Beam tilting means

Industry

CPC
H01J37/1478

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/1478Beam tilting means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of rolling k vectors of angled gratings
- Patent number 12,106,935
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Geometry based three dimensional reconstruction of a semiconductor...
- Patent number 11,953,316
- Issue date Apr 9, 2024
- Applied Materials Israel Ltd.
- Rafael Bistritzer
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for real time stereo imaging using multiple ele...
- Patent number 11,942,303
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 11,894,213
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Asako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 11,817,290
- Issue date Nov 14, 2023
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of rolling k vectors of angled gratings
- Patent number 11,670,482
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Joseph C. Olson
- G02 - OPTICS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,587,758
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 11,587,759
- Issue date Feb 21, 2023
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of rolling K vectors of angled gratings
- Patent number 11,456,152
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration sample, electron beam adjustment method and electron be...
- Patent number 11,435,178
- Issue date Sep 6, 2022
- HITACHI HIGH-TECH CORPORATION
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of ion beam angle
- Patent number 11,367,589
- Issue date Jun 21, 2022
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for repairing a photolithographic mask
- Patent number 11,256,168
- Issue date Feb 22, 2022
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement device and non-transitory computer readable med...
- Patent number 11,177,112
- Issue date Nov 16, 2021
- HITACHI HIGH-TECH CORPORATION
- Satoru Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diagonal compound mill
- Patent number 11,158,487
- Issue date Oct 26, 2021
- FEI Company
- Clifford Russell Bugge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,152,186
- Issue date Oct 19, 2021
- HITACHI HIGH-TECH CORPORATION
- Wataru Yamane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,069,513
- Issue date Jul 20, 2021
- Kioxia Corporation
- Mitsuo Koike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rock sample preparation method by using focused ion beam for minimi...
- Patent number 10,948,429
- Issue date Mar 16, 2021
- Saudi Arabian Oil Company
- Dong kyu Cha
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for combined stem and EDS tomography
- Patent number 10,890,545
- Issue date Jan 12, 2021
- Imec VZW
- Hugo Bender
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,879,031
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration measurement method and electron microscope
- Patent number 10,840,058
- Issue date Nov 17, 2020
- Jeol Ltd.
- Yuji Kohno
- G01 - MEASURING TESTING
Information Patent Grant
Focused ion beam apparatus
- Patent number 10,790,112
- Issue date Sep 29, 2020
- Hitachi High-Tech Science Corporation
- Yoshimi Kawanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and capturing condition adjusting meth...
- Patent number 10,770,266
- Issue date Sep 8, 2020
- HITACHI HIGH-TECH CORPORATION
- Tomohito Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enabling high throughput electron channeling contrast imaging (ECCI...
- Patent number 10,714,303
- Issue date Jul 14, 2020
- International Business Machines Corporation
- Brent A. Wacaser
- G01 - MEASURING TESTING
Information Patent Grant
Method for sample orientation for TEM lamella preparation
- Patent number 10,504,689
- Issue date Dec 10, 2019
- FEI Company
- TomáTomá{hacek over (s)} Vystavel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,395,886
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rock sample preparation method by using focused ion beam for minimi...
- Patent number 10,324,049
- Issue date Jun 18, 2019
- Saudi Arabian Oil Company
- Dong kyu Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing coma and chromatic aberration in a charged parti...
- Patent number 10,297,418
- Issue date May 21, 2019
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Jürgen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam inclination correction method and charged par...
- Patent number 10,229,811
- Issue date Mar 12, 2019
- Hitachi High-Technologies Corporation
- Yuzuru Mizuhara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FLOW FOR HIGH RESOLUTION STEREOSCOPIC MEASUREMENTS
- Publication number 20240339289
- Publication date Oct 10, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Adar Sonn-Segev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...
- Publication number 20240281952
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Thomas Korb
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING...
- Publication number 20240203688
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Kunsu KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL AUTO-FOCUS UNIT AND A METHOD FOR AUTO-FOCUS
- Publication number 20240071715
- Publication date Feb 29, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Sissi Lachmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...
- Publication number 20240029993
- Publication date Jan 25, 2024
- FEI Company
- Maarten BISCHOFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM APPARATUS WITH BEAM-TILT AND METHODS THEREOF
- Publication number 20240021404
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230411111
- Publication date Dec 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Tetsuro KADOWAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20230282441
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULATION OF ROLLING K VECTORS OF ANGLED GRATINGS
- Publication number 20230260746
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Joseph C. OLSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...
- Publication number 20230223231
- Publication date Jul 13, 2023
- FEI Company
- Maarten BISCHOFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING A...
- Publication number 20230223269
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Kevin Anglin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MULTIPLE PARTICLE BEAM SYSTEM WITH A CONTRAST CORRECTION LENS SYSTEM
- Publication number 20230207251
- Publication date Jun 29, 2023
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROSCOPY FEEDBACK FOR IMPROVED MILLING ACCURACY
- Publication number 20230197403
- Publication date Jun 22, 2023
- FEI Company
- Thomas Gary Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...
- Publication number 20230154723
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope and Image Acquisition Method
- Publication number 20230127255
- Publication date Apr 27, 2023
- JEOL Ltd.
- Kazunori Somehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS, SEMICONDUCTOR DEVICE AND MAN...
- Publication number 20230069666
- Publication date Mar 2, 2023
- KIOXIA Corporation
- Takayuki ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RIBBON BEAM ANGLE ADJUSTMENT IN AN ION IMPLANTATION SYSTEM
- Publication number 20230005701
- Publication date Jan 5, 2023
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Zhimin WAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN INSPECTING DEVICE
- Publication number 20220359151
- Publication date Nov 10, 2022
- Hitachi High-Tech Corporation
- Wei Sun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
THREE-DIMENSIONAL RECONSTRUCTION OF A SEMICONDUCTOR SPECIMEN
- Publication number 20220082376
- Publication date Mar 17, 2022
- APPLIED MATERIALS ISRAEL LTD.
- Rafael BISTRITZER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...
- Publication number 20210272767
- Publication date Sep 2, 2021
- FEI Company
- Maarten BISCHOFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20210265130
- Publication date Aug 26, 2021
- Hitachi High-Tech Corporation
- Asako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20210233736
- Publication date Jul 29, 2021
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION SAMPLE, ELECTRON BEAM ADJUSTMENT METHOD AND ELECTRON BE...
- Publication number 20210131801
- Publication date May 6, 2021
- Hitachi High-Technologies Corporation
- Yasunari SOHDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20210066045
- Publication date Mar 4, 2021
- KIOXIA Corporation
- Mitsuo KOIKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULATION OF ROLLING K VECTORS OF ANGLED GRATINGS
- Publication number 20210027985
- Publication date Jan 28, 2021
- Applied Materials, Inc.
- Joseph C. OLSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Measurement Device and Non-Transitory Computer Readable Med...
- Publication number 20200411281
- Publication date Dec 31, 2020
- Hitachi High-Tech Corporation
- Satoru YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS OF OPERATING T...
- Publication number 20200381212
- Publication date Dec 3, 2020
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGONAL COMPOUND MILL
- Publication number 20200312618
- Publication date Oct 1, 2020
- FEI Company
- Clifford Russell Bugge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULATION OF ION BEAM ANGLE
- Publication number 20200194228
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Joseph C. OLSON
- H01 - BASIC ELECTRIC ELEMENTS

Beam tilting means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ribbon beam angle adjustment in an ion implantation system

Modulation of rolling k vectors of angled gratings

Geometry based three dimensional reconstruction of a semiconductor...

Systems and methods for real time stereo imaging using multiple ele...

Ion milling device

Apparatus of plural charged-particle beams

Method, device and system for reducing off-axial aberration in elec...

Modulation of rolling k vectors of angled gratings

Apparatus of plural charged-particle beams

Method, device and system for reducing off-axial aberration in elec...

Modulation of rolling K vectors of angled gratings

Calibration sample, electron beam adjustment method and electron be...

Modulation of ion beam angle

Apparatus and method for repairing a photolithographic mask

Pattern measurement device and non-transitory computer readable med...

Diagonal compound mill

Charged particle beam device

Charged particle beam apparatus

Rock sample preparation method by using focused ion beam for minimi...

Apparatus for combined stem and EDS tomography

Apparatus of plural charged-particle beams

Aberration measurement method and electron microscope

Focused ion beam apparatus

Charged particle beam device and capturing condition adjusting meth...

Enabling high throughput electron channeling contrast imaging (ECCI...

Method for sample orientation for TEM lamella preparation

Apparatus of plural charged-particle beams

Rock sample preparation method by using focused ion beam for minimi...

Method of reducing coma and chromatic aberration in a charged parti...

Charged particle beam inclination correction method and charged par...

Patents Applicationslast 30 patents

FLOW FOR HIGH RESOLUTION STEREOSCOPIC MEASUREMENTS

3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...

APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

OPTICAL AUTO-FOCUS UNIT AND A METHOD FOR AUTO-FOCUS

METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...

CHARGED-PARTICLE BEAM APPARATUS WITH BEAM-TILT AND METHODS THEREOF

Charged Particle Beam Apparatus

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MODULATION OF ROLLING K VECTORS OF ANGLED GRATINGS

METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...

TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING A...

MULTIPLE PARTICLE BEAM SYSTEM WITH A CONTRAST CORRECTION LENS SYSTEM

MICROSCOPY FEEDBACK FOR IMPROVED MILLING ACCURACY

SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...

Electron Microscope and Image Acquisition Method

SEMICONDUCTOR MANUFACTURING APPARATUS, SEMICONDUCTOR DEVICE AND MAN...

RIBBON BEAM ANGLE ADJUSTMENT IN AN ION IMPLANTATION SYSTEM

PATTERN INSPECTING DEVICE

THREE-DIMENSIONAL RECONSTRUCTION OF A SEMICONDUCTOR SPECIMEN

METHOD, DEVICE AND SYSTEM FOR REDUCING OFF-AXIAL ABERRATION IN ELEC...

Ion Milling Device

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

CALIBRATION SAMPLE, ELECTRON BEAM ADJUSTMENT METHOD AND ELECTRON BE...

CHARGED PARTICLE BEAM APPARATUS

MODULATION OF ROLLING K VECTORS OF ANGLED GRATINGS

Pattern Measurement Device and Non-Transitory Computer Readable Med...

MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS OF OPERATING T...

DIAGONAL COMPOUND MILL

MODULATION OF ION BEAM ANGLE