by deposition of a layer

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H01L21/28229

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/28229by deposition of a layer

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Patents Grantslast 30 patents

Information Patent Grant
Fin-type field effect transistor having a wrap-around gate with bot...
- Patent number 12,094,949
- Issue date Sep 17, 2024
- International Business Machines Corporation
- Choonghyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively depositing a metallic film on a substrate
- Patent number 12,033,861
- Issue date Jul 9, 2024
- ASM IP Holding B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,929,403
- Issue date Mar 12, 2024
- Kabushiki Kaisha Toshiba
- Masaharu Shimabayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contacts
- Patent number 11,887,891
- Issue date Jan 30, 2024
- Intel Corporation
- Mark T. Bohr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 11,728,169
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Andrew Joseph Kelly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 11,705,336
- Issue date Jul 18, 2023
- SK Hynix Inc.
- Yunhyuck Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contacts
- Patent number 11,600,524
- Issue date Mar 7, 2023
- Intel Corporation
- Mark T. Bohr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 11,289,335
- Issue date Mar 29, 2022
- SK Hynix Inc.
- Yunhyuck Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and semiconductor device manufacturing method
- Patent number 11,257,944
- Issue date Feb 22, 2022
- Rohm Co., Ltd.
- Shigenari Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structures and methods for equivalent oxide thickness scaling on si...
- Patent number 11,152,214
- Issue date Oct 19, 2021
- International Business Machines Corporation
- Takashi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stacked nanosheets with self-aligned inner spacers and metallic sou...
- Patent number 11,121,232
- Issue date Sep 14, 2021
- International Business Machines Corporation
- Choonghyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned insulated film for high-K metal gate device
- Patent number 11,094,545
- Issue date Aug 17, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jin-Aun Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively depositing a metallic film on a substrate
- Patent number 11,094,546
- Issue date Aug 17, 2021
- ASM IP Holding B.V.
- Delphine Longrie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-k metal gate and method for fabricating the same
- Patent number 11,031,302
- Issue date Jun 8, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ju-Li Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit metal gate structure
- Patent number 11,004,950
- Issue date May 11, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yong-Tian Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device including an dielectric region and method for fabrica...
- Patent number 10,937,909
- Issue date Mar 2, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contacts
- Patent number 10,930,557
- Issue date Feb 23, 2021
- Intel Corporation
- Mark T. Bohr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 10,916,430
- Issue date Feb 9, 2021
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 10,903,328
- Issue date Jan 26, 2021
- United Microelectronics Corp.
- Po-Chun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating gate oxide of semiconductor device
- Patent number 10,763,114
- Issue date Sep 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Andrew Joseph Kelly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method for semiconductor device fabrication
- Patent number 10,763,115
- Issue date Sep 1, 2020
- NXP USA, INC.
- Rama I. Hegde
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Process for producing a strained layer based on germanium-tin
- Patent number 10,699,902
- Issue date Jun 30, 2020
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Vincent Reboud
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for avoiding IL regrown in a HKMG process
- Patent number 10,651,285
- Issue date May 12, 2020
- Shanghai Huali Microelectronics Corporation
- Yingming Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating FinFET including forming an oxide layer
- Patent number 10,629,737
- Issue date Apr 21, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contacts
- Patent number 10,629,483
- Issue date Apr 21, 2020
- Intel Corporation
- Mark T. Bohr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating oxides/semiconductor interfaces
- Patent number 10,615,028
- Issue date Apr 7, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Georgios Vellianitis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device
- Patent number 10,446,402
- Issue date Oct 15, 2019
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jie Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively depositing a metallic film on a substrate
- Patent number 10,403,504
- Issue date Sep 3, 2019
- ASM IP Holding B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stacked nanosheets with self-aligned inner spacers and metallic sou...
- Patent number 10,388,755
- Issue date Aug 20, 2019
- International Business Machines Corporation
- Choonghyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned insulated film for high-k metal gate device
- Patent number 10,388,531
- Issue date Aug 20, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jin-Aun Ng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED CIRCUIT METAL GATE STRUCTURE
- Publication number 20240379811
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yong-Tian Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DIPOLE REGION FOR TRANSISTOR
- Publication number 20240332008
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240234517
- Publication date Jul 11, 2024
- RENESAS ELECTRONICS CORPORATION
- Yu NAGAHAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240136410
- Publication date Apr 25, 2024
- RENESAS ELECTRONICS CORPORATION
- Yu NAGAHAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACTS
- Publication number 20240030067
- Publication date Jan 25, 2024
- Intel Corporation
- Mark T. BOHR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20230343595
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Andrew Joseph KELLY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIP STRUCTURE AND MANUFACTURING METHODS OF HIGH VOLTAGE DEVICE AND...
- Publication number 20230238242
- Publication date Jul 27, 2023
- RICHTEK TECHNOLOGY CORPORATION
- Chin-Chin Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACTS
- Publication number 20230154793
- Publication date May 18, 2023
- Intel Corporation
- Mark T. BOHR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN-TYPE FIELD EFFECT TRANSISTOR HAVING A WRAP-AROUND GATE WITH BOT...
- Publication number 20230096125
- Publication date Mar 30, 2023
- International Business Machines Corporation
- Choonghyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-K OR FERROELECTRIC GATE OXIDE WITH ZERO-SIO2 IL PROCESS FOR TR...
- Publication number 20230100952
- Publication date Mar 30, 2023
- Intel Corporation
- I-Cheng TUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20220270881
- Publication date Aug 25, 2022
- SK HYNIX INC.
- Yunhyuck JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20220093750
- Publication date Mar 24, 2022
- Kabushiki Kaisha Toshiba
- Masaharu Shimabayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY DEPOSITING A METALLIC FILM ON A SUBSTRATE
- Publication number 20210296130
- Publication date Sep 23, 2021
- ASM IP HOLDING B.V.
- Delphine Longrie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT METAL GATE STRUCTURE AND METHOD OF FABRICATING T...
- Publication number 20210265479
- Publication date Aug 26, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yong-Tian Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACTS
- Publication number 20210134673
- Publication date May 6, 2021
- Intel Corporation
- Mark T. BOHR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20210134597
- Publication date May 6, 2021
- SK HYNIX INC.
- Yunhyuck JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20200395216
- Publication date Dec 17, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Andrew Joseph KELLY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET DEVICE AND METHOD FOR FABRICATING SAME
- Publication number 20200321459
- Publication date Oct 8, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hao WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACTS
- Publication number 20200251387
- Publication date Aug 6, 2020
- Intel Corporation
- Mark T. BOHR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20200219761
- Publication date Jul 9, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- JONG-MOO CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20200203216
- Publication date Jun 25, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- DONGGEUN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY DEPOSITING A METALLIC FILM ON A SUBSTRATE
- Publication number 20200013626
- Publication date Jan 9, 2020
- ASM IP HOLDING B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STACKED NANOSHEETS WITH SELF-ALIGNED INNER SPACERS AND METALLIC SOU...
- Publication number 20190371917
- Publication date Dec 5, 2019
- International Business Machines Corporation
- Choonghyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Aligned Insulated Film for High-K Metal Gate Device
- Publication number 20190341263
- Publication date Nov 7, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jin-Aun Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-K Metal Gate and Method for Fabricating the Same
- Publication number 20190341317
- Publication date Nov 7, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- JU-LI HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT METAL GATE STRUCTURE
- Publication number 20190131419
- Publication date May 2, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yong-Tian HOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY DEPOSITING A METALLIC FILM ON A SUBSTRATE
- Publication number 20190109009
- Publication date Apr 11, 2019
- ASM IP HOLDING B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FABRICATING GATE OXIDE OF SEMICONDUCTOR DEVICE
- Publication number 20190096682
- Publication date Mar 28, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Andrew Joseph KELLY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-K METAL GATE AND METHOD FOR FABRICATING THE SAME
- Publication number 20190088556
- Publication date Mar 21, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- JU-LI HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACTS
- Publication number 20190051558
- Publication date Feb 14, 2019
- Intel Corporation
- Mark T. BOHR
- H01 - BASIC ELECTRIC ELEMENTS

by deposition of a layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Fin-type field effect transistor having a wrap-around gate with bot...

Method for selectively depositing a metallic film on a substrate

Method of manufacturing semiconductor device

Self-aligned contacts

Semiconductor device

Method for fabricating a semiconductor device

Self-aligned contacts

Method for fabricating a semiconductor device

Semiconductor device and semiconductor device manufacturing method

Structures and methods for equivalent oxide thickness scaling on si...

Stacked nanosheets with self-aligned inner spacers and metallic sou...

Self-aligned insulated film for high-K metal gate device

Method for selectively depositing a metallic film on a substrate

High-k metal gate and method for fabricating the same

Integrated circuit metal gate structure

FinFET device including an dielectric region and method for fabrica...

Self-aligned contacts

Semiconductor device and method for manufacturing the same

Method for fabricating semiconductor device

Method of fabricating gate oxide of semiconductor device

Substrate treatment method for semiconductor device fabrication

Process for producing a strained layer based on germanium-tin

Method for avoiding IL regrown in a HKMG process

Method for fabricating FinFET including forming an oxide layer

Self-aligned contacts

Method for fabricating oxides/semiconductor interfaces

Semiconductor device

Method for selectively depositing a metallic film on a substrate

Stacked nanosheets with self-aligned inner spacers and metallic sou...

Self-aligned insulated film for high-k metal gate device

Patents Applicationslast 30 patents

INTEGRATED CIRCUIT METAL GATE STRUCTURE

INTEGRATED DIPOLE REGION FOR TRANSISTOR

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SELF-ALIGNED CONTACTS

SEMICONDUCTOR DEVICE

PIP STRUCTURE AND MANUFACTURING METHODS OF HIGH VOLTAGE DEVICE AND...

SELF-ALIGNED CONTACTS

FIN-TYPE FIELD EFFECT TRANSISTOR HAVING A WRAP-AROUND GATE WITH BOT...

HIGH-K OR FERROELECTRIC GATE OXIDE WITH ZERO-SIO2 IL PROCESS FOR TR...

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR SELECTIVELY DEPOSITING A METALLIC FILM ON A SUBSTRATE

INTEGRATED CIRCUIT METAL GATE STRUCTURE AND METHOD OF FABRICATING T...

SELF-ALIGNED CONTACTS

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE

FINFET DEVICE AND METHOD FOR FABRICATING SAME

SELF-ALIGNED CONTACTS

METHOD OF FORMING SEMICONDUCTOR STRUCTURE

METHOD OF FORMING SEMICONDUCTOR STRUCTURE

METHOD FOR SELECTIVELY DEPOSITING A METALLIC FILM ON A SUBSTRATE

STACKED NANOSHEETS WITH SELF-ALIGNED INNER SPACERS AND METALLIC SOU...

Self-Aligned Insulated Film for High-K Metal Gate Device

High-K Metal Gate and Method for Fabricating the Same

INTEGRATED CIRCUIT METAL GATE STRUCTURE

METHOD FOR SELECTIVELY DEPOSITING A METALLIC FILM ON A SUBSTRATE

METHOD OF FABRICATING GATE OXIDE OF SEMICONDUCTOR DEVICE

HIGH-K METAL GATE AND METHOD FOR FABRICATING THE SAME

SELF-ALIGNED CONTACTS