Carbonyl compound containing

Industry

CPC
Y10S430/124

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/124Carbonyl compound containing

Industries

Patents Grantslast 30 patents

Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 9,012,129
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium derivatives and the use therof as latent acids
- Patent number 9,005,871
- Issue date Apr 14, 2015
- BASF SE
- Hitoshi Yamato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,940,473
- Issue date Jan 27, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition and radiation-sensitive acid...
- Patent number 8,889,336
- Issue date Nov 18, 2014
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,808,959
- Issue date Aug 19, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,415,085
- Issue date Apr 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive composition, positive permanent resist, and...
- Patent number 8,211,619
- Issue date Jul 3, 2012
- Adeka Corporation
- Hiroshi Morita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive composition
- Patent number 8,148,044
- Issue date Apr 3, 2012
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerizable anion-containing sulfonium salt and polymer, resist c...
- Patent number 8,057,985
- Issue date Nov 15, 2011
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Alkali development-type solder resist, cured product thereof, and p...
- Patent number 8,048,613
- Issue date Nov 1, 2011
- Taiyo Ink Mfg. Co., Ltd.
- Nobuhito Itoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,021,823
- Issue date Sep 20, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 7,927,780
- Issue date Apr 19, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition, pattern forming method using the photos...
- Patent number 7,695,891
- Issue date Apr 13, 2010
- FUJIFILM Corporation
- Kenji Wada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt having polymerizable anion, polymer, resist composit...
- Patent number 7,569,326
- Issue date Aug 4, 2009
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt photoinitiators and use thereof
- Patent number 7,560,219
- Issue date Jul 14, 2009
- Henkel AG & Co.KGaA
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Stimulation sensitive composition and compound
- Patent number 7,510,822
- Issue date Mar 31, 2009
- FUJIFILM Corporation
- Kunihiko Kodama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist resin composition
- Patent number 7,378,223
- Issue date May 27, 2008
- Dongjin Semichem, Co., Ltd.
- Bong-gi Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photopolymerizable composition
- Patent number 7,368,224
- Issue date May 6, 2008
- Kyowa Hakko Chemical Co., Ltd.
- Tsuguo Yamaoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoreactive composition
- Patent number 7,312,013
- Issue date Dec 25, 2007
- Sekisui Chemical Co., Ltd.
- Katsunori Takahashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photobase generator and curable composition
- Patent number 7,300,747
- Issue date Nov 27, 2007
- Mitsubishi Gas Chemical Company, Inc.
- Hitoshi Okazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt photinitiators and use thereof
- Patent number 7,230,122
- Issue date Jun 12, 2007
- National Starch and Chemical Investment Holding Corporation
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin film and cured film made therefrom
- Patent number 7,214,471
- Issue date May 8, 2007
- JSR Corporation
- Shin-ichiro Iwanaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive composition and acid generator
- Patent number 7,033,727
- Issue date Apr 25, 2006
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonate and a resist composition
- Patent number 7,001,706
- Issue date Feb 21, 2006
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photopolymerizable composition
- Patent number 6,838,222
- Issue date Jan 4, 2005
- Fuji Photo Film Co., Ltd.
- Keitaro Aoshima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition
- Patent number 6,818,375
- Issue date Nov 16, 2004
- Eternal Technology Corporation
- Thomas A. Koes
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive composition
- Patent number 6,808,862
- Issue date Oct 26, 2004
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplifying type positive resist composition
- Patent number 6,767,686
- Issue date Jul 27, 2004
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photodefineable compositions
- Patent number 6,727,038
- Issue date Apr 27, 2004
- Dow Global Technologies Inc.
- Ying Hung So
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for producing resist structures
- Patent number 6,703,190
- Issue date Mar 9, 2004
- Infineon Technologies AG
- Klaus Elian
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20140120472
- Publication date May 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID...
- Publication number 20130260316
- Publication date Oct 3, 2013
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20120264061
- Publication date Oct 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219904
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS
- Publication number 20110300484
- Publication date Dec 8, 2011
- BASF SE
- Hitoshi Yamato
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND...
- Publication number 20100273104
- Publication date Oct 28, 2010
- A D E K A (ADEKA CORPORATION)
- Hiroshi Morita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE PHOTOSENSITIVE COMPOSITION
- Publication number 20100136479
- Publication date Jun 3, 2010
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist composition, method of forming resist pattern, novel compoun...
- Publication number 20100119974
- Publication date May 13, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST C...
- Publication number 20100055608
- Publication date Mar 4, 2010
- Masaki Ohashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20090214982
- Publication date Aug 27, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20090068591
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ALKALI DEVELOPMENT-TYPE SOLDER RESIST, CURED PRODUCT THEREOF, AND P...
- Publication number 20090038834
- Publication date Feb 12, 2009
- Nobuhito Itoh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonium salt having polymerizable anion, polymer, resist composit...
- Publication number 20080102407
- Publication date May 1, 2008
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonium salt photoinitiators and use thereof
- Publication number 20070203254
- Publication date Aug 30, 2007
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive composition, pattern forming method using the photos...
- Publication number 20070082289
- Publication date Apr 12, 2007
- Fuji Photo Film Co., Ltd.
- Kenji Wada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photosensitive resin film and cured film made therefrom
- Publication number 20060210912
- Publication date Sep 21, 2006
- JSR Corporation
- Shin-ichiro Iwanaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist resin composition
- Publication number 20050255405
- Publication date Nov 17, 2005
- Bong-gi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photobase generator and curable composition
- Publication number 20050181300
- Publication date Aug 18, 2005
- Hitoshi Okazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photopolymerizable composition
- Publication number 20050164120
- Publication date Jul 28, 2005
- KYOWA HAKKO CHEMICAL CO., LTD.
- Tsuguo Yamaoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonium salt photoinitiators and use thereof
- Publication number 20050095531
- Publication date May 5, 2005
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonium salt photinitiators and use thereof
- Publication number 20050095528
- Publication date May 5, 2005
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonate and a resist composition
- Publication number 20050014095
- Publication date Jan 20, 2005
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoreactive composition
- Publication number 20040202956
- Publication date Oct 14, 2004
- Katsunori Takahashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Photosensitive composition and acid generator
- Publication number 20040072097
- Publication date Apr 15, 2004
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stimulation sensitive composition and compound
- Publication number 20030224288
- Publication date Dec 4, 2003
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Positive photosensitive composition
- Publication number 20030044717
- Publication date Mar 6, 2003
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method for producing resist structures
- Publication number 20030008240
- Publication date Jan 9, 2003
- Klaus Elian
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photopolymerizable composition
- Publication number 20020160295
- Publication date Oct 31, 2002
- Keitaro Aoshima
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Chemically amplifying type positive resist composition
- Publication number 20020146641
- Publication date Oct 10, 2002
- Yasunori Uetani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photoresist composition
- Publication number 20020132180
- Publication date Sep 19, 2002
- Shipley Company, L.L.C.
- Thomas A. Koes
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Carbonyl compound containing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition, method of forming resist pattern, novel compoun...

Sulfonium derivatives and the use therof as latent acids

Resist composition and method for producing resist pattern

Radiation-sensitive resin composition and radiation-sensitive acid...

Resist composition, method of forming resist pattern, novel compoun...

Resist composition, method of forming resist pattern, novel compoun...

Positive photosensitive composition, positive permanent resist, and...

Positive photosensitive composition

Polymerizable anion-containing sulfonium salt and polymer, resist c...

Alkali development-type solder resist, cured product thereof, and p...

Positive resist composition, method of forming resist pattern, and...

Resist composition, method of forming resist pattern, novel compoun...

Photosensitive composition, pattern forming method using the photos...

Sulfonium salt having polymerizable anion, polymer, resist composit...

Sulfonium salt photoinitiators and use thereof

Stimulation sensitive composition and compound

Photoresist resin composition

Photopolymerizable composition

Photoreactive composition

Photobase generator and curable composition

Sulfonium salt photinitiators and use thereof

Photosensitive resin film and cured film made therefrom

Photosensitive composition and acid generator

Sulfonate and a resist composition

Photopolymerizable composition

Photoresist composition

Positive photosensitive composition

Chemically amplifying type positive resist composition

Photodefineable compositions

Method for producing resist structures

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS

POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND...

POSITIVE PHOTOSENSITIVE COMPOSITION

Resist composition, method of forming resist pattern, novel compoun...

POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST C...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

ALKALI DEVELOPMENT-TYPE SOLDER RESIST, CURED PRODUCT THEREOF, AND P...

Sulfonium salt having polymerizable anion, polymer, resist composit...

Sulfonium salt photoinitiators and use thereof

Photosensitive composition, pattern forming method using the photos...

Photosensitive resin film and cured film made therefrom

Photoresist resin composition

Photobase generator and curable composition

Photopolymerizable composition

Sulfonium salt photoinitiators and use thereof

Sulfonium salt photinitiators and use thereof

Sulfonate and a resist composition

Photoreactive composition

Photosensitive composition and acid generator

Stimulation sensitive composition and compound

Positive photosensitive composition

Method for producing resist structures

Photopolymerizable composition

Chemically amplifying type positive resist composition

Photoresist composition