND SOURCE BUSHING THEREOF

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTI-ELECTRON BEAM DEVICE

CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURF...

CHARGED PARTICLE SOURCE

ION IMPLANTATION SYSTEM AND SOURCE BUSHING THEREOF

APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS

ION SOURCE AND ION IMPLANTATION APPARATUS

METHOD OF PROCESSING A SUBSTRATE USING AN ION BEAM AND APPARATUS FO...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS