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H01J2237/2813

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2813characterised by the application

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Graphene based substrates for imaging
- Patent number 12,217,931
- Issue date Feb 4, 2025
- University of Kansas
- Eduardo Rosa-Molinar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample preparation system and method for electron microscope observ...
- Patent number 11,990,314
- Issue date May 21, 2024
- SANYU ELECTRON CO., LTD.
- Shinsuke Shibata
- G01 - MEASURING TESTING
Information Patent Grant
Scanning electron microscope
- Patent number 11,756,763
- Issue date Sep 12, 2023
- HITACHI HIGH-TECH CORPORATION
- Teruo Kohashi
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 11,662,323
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate positioning device and electron beam inspection tool
- Patent number 11,621,142
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Marcel Koenraad Marie Baggen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid and automatic virus imaging and analysis system as well as me...
- Patent number 11,593,938
- Issue date Feb 28, 2023
- BORRIRS PTE. LTD.
- Zhongwei Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Wafer inspection based on electron beam induced current
- Patent number 11,501,949
- Issue date Nov 15, 2022
- ASML Netherlands B.V.
- Long Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image forming method and impedance microscope
- Patent number 11,454,605
- Issue date Sep 27, 2022
- Toshihiko Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detecting method and detecting equipment therefor
- Patent number 11,237,414
- Issue date Feb 1, 2022
- HKC CORPORATION LIMITED
- Chung-Kuang Chien
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,217,423
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imaging apparatus and related control unit
- Patent number 11,062,875
- Issue date Jul 13, 2021
- City University of Hong Kong
- Fu-Rong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for detection of passive voltage contrast
- Patent number 11,035,899
- Issue date Jun 15, 2021
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Changqing Chen
- G01 - MEASURING TESTING
Information Patent Grant
Method for measuring critical dimension and image-processing appara...
- Patent number 11,037,287
- Issue date Jun 15, 2021
- Winbond Electronics Corp.
- Ching-Ya Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Defect inspection method and defect inspection device
- Patent number 11,002,687
- Issue date May 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Observation method and specimen observation apparatus
- Patent number 10,809,515
- Issue date Oct 20, 2020
- Jeol Ltd.
- Katsuyuki Suzuki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 10,775,325
- Issue date Sep 15, 2020
- ASML Netherlands B.V.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for performing nano beam diffraction analysis
- Patent number 10,658,154
- Issue date May 19, 2020
- International Business Machines Corporation
- Marc Adam Bergendahl
- G01 - MEASURING TESTING
Information Patent Grant
Edge detection system and its use for optical proximity correction
- Patent number 10,656,532
- Issue date May 19, 2020
- Fractilia, LLC
- Chris Mack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for scanning an object with an electron beam usin...
- Patent number 10,541,104
- Issue date Jan 21, 2020
- Applied Materials Israel Ltd.
- Uri Lev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron energy loss spectroscopy with adjustable energy resolution
- Patent number 10,522,323
- Issue date Dec 31, 2019
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for correcting arrayed astigmatism in a multi-...
- Patent number 10,497,536
- Issue date Dec 3, 2019
- Rockwell Collins, Inc.
- Alan D. Brodie
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for laser machining
- Patent number 10,493,559
- Issue date Dec 3, 2019
- FEI Company
- Marcus Straw
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Scanning electron microscope and image processing apparatus
- Patent number 10,483,083
- Issue date Nov 19, 2019
- Hitachi, Ltd.
- Thantip Krasienapibal
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imaging of crystalline defects
- Patent number 10,347,462
- Issue date Jul 9, 2019
- Applied Materials Israel Ltd.
- Dror Shemesh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generating an image of an object or a representation of data about...
- Patent number 10,274,441
- Issue date Apr 30, 2019
- Carl Zeiss Microscopy GmbH
- Christian Hendrich
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,236,156
- Issue date Mar 19, 2019
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection of scattered hot spot areas on...
- Patent number 10,217,605
- Issue date Feb 26, 2019
- KLA-Tencor Corporation
- Sean X. Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making transparent conductive layer
- Patent number 10,121,564
- Issue date Nov 6, 2018
- Tsinghua University
- Dong-Qi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 10,088,438
- Issue date Oct 2, 2018
- Hermes-Microvision, Inc.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Grant
Structure electron beam inspection system for inspecting extreme ul...
- Patent number 10,054,556
- Issue date Aug 21, 2018
- Hermes Microvision Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SCANNING ELECTRON MICROSCOPY-BASED TOMOGRAPHY OF SPECIMENS
- Publication number 20240404784
- Publication date Dec 5, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Itamar Shani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANALYSIS SYSTEM, ANALYSIS METHOD, COMPUTER PROGRAM PRODUCT AND SAMP...
- Publication number 20230178333
- Publication date Jun 8, 2023
- CARL ZEISS MICROSCOPY GMBH
- Bruno Linn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20220246393
- Publication date Aug 4, 2022
- Hitachi High-Tech Corporation
- Teruo Kohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RAPID AND AUTOMATIC VIRUS IMAGING AND ANALYSIS SYSTEM AS WELL AS ME...
- Publication number 20220108443
- Publication date Apr 7, 2022
- BORRIES PTE. LTD.
- Zhongwei Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SAMPLE PREPARATION SYSTEM AND METHOD FOR ELECTRON MICROSCOPE OBSERV...
- Publication number 20220068598
- Publication date Mar 3, 2022
- SANYU ELECTRON CO., LTD.
- Shinsuke SHIBATA
- G01 - MEASURING TESTING
Information Patent Application
GRAPHENE BASED SUBSTRATES FOR IMAGING
- Publication number 20220068596
- Publication date Mar 3, 2022
- The University of Kansas
- Eduardo ROSA-MOLINAR
- G01 - MEASURING TESTING
Information Patent Application
IMAGE FORMING METHOD AND IMPEDANCE MICROSCOPE
- Publication number 20210270758
- Publication date Sep 2, 2021
- National Institute of Advanced Industrial Science and Technology
- Toshihiko OGURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20210172891
- Publication date Jun 10, 2021
- ASML NETHERLANDS B.V.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
WAFER INSPECTION BASED ON ELECTRON BEAM INDUCED CURRENT
- Publication number 20210134556
- Publication date May 6, 2021
- ASML NETHERLANDS B.V.
- Long MA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING APPARATUS AND RELATED CONTROL UNIT
- Publication number 20210110990
- Publication date Apr 15, 2021
- City University of Hong Kong
- Fu-Rong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POSITIONING DEVICE AND ELECTRON BEAM INSPECTION TOOL
- Publication number 20200373118
- Publication date Nov 26, 2020
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR DETECTION OF PASSIVE VOLTAGE CONTRAST
- Publication number 20200363469
- Publication date Nov 19, 2020
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Changqing CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect Inspection Method and Defect Inspection Device
- Publication number 20200292466
- Publication date Sep 17, 2020
- Hitachi High-Technologies Corporation
- Masaki HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MEASURING CRITICAL DIMENSION AND IMAGE-PROCESSING APPARA...
- Publication number 20190347781
- Publication date Nov 14, 2019
- Winbond Electronics Corp.
- Ching-Ya HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTRON ENERGY LOSS SPECTROSCOPY WITH ADJUSTABLE ENERGY RESOLUTION
- Publication number 20190311880
- Publication date Oct 10, 2019
- FEI Company
- Peter Christiaan TIEMEIJER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190279842
- Publication date Sep 12, 2019
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE DETECTION SYSTEM AND ITS USE FOR OPTICAL PROXIMITY CORRECTION
- Publication number 20190187570
- Publication date Jun 20, 2019
- FRACTILIA, LLC
- Chris MACK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OF CRYSTALLINE DEFECTS
- Publication number 20190180975
- Publication date Jun 13, 2019
- APPLIED MATERIALS ISRAEL LTD.
- Dror Shemesh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20190170671
- Publication date Jun 6, 2019
- HERMES MICROVISION, INC.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND IMAGE PROCESSING APPARATUS
- Publication number 20190035597
- Publication date Jan 31, 2019
- Hitachi, Ltd
- Thantip KRASIENAPIBAL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Apparatus and Method for Correcting Arrayed Astigmatism in a Multi-...
- Publication number 20180068825
- Publication date Mar 8, 2018
- KLA-Tencor Corporation
- Alan D. Brodie
- G01 - MEASURING TESTING
Information Patent Application
GENERATING AN IMAGE OF AN OBJECT OR A REPRESENTATION OF DATA ABOUT...
- Publication number 20170336335
- Publication date Nov 23, 2017
- CARL ZEISS MICROSCOPY GMBH
- Christian Hendrich
- G01 - MEASURING TESTING
Information Patent Application
CD-SEM TECHNIQUE FOR WAFERS FABRICATION CONTROL
- Publication number 20170194125
- Publication date Jul 6, 2017
- APPLIED MATERIALS ISRAEL LTD.
- Roman KRIS
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20170052129
- Publication date Feb 23, 2017
- HERMES MICROVISION, INC.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
Range-Based Real-Time Scanning Electron Microscope Non-Visual Binner
- Publication number 20170040142
- Publication date Feb 9, 2017
- KLA-Tencor Corporation
- Hemanta Kumar Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REVIEW OF SUSPECTED DEFECTS USING ONE OR MORE REFERENCE DIES
- Publication number 20170018398
- Publication date Jan 19, 2017
- APPLIED MATERIALS ISRAEL LTD.
- Ofir Greenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR SCANNING AN OBJECT WITH AN ELECTRON BEAM
- Publication number 20170011883
- Publication date Jan 12, 2017
- APPLIED MATERIALS ISRAEL, LTD.
- Uri Lev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus of Plural Charged-Particle Beams
- Publication number 20160284505
- Publication date Sep 29, 2016
- HERMES MICROVISION INC.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION OF SCATTERED HOT SPOT AREAS ON...
- Publication number 20160260577
- Publication date Sep 8, 2016
- KLA-Tencor Corporation
- Sean X. Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for determining 3D primitive reciprocal basis of unknown cry...
- Publication number 20160238545
- Publication date Aug 18, 2016
- East China Jiaotong University
- Ming Han
- G01 - MEASURING TESTING

characterised by the application

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Graphene based substrates for imaging

Sample preparation system and method for electron microscope observ...

Scanning electron microscope

Method and system for inspecting an EUV mask

Substrate positioning device and electron beam inspection tool

Rapid and automatic virus imaging and analysis system as well as me...

Wafer inspection based on electron beam induced current

Image forming method and impedance microscope

Detecting method and detecting equipment therefor

Apparatus of plural charged-particle beams

Imaging apparatus and related control unit

System for detection of passive voltage contrast

Method for measuring critical dimension and image-processing appara...

Defect inspection method and defect inspection device

Observation method and specimen observation apparatus

Method and system for inspecting an EUV mask

System and method for performing nano beam diffraction analysis

Edge detection system and its use for optical proximity correction

System and method for scanning an object with an electron beam usin...

Electron energy loss spectroscopy with adjustable energy resolution

Apparatus and method for correcting arrayed astigmatism in a multi-...

Method and apparatus for laser machining

Scanning electron microscope and image processing apparatus

Imaging of crystalline defects

Generating an image of an object or a representation of data about...

Apparatus of plural charged-particle beams

Method and apparatus for inspection of scattered hot spot areas on...

Method for making transparent conductive layer

Method and system for inspecting an EUV mask

Structure electron beam inspection system for inspecting extreme ul...

Patents Applicationslast 30 patents

SCANNING ELECTRON MICROSCOPY-BASED TOMOGRAPHY OF SPECIMENS

ANALYSIS SYSTEM, ANALYSIS METHOD, COMPUTER PROGRAM PRODUCT AND SAMP...

SCANNING ELECTRON MICROSCOPE

RAPID AND AUTOMATIC VIRUS IMAGING AND ANALYSIS SYSTEM AS WELL AS ME...

SAMPLE PREPARATION SYSTEM AND METHOD FOR ELECTRON MICROSCOPE OBSERV...

GRAPHENE BASED SUBSTRATES FOR IMAGING

IMAGE FORMING METHOD AND IMPEDANCE MICROSCOPE

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

WAFER INSPECTION BASED ON ELECTRON BEAM INDUCED CURRENT

IMAGING APPARATUS AND RELATED CONTROL UNIT

SUBSTRATE POSITIONING DEVICE AND ELECTRON BEAM INSPECTION TOOL

SYSTEM FOR DETECTION OF PASSIVE VOLTAGE CONTRAST

Defect Inspection Method and Defect Inspection Device

METHOD FOR MEASURING CRITICAL DIMENSION AND IMAGE-PROCESSING APPARA...

ELECTRON ENERGY LOSS SPECTROSCOPY WITH ADJUSTABLE ENERGY RESOLUTION

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

EDGE DETECTION SYSTEM AND ITS USE FOR OPTICAL PROXIMITY CORRECTION

IMAGING OF CRYSTALLINE DEFECTS

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

SCANNING ELECTRON MICROSCOPE AND IMAGE PROCESSING APPARATUS

Apparatus and Method for Correcting Arrayed Astigmatism in a Multi-...

GENERATING AN IMAGE OF AN OBJECT OR A REPRESENTATION OF DATA ABOUT...

CD-SEM TECHNIQUE FOR WAFERS FABRICATION CONTROL

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

Range-Based Real-Time Scanning Electron Microscope Non-Visual Binner

REVIEW OF SUSPECTED DEFECTS USING ONE OR MORE REFERENCE DIES

SYSTEM AND METHOD FOR SCANNING AN OBJECT WITH AN ELECTRON BEAM

Apparatus of Plural Charged-Particle Beams

METHOD AND APPARATUS FOR INSPECTION OF SCATTERED HOT SPOT AREAS ON...

Method for determining 3D primitive reciprocal basis of unknown cry...