Capacitively coupled

Industry

CPC
H05H2001/4675

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Parent Industries

HELECTRICITY H05Electric techniques H05HPLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS

Current Industry

H05H2001/4675Capacitively coupled

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma generating device
- Patent number 10,980,101
- Issue date Apr 13, 2021
- FUJI CORPORATION
- Akihiro Niwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multifunctional radio frequency systems and methods for UV steriliz...
- Patent number 10,648,728
- Issue date May 12, 2020
- NXP USA, INC.
- Pierre Marie Jean Piel
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 10,638,593
- Issue date Apr 28, 2020
- Lam Research Corporation
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma generating method
- Patent number 10,615,005
- Issue date Apr 7, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monopole antenna array source with phase shifted zones for semicond...
- Patent number 10,431,427
- Issue date Oct 1, 2019
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitively coupled devices and oscillators
- Patent number 10,375,810
- Issue date Aug 6, 2019
- PerkinElmer Health Sciences, Inc.
- Peter J Morrisroe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical generator and molecular beam epitaxy apparatus
- Patent number 10,312,054
- Issue date Jun 4, 2019
- National University Corporation Nagoya University
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generation apparatus and high-frequency power source
- Patent number 10,306,744
- Issue date May 28, 2019
- Daihen Corporation
- Hayato Notomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,264,662
- Issue date Apr 16, 2019
- Tokyo Electron Limited
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 10,264,663
- Issue date Apr 16, 2019
- Lam Research Corporation
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma source for a plasma CVD apparatus and a manufacturing method...
- Patent number 10,204,767
- Issue date Feb 12, 2019
- AGC Inc.
- Hirotomo Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ion control for dielectric etch
- Patent number 10,181,412
- Issue date Jan 15, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF power distribution device and RF power distribution method
- Patent number 9,736,919
- Issue date Aug 15, 2017
- Plasmart, Inc.
- Jaehyun Kim
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Methods and apparatus for material processing using plasma thermal...
- Patent number 9,550,694
- Issue date Jan 24, 2017
- Corning Incorporated
- Daniel Robert Boughton
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Electrostatic remote plasma source system and method
- Patent number 9,524,854
- Issue date Dec 20, 2016
- Advanced Energy Industries, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid plasma reactor
- Patent number 9,451,686
- Issue date Sep 20, 2016
- Dae-Kyu Choi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radio frequency (RF) power coupling system utilizing multiple RF po...
- Patent number 9,396,900
- Issue date Jul 19, 2016
- Tokyo Electron Limited
- Barton Lane
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capacitive-coupled plasma processing apparatus and method for proce...
- Patent number 9,230,781
- Issue date Jan 5, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Zhongdu Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma generator
- Patent number 9,224,580
- Issue date Dec 29, 2015
- MAPPER LITOHGRAPHY IP B.V.
- Marc Smits
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capacitively coupled remote plasma source
- Patent number 9,142,388
- Issue date Sep 22, 2015
- Advanced Energy Industries, Inc.
- Daniel J. Hoffman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Negative ion control for dielectric etch
- Patent number 9,117,767
- Issue date Aug 25, 2015
- Lam Research Corporation
- Alexei Marakhatanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,883,025
- Issue date Nov 11, 2014
- Panasonic Corporation
- Shogo Okita
- B44 - DECORATIVE ARTS
Information Patent Grant
Hybrid plasma reactor
- Patent number 8,866,390
- Issue date Oct 21, 2014
- Dae-Kyu Choi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrostatic remote plasma source
- Patent number 8,723,423
- Issue date May 13, 2014
- Advanced Energy Industries, Inc.
- Daniel J. Hoffman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma particle extraction process for PECVD
- Patent number 8,192,806
- Issue date Jun 5, 2012
- Novellus Systems, Inc.
- Sesha Varadarajan
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method, arrangement and electrode for generating an atmospheric pre...
- Patent number 7,485,205
- Issue date Feb 3, 2009
- Fuji Photo Film B.V.
- Hindrik Wilem DeVries
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capacitive discharge plasma ion source
- Patent number 7,274,015
- Issue date Sep 25, 2007
- Sionex Corporation
- Raanan A. Miller
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
RADIO FREQUENCY GROUND SYSTEM AND METHOD
- Publication number 20210391147
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Gaosheng FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL SYSTEM AND PLASMA CONTROL SYSTEM PROGRAM
- Publication number 20210022236
- Publication date Jan 21, 2021
- NISSIN ELECTRIC CO., LTD.
- Tsubasa IWAKOKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20200253034
- Publication date Aug 6, 2020
- LAM RESEARCH CORPORATION
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
MULTIFUNCTIONAL RADIO FREQUENCY SYSTEMS AND METHODS FOR UV STERILIZ...
- Publication number 20200224960
- Publication date Jul 16, 2020
- NXP USA, Inc.
- Pierre Marie Jean PIEL
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
PLASMA GENERATING METHOD
- Publication number 20190318915
- Publication date Oct 17, 2019
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20190215942
- Publication date Jul 11, 2019
- LAM RESEARCH CORPORATION
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA REACTOR HAVING A FUNCTION OF TUNING LOW FREQUENCY RF POWER D...
- Publication number 20190206703
- Publication date Jul 4, 2019
- Advanced Micro-Fabrication Equipment Inc, China
- Kui ZHAO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Matchless Plasma Source for Semiconductor Wafer Fabrication
- Publication number 20190116656
- Publication date Apr 18, 2019
- LAM RESEARCH CORPORATION
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MONOPOLE ANTENNA ARRAY SOURCE WITH PHASE SHIFTED ZONES FOR SEMICOND...
- Publication number 20180342372
- Publication date Nov 29, 2018
- Applied Materials, Inc.
- Qiwei Liang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING SYSTEM USING ELECTRON BEAM AND CAPACITIVELY-COUPL...
- Publication number 20170330773
- Publication date Nov 16, 2017
- Korea Advanced Institute of Science and Technology
- Hong-Young Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING APPARATUS AND SUBSTRATE TREATING APPARATUS
- Publication number 20140320016
- Publication date Oct 30, 2014
- Hong-Young CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR
- Publication number 20140252953
- Publication date Sep 11, 2014
- Marc Smits
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR
- Publication number 20140231667
- Publication date Aug 21, 2014
- Marc Smits
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVELY COUPLED REMOTE PLASMA SOURCE
- Publication number 20140210345
- Publication date Jul 31, 2014
- Advanced Energy Industries, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MICRO-THRUSTER
- Publication number 20140202131
- Publication date Jul 24, 2014
- Roderick William Boswell
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130199727
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Manabu IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID PLASMA REACTOR
- Publication number 20130175928
- Publication date Jul 11, 2013
- Dae-Kyu CHOI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MAGNETIC FLUX CHANNEL COUPLED PLASMA REACTOR
- Publication number 20130171038
- Publication date Jul 4, 2013
- Dae-Kyu CHOI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
HYBRID PLASMA REACTOR
- Publication number 20130154480
- Publication date Jun 20, 2013
- Dae-Kyu CHOI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RF POWER DISTRIBUTION DEVICE AND RF POWER DISTRIBUTION METHOD
- Publication number 20130134877
- Publication date May 30, 2013
- PLASMART, INC.
- Jaehyun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY (RF) POWER COUPLING SYSTEM UTILIZING MULTIPLE RF PO...
- Publication number 20130119854
- Publication date May 16, 2013
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130068727
- Publication date Mar 21, 2013
- Shogo Okita
- B44 - DECORATIVE ARTS
Information Patent Application
CAPACITIVE-COUPLED PLASMA PROCESSING APPARATUS AND METHOD FOR PROCE...
- Publication number 20130032574
- Publication date Feb 7, 2013
- Zhongdu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Negative Ion Control for Dielectric Etch
- Publication number 20130023064
- Publication date Jan 24, 2013
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC REMOTE PLASMA SOURCE
- Publication number 20120187844
- Publication date Jul 26, 2012
- Advanced Energy Industries, Inc.
- Daniel J. Hoffman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS AND METHOD FOR PRODUCING PLASMA DURING MILLING FOR PROCES...
- Publication number 20110297532
- Publication date Dec 8, 2011
- GENERAL ELECTRIC COMPANY
- Jay Chakraborty
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Method, arrangement and electrode for generating an atmospheric pre...
- Publication number 20050150602
- Publication date Jul 14, 2005
- FUJI PHOTO FILM B.V.
- Hindrik Wilem DeVries
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Capacitive discharge plasma ion source
- Publication number 20030070913
- Publication date Apr 17, 2003
- Sionex Corporation
- Raanan A. Miller
- G01 - MEASURING TESTING

Capacitively coupled

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma generating device

Multifunctional radio frequency systems and methods for UV steriliz...

Matchless plasma source for semiconductor wafer fabrication

Plasma generating method

Monopole antenna array source with phase shifted zones for semicond...

Capacitively coupled devices and oscillators

Radical generator and molecular beam epitaxy apparatus

Plasma generation apparatus and high-frequency power source

Plasma processing apparatus

Matchless plasma source for semiconductor wafer fabrication

Plasma source for a plasma CVD apparatus and a manufacturing method...

Negative ion control for dielectric etch

RF power distribution device and RF power distribution method

Methods and apparatus for material processing using plasma thermal...

Electrostatic remote plasma source system and method

Hybrid plasma reactor

Radio frequency (RF) power coupling system utilizing multiple RF po...

Capacitive-coupled plasma processing apparatus and method for proce...

Plasma generator

Capacitively coupled remote plasma source

Negative ion control for dielectric etch

Plasma processing apparatus and plasma processing method

Hybrid plasma reactor

Electrostatic remote plasma source

Plasma particle extraction process for PECVD

Method, arrangement and electrode for generating an atmospheric pre...

Capacitive discharge plasma ion source

Patents Applicationslast 30 patents

RADIO FREQUENCY GROUND SYSTEM AND METHOD

PLASMA CONTROL SYSTEM AND PLASMA CONTROL SYSTEM PROGRAM

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

MULTIFUNCTIONAL RADIO FREQUENCY SYSTEMS AND METHODS FOR UV STERILIZ...

PLASMA GENERATING METHOD

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

PLASMA REACTOR HAVING A FUNCTION OF TUNING LOW FREQUENCY RF POWER D...

Matchless Plasma Source for Semiconductor Wafer Fabrication

MONOPOLE ANTENNA ARRAY SOURCE WITH PHASE SHIFTED ZONES FOR SEMICOND...

PLASMA PROCESSING SYSTEM USING ELECTRON BEAM AND CAPACITIVELY-COUPL...

PLASMA GENERATING APPARATUS AND SUBSTRATE TREATING APPARATUS

PLASMA GENERATOR

PLASMA GENERATOR

CAPACITIVELY COUPLED REMOTE PLASMA SOURCE

PLASMA MICRO-THRUSTER

PLASMA PROCESSING APPARATUS

HYBRID PLASMA REACTOR

MAGNETIC FLUX CHANNEL COUPLED PLASMA REACTOR

HYBRID PLASMA REACTOR

RF POWER DISTRIBUTION DEVICE AND RF POWER DISTRIBUTION METHOD

RADIO FREQUENCY (RF) POWER COUPLING SYSTEM UTILIZING MULTIPLE RF PO...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CAPACITIVE-COUPLED PLASMA PROCESSING APPARATUS AND METHOD FOR PROCE...

Negative Ion Control for Dielectric Etch

ELECTROSTATIC REMOTE PLASMA SOURCE

APPARATUS AND METHOD FOR PRODUCING PLASMA DURING MILLING FOR PROCES...

Method, arrangement and electrode for generating an atmospheric pre...

Capacitive discharge plasma ion source