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CPC
H01L21/31133

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/31133by chemical means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and methods of formation
- Patent number 12,165,875
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsu Ming Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toposelective vapor deposition using an inhibitor
- Patent number 12,136,552
- Issue date Nov 5, 2024
- ASM IP Holding B.V.
- Andrea Illiberi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for tuning via profile in dielectric material
- Patent number 12,136,644
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun Kai Tzeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to form contacts with multiple depth by enhanced CESL
- Patent number 12,131,946
- Issue date Oct 29, 2024
- SiEn (QingDao) Integrated Circuits Co., Ltd
- Min-Hwa Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,125,908
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ling Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist patterning process
- Patent number 12,085,858
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Huixiong Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin Field-Effect transistor and method of forming the same
- Patent number 12,051,626
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Cheng Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective patterning with molecular layer deposition
- Patent number 11,990,369
- Issue date May 21, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor structure having air gaps and method for manufacturin...
- Patent number 11,923,306
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Wei Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Footing removal in cut-metal process
- Patent number 11,854,903
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Chi Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor package and method of forming same
- Patent number 11,854,927
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ting-Chen Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for solvent recycling
- Patent number 11,798,800
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Wei Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing hard masks
- Patent number 11,788,007
- Issue date Oct 17, 2023
- Entegris, Inc.
- Hsing-Chen Wu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Apparatus and method for removing photoresist layer from alignment...
- Patent number 11,747,742
- Issue date Sep 5, 2023
- VisEra Technologies Company Limited
- Yuan-Chun Chao
- B08 - CLEANING
Information Patent Grant
Substrate processing method
- Patent number 11,742,211
- Issue date Aug 29, 2023
- SCREEN Holdings Co., Ltd.
- Akira Horikoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 11,705,331
- Issue date Jul 18, 2023
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist removal
- Patent number 11,664,235
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Shang-Yuan Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controlling semiconductor film thickness
- Patent number 11,656,550
- Issue date May 23, 2023
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning formulation for removing residues on surfaces
- Patent number 11,639,487
- Issue date May 2, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning formulation for removing residues on surfaces
- Patent number 11,618,867
- Issue date Apr 4, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Skip-via proximity interconnect
- Patent number 11,600,519
- Issue date Mar 7, 2023
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal structure and method for fabricating same and display panel u...
- Patent number 11,556,036
- Issue date Jan 17, 2023
- AU OPTRONICS CORPORATION
- Shuo-Hong Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
UV-assisted stripping of hardened photoresist to create chemical te...
- Patent number 11,538,684
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Mark H. Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Localized etch stop layer
- Patent number 11,532,517
- Issue date Dec 20, 2022
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for tuning via profile in dielectric material
- Patent number 11,532,692
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun Kai Tzeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive photoresist composition, via-forming method, display subst...
- Patent number 11,526,077
- Issue date Dec 13, 2022
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Wei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device
- Patent number 11,515,213
- Issue date Nov 29, 2022
- United Microelectronics Corp.
- Chih-Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,443,960
- Issue date Sep 13, 2022
- SCREEN Holdings Co., Ltd.
- Masayuki Otsuji
- B08 - CLEANING
Information Patent Grant
Trench isolation process
- Patent number 11,443,976
- Issue date Sep 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Lei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous solution for etching silicon oxide
- Patent number 11,434,424
- Issue date Sep 6, 2022
- Imec VZW
- Guy Vereecke
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR REMOVING UPPER PART OF SACRIFICIAL LAYER, AND SACRIFICIA...
- Publication number 20250014899
- Publication date Jan 9, 2025
- Merck Patent GmbH
- Takashi SEKITO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST PATTERNING PROCESS
- Publication number 20240393695
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Huixiong DAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PACKAGE AND METHOD OF FORMING SAME
- Publication number 20240387310
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ting-Chen Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR TUNING VIA PROFILE IN DIELECTRIC MATERIAL
- Publication number 20240371915
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun Kai Tzeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Processing Using a Two-Dimensional Polymer
- Publication number 20240363333
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME
- Publication number 20240355680
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Cheng Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...
- Publication number 20240288775
- Publication date Aug 29, 2024
- Tokyo Electron Limited
- Soichiro OKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR STRUCTURE HAVING AIR GAPS AND METHOD FOR MANUFACTURIN...
- Publication number 20240170403
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Wei SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
- Publication number 20240047245
- Publication date Feb 8, 2024
- SCREEN Holdings Co., Ltd.
- Kana TAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PACKAGE AND METHOD OF FORMING SAME
- Publication number 20230386955
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ting-Chen Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20230369039
- Publication date Nov 16, 2023
- Samsung Electronics Co., Ltd.
- Eunhyea KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING COMPOSITIONS AND METHODS TO ENHANCE SC-1 RESISTANCE
- Publication number 20230282478
- Publication date Sep 7, 2023
- Brewer Science, Inc.
- Daniel Patrick Sweat
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Process for Tuning Via Profile in Dielectric Material
- Publication number 20230107187
- Publication date Apr 6, 2023
- Chun Kai Tzeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
- Publication number 20230100080
- Publication date Mar 30, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
- Publication number 20230066300
- Publication date Mar 2, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...
- Publication number 20230063662
- Publication date Mar 2, 2023
- KIOXIA Corporation
- Makoto AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME
- Publication number 20230068714
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Cheng Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE HAVING AIR GAPS AND METHOD FOR MANUFACTURIN...
- Publication number 20230067563
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Wei SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE PATTERNING WITH MOLECULAR LAYER DEPOSITION
- Publication number 20230057258
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SOLVENT RECYCLING
- Publication number 20230043243
- Publication date Feb 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Wei LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PHOTORESIST PATTERNS
- Publication number 20230026579
- Publication date Jan 26, 2023
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PACKAGE STRUCTURE AND METHOD FOR FABRICATING SAME
- Publication number 20230017846
- Publication date Jan 19, 2023
- Changxin Memory Technologies, Inc.
- Ling-Yi CHUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING STACKED SUBSTRATES
- Publication number 20230008039
- Publication date Jan 12, 2023
- INVENSAS BONDING TECHNOLOGIES, INC.
- Cyprian Emeka UZOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SOLVENT RECYCLING
- Publication number 20220415646
- Publication date Dec 29, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Wei LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH ISOLATION PROCESS
- Publication number 20220392799
- Publication date Dec 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Lei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET-DRY BILAYER RESIST DUAL TONE EXPOSURE
- Publication number 20220351966
- Publication date Nov 3, 2022
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Point of Use Solvent Mixing for Film Removal
- Publication number 20220334485
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Lior Huli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Composition for Tri-Layer Removal
- Publication number 20220334473
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Min Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PACKAGE AND METHOD OF FORMING SAME
- Publication number 20220310467
- Publication date Sep 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ting-Chen Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20220285552
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Ling Chan
- H01 - BASIC ELECTRIC ELEMENTS

by chemical means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device and methods of formation

Toposelective vapor deposition using an inhibitor

Process for tuning via profile in dielectric material

Method to form contacts with multiple depth by enhanced CESL

Semiconductor device and method

Photoresist patterning process

Fin Field-Effect transistor and method of forming the same

Selective patterning with molecular layer deposition

Semiconductor structure having air gaps and method for manufacturin...

Footing removal in cut-metal process

Semiconductor package and method of forming same

Method and apparatus for solvent recycling

Method for removing hard masks

Apparatus and method for removing photoresist layer from alignment...

Substrate processing method

Method and composition for selectively modifying base material surface

Photoresist removal

Controlling semiconductor film thickness

Cleaning formulation for removing residues on surfaces

Cleaning formulation for removing residues on surfaces

Skip-via proximity interconnect

Metal structure and method for fabricating same and display panel u...

UV-assisted stripping of hardened photoresist to create chemical te...

Localized etch stop layer

Process for tuning via profile in dielectric material

Positive photoresist composition, via-forming method, display subst...

Method of forming a semiconductor device

Substrate processing apparatus and substrate processing method

Trench isolation process

Aqueous solution for etching silicon oxide

Patents Applicationslast 30 patents

METHOD FOR REMOVING UPPER PART OF SACRIFICIAL LAYER, AND SACRIFICIA...

PHOTORESIST PATTERNING PROCESS

SEMICONDUCTOR PACKAGE AND METHOD OF FORMING SAME

PROCESS FOR TUNING VIA PROFILE IN DIELECTRIC MATERIAL

Semiconductor Processing Using a Two-Dimensional Polymer

FIN FIELD-EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...

SEMICONDUCTOR STRUCTURE HAVING AIR GAPS AND METHOD FOR MANUFACTURIN...

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE

SEMICONDUCTOR PACKAGE AND METHOD OF FORMING SAME

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

COATING COMPOSITIONS AND METHODS TO ENHANCE SC-1 RESISTANCE

Process for Tuning Via Profile in Dielectric Material

CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES

CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...

FIN FIELD-EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME

SEMICONDUCTOR STRUCTURE HAVING AIR GAPS AND METHOD FOR MANUFACTURIN...

SELECTIVE PATTERNING WITH MOLECULAR LAYER DEPOSITION

METHOD AND APPARATUS FOR SOLVENT RECYCLING

METHOD FOR FORMING PHOTORESIST PATTERNS

PACKAGE STRUCTURE AND METHOD FOR FABRICATING SAME

PROCESSING STACKED SUBSTRATES

METHOD AND APPARATUS FOR SOLVENT RECYCLING

TRENCH ISOLATION PROCESS

WET-DRY BILAYER RESIST DUAL TONE EXPOSURE

Point of Use Solvent Mixing for Film Removal

Chemical Composition for Tri-Layer Removal

SEMICONDUCTOR PACKAGE AND METHOD OF FORMING SAME

Semiconductor Device and Method