Beam profile

Industry

CPC
H01J2237/24542

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24542Beam profile

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods of profiling charged-particle beams
- Patent number 12,165,836
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Maikel Robert Goosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam profiling system and related methods
- Patent number 11,598,890
- Issue date Mar 7, 2023
- Battelle Energy Alliance, LLC
- Chase N. Taylor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam profiles for analytic equipment configuration
- Patent number 11,508,549
- Issue date Nov 22, 2022
- FEI Company
- Herman Carlo Floresca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 11,508,552
- Issue date Nov 22, 2022
- HITACHI HIGH-TECH CORPORATION
- Hitoshi Kamoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and beam profiler
- Patent number 11,205,560
- Issue date Dec 21, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- David Edward Potkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam profile determination method and ion beam irradiation apparatus
- Patent number 11,145,486
- Issue date Oct 12, 2021
- NISSIN ION EQUIPMENT CO., LTD.
- Yutaka Inouchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 11,114,277
- Issue date Sep 7, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Angled slit design for computed tomographic imaging of electron beams
- Patent number 10,888,284
- Issue date Jan 12, 2021
- Lawrence Livermore National Security, LLC
- John W. Elmer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,867,774
- Issue date Dec 15, 2020
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 10,790,112
- Issue date Sep 29, 2020
- Hitachi High-Tech Science Corporation
- Yoshimi Kawanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 10,741,361
- Issue date Aug 11, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of obtaining beam deflection shape and method of obtaining a...
- Patent number 10,586,682
- Issue date Mar 10, 2020
- NuFlare Technology, Inc.
- Shunsuke Isaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and ion implantation apparatus
- Patent number 10,573,490
- Issue date Feb 25, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam profiling speed enhancement for scanned beam implanters
- Patent number 10,483,086
- Issue date Nov 19, 2019
- Axcelis Technologies, Inc.
- Andy M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,483,088
- Issue date Nov 19, 2019
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for beam mapping in ion beam system
- Patent number 10,431,421
- Issue date Oct 1, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Eric D. Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged-particle beam writing apparatus and adjustment method...
- Patent number 10,109,458
- Issue date Oct 23, 2018
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method and ion implantation apparatus performing t...
- Patent number 10,002,799
- Issue date Jun 19, 2018
- BOE Technology Group Co., Ltd.
- Hui Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and semiconductor manufacturing method
- Patent number 9,773,712
- Issue date Sep 26, 2017
- TOSHIBA MEMORY CORPORATION
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling implant process
- Patent number 9,738,968
- Issue date Aug 22, 2017
- Varian Semiconductor Equipment Associates, Inc.
- George M. Gammel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for characterizing focused charged beams
- Patent number 9,733,366
- Issue date Aug 15, 2017
- Indian Institute of Technology Kanpur
- Sudeep Bhattacharjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring vertical beam profile in an ion implantation sy...
- Patent number 9,711,328
- Issue date Jul 18, 2017
- Axcelis Technologies, Inc.
- Shu Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam line
- Patent number 9,502,213
- Issue date Nov 22, 2016
- Nissin Ion Equipment Co., Ltd.
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Current regulation method of multiple beams
- Patent number 9,455,123
- Issue date Sep 27, 2016
- NuFlare Technology, Inc.
- Kenichi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring ion implantation
- Patent number 9,449,889
- Issue date Sep 20, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-invasive charged particle beam monitor
- Patent number 9,390,887
- Issue date Jul 12, 2016
- KLA-Tencor Corporation
- Thomas Plettner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining beam parameters of a charge carrier beam, me...
- Patent number 9,347,974
- Issue date May 24, 2016
- RWTH AACHEN KOERPERSCHAFT DES OEFFENTLICHEN RECHTS
- Uwe Reisgen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electron beam exposure apparatus and method of detecting error usin...
- Patent number 9,229,327
- Issue date Jan 5, 2016
- Samsung Electronics Co., Ltd.
- Sang Yong Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam monitoring device, method, and system
- Patent number 9,218,938
- Issue date Dec 22, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of beam scanning to improve uniformity and productivity of a 2D...
- Patent number 9,147,554
- Issue date Sep 29, 2015
- Axcelis Technologies, Inc.
- Andy Ray
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...
- Publication number 20240087838
- Publication date Mar 14, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Gun, Electron Beam Applicator, and Method for Controlling...
- Publication number 20230131413
- Publication date Apr 27, 2023
- PHOTO ELECTRON SOUL INC.
- Atsushi KOIZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ION IMPLANTATION UNIFORMITY CONTROL
- Publication number 20230016619
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tien-Shun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF PROFILING CHARGED-PARTICLE BEAMS
- Publication number 20220392741
- Publication date Dec 8, 2022
- ASML NETHERLANDS B.V.
- Maikel Robert GOOSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20210183615
- Publication date Jun 17, 2021
- Hitachi High-Tech Corporation
- Hitoshi KAMOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND BEAM PROFILER
- Publication number 20210134559
- Publication date May 6, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- David Edward Potkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM PROFILES FOR ANALYTIC EQUIPMENT CONFIGURATION
- Publication number 20210125808
- Publication date Apr 29, 2021
- FEI Company
- Herman Carlo Floresca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM PROFILE DETERMINATION METHOD AND ION BEAM IRRADIATION APPARATUS
- Publication number 20210035774
- Publication date Feb 4, 2021
- NISSIN ION EQUIPMENT CO., LTD.
- Yutaka Inouchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANGLED SLIT DESIGN FOR COMPUTED TOMOGRAPHIC IMAGING OF ELECTRON BEAMS
- Publication number 20200297290
- Publication date Sep 24, 2020
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- John W. Elmer
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Dual Cathode Ion Source
- Publication number 20200294765
- Publication date Sep 17, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM
- Publication number 20200027698
- Publication date Jan 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Eric D. Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE AND ION IMPLANTATION APPARATUS
- Publication number 20190326089
- Publication date Oct 24, 2019
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...
- Publication number 20190172678
- Publication date Jun 6, 2019
- NuFlare Technology, Inc.
- Shunsuke ISAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED-PARTICLE BEAM WRITING APPARATUS AND ADJUSTMENT METHOD...
- Publication number 20170358425
- Publication date Dec 14, 2017
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR CONTROLLING ION IMPLANTATION UNIFORMITY
- Publication number 20140326179
- Publication date Nov 6, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Stanislav S. Todorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Beam Monitoring Device, Method, and System
- Publication number 20140306119
- Publication date Oct 16, 2014
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CURRENT REGULATION METHOD OF MULTIPLE BEAMS
- Publication number 20140265827
- Publication date Sep 18, 2014
- NuFlare Technology, Inc.
- Kenichi SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM LINE
- Publication number 20140261171
- Publication date Sep 18, 2014
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION
- Publication number 20140261181
- Publication date Sep 18, 2014
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Jiong Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE
- Publication number 20140161987
- Publication date Jun 12, 2014
- ADVANCED ION BEAM TECHNOLOGY., INC.
- ZHIMIN WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION IMPLANTATION APPARATUS
- Publication number 20140053778
- Publication date Feb 27, 2014
- NISSIN ION EQUIPMENT CO., LTD.
- Masao Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHOD AND ION IMPLANTER
- Publication number 20130299722
- Publication date Nov 14, 2013
- CHENG-HUI SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Monitoring Ion Implantation
- Publication number 20130280823
- Publication date Oct 24, 2013
- Chun-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20130256566
- Publication date Oct 3, 2013
- SEN Corporation
- Hiroyuki KARIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION
- Publication number 20130239892
- Publication date Sep 19, 2013
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Jiong Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20130143161
- Publication date Jun 6, 2013
- Canon Kabushiki Kaisha
- Keiichi ARITA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron Beam Profile Measurement System and Method with Optional F...
- Publication number 20130134323
- Publication date May 30, 2013
- ATTI INTERNATIONAL SERVICES COMPANY, INC
- Artush A. Abgaryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam Monitoring Device, Method, And System
- Publication number 20130075624
- Publication date Mar 28, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Monitoring Ion Implantation
- Publication number 20130068960
- Publication date Mar 21, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Ion Implantation with Improved Productivity a...
- Publication number 20130026356
- Publication date Jan 31, 2013
- Axcelis Technologies Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS

Beam profile

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods of profiling charged-particle beams

Ion beam profiling system and related methods

Particle beam profiles for analytic equipment configuration

Ion milling device

Ion implanter and beam profiler

Beam profile determination method and ion beam irradiation apparatus

Dual cathode ion source

Angled slit design for computed tomographic imaging of electron beams

Multi charged particle beam writing apparatus and multi charged par...

Focused ion beam apparatus

Dual cathode ion source

Method of obtaining beam deflection shape and method of obtaining a...

Ion source and ion implantation apparatus

Beam profiling speed enhancement for scanned beam implanters

Multi charged particle beam writing apparatus and multi charged par...

Apparatus and techniques for beam mapping in ion beam system

Multi charged-particle beam writing apparatus and adjustment method...

Ion implantation method and ion implantation apparatus performing t...

Ion implantation apparatus and semiconductor manufacturing method

Apparatus and method for controlling implant process

System and method for characterizing focused charged beams

Method of measuring vertical beam profile in an ion implantation sy...

Ion beam line

Current regulation method of multiple beams

Method for monitoring ion implantation

Non-invasive charged particle beam monitor

Method for determining beam parameters of a charge carrier beam, me...

Electron beam exposure apparatus and method of detecting error usin...

Beam monitoring device, method, and system

Use of beam scanning to improve uniformity and productivity of a 2D...

Patents Applicationslast 30 patents

MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...

Electron Gun, Electron Beam Applicator, and Method for Controlling...

METHOD FOR ION IMPLANTATION UNIFORMITY CONTROL

SYSTEMS AND METHODS OF PROFILING CHARGED-PARTICLE BEAMS

Ion Milling Device

ION IMPLANTER AND BEAM PROFILER

PARTICLE BEAM PROFILES FOR ANALYTIC EQUIPMENT CONFIGURATION

BEAM PROFILE DETERMINATION METHOD AND ION BEAM IRRADIATION APPARATUS

ANGLED SLIT DESIGN FOR COMPUTED TOMOGRAPHIC IMAGING OF ELECTRON BEAMS

Dual Cathode Ion Source

APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM

ION SOURCE AND ION IMPLANTATION APPARATUS

METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...

MULTI CHARGED-PARTICLE BEAM WRITING APPARATUS AND ADJUSTMENT METHOD...

APPARATUS AND TECHNIQUES FOR CONTROLLING ION IMPLANTATION UNIFORMITY

Beam Monitoring Device, Method, and System

CURRENT REGULATION METHOD OF MULTIPLE BEAMS

ION BEAM LINE

BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION

IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE

ION IMPLANTATION APPARATUS

ION IMPLANTATION METHOD AND ION IMPLANTER

Apparatus for Monitoring Ion Implantation

ION IMPLANTATION APPARATUS AND CONTROL METHOD THEREOF

BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION

CHARGED PARTICLE BEAM APPARATUS

Electron Beam Profile Measurement System and Method with Optional F...

Beam Monitoring Device, Method, And System

Apparatus for Monitoring Ion Implantation

System and Method for Ion Implantation with Improved Productivity a...