by electric means

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CPC
H05H1/0081

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HELECTRICITY H05Electric techniques H05HPLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS H05H1/00Generating plasma Handling plasma

Current Industry

H05H1/0081by electric means

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for measuring electron nonextensive parameter of plasma usin...
- Patent number 12,144,096
- Issue date Nov 12, 2024
- Nanchang University
- Huibin Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Waveform shape factor for pulsed PVD power
- Patent number 12,018,361
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Shouyin Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for detecting plasma of ultra fast with multi channel
- Patent number 11,961,720
- Issue date Apr 16, 2024
- T.O.S Co., Ltd.
- Yong Kyu Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring plasma ion nonextensive parameter
- Patent number 11,856,682
- Issue date Dec 26, 2023
- Nanchang University
- Huibin Qiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Microscale gas breakdown device and process
- Patent number 11,371,960
- Issue date Jun 28, 2022
- Board of Trustees of Michigan State University
- Yangyang Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-based electro-optical sensing and methods
- Patent number 11,153,960
- Issue date Oct 19, 2021
- Innoveering, LLC
- George Papadopoulos
- G01 - MEASURING TESTING
Information Patent Grant
Method for controlling semiconductor process
- Patent number 11,049,754
- Issue date Jun 29, 2021
- Samsung Electronics Co., Ltd.
- Seul Ha Myung
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Feedforward temperature control for plasma processing apparatus
- Patent number 10,854,425
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Chetan Mahadeswaraswamy
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma generation apparatus, substrate treating apparatus including...
- Patent number 10,600,618
- Issue date Mar 24, 2020
- Semes Co., Ltd.
- Ogsen Galstyan
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Suppression of self pulsing DC driven nonthermal microplasma discha...
- Patent number 10,542,613
- Issue date Jan 21, 2020
- University of South Carolina
- Tanvir Farouk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and system for carrying out plasma chemical reaction in gas...
- Patent number 10,477,666
- Issue date Nov 12, 2019
- DM ECO Plasma, Inc.
- Dmitry Medvedev
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Dielectric barrier discharge ionization detector
- Patent number 10,436,750
- Issue date Oct 8, 2019
- Shimadzu Corporation
- Kei Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for determining the type, density and temperat...
- Patent number 9,930,766
- Issue date Mar 27, 2018
- Nanyang Technological University
- Chia Sern Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and control unit for operating a plasma generation apparatus
- Patent number 9,756,713
- Issue date Sep 5, 2017
- OERLIKEN METCO AG, WOHLEN
- Florian Liechti
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Atomic flux measurement device
- Patent number 9,658,191
- Issue date May 23, 2017
- The Doshisha
- Tadashi Ohachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method of determining effective glow discharge lamp current
- Patent number 9,426,873
- Issue date Aug 23, 2016
- Leco Corporation
- Ted J Casper
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Feedforward temperature control for plasma processing apparatus
- Patent number 9,338,871
- Issue date May 10, 2016
- Applied Materials, Inc.
- Chetan Mahadeswaraswamy
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma evaluation apparatus
- Patent number 9,254,397
- Issue date Feb 9, 2016
- National Institute of Advanced Industrial Science and Technology
- Hajime Sakakita
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Systems and methods for calibrating a switched mode ion energy dist...
- Patent number 9,210,790
- Issue date Dec 8, 2015
- Advanced Energy Industries, Inc.
- Daniel J. Hoffman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for detecting arc in plasma chamber
- Patent number 9,170,295
- Issue date Oct 27, 2015
- NEW POWER PLASMA CO., LTD.
- Sang-Don Choi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Device and use of the device for measuring the density and/or the e...
- Patent number 9,113,543
- Issue date Aug 18, 2015
- Ruhr-Universität Bochum
- Ralf Peter Brinkmann
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods of electrical signaling in an ion energy analyzer
- Patent number 9,087,677
- Issue date Jul 21, 2015
- Tokyo Electron Limited
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems for detecting unconfined-plasma events
- Patent number 9,074,285
- Issue date Jul 7, 2015
- Lam Research Corporation
- John Pease
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ VHF current sensor for a plasma reactor
- Patent number 8,970,226
- Issue date Mar 3, 2015
- Applied Materials, Inc.
- Hiroji Hanawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High frequency detection device and coaxial cable including the same
- Patent number 8,937,480
- Issue date Jan 20, 2015
- Daihen Corporation
- Isao Tabuchi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion energy analyzer
- Patent number 8,847,159
- Issue date Sep 30, 2014
- Tokyo Electron Limited
- Lee Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion energy analyzer and methods of manufacturing the same
- Patent number 8,816,281
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma sterilizing device and method
- Patent number 8,696,983
- Issue date Apr 15, 2014
- Saga University
- Nobuya Hayashi
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Method and system for characterizing a plasma
- Patent number 8,660,805
- Issue date Feb 25, 2014
- Tokyo Electron Limited
- Ronald Victor Bravenec
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
In-situ VHF voltage sensor for a plasma reactor
- Patent number 8,513,939
- Issue date Aug 20, 2013
- Applied Materials, Inc.
- Hiroji Hanawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MEASURING PLASMA ION NONEXTENSIVE PARAMETER
- Publication number 20230189423
- Publication date Jun 15, 2023
- Nanchang University
- Huibin Qiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Langmuir Probe Operating at Fixed Voltages
- Publication number 20220338337
- Publication date Oct 20, 2022
- Lockheed Martin Corporation
- Aaron Michael Schinder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR DETECTING PLASMA OF ULTRA FAST WITH MULTI CHANNEL
- Publication number 20220223389
- Publication date Jul 14, 2022
- T.O.S CO., Ltd.
- Yong Kyu KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MEASURING PLASMA ELECTRON NONEXTENSIVE PARAMETER
- Publication number 20220110206
- Publication date Apr 7, 2022
- Nanchang University
- Huibin Qiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA GENERATION APPARATUS, SUBSTRATE TREATING APPARATUS INCLUDING...
- Publication number 20200051784
- Publication date Feb 13, 2020
- SEMES CO., LTD.
- Ogsen GALSTYAN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR CONTROLLING SEMICONDUCTOR PROCESS
- Publication number 20190198373
- Publication date Jun 27, 2019
- Samsung Electronics Co., Ltd.
- Seul Ha MYUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for carrying out plasma chemical reaction in gas...
- Publication number 20190174616
- Publication date Jun 6, 2019
- DM ECO Plasma, Inc.
- Dmitry Medvedev
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUPPRESSION OF SELF PULSING DC DRIVEN NONTHERMAL MICROPLASMA DISCHA...
- Publication number 20170290137
- Publication date Oct 5, 2017
- University of South Carolina
- Tanvir Farouk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
AN APPARATUS AND METHOD FOR DIAGNOSTICS OF NETURAL RADICALS IN PLASMA
- Publication number 20160198558
- Publication date Jul 7, 2016
- Chia Sern CHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND CONTROL UNIT FOR OPERATING A PLASMA GENERATION APPARATUS
- Publication number 20150319834
- Publication date Nov 5, 2015
- OERLIKON METCO AG
- Florian LIECHTI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA EVALUATION APPARATUS
- Publication number 20140312241
- Publication date Oct 23, 2014
- Hajime Sakakita
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
SYSTEM AND METHOD OF DETERMINING EFFECTIVE GLOW DISCHARGE LAMP CURRENT
- Publication number 20140062306
- Publication date Mar 6, 2014
- Leco Corporation
- Ted J Casper
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS AND METHODS FOR CALIBRATING A SWITCHED MODE ION ENERGY DIST...
- Publication number 20140062303
- Publication date Mar 6, 2014
- Advanced Energy Industries, Inc.
- Daniel J. Hoffman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU VHF CURRENT SENSOR FOR A PLASMA REACTOR
- Publication number 20130320998
- Publication date Dec 5, 2013
- Applied Materials, Inc.
- Hiroji Hanawa
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR DETECTING ARC IN PLASMA CHAMBER
- Publication number 20130221847
- Publication date Aug 29, 2013
- NEW POWER PLASMA CO., LTD.
- Sang-Don CHOI
- G01 - MEASURING TESTING
Information Patent Application
DEVICE AND USE OF THE DEVICE FOR MEASURING THE DENSITY AND/OR THE E...
- Publication number 20130160523
- Publication date Jun 27, 2013
- RUHR-UNIVERSITÄT BOCHUM
- Ralf Peter Brinkmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC FLUX MEASUREMENT DEVICE
- Publication number 20130124124
- Publication date May 16, 2013
- ARIOS INC.
- Tadashi OHACHI
- C30 - CRYSTAL GROWTH
Information Patent Application
SHIELDED CAPACITIVE ELECTRODE
- Publication number 20130068963
- Publication date Mar 21, 2013
- The Regents of the University of California
- Michel Kireeff Covo
- G01 - MEASURING TESTING
Information Patent Application
ION ENERGY ANALYZER
- Publication number 20120248310
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Lee Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS OF ELECTRICAL SIGNALING IN AN ION ENERGY ANALYZER
- Publication number 20120248322
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ION ENERGY ANALYZER AND METHODS OF MANUFACTURING THE SAME
- Publication number 20120248311
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
IN-SITU VHF VOLTAGE/CURRENT SENSORS FOR A PLASMA REACTOR
- Publication number 20120086464
- Publication date Apr 12, 2012
- Applied Materials, Inc.
- Hiroji Hanawa
- G01 - MEASURING TESTING
Information Patent Application
LC Resonance Probe for Determining Local Plasma Density
- Publication number 20120084046
- Publication date Apr 5, 2012
- THE GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETA...
- David R. Boris
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND SYSTEM FOR CHARACTERIZING A PLASMA
- Publication number 20120084026
- Publication date Apr 5, 2012
- TOKYO ELECTRON LIMITED
- Ronald Victor BRAVENEC
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
HIGH FREQUENCY DETECTION DEVICE AND COAXIAL CABLE INCLUDING THE SAME
- Publication number 20120019267
- Publication date Jan 26, 2012
- DAIHEN Corporation
- Isao TABUCHI
- G01 - MEASURING TESTING
Information Patent Application
FEEDFORWARD TEMPERATURE CONTROL FOR PLASMA PROCESSING APPARATUS
- Publication number 20110186545
- Publication date Aug 4, 2011
- Applied Materials, Inc.
- Chetan MAHADESWARASWAMY
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110061811
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Toru Ito
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA MONITORING METHOD
- Publication number 20100244861
- Publication date Sep 30, 2010
- Oki Semiconductor Co., Ltd.
- Tomohiko Tatsumi
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR MEASURING A SET OF ELECTRICAL CHARACTERISTICS IN A PLASMA
- Publication number 20100229372
- Publication date Sep 16, 2010
- Christopher Kimball
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA STERILIZING DEVICE AND METHOD
- Publication number 20100209292
- Publication date Aug 19, 2010
- Saga University
- Nobuya Hayashi
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING

by electric means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for measuring electron nonextensive parameter of plasma usin...

Waveform shape factor for pulsed PVD power

Device for detecting plasma of ultra fast with multi channel

Method for measuring plasma ion nonextensive parameter

Microscale gas breakdown device and process

Plasma-based electro-optical sensing and methods

Method for controlling semiconductor process

Feedforward temperature control for plasma processing apparatus

Plasma generation apparatus, substrate treating apparatus including...

Suppression of self pulsing DC driven nonthermal microplasma discha...

Method and system for carrying out plasma chemical reaction in gas...

Dielectric barrier discharge ionization detector

Apparatus and method for determining the type, density and temperat...

Method and control unit for operating a plasma generation apparatus

Atomic flux measurement device

System and method of determining effective glow discharge lamp current

Feedforward temperature control for plasma processing apparatus

Plasma evaluation apparatus

Systems and methods for calibrating a switched mode ion energy dist...

Method and apparatus for detecting arc in plasma chamber

Device and use of the device for measuring the density and/or the e...

Methods of electrical signaling in an ion energy analyzer

Systems for detecting unconfined-plasma events

In-situ VHF current sensor for a plasma reactor

High frequency detection device and coaxial cable including the same

Ion energy analyzer

Ion energy analyzer and methods of manufacturing the same

Plasma sterilizing device and method

Method and system for characterizing a plasma

In-situ VHF voltage sensor for a plasma reactor

Patents Applicationslast 30 patents

METHOD FOR MEASURING PLASMA ION NONEXTENSIVE PARAMETER

Langmuir Probe Operating at Fixed Voltages

DEVICE FOR DETECTING PLASMA OF ULTRA FAST WITH MULTI CHANNEL

METHOD FOR MEASURING PLASMA ELECTRON NONEXTENSIVE PARAMETER

PLASMA GENERATION APPARATUS, SUBSTRATE TREATING APPARATUS INCLUDING...

METHOD FOR CONTROLLING SEMICONDUCTOR PROCESS

Method and system for carrying out plasma chemical reaction in gas...

SUPPRESSION OF SELF PULSING DC DRIVEN NONTHERMAL MICROPLASMA DISCHA...

AN APPARATUS AND METHOD FOR DIAGNOSTICS OF NETURAL RADICALS IN PLASMA

METHOD AND CONTROL UNIT FOR OPERATING A PLASMA GENERATION APPARATUS

PLASMA EVALUATION APPARATUS

SYSTEM AND METHOD OF DETERMINING EFFECTIVE GLOW DISCHARGE LAMP CURRENT

SYSTEMS AND METHODS FOR CALIBRATING A SWITCHED MODE ION ENERGY DIST...

IN-SITU VHF CURRENT SENSOR FOR A PLASMA REACTOR

METHOD AND APPARATUS FOR DETECTING ARC IN PLASMA CHAMBER

DEVICE AND USE OF THE DEVICE FOR MEASURING THE DENSITY AND/OR THE E...

ATOMIC FLUX MEASUREMENT DEVICE

SHIELDED CAPACITIVE ELECTRODE

ION ENERGY ANALYZER

METHODS OF ELECTRICAL SIGNALING IN AN ION ENERGY ANALYZER

ION ENERGY ANALYZER AND METHODS OF MANUFACTURING THE SAME

IN-SITU VHF VOLTAGE/CURRENT SENSORS FOR A PLASMA REACTOR

LC Resonance Probe for Determining Local Plasma Density

METHOD AND SYSTEM FOR CHARACTERIZING A PLASMA

HIGH FREQUENCY DETECTION DEVICE AND COAXIAL CABLE INCLUDING THE SAME

FEEDFORWARD TEMPERATURE CONTROL FOR PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA MONITORING METHOD

METHODS FOR MEASURING A SET OF ELECTRICAL CHARACTERISTICS IN A PLASMA

PLASMA STERILIZING DEVICE AND METHOD