Calibration grids

Industry

CPC
H01J2237/30444

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/30444Calibration grids

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for investigating an object
- Patent number 9,115,981
- Issue date Aug 25, 2015
- Carl Zeiss SMS GmbH
- Christof Baur
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Correcting substrate for charged particle beam lithography apparatus
- Patent number 8,183,544
- Issue date May 22, 2012
- Nuflare Technology, Inc.
- Kaoru Tsuruta
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Standard component for calibration and calibration method using it...
- Patent number 7,834,997
- Issue date Nov 16, 2010
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for scanned instrument calibration
- Patent number 6,770,867
- Issue date Aug 3, 2004
- FEI Company
- Henri J. Lezec
- G01 - MEASURING TESTING
Information Patent Grant
Submicron dimensional calibration standards and methods of manufact...
- Patent number 6,646,737
- Issue date Nov 11, 2003
- KLA Tencor Technologies
- Marco Tortonese
- G01 - MEASURING TESTING
Information Patent Grant
Method of calibrating an electron beam system for lithography
- Patent number 6,291,819
- Issue date Sep 18, 2001
- International Business Machines Corporation
- John G. Hartley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable transmission reticle for charged particle beam lithography...
- Patent number 6,262,427
- Issue date Jul 17, 2001
- Nikon Corporation
- Michael S. Gordon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction of pattern-dependent errors in a particle beam lithograp...
- Patent number 6,177,680
- Issue date Jan 23, 2001
- International Business Machines Corporation
- Gregory J. Dick
- G05 - CONTROLLING REGULATING
Information Patent Grant
Correction of pattern dependent position errors in electron beam li...
- Patent number 5,798,528
- Issue date Aug 25, 1998
- International Business Machines Corporation
- Rainer Butsch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Fabrication and use of sub-micron dimensional standard
- Patent number 5,585,211
- Issue date Dec 17, 1996
- Leon A. Firstein
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Repositionable substrate for microscopes
- Patent number 5,365,072
- Issue date Nov 15, 1994
- The United States of America as represented by the Secretary of the Navy
- David C. Turner
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
Device and Method for Calibrating a Charged-Particle Beam
- Publication number 20240304407
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR INVESTIGATING AN OBJECT
- Publication number 20140027512
- Publication date Jan 30, 2014
- Christof Baur
- B82 - NANO-TECHNOLOGY
Information Patent Application
CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS
- Publication number 20090242807
- Publication date Oct 1, 2009
- NuFlare Technology, Inc.
- Kaoru TSURUTA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron microscope and scanning probe microscope calibration device
- Publication number 20080067370
- Publication date Mar 20, 2008
- John Patrick McCaffrey
- G01 - MEASURING TESTING
Information Patent Application
STANDARD COMPONENT FOR CALIBRATION AND CALIBRATION METHOD USING IT...
- Publication number 20080067447
- Publication date Mar 20, 2008
- Yoshinori Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and apparatus for scanned instrument calibration
- Publication number 20030085352
- Publication date May 8, 2003
- Henri J. Lezec
- G01 - MEASURING TESTING
Information Patent Application
Submicron dimensional calibration standards and methods of manufact...
- Publication number 20030058437
- Publication date Mar 27, 2003
- Marco Tortonese
- B82 - NANO-TECHNOLOGY

Calibration grids

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method for investigating an object

Correcting substrate for charged particle beam lithography apparatus

Standard component for calibration and calibration method using it...

Method and apparatus for scanned instrument calibration

Submicron dimensional calibration standards and methods of manufact...

Method of calibrating an electron beam system for lithography

Variable transmission reticle for charged particle beam lithography...

Correction of pattern-dependent errors in a particle beam lithograp...

Correction of pattern dependent position errors in electron beam li...

Fabrication and use of sub-micron dimensional standard

Repositionable substrate for microscopes

Patents Applicationslast 30 patents

Device and Method for Calibrating a Charged-Particle Beam

APPARATUS AND METHOD FOR INVESTIGATING AN OBJECT

CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

Electron microscope and scanning probe microscope calibration device

STANDARD COMPONENT FOR CALIBRATION AND CALIBRATION METHOD USING IT...

Method and apparatus for scanned instrument calibration

Submicron dimensional calibration standards and methods of manufact...