Carbonyl in heterocyclic compound

Industry

CPC
Y10S430/125

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/125Carbonyl in heterocyclic compound

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Sulfonium derivatives and the use therof as latent acids
- Patent number 9,005,871
- Issue date Apr 14, 2015
- BASF SE
- Hitoshi Yamato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Alkali development-type solder resist, cured product thereof, and p...
- Patent number 8,048,613
- Issue date Nov 1, 2011
- Taiyo Ink Mfg. Co., Ltd.
- Nobuhito Itoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,021,823
- Issue date Sep 20, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 7,927,780
- Issue date Apr 19, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt photoinitiators and use thereof
- Patent number 7,560,219
- Issue date Jul 14, 2009
- Henkel AG & Co.KGaA
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist resin composition
- Patent number 7,378,223
- Issue date May 27, 2008
- Dongjin Semichem, Co., Ltd.
- Bong-gi Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin composition, photosensitive element using the...
- Patent number 7,232,647
- Issue date Jun 19, 2007
- Hitachi Chemical Co., Ltd.
- Yasuhara Murakami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonium salt photinitiators and use thereof
- Patent number 7,230,122
- Issue date Jun 12, 2007
- National Starch and Chemical Investment Holding Corporation
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, photosensitive element using the...
- Patent number 7,220,533
- Issue date May 22, 2007
- Hitachi Chemical Co., Ltd.
- Yasuharu Murakami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition
- Patent number 6,818,375
- Issue date Nov 16, 2004
- Eternal Technology Corporation
- Thomas A. Koes
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive thick film composition
- Patent number 6,800,420
- Issue date Oct 5, 2004
- Industrial Technology Research Institute
- Tsing-Tang Song
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin composition
- Patent number 6,280,905
- Issue date Aug 28, 2001
- JSR Corporation
- Katsuo Koshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive composition, photosensitive lithographic pr...
- Patent number 6,110,646
- Issue date Aug 29, 2000
- Mitsubishi Chemical Corporation
- Toshiyuki Urano
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photoresist composition
- Patent number 5,985,511
- Issue date Nov 16, 1999
- Sumitomo Chemical Company, Limited
- Yuko Yako
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive composition
- Patent number 5,891,603
- Issue date Apr 6, 1999
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoinitiator compositions including amino acids, coumarin and tit...
- Patent number 5,811,218
- Issue date Sep 22, 1998
- Hitachi Chemical Company, Ltd.
- Makoto Kaji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Unsaturated group-containing urethane compound, photopolymerizable...
- Patent number 5,723,260
- Issue date Mar 3, 1998
- Mitsubishi Chemical Corporation
- Shigeo Tsuji
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition containing alkyletherified polyvinylphenol
- Patent number 5,585,218
- Issue date Dec 17, 1996
- Sumitomo Chemical Company, Limited
- Yuko Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aminoketone sensitizers for photopolymer compositions
- Patent number 5,534,633
- Issue date Jul 9, 1996
- Minnesota Mining and Manufacturing Company
- M. Zaki Ali
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive compounds
- Patent number 5,519,136
- Issue date May 21, 1996
- John R. Wade
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Aminoketone sensitizers for photopolymer compositions
- Patent number 5,415,976
- Issue date May 16, 1995
- Minnesota Mining and Manufacturing Company
- M. Zaki Ali
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive plates
- Patent number 5,286,603
- Issue date Feb 15, 1994
- Vickers PLC
- John R. Wade
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Visible photosensitizers for photopolymerizable compositions
- Patent number 5,256,520
- Issue date Oct 26, 1993
- E. I. Du Pont de Nemours and Company
- William K. Smothers
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Visible photosensitizers for photopolymerizable compositions
- Patent number 5,236,808
- Issue date Aug 17, 1993
- E. I. Du Pont de Nemours and Company
- William K. Smothers
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive compound
- Patent number 5,141,841
- Issue date Aug 25, 1992
- Vickers PLC
- John R. Wade
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation sensitive plates
- Patent number 5,130,227
- Issue date Jul 14, 1992
- Vickers PLC
- John R. Wade
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Alkali soluble phenol polymer photosensitive composition
- Patent number 5,091,282
- Issue date Feb 25, 1992
- Kabushiki Kaisha Toshiba
- Yasunobu Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoinitiator mixtures containing a titanocene and a 3-ketocoumarin
- Patent number 5,011,755
- Issue date Apr 30, 1991
- Ciba-Geigy Corporation
- Ottmar Rohde
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoinitiator and photopolymerizable composition using the same
- Patent number 4,987,057
- Issue date Jan 22, 1991
- Hitachi Chemical Co., Ltd.
- Makoto Kaji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recording medium comprising photopolymers
- Patent number 4,948,694
- Issue date Aug 14, 1990
- Canon Kabushiki Kaisha
- Norio Ohkuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS
- Publication number 20110300484
- Publication date Dec 8, 2011
- BASF SE
- Hitoshi Yamato
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20090214982
- Publication date Aug 27, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20090068591
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ALKALI DEVELOPMENT-TYPE SOLDER RESIST, CURED PRODUCT THEREOF, AND P...
- Publication number 20090038834
- Publication date Feb 12, 2009
- Nobuhito Itoh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonium salt photoinitiators and use thereof
- Publication number 20070203254
- Publication date Aug 30, 2007
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist resin composition
- Publication number 20050255405
- Publication date Nov 17, 2005
- Bong-gi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive resin composition, photosensitive element using the...
- Publication number 20050164124
- Publication date Jul 28, 2005
- Hitachi Chemical Co., Ltd.
- Yasuharu Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sulfonium salt photoinitiators and use thereof
- Publication number 20050095531
- Publication date May 5, 2005
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonium salt photinitiators and use thereof
- Publication number 20050095528
- Publication date May 5, 2005
- Yuxia Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive resin composition, photosensitive element comprising...
- Publication number 20040038149
- Publication date Feb 26, 2004
- Yasuharu Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive thick film composition
- Publication number 20030162128
- Publication date Aug 28, 2003
- INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Tsing-Tang Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition
- Publication number 20020132180
- Publication date Sep 19, 2002
- Shipley Company, L.L.C.
- Thomas A. Koes
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Carbonyl in heterocyclic compound

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Sulfonium derivatives and the use therof as latent acids

Alkali development-type solder resist, cured product thereof, and p...

Positive resist composition, method of forming resist pattern, and...

Resist composition, method of forming resist pattern, novel compoun...

Sulfonium salt photoinitiators and use thereof

Photoresist resin composition

Photosensitive resin composition, photosensitive element using the...

Sulfonium salt photinitiators and use thereof

Photosensitive resin composition, photosensitive element using the...

Photoresist composition

Photosensitive thick film composition

Photosensitive resin composition

Positive photosensitive composition, photosensitive lithographic pr...

Photoresist composition

Positive working photosensitive composition

Photoinitiator compositions including amino acids, coumarin and tit...

Unsaturated group-containing urethane compound, photopolymerizable...

Photoresist composition containing alkyletherified polyvinylphenol

Aminoketone sensitizers for photopolymer compositions

Radiation sensitive compounds

Aminoketone sensitizers for photopolymer compositions

Radiation sensitive plates

Visible photosensitizers for photopolymerizable compositions

Visible photosensitizers for photopolymerizable compositions

Radiation sensitive compound

Radiation sensitive plates

Alkali soluble phenol polymer photosensitive composition

Photoinitiator mixtures containing a titanocene and a 3-ketocoumarin

Photoinitiator and photopolymerizable composition using the same

Recording medium comprising photopolymers

Patents Applicationslast 30 patents

SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

ALKALI DEVELOPMENT-TYPE SOLDER RESIST, CURED PRODUCT THEREOF, AND P...

Sulfonium salt photoinitiators and use thereof

Photoresist resin composition

Photosensitive resin composition, photosensitive element using the...

Sulfonium salt photoinitiators and use thereof

Sulfonium salt photinitiators and use thereof

Photosensitive resin composition, photosensitive element comprising...

Photosensitive thick film composition

Photoresist composition