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H01L21/28114

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/28114characterised by the sectional shape

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Integrated circuit and manufacturing method thereof
- Patent number 12,166,040
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Che-Cheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a gate structure with different lengths...
- Patent number 12,142,666
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Yu Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing metal gate overhang by forming a top-wide bottom-narrow du...
- Patent number 12,142,664
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih Wei Bih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MOS transistor having substantially parallelepiped-shaped insulatin...
- Patent number 12,125,899
- Issue date Oct 22, 2024
- STMicroelectronics (Rousset) SAS
- Arnaud Regnier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strained gate semiconductor device having an interlayer dielectric...
- Patent number 12,100,767
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for metal gates
- Patent number 12,100,627
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tung-Huang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned gate endcap (SAGE) architectures with gate-all-around...
- Patent number 12,057,491
- Issue date Aug 6, 2024
- Intel Corporation
- Biswajeet Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device structure with gate
- Patent number 12,051,594
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuei-Lun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof, and electron...
- Patent number 12,046,672
- Issue date Jul 23, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Huilong Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-threshold voltage devices and associated techniques and confi...
- Patent number 12,021,141
- Issue date Jun 25, 2024
- Sony Group Corporation
- Joseph M. Steigerwald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Work function metal gate device
- Patent number 12,021,129
- Issue date Jun 25, 2024
- United Microelectronics Corp.
- Chih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a source/drain contact plug with an upw...
- Patent number 12,014,957
- Issue date Jun 18, 2024
- Samsung Electronics Co., Ltd.
- Sungmoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate electrodes with notches and methods for forming the same
- Patent number 12,009,214
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Min-Feng Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET devices and methods of forming the same
- Patent number 11,978,802
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Wei Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having gate electrode with multi-layers and el...
- Patent number 11,937,431
- Issue date Mar 19, 2024
- Samsung Electronics Co., Ltd.
- Sanghoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,869,773
- Issue date Jan 9, 2024
- Mitsubishi Electric Corporation
- Tomohito Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 11,804,535
- Issue date Oct 31, 2023
- Samsung Electronics Co., Ltd.
- Jong Chul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,742,404
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for laterally etching gate spacers
- Patent number 11,705,502
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Yu Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact formation method and related structure
- Patent number 11,682,707
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Lin-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a source/drain of a semiconductor device having...
- Patent number 11,664,423
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Shuo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for forming the same
- Patent number 11,664,438
- Issue date May 30, 2023
- Winbond Electronics Corp.
- Shu-Ming Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrochemical depositions of nanotwin copper materials
- Patent number 11,634,830
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Jing Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrochemical depositions of ruthenium-containing materials
- Patent number 11,629,423
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Eric J. Bergman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Contact photolithography-based nanopatterning using photoresist fea...
- Patent number 11,616,129
- Issue date Mar 28, 2023
- Wisconsin Alumni Research Foundation
- Zhenqiang Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for metal gates
- Patent number 11,605,566
- Issue date Mar 14, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tung-Huang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having gate structures with skirt regions
- Patent number 11,600,711
- Issue date Mar 7, 2023
- Samsung Electronics Co., Ltd.
- Jung-Gun You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate feature in FinFET device
- Patent number 11,594,607
- Issue date Feb 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Guan-Jie Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 11,581,225
- Issue date Feb 14, 2023
- Shanghai Huali Integrated Circuit Corporation
- Changhung Kung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, semiconductor chip and method of manufacturin...
- Patent number 11,538,729
- Issue date Dec 27, 2022
- DYNAX SEMICONDUCTOR, INC.
- Yi Pei
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LATERALLY ETCHED SPACERS FOR SEMICONDUCTOR DEVICE
- Publication number 20240387692
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Yu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR DEVICE WITH RECESSED GATE STRUCTURE
- Publication number 20240379789
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Liang Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20240379364
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Jiun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH GATE AND METHOD FOR FORMING THE...
- Publication number 20240371643
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei-Lun LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR METAL GATES
- Publication number 20240363441
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- TUNG-HUANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED GATE ENDCAP (SAGE) ARCHITECTURES WITH GATE-ALL-AROUND...
- Publication number 20240355903
- Publication date Oct 24, 2024
- Intel Corporation
- Biswajeet GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-THRESHOLD VOLTAGE DEVICES AND ASSOCIATED TECHNIQUES AND CONFI...
- Publication number 20240322037
- Publication date Sep 26, 2024
- SONY GROUP CORPORATION
- Joseph M. Steigerwald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORK FUNCTION METAL GATE DEVICE
- Publication number 20240313074
- Publication date Sep 19, 2024
- UNITED MICROELECTRONICS CORP.
- Chih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240105795
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jun-Ye Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20230352550
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Chieh WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH T-SHAPED ACTIVE REGION AND METHODS OF FOR...
- Publication number 20230343594
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Huaixin XIAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTACT FORMATION METHOD AND RELATED STRUCTURE
- Publication number 20230326986
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lin-Yu HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROCHEMICAL DEPOSITIONS OF NANOTWIN COPPER MATERIALS
- Publication number 20230272547
- Publication date Aug 31, 2023
- Applied Materials, Inc.
- Jing Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A SEMICONDUCTOR STRUCTURE
- Publication number 20230268417
- Publication date Aug 24, 2023
- WINBOND ELECTRONICS CORP.
- Shu-Ming LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR METAL GATES
- Publication number 20230245931
- Publication date Aug 3, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- TUNG-HUANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL GATE FEATURE IN FINFET DEVICE
- Publication number 20230207649
- Publication date Jun 29, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Guan-Jie SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method And Device For Forming Metal Gate Electrodes For Transistors
- Publication number 20230099320
- Publication date Mar 30, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Huan-Chieh Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROCHEMICAL DEPOSITIONS OF NANOTWIN COPPER MATERIALS
- Publication number 20230068074
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Jing Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROCHEMICAL DEPOSITIONS OF RUTHENIUM-CONTAINING MATERIALS
- Publication number 20230066404
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Eric J. Bergman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WORK FUNCTION METAL GATE DEVICE
- Publication number 20230014945
- Publication date Jan 19, 2023
- UNITED MICROELECTRONICS CORP.
- Chih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR GATE STRUCTURE AND PROCESS
- Publication number 20220406913
- Publication date Dec 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiu-Ling Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERALLY ETCHED SPACERS FOR SEMICONDUCTOR DEVICE
- Publication number 20220376087
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR DEVICE WITH RECESSED GATE STRUCTURE
- Publication number 20220367655
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Liang Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT AND MANUFACTURING METHOD THEREOF
- Publication number 20220367464
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Che-Cheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Electrodes with Notches and Methods for Forming the Same
- Publication number 20220359205
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Min-Feng Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20220351975
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Jiun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-THRESHOLD VOLTAGE DEVICES AND ASSOCIATED TECHNIQUES AND CONFI...
- Publication number 20220328689
- Publication date Oct 13, 2022
- SONY GROUP CORPORATION
- Joseph M. Steigerwald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH GATE
- Publication number 20220285160
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei-Lun LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR METAL GATES
- Publication number 20220230921
- Publication date Jul 21, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- TUNG-HUANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING SEMICONDUCTOR DE...
- Publication number 20220216107
- Publication date Jul 7, 2022
- Samsung Electronics Co., Ltd.
- Sungmoon Lee
- H01 - BASIC ELECTRIC ELEMENTS

characterised by the sectional shape

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Integrated circuit and manufacturing method thereof

Semiconductor device having a gate structure with different lengths...

Reducing metal gate overhang by forming a top-wide bottom-narrow du...

MOS transistor having substantially parallelepiped-shaped insulatin...

Strained gate semiconductor device having an interlayer dielectric...

Method and structure for metal gates

Self-aligned gate endcap (SAGE) architectures with gate-all-around...

Method for forming semiconductor device structure with gate

Semiconductor device and manufacturing method thereof, and electron...

Multi-threshold voltage devices and associated techniques and confi...

Work function metal gate device

Semiconductor device having a source/drain contact plug with an upw...

Gate electrodes with notches and methods for forming the same

FinFET devices and methods of forming the same

Semiconductor device having gate electrode with multi-layers and el...

Method of manufacturing semiconductor device

Semiconductor device and method for fabricating the same

Method of manufacturing a semiconductor device and a semiconductor...

Method for laterally etching gate spacers

Contact formation method and related structure

Method for forming a source/drain of a semiconductor device having...

Semiconductor structure and method for forming the same

Electrochemical depositions of nanotwin copper materials

Electrochemical depositions of ruthenium-containing materials

Contact photolithography-based nanopatterning using photoresist fea...

Method and structure for metal gates

Semiconductor devices having gate structures with skirt regions

Gate feature in FinFET device

Method for manufacturing semiconductor device

Semiconductor device, semiconductor chip and method of manufacturin...

Patents Applicationslast 30 patents

LATERALLY ETCHED SPACERS FOR SEMICONDUCTOR DEVICE

TRANSISTOR DEVICE WITH RECESSED GATE STRUCTURE

SEMICONDUCTOR DEVICES

SEMICONDUCTOR DEVICE STRUCTURE WITH GATE AND METHOD FOR FORMING THE...

METHOD AND STRUCTURE FOR METAL GATES

SELF-ALIGNED GATE ENDCAP (SAGE) ARCHITECTURES WITH GATE-ALL-AROUND...

MULTI-THRESHOLD VOLTAGE DEVICES AND ASSOCIATED TECHNIQUES AND CONFI...

WORK FUNCTION METAL GATE DEVICE

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

SEMICONDUCTOR DEVICE WITH T-SHAPED ACTIVE REGION AND METHODS OF FOR...

CONTACT FORMATION METHOD AND RELATED STRUCTURE

ELECTROCHEMICAL DEPOSITIONS OF NANOTWIN COPPER MATERIALS

METHOD FOR FORMING A SEMICONDUCTOR STRUCTURE

METHOD AND STRUCTURE FOR METAL GATES

NOVEL GATE FEATURE IN FINFET DEVICE

Method And Device For Forming Metal Gate Electrodes For Transistors

ELECTROCHEMICAL DEPOSITIONS OF NANOTWIN COPPER MATERIALS

ELECTROCHEMICAL DEPOSITIONS OF RUTHENIUM-CONTAINING MATERIALS

WORK FUNCTION METAL GATE DEVICE

TRANSISTOR GATE STRUCTURE AND PROCESS

LATERALLY ETCHED SPACERS FOR SEMICONDUCTOR DEVICE

TRANSISTOR DEVICE WITH RECESSED GATE STRUCTURE

INTEGRATED CIRCUIT AND MANUFACTURING METHOD THEREOF

Gate Electrodes with Notches and Methods for Forming the Same

Semiconductor Device and Method

MULTI-THRESHOLD VOLTAGE DEVICES AND ASSOCIATED TECHNIQUES AND CONFI...

METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH GATE

METHOD AND STRUCTURE FOR METAL GATES

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING SEMICONDUCTOR DE...