Radiation imagery chemistry: process, composition, or product thereof

Industry

  • CPC
  • Y10S430/00
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Sub Industries

Y10S430/001Electric or magnetic imagery, e.g., xerography, electrography, magnetography, etc. Process, composition, or product Y10S430/10Donor-acceptor complex photoconductor Y10S430/101Photoconductive powder Y10S430/102Electrically charging radiation-conductive surface Y10S430/103Radiation sensitive composition or product containing specified antioxidant Y10S430/104One component toner Y10S430/105Polymer in developer Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing Y10S430/1055Radiation sensitive composition or product or process of making Y10S430/106Binder containing Y10S430/107Polyamide or polyurethane Y10S430/108Polyolefin or halogen containing Y10S430/109Polyester Y10S430/11Vinyl alcohol polymer or derivative Y10S430/111Polymer of unsaturated acid or ester Y10S430/112Cellulosic Y10S430/113with plasticizer Y10S430/114Initiator containing Y10S430/115Cationic or anionic Y10S430/116Redox or dye sensitizer Y10S430/117Free radical Y10S430/118with inhibitor or stabilizer Y10S430/119Hydroxyl or carbonyl group containing as sole functional groups Y10S430/12Nitrogen compound containing Y10S430/121Nitrogen in heterocyclic ring Y10S430/122Sulfur compound containing Y10S430/123Sulfur in heterocyclic ring Y10S430/124Carbonyl compound containing Y10S430/125Carbonyl in heterocyclic compound Y10S430/126Halogen compound containing Y10S430/127Spectral sensitizer containing Y10S430/128Radiation-activated cross-linking agent containing Y10S430/129Aerial films or processes specifically adapted for aerial radiaion imagery Y10S430/13Antibronze agent or process Y10S430/131Anticurl layer Y10S430/132Anti-ultraviolet fading Y10S430/133Binder-free emulsion Y10S430/134Brightener containing Y10S430/135Cine film Y10S430/136Coating process making radiation sensitive element Y10S430/137Cobalt complex containing Y10S430/138Corona discharge process Y10S430/139Defect coating Y10S430/14Dimensionally stable material Y10S430/141Direct positive material Y10S430/142Dye mordant Y10S430/143Electron beam Y10S430/144Hydrogen peroxide treatment Y10S430/145Infrared Y10S430/146Laser beam Y10S430/147Lenticular Y10S430/148Light sensitive titanium compound containing Y10S430/149Lippmann Y10S430/15Lithographic emulsion Y10S430/151Matting or other surface reflectivity altering material Y10S430/152Making camera copy Y10S430/153Multiple image producing on single receiver Y10S430/154Neutron beam Y10S430/155Nonresinous additive to promote interlayer adhesion in element Y10S430/156Precursor compound Y10S430/157interlayer correction coupler, ICC Y10S430/158Development inhibitor releaser, DIR Y10S430/159Development dye releaser, DDR Y10S430/16Blocked developers Y10S430/161Blocked restrainers Y10S430/162Protective or antiabrasion layer Y10S430/163Radiation-chromic compound Y10S430/164Rapid access processing Y10S430/165Thermal imaging composition Y10S430/166Toner containing Y10S430/167X-ray Y10S430/168X-ray exposure process