Industry
-
CPC
-
Y10S430/00
This industry / category may be too specific. Please go to a parent level for more data
Sub Industries
Y10S430/001Electric or magnetic imagery, e.g., xerography, electrography, magnetography, etc. Process, composition, or product
Y10S430/10Donor-acceptor complex photoconductor
Y10S430/101Photoconductive powder
Y10S430/102Electrically charging radiation-conductive surface
Y10S430/103Radiation sensitive composition or product containing specified antioxidant
Y10S430/104One component toner
Y10S430/105Polymer in developer
Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
Y10S430/1055Radiation sensitive composition or product or process of making
Y10S430/106Binder containing
Y10S430/107Polyamide or polyurethane
Y10S430/108Polyolefin or halogen containing
Y10S430/109Polyester
Y10S430/11Vinyl alcohol polymer or derivative
Y10S430/111Polymer of unsaturated acid or ester
Y10S430/112Cellulosic
Y10S430/113with plasticizer
Y10S430/114Initiator containing
Y10S430/115Cationic or anionic
Y10S430/116Redox or dye sensitizer
Y10S430/117Free radical
Y10S430/118with inhibitor or stabilizer
Y10S430/119Hydroxyl or carbonyl group containing as sole functional groups
Y10S430/12Nitrogen compound containing
Y10S430/121Nitrogen in heterocyclic ring
Y10S430/122Sulfur compound containing
Y10S430/123Sulfur in heterocyclic ring
Y10S430/124Carbonyl compound containing
Y10S430/125Carbonyl in heterocyclic compound
Y10S430/126Halogen compound containing
Y10S430/127Spectral sensitizer containing
Y10S430/128Radiation-activated cross-linking agent containing
Y10S430/129Aerial films or processes specifically adapted for aerial radiaion imagery
Y10S430/13Antibronze agent or process
Y10S430/131Anticurl layer
Y10S430/132Anti-ultraviolet fading
Y10S430/133Binder-free emulsion
Y10S430/134Brightener containing
Y10S430/135Cine film
Y10S430/136Coating process making radiation sensitive element
Y10S430/137Cobalt complex containing
Y10S430/138Corona discharge process
Y10S430/139Defect coating
Y10S430/14Dimensionally stable material
Y10S430/141Direct positive material
Y10S430/142Dye mordant
Y10S430/143Electron beam
Y10S430/144Hydrogen peroxide treatment
Y10S430/145Infrared
Y10S430/146Laser beam
Y10S430/147Lenticular
Y10S430/148Light sensitive titanium compound containing
Y10S430/149Lippmann
Y10S430/15Lithographic emulsion
Y10S430/151Matting or other surface reflectivity altering material
Y10S430/152Making camera copy
Y10S430/153Multiple image producing on single receiver
Y10S430/154Neutron beam
Y10S430/155Nonresinous additive to promote interlayer adhesion in element
Y10S430/156Precursor compound
Y10S430/157interlayer correction coupler, ICC
Y10S430/158Development inhibitor releaser, DIR
Y10S430/159Development dye releaser, DDR
Y10S430/16Blocked developers
Y10S430/161Blocked restrainers
Y10S430/162Protective or antiabrasion layer
Y10S430/163Radiation-chromic compound
Y10S430/164Rapid access processing
Y10S430/165Thermal imaging composition
Y10S430/166Toner containing
Y10S430/167X-ray
Y10S430/168X-ray exposure process