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Y10S430/106

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

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Y10S430/106Binder containing

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Patents Grantslast 30 patents

Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 10,310,375
- Issue date Jun 4, 2019
- Kenneth E Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers and photoresist compositions
- Patent number 9,983,477
- Issue date May 29, 2018
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 9,897,913
- Issue date Feb 20, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,798,235
- Issue date Oct 24, 2017
- FUJIFILM Corporation
- Hiromi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,703,196
- Issue date Jul 11, 2017
- FUJIFILM Corporation
- Hiromi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,465,292
- Issue date Oct 11, 2016
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,316,912
- Issue date Apr 19, 2016
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt-containing polymer, resist composition, patterning p...
- Patent number 9,233,919
- Issue date Jan 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive composition and method of forming pattern u...
- Patent number 9,052,594
- Issue date Jun 9, 2015
- FUJIFILM Corporation
- Hyou Takahashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,029,070
- Issue date May 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Film, method for manufacturing the film and masking method using th...
- Patent number 9,017,920
- Issue date Apr 28, 2015
- Shenzhen Futaihong Precision Industry Co., Ltd.
- Quan Zhou
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for forming resist underlayer film for EUV lithography
- Patent number 9,005,873
- Issue date Apr 14, 2015
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,621
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Aqueous base-developable negative-tone films based on functionalize...
- Patent number 8,986,923
- Issue date Mar 24, 2015
- Promerus, LLC
- Brian Knapp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for resist underlayer film and process for producing same
- Patent number 8,968,458
- Issue date Mar 3, 2015
- JSR Corporation
- Keiji Konno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist materials and photolithography processes
- Patent number 8,848,163
- Issue date Sep 30, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsien-Cheng Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,846,292
- Issue date Sep 30, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic-ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,841,060
- Issue date Sep 23, 2014
- FUJIFILM Corporation
- Shohei Kataoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin composition for color filter and color filter...
- Patent number 8,828,282
- Issue date Sep 9, 2014
- Cheil Industries Inc.
- Kyung-Hee Hyung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 8,828,643
- Issue date Sep 9, 2014
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for resist underlayer film and process for producing same
- Patent number 8,808,446
- Issue date Aug 19, 2014
- JSR Corporation
- Keiji Konno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,808,966
- Issue date Aug 19, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound for resist and radiation-sensitive composition specification
- Patent number 8,802,353
- Issue date Aug 12, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonium salt-containing polymer, resist composition, patterning p...
- Patent number 8,785,105
- Issue date Jul 22, 2014
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,735,044
- Issue date May 27, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 8,685,616
- Issue date Apr 1, 2014
- University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process and photoresist with a photodegradable base
- Patent number 8,658,344
- Issue date Feb 25, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Wei Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 8,642,245
- Issue date Feb 4, 2014
- FUJIFILM Corporation
- Kana Fujii
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for negative tone development and pattern formin...
- Patent number 8,642,253
- Issue date Feb 4, 2014
- FUJIFILM Incorporated
- Hideaki Tsubaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,637,220
- Issue date Jan 28, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20170255098
- Publication date Sep 7, 2017
- FUJIFILM CORPORATION
- Hiromi KOBAYASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20140363773
- Publication date Dec 11, 2014
- JSR Corporation
- Atsushi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photoacid Generators And Lithographic Resists Comprising The Same
- Publication number 20140315130
- Publication date Oct 23, 2014
- University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...
- Publication number 20140296561
- Publication date Oct 2, 2014
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photosensitive Resin Composition for Color Filter and Color Filter...
- Publication number 20140183425
- Publication date Jul 3, 2014
- CHEIL INDUSTRIES INC.
- Kyung-Hee HYUNG
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY
- Publication number 20140099791
- Publication date Apr 10, 2014
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AQUEOUS BASE-DEVELOPABLE NEGATIVE-TONE FILMS BASED ON FUNCTIONALIZE...
- Publication number 20140038112
- Publication date Feb 6, 2014
- PROMERUS, LLC
- Brian Knapp
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20130177850
- Publication date Jul 11, 2013
- FUJIFILM CORPORATION
- Hiromi KANDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...
- Publication number 20130160939
- Publication date Jun 27, 2013
- FIH (HONG KONG) LIMITED
- QUAN ZHOU
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS
- Publication number 20130029269
- Publication date Jan 31, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20130004740
- Publication date Jan 3, 2013
- FUJIFILM CORPORATION
- Shohei KATAOKA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION
- Publication number 20130004896
- Publication date Jan 3, 2013
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS AND PHOTORESIST WITH A PHOTODEGRADABLE BASE
- Publication number 20120264057
- Publication date Oct 18, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Wei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMALLY IMAGEABLE DIELECTRIC LAYERS, THERMAL TRANSFER DONORS AND...
- Publication number 20120251802
- Publication date Oct 4, 2012
- E.I. du Pont de Nemours and Company
- Gerald Donald Andrews
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20120231393
- Publication date Sep 13, 2012
- FUJIFILM CORPORATION
- Kana FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20120171379
- Publication date Jul 5, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120156621
- Publication date Jun 21, 2012
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20120148957
- Publication date Jun 14, 2012
- FUJIFILM CORPORATION
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...
- Publication number 20120129103
- Publication date May 24, 2012
- Youichi Ohsawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
OPTICAL WAVEGUIDES AND METHODS THEREOF
- Publication number 20120064458
- Publication date Mar 15, 2012
- PROMERUS, LLC
- Koji CHOKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN U...
- Publication number 20120058431
- Publication date Mar 8, 2012
- FUJIFILM CORPORATION
- Hyou Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY
- Publication number 20120040291
- Publication date Feb 16, 2012
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20120034564
- Publication date Feb 9, 2012
- FUJIFILM CORPORATION
- Toshiaki Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20120015293
- Publication date Jan 19, 2012
- FUJIFILM CORPORATION
- Hiromi KANDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20120003583
- Publication date Jan 5, 2012
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAININ...
- Publication number 20110318692
- Publication date Dec 29, 2011
- LG CHEM, LTD.
- Chang Ho Cho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20110305991
- Publication date Dec 15, 2011
- FUJIFILM CORPORATION
- Fumiyuki NISHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS
- Publication number 20110236823
- Publication date Sep 29, 2011
- Rohm and Haas Electronic Materials L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTE...
- Publication number 20110212391
- Publication date Sep 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Binder containing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoacid generators and lithographic resists comprising the same

Polymers and photoresist compositions

Radiation-sensitive composition

Positive type resist composition for use in liquid immersion exposu...

Positive type resist composition for use in liquid immersion exposu...

Positive type resist composition for use in liquid immersion exposu...

Positive type resist composition for use in liquid immersion exposu...

Sulfonium salt-containing polymer, resist composition, patterning p...

Positive photosensitive composition and method of forming pattern u...

Resist composition and method of forming resist pattern

Film, method for manufacturing the film and masking method using th...

Composition for forming resist underlayer film for EUV lithography

Pattern forming method, chemical amplification resist composition a...

Aqueous base-developable negative-tone films based on functionalize...

Composition for resist underlayer film and process for producing same

Photoresist materials and photolithography processes

Radiation-sensitive composition

Actinic-ray-sensitive or radiation-sensitive resin composition, res...

Photosensitive resin composition for color filter and color filter...

Positive type resist composition for use in liquid immersion exposu...

Composition for resist underlayer film and process for producing same

Positive resist composition and patterning process

Compound for resist and radiation-sensitive composition specification

Sulfonium salt-containing polymer, resist composition, patterning p...

Salt and photoresist composition containing the same

Photoacid generators and lithographic resists comprising the same

Patterning process and photoresist with a photodegradable base

Actinic-ray- or radiation-sensitive resin composition and method of...

Resist composition for negative tone development and pattern formin...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Patents Applicationslast 30 patents

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

PATTERN-FORMING METHOD

Photoacid Generators And Lithographic Resists Comprising The Same

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...

Photosensitive Resin Composition for Color Filter and Color Filter...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY

AQUEOUS BASE-DEVELOPABLE NEGATIVE-TONE FILMS BASED ON FUNCTIONALIZE...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION

PATTERNING PROCESS AND PHOTORESIST WITH A PHOTODEGRADABLE BASE

THERMALLY IMAGEABLE DIELECTRIC LAYERS, THERMAL TRANSFER DONORS AND...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...

OPTICAL WAVEGUIDES AND METHODS THEREOF

POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN U...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAININ...

POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD

NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS

POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTE...