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H01L21/28026

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/28026characterised by the conductor

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor devices having buried gates
- Patent number 12,127,394
- Issue date Oct 22, 2024
- Samsung Electronics Co., Ltd.
- Huijung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching back and selective deposition of metal gate
- Patent number 12,068,393
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with metal cap layer and method for manufac...
- Patent number 12,009,403
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench-gate MOS transistor and method for manufacturing the same
- Patent number 11,996,458
- Issue date May 28, 2024
- Kabushiki Kaisha Toshiba
- Hiroyuki Kishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate fixing device
- Patent number 11,961,754
- Issue date Apr 16, 2024
- Shinko Electric Industries Co., Ltd.
- Hiroki Oguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming metal contacts on metal gates
- Patent number 11,901,426
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning a structure and method of depositing a capping l...
- Patent number 11,830,725
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Naomi Yoshida
- B08 - CLEANING
Information Patent Grant
Hybrid under-bump metallization component
- Patent number 11,749,605
- Issue date Sep 5, 2023
- International Business Machines Corporation
- Jae-Woong Nah
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Forming metal contacts on metal gates
- Patent number 11,532,717
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with metal cap layer
- Patent number 11,393,912
- Issue date Jul 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching back and selective deposition of metal gate
- Patent number 11,380,774
- Issue date Jul 5, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench-gate MOS transistor and method for manufacturing
- Patent number 11,251,278
- Issue date Feb 15, 2022
- Kabushiki Kaisha Toshiba
- Hiroyuki Kishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
N-work function metal with crystal structure
- Patent number 11,133,395
- Issue date Sep 28, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having active region and method for fabricatin...
- Patent number 11,133,227
- Issue date Sep 28, 2021
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Deok-Yong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate scheme for device and methods of forming
- Patent number 11,127,836
- Issue date Sep 21, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Chiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming bottom source and drain extension on vertical transport FET...
- Patent number 11,063,147
- Issue date Jul 13, 2021
- International Business Machines Corporation
- Shogo Mochizuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with ion-sensitive field effect transistor
- Patent number 11,054,387
- Issue date Jul 6, 2021
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Xinshu Cai
- G01 - MEASURING TESTING
Information Patent Grant
Forming metal contacts on metal gates
- Patent number 10,923,573
- Issue date Feb 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching back and selective deposition of metal gate
- Patent number 10,879,370
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device and method of fabricating the same
- Patent number 10,868,016
- Issue date Dec 15, 2020
- Samsung Electronics., Ltd.
- Dong-Hyun Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with an oxygen sink and method for fabricating...
- Patent number 10,847,629
- Issue date Nov 24, 2020
- SK Hynix Inc.
- Eun-Sung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device and method of fabricating the same
- Patent number 10,833,088
- Issue date Nov 10, 2020
- Samsung Electronics Co., Ltd.
- Dong-Hyun Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming metal cap layers to improve performance of semic...
- Patent number 10,818,768
- Issue date Oct 27, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Buffer layer to prevent etching by photoresist developer
- Patent number 10,811,276
- Issue date Oct 20, 2020
- Google LLC
- Anthony Edward Megrant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film transistor and manufacturing method thereof
- Patent number 10,777,662
- Issue date Sep 15, 2020
- Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Huafei Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Buffer layer to prevent etching by photoresist developer
- Patent number 10,770,307
- Issue date Sep 8, 2020
- Google LLC
- Anthony Edward Megrant
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Electronic device, manufacturing method for electronic device, and...
- Patent number 10,734,495
- Issue date Aug 4, 2020
- Fujitsu Limited
- Shintaro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Buffer layer to prevent etching by photoresist developer
- Patent number 10,727,079
- Issue date Jul 28, 2020
- Google LLC
- Anthony Edward Megrant
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 10,685,963
- Issue date Jun 16, 2020
- Samsung Electronics Co., Ltd.
- Kiseok Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid aspect ratio trapping
- Patent number 10,559,662
- Issue date Feb 11, 2020
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING BACK AND SELECTIVE DEPOSITION OF METAL GATE
- Publication number 20240371973
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METAL CONTACTS ON METAL GATES
- Publication number 20240250139
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20230178625
- Publication date Jun 8, 2023
- Samsung Electronics Co., Ltd.
- Juyoun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming Metal Contacts on Metal Gates
- Publication number 20230121981
- Publication date Apr 20, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE FIXING DEVICE
- Publication number 20230060253
- Publication date Mar 2, 2023
- Shinko Electric Industries Co., Ltd.
- Hiroki OGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH METAL CAP LAYER AND METHOD FOR MANUFAC...
- Publication number 20220293765
- Publication date Sep 15, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Liang CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Back and Selective Deposition of Metal Gate
- Publication number 20220278224
- Publication date Sep 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20210320008
- Publication date Oct 14, 2021
- SK HYNIX INC.
- Jin Woong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING A STRUCTURE AND METHOD OF DEPOSITING A CAPPING L...
- Publication number 20210233765
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Naomi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METAL CONTACTS ON METAL GATES
- Publication number 20210167179
- Publication date Jun 3, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES WITH ION-SENSITIVE FIELD EFFECT TRANSISTOR
- Publication number 20210055256
- Publication date Feb 25, 2021
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Xinshu CAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH METAL CAP LAYER
- Publication number 20210043747
- Publication date Feb 11, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Liang CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20200219776
- Publication date Jul 9, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- DEOK-YONG KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Back and Selective Deposition of Metal Gate
- Publication number 20200083351
- Publication date Mar 12, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METAL CONTACTS ON METAL GATES
- Publication number 20200013866
- Publication date Jan 9, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20190355727
- Publication date Nov 21, 2019
- Samsung Electronics Co., Ltd.
- Kiseok Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE
- Publication number 20190348526
- Publication date Nov 14, 2019
- Unisantis Electronics Singapore PTE LTD.
- FUJIO MASUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gate Scheme for Device and Methods of Forming
- Publication number 20190259853
- Publication date Aug 22, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Chiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
N-work Function Metal with Crystal Structure
- Publication number 20190252512
- Publication date Aug 15, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20190189765
- Publication date Jun 20, 2019
- SK HYNIX INC.
- Eun-Sung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE, MANUFACTURING METHOD FOR ELECTRONIC DEVICE, AND...
- Publication number 20190165120
- Publication date May 30, 2019
- Fujitsu Limited
- Shintaro SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming Metal Contacts on Metal Gates
- Publication number 20190157409
- Publication date May 23, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF
- Publication number 20190157428
- Publication date May 23, 2019
- SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR TECHNOLOGY CO., LTD.
- Huafei XIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE PICKUP METHOD USING METAL SELECTIVITY
- Publication number 20180337037
- Publication date Nov 22, 2018
- GLOBALFOUNDRIES INC.
- Guillaume BOUCHE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Back and Selective Deposition of Metal Gate
- Publication number 20180175165
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peng-Soon Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND FORMING METHOD THEREOF
- Publication number 20180151580
- Publication date May 31, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Cheng WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gate Scheme for Device and Methods of Forming
- Publication number 20180145151
- Publication date May 24, 2018
- Taiwan Semiconductor Manufacturing company Ltd.
- Chung-Chiang Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20180138294
- Publication date May 17, 2018
- Unisantis Electronics Singapore PTE Ltd.
- FUJIO MASUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING A GATE CONTACT FOR A TRANSISTOR ABOVE THE ACTIVE...
- Publication number 20180122919
- Publication date May 3, 2018
- GLOBALFOUNDRIES INC.
- Chanro Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURES AND FABRICATION METHODS THEREOF
- Publication number 20180108745
- Publication date Apr 19, 2018
- Semiconductor Manufacturing International ( (Shanghai) Corporation
- Yong LI
- H01 - BASIC ELECTRIC ELEMENTS

characterised by the conductor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor devices having buried gates

Etching back and selective deposition of metal gate

Semiconductor structure with metal cap layer and method for manufac...

Trench-gate MOS transistor and method for manufacturing the same

Substrate fixing device

Forming metal contacts on metal gates

Method of cleaning a structure and method of depositing a capping l...

Hybrid under-bump metallization component

Forming metal contacts on metal gates

Semiconductor structure with metal cap layer

Etching back and selective deposition of metal gate

Trench-gate MOS transistor and method for manufacturing

N-work function metal with crystal structure

Semiconductor device having active region and method for fabricatin...

Metal gate scheme for device and methods of forming

Forming bottom source and drain extension on vertical transport FET...

Semiconductor devices with ion-sensitive field effect transistor

Forming metal contacts on metal gates

Etching back and selective deposition of metal gate

Semiconductor memory device and method of fabricating the same

Semiconductor device with an oxygen sink and method for fabricating...

Semiconductor memory device and method of fabricating the same

Method for forming metal cap layers to improve performance of semic...

Buffer layer to prevent etching by photoresist developer

Thin film transistor and manufacturing method thereof

Buffer layer to prevent etching by photoresist developer

Electronic device, manufacturing method for electronic device, and...

Buffer layer to prevent etching by photoresist developer

Semiconductor device and method of manufacturing the same

Hybrid aspect ratio trapping

Patents Applicationslast 30 patents

ETCHING BACK AND SELECTIVE DEPOSITION OF METAL GATE

FORMING METAL CONTACTS ON METAL GATES

SEMICONDUCTOR DEVICE

Forming Metal Contacts on Metal Gates

SUBSTRATE FIXING DEVICE

SEMICONDUCTOR STRUCTURE WITH METAL CAP LAYER AND METHOD FOR MANUFAC...

Etching Back and Selective Deposition of Metal Gate

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

METHOD OF CLEANING A STRUCTURE AND METHOD OF DEPOSITING A CAPPING L...

FORMING METAL CONTACTS ON METAL GATES

SEMICONDUCTOR DEVICES WITH ION-SENSITIVE FIELD EFFECT TRANSISTOR

SEMICONDUCTOR STRUCTURE WITH METAL CAP LAYER

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

Etching Back and Selective Deposition of Metal Gate

FORMING METAL CONTACTS ON METAL GATES

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE

Metal Gate Scheme for Device and Methods of Forming

N-work Function Metal with Crystal Structure

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

ELECTRONIC DEVICE, MANUFACTURING METHOD FOR ELECTRONIC DEVICE, AND...

Forming Metal Contacts on Metal Gates

THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF

GATE PICKUP METHOD USING METAL SELECTIVITY

Etching Back and Selective Deposition of Metal Gate

SEMICONDUCTOR DEVICE AND FORMING METHOD THEREOF

Metal Gate Scheme for Device and Methods of Forming

METHOD FOR PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

METHODS OF FORMING A GATE CONTACT FOR A TRANSISTOR ABOVE THE ACTIVE...

SEMICONDUCTOR STRUCTURES AND FABRICATION METHODS THEREOF