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CPC
Y10S430/16

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/16Blocked developers

Industries

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,146,142
- Issue date Dec 4, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,606,448
- Issue date Mar 28, 2017
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,442,388
- Issue date Sep 13, 2016
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pre-patterned hard mask for ultrafast lithographic imaging
- Patent number 9,285,682
- Issue date Mar 15, 2016
- Intel Corporation
- Robert L. Bristol
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Drug development and manufacturing
- Patent number 9,157,875
- Issue date Oct 13, 2015
- Benjamin P. Warner
- G01 - MEASURING TESTING
Information Patent Grant
Patterning
- Patent number 9,034,736
- Issue date May 19, 2015
- Cambridge Enterprise Limited
- Henning Sirringhaus
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pre-patterned hard mask for ultrafast lithographic imaging
- Patent number 9,005,875
- Issue date Apr 14, 2015
- Intel Corporation
- Robert L. Bristol
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming an image having multiple phases
- Patent number 8,637,226
- Issue date Jan 28, 2014
- 3M Innovative Properties Company
- Mieczyslaw H. Mazurek
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorine-containing compound, fluorine-containing polymer, negative...
- Patent number 8,513,457
- Issue date Aug 20, 2013
- Central Glass Company, Limited
- Yoshimi Isono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
process for preparing a white non-transparent microvoided biaxially...
- Patent number 8,329,784
- Issue date Dec 11, 2012
- Agfa-Gevaert N.V.
- Dirk Quintens
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,208,124
- Issue date Jun 26, 2012
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing compound, fluorine-containing polymer, negative...
- Patent number 8,187,787
- Issue date May 29, 2012
- Central Glass Company, Limited
- Yoshimi Isono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Electromagnetic radiation or thermally sensitive composition
- Patent number 8,178,277
- Issue date May 15, 2012
- Datalase Ltd.
- Jonathan Campbell
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method of forming an image having multiple phases
- Patent number 8,133,644
- Issue date Mar 13, 2012
- 3M Innovative Properties Company
- Mieczyslaw H. Mazurek
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition for electron beam, X-ray, or EUV, and pattern-fo...
- Patent number 8,084,183
- Issue date Dec 27, 2011
- FUJIFILM Corporation
- Katsuhiro Yamashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for forming a fine pattern in a semicondutor device
- Patent number 8,067,146
- Issue date Nov 29, 2011
- Hynix Semiconductor Inc.
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonium salt-containing polymer, resist composition, and patterni...
- Patent number 8,048,610
- Issue date Nov 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing a non-transparent microvoided self-supporting...
- Patent number 8,034,541
- Issue date Oct 11, 2011
- Agfa-Gevaert N.V.
- Dirk Quintens
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Coating composition for marking substrates
- Patent number 8,021,820
- Issue date Sep 20, 2011
- Datalase Ltd.
- Karen O'Donoghue
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Coating compositions comprising a latent activator for marking subs...
- Patent number 7,998,653
- Issue date Aug 16, 2011
- CIBA Corp.
- Karen O'Donoghue
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method and materials for patterning of an amorphous, non-polymeric,...
- Patent number 7,977,864
- Issue date Jul 12, 2011
- Samsung Mobile Display Co., Ltd.
- Erika Bellmann
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Exposure method and device manufacturing method
- Patent number 7,914,972
- Issue date Mar 29, 2011
- Nikon Corporation
- Tomoharu Fujiwara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-type resist composition
- Patent number 7,906,269
- Issue date Mar 15, 2011
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for detecting binding events using micro-X-ray fluorescence...
- Patent number 7,858,385
- Issue date Dec 28, 2010
- LOS ALAMOS NATIONAL SECURITY, LLC
- Benjamin P. Warner
- G01 - MEASURING TESTING
Information Patent Grant
Photosensitive composition, compound for use in the photosensitive...
- Patent number 7,851,130
- Issue date Dec 14, 2010
- FUJIFILM Corporation
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substrate processing method, substrate processing apparatus, and ma...
- Patent number 7,794,923
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method and method of manufacturing semiconductor de...
- Patent number 7,794,922
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Water soluble resin composition and method for pattern formation us...
- Patent number 7,745,093
- Issue date Jun 29, 2010
- AZ Electronic Materials USA Corp.
- Takeshi Nishibe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silver halide photosensitive material for color-photography and ima...
- Patent number 7,674,575
- Issue date Mar 9, 2010
- FUJIFILM Corporation
- Naoto Oshima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Inkless reimageable printing paper and method
- Patent number 7,645,558
- Issue date Jan 12, 2010
- Xerox Corporation
- Tyler B. Norsten
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190086819
- Publication date Mar 21, 2019
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140347642
- Publication date Nov 27, 2014
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PRE-PATTERNED HARD MASK FOR ULTRAFAST LITHOGRAPHIC IMAGING
- Publication number 20140272711
- Publication date Sep 18, 2014
- ROBERT L. BRISTOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN IMAGE HAVING MULTIPLE PHASES
- Publication number 20140106267
- Publication date Apr 17, 2014
- 3M Innovative Properties Company
- Mieczyslaw H. Mazurek
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140071420
- Publication date Mar 13, 2014
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERNING
- Publication number 20120280216
- Publication date Nov 8, 2012
- Henning Sirringhaus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...
- Publication number 20120226070
- Publication date Sep 6, 2012
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING AN IMAGE HAVING MULTIPLE PHASES
- Publication number 20120135207
- Publication date May 31, 2012
- 3M Innovative Properties Company
- Mieczyslaw H. Mazurek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20120013868
- Publication date Jan 19, 2012
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Hardening Coating Agent
- Publication number 20110275746
- Publication date Nov 10, 2011
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NON-TRANSPARENT MICROVOIDED AXIALLY STRETCHED FILM, PRODUCTION PROC...
- Publication number 20110133359
- Publication date Jun 9, 2011
- AGFA-GEVAERT N.V.
- DIRK QUINTENS
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Pattern Forming Method and Method of Manufacturing Semiconductor De...
- Publication number 20110039214
- Publication date Feb 17, 2011
- Kabushiki Kaisha Toshiba
- Shinichi ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROMAGNETIC RADIATION OR THERMALLY SENSITIVE COMPOSITION
- Publication number 20100104825
- Publication date Apr 29, 2010
- Jonathan Campbell
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNI...
- Publication number 20090269696
- Publication date Oct 29, 2009
- Youichi OHSAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Coating Compositions Comprising a Latent Activator for Marking Sub...
- Publication number 20090220749
- Publication date Sep 3, 2009
- Karen O' Donoghue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Coating Composition for Marking Substrates
- Publication number 20090191420
- Publication date Jul 30, 2009
- CIBA Specialty Chemicals Holding Inc.
- Karen O'Donoghue
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
METHOD OF FORMING AN IMAGE HAVING MULTIPLE PHASES
- Publication number 20090111055
- Publication date Apr 30, 2009
- 3M Innovative Properties Company
- Mieczyslaw H. Mazurek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive-Type Resist Composition
- Publication number 20090061353
- Publication date Mar 5, 2009
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY, OR EUV, AND PATTERN-FO...
- Publication number 20090047598
- Publication date Feb 19, 2009
- FUJIFILM CORPORATION
- Katsuhiro YAMASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...
- Publication number 20090011199
- Publication date Jan 8, 2009
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
INKLESS REIMAGEABLE PRINTING PAPER AND METHOD
- Publication number 20080311494
- Publication date Dec 18, 2008
- XEROX Corporation
- Tyler B. Norsten
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PROCESS FOR PRODUCING A NON-TRANSPARENT MICROVOIDED SELF-SUPPORTING...
- Publication number 20080254396
- Publication date Oct 16, 2008
- Dirk Quintens
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PERMANENT TRANSPARENT PATTERN IN A NON-TRANSPARENT MICROVOIDED AXIA...
- Publication number 20080254397
- Publication date Oct 16, 2008
- Dirk Quintens
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
NON-TRANSPARENT MICROVOIDED AXIALLY STRETCHED FILM, PRODUCTION PROC...
- Publication number 20080251181
- Publication date Oct 16, 2008
- Dirk Quintens
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE
- Publication number 20080220365
- Publication date Sep 11, 2008
- Heidi M. Munnelly
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Water Soluble Resin Composition and Method for Pattern Formation Us...
- Publication number 20080193880
- Publication date Aug 14, 2008
- Takeshi Nishibe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Forming a Fine Pattern in a Semicondutor Device
- Publication number 20080166665
- Publication date Jul 10, 2008
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NON-TRANSPARENT MICROVOIDED BIAXIALLY STRETCHED FILM, PRODUCTION PR...
- Publication number 20080096143
- Publication date Apr 24, 2008
- Dirk Quintens
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE...
- Publication number 20080081288
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD AND MATERIALS FOR PATTERNING OF AN AMORPHOUS, NON-POLYMERIC,...
- Publication number 20080069980
- Publication date Mar 20, 2008
- 3M Innovative Properties Company
- Erika Bellmann
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Blocked developers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Pre-patterned hard mask for ultrafast lithographic imaging

Drug development and manufacturing

Patterning

Pre-patterned hard mask for ultrafast lithographic imaging

Method of forming an image having multiple phases

Fluorine-containing compound, fluorine-containing polymer, negative...

process for preparing a white non-transparent microvoided biaxially...

Lithographic apparatus and device manufacturing method

Fluorine-containing compound, fluorine-containing polymer, negative...

Electromagnetic radiation or thermally sensitive composition

Method of forming an image having multiple phases

Resist composition for electron beam, X-ray, or EUV, and pattern-fo...

Method for forming a fine pattern in a semicondutor device

Sulfonium salt-containing polymer, resist composition, and patterni...

Process for producing a non-transparent microvoided self-supporting...

Coating composition for marking substrates

Coating compositions comprising a latent activator for marking subs...

Method and materials for patterning of an amorphous, non-polymeric,...

Exposure method and device manufacturing method

Positive-type resist composition

Method for detecting binding events using micro-X-ray fluorescence...

Photosensitive composition, compound for use in the photosensitive...

Substrate processing method, substrate processing apparatus, and ma...

Pattern forming method and method of manufacturing semiconductor de...

Water soluble resin composition and method for pattern formation us...

Silver halide photosensitive material for color-photography and ima...

Inkless reimageable printing paper and method

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PRE-PATTERNED HARD MASK FOR ULTRAFAST LITHOGRAPHIC IMAGING

METHOD OF FORMING AN IMAGE HAVING MULTIPLE PHASES

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PATTERNING

Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...

METHOD OF FORMING AN IMAGE HAVING MULTIPLE PHASES

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Pattern Hardening Coating Agent

NON-TRANSPARENT MICROVOIDED AXIALLY STRETCHED FILM, PRODUCTION PROC...

Pattern Forming Method and Method of Manufacturing Semiconductor De...

ELECTROMAGNETIC RADIATION OR THERMALLY SENSITIVE COMPOSITION

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNI...

Coating Compositions Comprising a Latent Activator for Marking Sub...

Coating Composition for Marking Substrates

METHOD OF FORMING AN IMAGE HAVING MULTIPLE PHASES

Positive-Type Resist Composition

RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY, OR EUV, AND PATTERN-FO...

Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...

INKLESS REIMAGEABLE PRINTING PAPER AND METHOD

PROCESS FOR PRODUCING A NON-TRANSPARENT MICROVOIDED SELF-SUPPORTING...

PERMANENT TRANSPARENT PATTERN IN A NON-TRANSPARENT MICROVOIDED AXIA...

NON-TRANSPARENT MICROVOIDED AXIALLY STRETCHED FILM, PRODUCTION PROC...

NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE

Water Soluble Resin Composition and Method for Pattern Formation Us...

Method for Forming a Fine Pattern in a Semicondutor Device

NON-TRANSPARENT MICROVOIDED BIAXIALLY STRETCHED FILM, PRODUCTION PR...

PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE...

METHOD AND MATERIALS FOR PATTERNING OF AN AMORPHOUS, NON-POLYMERIC,...