Cationic or anionic

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CPC
Y10S430/115

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/115Cationic or anionic

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,335,630
- Issue date May 10, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,298,090
- Issue date Mar 29, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating compositions
- Patent number 9,146,467
- Issue date Sep 29, 2015
- Merck Patent GmbH
- Francis Houlihan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern and compound
- Patent number 9,040,224
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,034,559
- Issue date May 19, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,017,924
- Issue date Apr 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 9,017,919
- Issue date Apr 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, polymeric compound, acid generator, resist composition, a...
- Patent number 9,005,874
- Issue date Apr 14, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Hydrophilic photoacid generator and resist composition comprising same
- Patent number 8,980,526
- Issue date Mar 17, 2015
- Korea Kumho Petrochemical Co., Ltd.
- Dae Kyung Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for resist underlayer film and process for producing same
- Patent number 8,968,458
- Issue date Mar 3, 2015
- JSR Corporation
- Keiji Konno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,956,802
- Issue date Feb 17, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,940,473
- Issue date Jan 27, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,871,427
- Issue date Oct 28, 2014
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition and cured product thereof
- Patent number 8,865,392
- Issue date Oct 21, 2014
- Nippon Kayaku Kabushiki Kaisha
- Misato Oonishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for resist underlayer film and process for producing same
- Patent number 8,808,446
- Issue date Aug 19, 2014
- JSR Corporation
- Keiji Konno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive composition
- Patent number 8,685,614
- Issue date Apr 1, 2014
- FUJIFILM Corporation
- Kunihiko Kodama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure and method of forming res...
- Patent number 8,574,813
- Issue date Nov 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko Irie
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing compound, fluorine-containing polymer, negative...
- Patent number 8,513,457
- Issue date Aug 20, 2013
- Central Glass Company, Limited
- Yoshimi Isono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating composition
- Patent number 8,455,176
- Issue date Jun 4, 2013
- AZ Electronic Materials USA Corp.
- Francis Houlihan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generator and photoreactive composition
- Patent number 8,216,768
- Issue date Jul 10, 2012
- Sumitomo Seika Chemicals Co., Ltd.
- Katsumasa Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, polymer preparation method, resist composition and pattern...
- Patent number 8,216,766
- Issue date Jul 10, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive composition, positive permanent resist, and...
- Patent number 8,211,619
- Issue date Jul 3, 2012
- Adeka Corporation
- Hiroshi Morita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer for immersion lithography and compositions
- Patent number 8,211,615
- Issue date Jul 3, 2012
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process
- Patent number 8,198,016
- Issue date Jun 12, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for immersion exposure and method of forming res...
- Patent number 8,192,914
- Issue date Jun 5, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko Irie
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing compound, fluorine-containing polymer, negative...
- Patent number 8,187,787
- Issue date May 29, 2012
- Central Glass Company, Limited
- Yoshimi Isono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer for resist and resist composition manufactured using the same
- Patent number 8,187,790
- Issue date May 29, 2012
- Korea Kumho Petrochemical Co., Ltd.
- Hyunsang Joo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, polymer compound, method of formi...
- Patent number 8,173,349
- Issue date May 8, 2012
- FUJIFILM Corporation
- Masanori Hikita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound and radiation-sensitive composition
- Patent number 8,173,351
- Issue date May 8, 2012
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition, method of forming pattern using the photor...
- Patent number 8,163,463
- Issue date Apr 24, 2012
- Samsung Electronics Co., Ltd.
- Jin-baek Kim
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20140255853
- Publication date Sep 11, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
- Publication number 20140178821
- Publication date Jun 26, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COATING COMPOSITIONS
- Publication number 20130236833
- Publication date Sep 12, 2013
- AZ Electronic Materials USA Corp.
- Francis HOULIHAN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20130230804
- Publication date Sep 5, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130202999
- Publication date Aug 8, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HYDROPHILIC PHOTOACID GENERATOR AND RESIST COMPOSITION COMPRISING SAME
- Publication number 20130177852
- Publication date Jul 11, 2013
- KOREA KUMHO PETROCHEMICAL CO., LTD.
- Dae Kyung YOON
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photosensitive Resin Composition And Cured Product Thereof
- Publication number 20130108961
- Publication date May 2, 2013
- NIPPON KAYAKU KABUSHIKI KAISHA
- Misato Oonishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130045444
- Publication date Feb 21, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, A...
- Publication number 20120270155
- Publication date Oct 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...
- Publication number 20120225383
- Publication date Sep 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...
- Publication number 20120226070
- Publication date Sep 6, 2012
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219904
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20120107744
- Publication date May 3, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE PHOTOSENSITIVE FLUORINATED AROMATIC RESIN COMPOSITION
- Publication number 20110117496
- Publication date May 19, 2011
- ASAHI GLASS COMPANY LIMITED
- Takeshi ERIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND...
- Publication number 20100273104
- Publication date Oct 28, 2010
- A D E K A (ADEKA CORPORATION)
- Hiroshi Morita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE PHOTOSENSITIVE COMPOSITION
- Publication number 20100255419
- Publication date Oct 7, 2010
- FUJIFILM CORPORATION
- Kunihiko Kodama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION
- Publication number 20100233621
- Publication date Sep 16, 2010
- Sumitomo Seika Chemicals Co., Ltd.
- Katsumasa Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME
- Publication number 20100151384
- Publication date Jun 17, 2010
- JSR Corporation
- Keiji Konno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING COMPOSITION
- Publication number 20100119972
- Publication date May 13, 2010
- Francis Houlihan
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER FOR RESIST AND RESIST COMPOSITION MANUFACTURED USING THE SAME
- Publication number 20100081079
- Publication date Apr 1, 2010
- Korea Kumho Petrochemical Co., Ltd.
- Hyunsang JOO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMI...
- Publication number 20100080963
- Publication date Apr 1, 2010
- FUJIFILM CORPORATION
- Masanori HIKITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resin and Chemically Amplified Resist Composition Comprising the Same
- Publication number 20100075257
- Publication date Mar 25, 2010
- Sumitomo Chemical Company, Limited
- Ichiki Takemoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS
- Publication number 20100047710
- Publication date Feb 25, 2010
- MARUZEN PETROCHEMICAL CO., LTD.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Patterning process
- Publication number 20090286188
- Publication date Nov 19, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20090274977
- Publication date Nov 5, 2009
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20090274978
- Publication date Nov 5, 2009
- Masaki OHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, POLYMER PREPARATION METHOD, RESIST COMPOSITION AND PATTERN...
- Publication number 20090246686
- Publication date Oct 1, 2009
- Takeru WATANABE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CON...
- Publication number 20090220886
- Publication date Sep 3, 2009
- Sumitomo Chemical Company, Limited
- Ichiki Takemoto
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON-A...
- Publication number 20090202941
- Publication date Aug 13, 2009
- Dow Corning Corporation
- Sanlin Hu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME
- Publication number 20090155714
- Publication date Jun 18, 2009
- Jae-Woo LEE
- C07 - ORGANIC CHEMISTRY

Cationic or anionic

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pattern-forming method, and radiation-sensitive composition

Pattern-forming method, and radiation-sensitive composition

Coating compositions

Resist composition, method of forming resist pattern and compound

Pattern-forming method, and radiation-sensitive composition

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern, novel compoun...

Compound, polymeric compound, acid generator, resist composition, a...

Hydrophilic photoacid generator and resist composition comprising same

Composition for resist underlayer film and process for producing same

Pattern forming method, chemical amplification resist composition a...

Resist composition and method for producing resist pattern

Positive resist composition and patterning process

Photosensitive resin composition and cured product thereof

Composition for resist underlayer film and process for producing same

Positive photosensitive composition

Resist composition for immersion exposure and method of forming res...

Fluorine-containing compound, fluorine-containing polymer, negative...

Coating composition

Photoacid generator and photoreactive composition

Polymer, polymer preparation method, resist composition and pattern...

Positive photosensitive composition, positive permanent resist, and...

Copolymer for immersion lithography and compositions

Patterning process

Resist composition for immersion exposure and method of forming res...

Fluorine-containing compound, fluorine-containing polymer, negative...

Polymer for resist and resist composition manufactured using the same

Photosensitive resin composition, polymer compound, method of formi...

Compound and radiation-sensitive composition

Photoresist composition, method of forming pattern using the photor...

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND

COATING COMPOSITIONS

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

HYDROPHILIC PHOTOACID GENERATOR AND RESIST COMPOSITION COMPRISING SAME

Photosensitive Resin Composition And Cured Product Thereof

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, A...

RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...

Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

NEGATIVE PHOTOSENSITIVE FLUORINATED AROMATIC RESIN COMPOSITION

POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND...

POSITIVE PHOTOSENSITIVE COMPOSITION

PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION

COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME

COATING COMPOSITION

POLYMER FOR RESIST AND RESIST COMPOSITION MANUFACTURED USING THE SAME

PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMI...

Resin and Chemically Amplified Resist Composition Comprising the Same

COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS

Patterning process

COMPOUND AND RADIATION-SENSITIVE COMPOSITION

NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS

POLYMER, POLYMER PREPARATION METHOD, RESIST COMPOSITION AND PATTERN...

POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CON...

SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON-A...

PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME