characterised by a multilayer structure

Industry

CPC
G21K2201/061

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Parent Industries

GPHYSICS G21Nuclear engineering G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR IRRADIATION DEVICES GAMMA RAY OR X-RAY MICROSCOPES G21K2201/00Arrangements for handling radiation or particles

Current Industry

G21K2201/061characterised by a multilayer structure

Industries

Patents Grantslast 30 patents

Information Patent Grant
Electron diffraction intensity from single crystal silicon in a pho...
- Patent number 11,915,837
- Issue date Feb 27, 2024
- Arizona Board of Regents on behalf of Arizona State University
- William Graves
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Interferometer for x-ray phase contrast imaging
- Patent number 11,813,102
- Issue date Nov 14, 2023
- Houxun Miao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Nanopatterned electron beams for temporal coherence and determinist...
- Patent number 11,798,706
- Issue date Oct 24, 2023
- Arizona Board of Regents on behalf of Arizona State University
- William Graves
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for producing a multilayer Laue lens
- Patent number 11,789,187
- Issue date Oct 17, 2023
- Deutsches Elektronen-Synchrotron DESY
- Henry Chapman
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Microscopic system for testing structures and defects on EUV lithog...
- Patent number 11,615,897
- Issue date Mar 28, 2023
- RI Research Institute GmbH
- Rainer Lebert
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multilayer mirror for reflecting EUV radiation and method for produ...
- Patent number 11,500,137
- Issue date Nov 15, 2022
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Philipp Naujok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray apparatus including x-ray reflector and method for operating...
- Patent number 11,229,411
- Issue date Jan 25, 2022
- Siemens Healthcare GmbH
- Michael Wiets
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Metal X-ray grid, X-ray imaging device, and production method for m...
- Patent number 11,101,051
- Issue date Aug 24, 2021
- Hamamatsu Photonics K.K.
- Masahiro Kotani
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
System and method for x-ray fluorescence with filtering
- Patent number 10,962,491
- Issue date Mar 30, 2021
- Sigray, Inc.
- Wenbing Yun
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray generator and x-ray analysis device
- Patent number 10,854,348
- Issue date Dec 1, 2020
- Rigaku Corporation
- Kazuhiko Omote
- G01 - MEASURING TESTING
Information Patent Grant
Reticles for lithography
- Patent number 10,782,607
- Issue date Sep 22, 2020
- Imec VZW
- Boon Teik Chan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor apparatus and method of operating the same
- Patent number 10,613,444
- Issue date Apr 7, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Graphene spectral purity filter
- Patent number 10,481,510
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray optics assembly with switching system for three beam paths, a...
- Patent number 10,429,326
- Issue date Oct 1, 2019
- Frank Hans Hoffman
- G01 - MEASURING TESTING
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer mirror
- Patent number 10,209,411
- Issue date Feb 19, 2019
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mirror, projection optical system, exposure apparatus, a...
- Patent number 10,191,387
- Issue date Jan 29, 2019
- Nikon Corporation
- Yoshio Kawabe
- G02 - OPTICS
Information Patent Grant
Methods for manufacturing doubly bent X-ray focusing device, doubly...
- Patent number 10,175,185
- Issue date Jan 8, 2019
- Rigaku Corporation
- Naoki Kawahara
- G01 - MEASURING TESTING
Information Patent Grant
Structure, method for manufacturing the same, and talbot interferom...
- Patent number 10,045,753
- Issue date Aug 14, 2018
- Canon Kabushiki Kaisha
- Takayuki Teshima
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,989,844
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mirror, projection optical system, exposure apparatus, a...
- Patent number 9,864,278
- Issue date Jan 9, 2018
- Nikon Corporation
- Yoshio Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Collector
- Patent number 9,645,503
- Issue date May 9, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mirror, projection optical system, exposure apparatus, a...
- Patent number 9,606,447
- Issue date Mar 28, 2017
- Nikon Corporation
- Yoshio Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray surface analysis and measurement apparatus
- Patent number 9,594,036
- Issue date Mar 14, 2017
- Sigray, Inc.
- Wenbing Yun
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 9,594,306
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror, projection objective with such mirror, and projection expos...
- Patent number 9,575,224
- Issue date Feb 21, 2017
- Carl Zeiss SMT GmbH
- Rolf Freimann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Color x-ray histology for multi-stained biologic sample
- Patent number 9,513,233
- Issue date Dec 6, 2016
- The University of Chicago
- Patrick La Riviere
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE

Patents Applicationslast 30 patents

Information Patent Application
MICROSCOPIC SYSTEM FOR TESTING STRUCTURES AND DEFECTS ON EUV LITHOG...
- Publication number 20220392660
- Publication date Dec 8, 2022
- RI Research Instruments GmbH
- Rainer LEBERT
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR PRODUCING A MULTILAYER LAUE LENS
- Publication number 20220146721
- Publication date May 12, 2022
- DEUTSCHES ELEKTRONEN-SYNCHROTRON DESY
- Henry Chapman
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
NANOPATTERNED ELECTRON BEAMS FOR TEMPORAL COHERENCE AND DETERMINIST...
- Publication number 20210343444
- Publication date Nov 4, 2021
- Arizona Board of Regents on behalf of Arizona State University
- William Graves
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME
- Publication number 20200073248
- Publication date Mar 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR X-RAY FLUORESCENCE WITH FILTERING
- Publication number 20200072770
- Publication date Mar 5, 2020
- Sigray, Inc.
- Wenbing Yun
- G01 - MEASURING TESTING
Information Patent Application
X-RAY APPARATUS AND METHOD FOR OPERATING THE X-RAY APPARATUS
- Publication number 20200043626
- Publication date Feb 6, 2020
- Siemens Healthcare GmbH
- Michael WIETS
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
X-RAY GENERATOR AND X-RAY ANALYSIS DEVICE
- Publication number 20190272929
- Publication date Sep 5, 2019
- Rigaku Corporation
- Kazuhiko Omote
- G01 - MEASURING TESTING
Information Patent Application
Multilayer Mirror for Reflecting EUV Radiation and Method for Produ...
- Publication number 20190235141
- Publication date Aug 1, 2019
- Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
- Philipp Naujok
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20180259846
- Publication date Sep 13, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MIRROR, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, A...
- Publication number 20180120713
- Publication date May 3, 2018
- Nikon Corporation
- Yoshio Kawabe
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MIRROR, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, A...
- Publication number 20170206994
- Publication date Jul 20, 2017
- NIKON CORPORATION
- Yoshio Kawabe
- G02 - OPTICS
Information Patent Application
MULTILAYER MIRROR
- Publication number 20160202396
- Publication date Jul 14, 2016
- Carl Zeiss SMT GMBH
- Aksel GOEHNERMEIER
- G02 - OPTICS
Information Patent Application
STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND TALBOT INTERFEROM...
- Publication number 20160027546
- Publication date Jan 28, 2016
- Canon Kabushiki Kaisha
- Takayuki Teshima
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
REFLECTOR, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVIC...
- Publication number 20150219997
- Publication date Aug 6, 2015
- Nikon Corporation
- Yoshio Kawabe
- G02 - OPTICS
Information Patent Application
X RAY WAVEGUIDE SYSTEM
- Publication number 20140376699
- Publication date Dec 25, 2014
- Canon Kabushiki Kaisha
- Atsushi Komoto
- B82 - NANO-TECHNOLOGY
Information Patent Application
COLOR X-RAY HISTOLOGY FOR MULTI-STAINED BIOLOGIC SAMPLE
- Publication number 20140301528
- Publication date Oct 9, 2014
- The University of Chicago
- Patrick La Riviere
- B82 - NANO-TECHNOLOGY
Information Patent Application
X-RAY WAVEGUIDE
- Publication number 20140294158
- Publication date Oct 2, 2014
- Canon Kabushiki Kaisha
- Kohei Okamoto
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SCINTILLATOR PLATE
- Publication number 20140211918
- Publication date Jul 31, 2014
- HAMAMATSU PHOTONICS K. K.
- Toshiyasu Suyama
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTILAYER MIRROR, METHOD OF PRODUCING A MULTILAYER MIRROR AND LITH...
- Publication number 20140198306
- Publication date Jul 17, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
COLLECTOR
- Publication number 20140192339
- Publication date Jul 10, 2014
- Ingo Saenger
- B82 - NANO-TECHNOLOGY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20140160455
- Publication date Jun 12, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich YAKUNIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20140085619
- Publication date Mar 27, 2014
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Application
Grazing Incidence Reflectors, Lithographic Apparatus, Methods for M...
- Publication number 20140078486
- Publication date Mar 20, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Deflection Mirror and Projection Exposure Apparatus for Microlithog...
- Publication number 20140022525
- Publication date Jan 23, 2014
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- B82 - NANO-TECHNOLOGY
Information Patent Application
SCINTILLATOR PLATE
- Publication number 20140021372
- Publication date Jan 23, 2014
- Hamamatsu Photonics K.K.
- Toshiyasu Suyama
- B82 - NANO-TECHNOLOGY
Information Patent Application
MIRROR, PROJECTION OBJECTIVE WITH SUCH MIRROR, AND PROJECTION EXPOS...
- Publication number 20130286471
- Publication date Oct 31, 2013
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR MANUFACTURING X-RAY/GAMMA-RAY FOCUSING OPTICAL SYSTEM US...
- Publication number 20130280421
- Publication date Oct 24, 2013
- POSTECH ACADEMY-INDUSTRY FOUNDATION
- Jung Ho Je
- B82 - NANO-TECHNOLOGY

characterised by a multilayer structure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electron diffraction intensity from single crystal silicon in a pho...

Interferometer for x-ray phase contrast imaging

Nanopatterned electron beams for temporal coherence and determinist...

Method for producing a multilayer Laue lens

Microscopic system for testing structures and defects on EUV lithog...

Multilayer mirror for reflecting EUV radiation and method for produ...

X-ray apparatus including x-ray reflector and method for operating...

Metal X-ray grid, X-ray imaging device, and production method for m...

System and method for x-ray fluorescence with filtering

X-ray generator and x-ray analysis device

Reticles for lithography

EUV exposure apparatus with reflective elements having reduced infl...

Semiconductor apparatus and method of operating the same

Graphene spectral purity filter

X-ray optics assembly with switching system for three beam paths, a...

EUV exposure apparatus with reflective elements having reduced infl...

Multilayer mirror

Reflective mirror, projection optical system, exposure apparatus, a...

Methods for manufacturing doubly bent X-ray focusing device, doubly...

Structure, method for manufacturing the same, and talbot interferom...

EUV exposure apparatus with reflective elements having reduced infl...

Pellicle for reticle and multilayer mirror

Reflective mirror, projection optical system, exposure apparatus, a...

EUV exposure apparatus with reflective elements having reduced infl...

Collector

Reflective mirror, projection optical system, exposure apparatus, a...

X-ray surface analysis and measurement apparatus

Lithographic apparatus, spectral purity filter and device manufactu...

Mirror, projection objective with such mirror, and projection expos...

Color x-ray histology for multi-stained biologic sample

Patents Applicationslast 30 patents

MICROSCOPIC SYSTEM FOR TESTING STRUCTURES AND DEFECTS ON EUV LITHOG...

METHOD FOR PRODUCING A MULTILAYER LAUE LENS

NANOPATTERNED ELECTRON BEAMS FOR TEMPORAL COHERENCE AND DETERMINIST...

SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME

SYSTEM AND METHOD FOR X-RAY FLUORESCENCE WITH FILTERING

X-RAY APPARATUS AND METHOD FOR OPERATING THE X-RAY APPARATUS

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

X-RAY GENERATOR AND X-RAY ANALYSIS DEVICE

Multilayer Mirror for Reflecting EUV Radiation and Method for Produ...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

REFLECTIVE MIRROR, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, A...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

REFLECTIVE MIRROR, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, A...

MULTILAYER MIRROR

STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND TALBOT INTERFEROM...

REFLECTOR, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVIC...

X RAY WAVEGUIDE SYSTEM

COLOR X-RAY HISTOLOGY FOR MULTI-STAINED BIOLOGIC SAMPLE

X-RAY WAVEGUIDE

SCINTILLATOR PLATE

MULTILAYER MIRROR, METHOD OF PRODUCING A MULTILAYER MIRROR AND LITH...

COLLECTOR

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

Grazing Incidence Reflectors, Lithographic Apparatus, Methods for M...

Deflection Mirror and Projection Exposure Apparatus for Microlithog...

SCINTILLATOR PLATE

MIRROR, PROJECTION OBJECTIVE WITH SUCH MIRROR, AND PROJECTION EXPOS...

METHOD FOR MANUFACTURING X-RAY/GAMMA-RAY FOCUSING OPTICAL SYSTEM US...