Circuits specially adapted for controlling the glow discharge

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CPC
H01J37/32045

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32045Circuits specially adapted for controlling the glow discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Atomic layer etching by electron wavefront
- Patent number 12,119,205
- Issue date Oct 15, 2024
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable inductor for plasma generator
- Patent number 12,087,546
- Issue date Sep 10, 2024
- Advanced Energy Industries, Inc.
- Fabio Vicinanza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Glow plasma gas measurement signal processing
- Patent number 11,948,774
- Issue date Apr 2, 2024
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching by electron wavefront
- Patent number 11,942,306
- Issue date Mar 26, 2024
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast neutral generation for plasma processing
- Patent number 11,915,910
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High frequency power source allowing arbitrary setting of temporal...
- Patent number 11,875,968
- Issue date Jan 16, 2024
- Adtec Plasma Technology Co., Ltd.
- Toshihiro Takahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching by electron wavefront
- Patent number 11,869,747
- Issue date Jan 9, 2024
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,842,885
- Issue date Dec 12, 2023
- HITACHI HIGH-TECH CORPORATION
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching by electron wavefront
- Patent number 11,810,757
- Issue date Nov 7, 2023
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,764,082
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC plasma control for electron enhanced material processing
- Patent number 11,715,623
- Issue date Aug 1, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC plasma control for electron enhanced material processing
- Patent number 11,676,797
- Issue date Jun 13, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of low-temperature plasma generation, method of an electrica...
- Patent number 11,651,937
- Issue date May 16, 2023
- FYZIKALINI USTAV AV CR, V.V.I.
- ZdenZden{hacek over (e)}k Hubicka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for the thermal treatment of a substrate
- Patent number 11,490,473
- Issue date Nov 1, 2022
- Harald Gross
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electric discharge generator and power supply device of electric di...
- Patent number 11,466,366
- Issue date Oct 11, 2022
- Toshiba Mitsubishi-Electric Industrial Systems Corporation
- Yoichiro Tabata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Container, apparatus and method for handling an implant
- Patent number 11,382,732
- Issue date Jul 12, 2022
- NOVA PLASMA LTD.
- Amnon Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electrode/multi-modal atmospheric pressure glow discharge pla...
- Patent number 11,366,066
- Issue date Jun 21, 2022
- Battelle Memorial Institute
- David W. Koppenaal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arc suppression and pulsing in high power impulse magnetron sputter...
- Patent number 11,211,234
- Issue date Dec 28, 2021
- EVATEC AG
- Stanislav Kadlec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and apparatus
- Patent number 11,189,461
- Issue date Nov 30, 2021
- Tokyo Electron Limited
- Yoshinori Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for tunable workpiece biasing in a plasma reactor
- Patent number 10,923,320
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Travis Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply system
- Patent number 10,755,894
- Issue date Aug 25, 2020
- Tokyo Electron Limited
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching with pulsed plasmas
- Patent number 10,515,782
- Issue date Dec 24, 2019
- University of Houston System
- Vincent M. Donnelly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for plasma ignition
- Patent number 10,475,622
- Issue date Nov 12, 2019
- Advanced Energy Industries, Inc.
- Josh Pankratz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Container, apparatus and method for handling an implant
- Patent number 10,426,588
- Issue date Oct 1, 2019
- NOVA PLASMA LTD.
- Amnon Lam
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,388,544
- Issue date Aug 20, 2019
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for tunable workpiece biasing in a plasma reactor
- Patent number 10,373,804
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Travis Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Redundant Power Supply System for a plasma process
- Patent number 10,176,970
- Issue date Jan 8, 2019
- TRUMPF Huettinger GmbH + Co. KG
- Moritz Nitschke
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
System and method for controlling plasma density
- Patent number 10,002,744
- Issue date Jun 19, 2018
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply device for plasma processing
- Patent number 9,997,903
- Issue date Jun 12, 2018
- Solvix GmbH
- Albert Bulliard
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma generation device
- Patent number 9,928,992
- Issue date Mar 27, 2018
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Yoshihiro Sakaguchi
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20240347323
- Publication date Oct 17, 2024
- VELVETCH LLC
- David Irwin Margolese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING BY ELECTRON WAVEFRONT
- Publication number 20240249913
- Publication date Jul 25, 2024
- VELVETCH LLC
- Samir John Anz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST NEUTRAL GENERATION FOR PLASMA PROCESSING
- Publication number 20220310357
- Publication date Sep 29, 2022
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH FREQUENCY POWER SOURCE ALLOWING ARBITRARY SETTING OF TEMPORAL...
- Publication number 20220293393
- Publication date Sep 15, 2022
- ADTEC PLASMA TECHNOLOGY CO., LTD.
- Toshihiro Takahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
- Publication number 20210134561
- Publication date May 6, 2021
- Applied Materials, Inc.
- TRAVIS KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF LOW-TEMPERATURE PLASMA GENERATION, METHOD OF AN ELECTRICA...
- Publication number 20210050181
- Publication date Feb 18, 2021
- FYZIKALNI USTAV AV CR, V.V.I.
- Zdenek Hubicka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GLOW PLASMA STABILIZATION
- Publication number 20200343074
- Publication date Oct 29, 2020
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20200294767
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Yoshinori YAMAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTAINER, APPARATUS AND METHOD FOR HANDLING AN IMPLANT
- Publication number 20190374327
- Publication date Dec 12, 2019
- NOVA PLASMA LTD.
- Amnon LAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
- Publication number 20190348258
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- TRAVIS KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE SPUTTERING
- Publication number 20180261428
- Publication date Sep 13, 2018
- GENCOA LTD
- Victor Bellido-Gonzalez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
- Publication number 20180226225
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- TRAVIS KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY SYSTEM
- Publication number 20180226226
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- G05 - CONTROLLING REGULATING
Information Patent Application
Atomic Layer Etching with Pulsed Plasmas
- Publication number 20180226227
- Publication date Aug 9, 2018
- UNIVERSITY OF HOUSTON SYSTEM
- Vincent M. Donnelly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Redundant Power Supply System for a Plasma Process
- Publication number 20170358429
- Publication date Dec 14, 2017
- TRUMPF Huettinger GmbH + Co. KG
- Moritz Nitschke
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
ELECTRIC DISCHARGE GENERATOR AND POWER SUPPLY DEVICE OF ELECTRIC DI...
- Publication number 20170241021
- Publication date Aug 24, 2017
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Yoichiro TABATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTAINER, APPARATUS AND METHOD FOR HANDLING AN IMPLANT
- Publication number 20160302906
- Publication date Oct 20, 2016
- NOVA PLASMA LTD.
- Amnon LAM
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
APPARATUS AND METHOD FOR TREATMENT OF ORGANIC HUMAN TISSUE WITH A L...
- Publication number 20160193475
- Publication date Jul 7, 2016
- NORTHCO VENTURES GMBH & CO. KG
- Josef Srb
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
METHOD OF PROCESSING TARGET OBJECT AND PLASMA PROCESSING APPARATUS
- Publication number 20150243524
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Treating a Porous Substrate and Manufacture of a Membrane
- Publication number 20150231575
- Publication date Aug 20, 2015
- FUJIFILM Manufacturing Europe B.V.
- Serguei Starostine
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150053645
- Publication date Feb 26, 2015
- PANASONIC CORPORATION
- Tomohiro OKUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY SYSTEM, PLASMA ETCHING APPARATUS, AND PLASMA ETCHING M...
- Publication number 20150000842
- Publication date Jan 1, 2015
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY DEVICE FOR PLASMA PROCESSING
- Publication number 20140254054
- Publication date Sep 11, 2014
- Albert BULLIARD
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
PLASMA SOURCE
- Publication number 20140217892
- Publication date Aug 7, 2014
- OERLIKON TRADING AG, TRUBBACH
- Siegfried Krassnitzer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINING HIGH FREQUENCY OPERATING PARAMETERS IN A PLASMA SYSTEM
- Publication number 20140125315
- Publication date May 8, 2014
- HUETTINGER Elektronik GmbH + Co. KG
- Thomas Kirchmeier
- G01 - MEASURING TESTING
Information Patent Application
POWER SUPPLY DEVICE FOR PLASMA PROCESSING
- Publication number 20130271885
- Publication date Oct 17, 2013
- SOLVIX SA
- Albert BULLIARD
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
POWER SUPPLY DEVICE FOR PLASMA PROCESSING
- Publication number 20130221850
- Publication date Aug 29, 2013
- SOLVIX SA
- Albert BULLIARD
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
Plasma Supply Device
- Publication number 20130214680
- Publication date Aug 22, 2013
- HUETTINGER Elektronik GmbH + Co. KG
- Thomas Kirchmeier
- G01 - MEASURING TESTING
Information Patent Application
Ignition Circuit for Igniting a Plasma fed with Alternating Power
- Publication number 20130187545
- Publication date Jul 25, 2013
- HUETTINGER Elektronik GmbH + Co. KG
- Ulrich Richter
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
OVER-VOLTAGE PROTECTION DURING ARC RECOVERY FOR PLASMA-CHAMBER POWE...
- Publication number 20130180964
- Publication date Jul 18, 2013
- Advanced Energy Industries, Inc.
- Milan Ilic
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Circuits specially adapted for controlling the glow discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Atomic layer etching by electron wavefront

Variable inductor for plasma generator

Glow plasma gas measurement signal processing

Atomic layer etching by electron wavefront

Fast neutral generation for plasma processing

High frequency power source allowing arbitrary setting of temporal...

Atomic layer etching by electron wavefront

Plasma processing apparatus and plasma processing method

Atomic layer etching by electron wavefront

Control method and plasma processing apparatus

DC plasma control for electron enhanced material processing

DC plasma control for electron enhanced material processing

Method of low-temperature plasma generation, method of an electrica...

Method and apparatus for the thermal treatment of a substrate

Electric discharge generator and power supply device of electric di...

Container, apparatus and method for handling an implant

Multi-electrode/multi-modal atmospheric pressure glow discharge pla...

Arc suppression and pulsing in high power impulse magnetron sputter...

Substrate processing method and apparatus

System for tunable workpiece biasing in a plasma reactor

Power supply system

Atomic layer etching with pulsed plasmas

System and method for plasma ignition

Container, apparatus and method for handling an implant

Substrate processing apparatus and substrate processing method

System for tunable workpiece biasing in a plasma reactor

Redundant Power Supply System for a plasma process

System and method for controlling plasma density

Power supply device for plasma processing

Plasma generation device

Patents Applicationslast 30 patents

COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING

ATOMIC LAYER ETCHING BY ELECTRON WAVEFRONT

FAST NEUTRAL GENERATION FOR PLASMA PROCESSING

HIGH FREQUENCY POWER SOURCE ALLOWING ARBITRARY SETTING OF TEMPORAL...

SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR

METHOD OF LOW-TEMPERATURE PLASMA GENERATION, METHOD OF AN ELECTRICA...

GLOW PLASMA STABILIZATION

SUBSTRATE PROCESSING METHOD AND APPARATUS

CONTAINER, APPARATUS AND METHOD FOR HANDLING AN IMPLANT

SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR

ION SOURCE SPUTTERING

SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR

POWER SUPPLY SYSTEM

Atomic Layer Etching with Pulsed Plasmas

Redundant Power Supply System for a Plasma Process

ELECTRIC DISCHARGE GENERATOR AND POWER SUPPLY DEVICE OF ELECTRIC DI...

CONTAINER, APPARATUS AND METHOD FOR HANDLING AN IMPLANT

APPARATUS AND METHOD FOR TREATMENT OF ORGANIC HUMAN TISSUE WITH A L...

METHOD OF PROCESSING TARGET OBJECT AND PLASMA PROCESSING APPARATUS

Method of Treating a Porous Substrate and Manufacture of a Membrane

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

POWER SUPPLY SYSTEM, PLASMA ETCHING APPARATUS, AND PLASMA ETCHING M...

POWER SUPPLY DEVICE FOR PLASMA PROCESSING

PLASMA SOURCE

DETERMINING HIGH FREQUENCY OPERATING PARAMETERS IN A PLASMA SYSTEM

POWER SUPPLY DEVICE FOR PLASMA PROCESSING

POWER SUPPLY DEVICE FOR PLASMA PROCESSING

Plasma Supply Device

Ignition Circuit for Igniting a Plasma fed with Alternating Power

OVER-VOLTAGE PROTECTION DURING ARC RECOVERY FOR PLASMA-CHAMBER POWE...