Circuits specially adapted for controlling the microwave discharge

Industry

CPC
H01J37/32311

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32311Circuits specially adapted for controlling the microwave discharge

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,165,846
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Eiki Kamata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,094,697
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Toshimasa Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,046,453
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,009,180
- Issue date Jun 11, 2024
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular high-frequency source
- Patent number 12,002,654
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave coupling/combining device and associated microwave generator
- Patent number 11,961,713
- Issue date Apr 16, 2024
- SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQU...
- Louis Latrasse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,948,776
- Issue date Apr 2, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source, microwave plasma processing apparatus and...
- Patent number 11,942,308
- Issue date Mar 26, 2024
- Tokyo Electron Limited
- Yasuaki Taniike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,887,816
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave heating device
- Patent number 11,862,432
- Issue date Jan 2, 2024
- Mitsubishi Electric Corporation
- Hiroshi Suenobu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 11,854,775
- Issue date Dec 26, 2023
- Board of Trustees of Michigan State University
- Timothy A. Grotjohn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,756,774
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Toshimasa Kobayashi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Device for measuring plasma ion density and apparatus for diagnosin...
- Patent number 11,735,397
- Issue date Aug 22, 2023
- Korea Research Institute of Standards and Science
- Hyo Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of power generation with phase linked solid-state...
- Patent number 11,721,526
- Issue date Aug 8, 2023
- MKS Instruments, Inc.
- Francesco Braghiroli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and plasma processing apparatus
- Patent number 11,705,313
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 11,646,178
- Issue date May 9, 2023
- Tokyo Electron Limited
- Yuji Onuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-power solid-state microwave generator for RF energy applications
- Patent number 11,646,177
- Issue date May 9, 2023
- Precisepower, LLC
- Kenneth Kaplan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,569,068
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of power generation with phase linked solid-state...
- Patent number 11,476,092
- Issue date Oct 18, 2022
- MKS Instruments, Inc.
- Kenneth Trenholm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,424,106
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Yuki Kondo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,417,501
- Issue date Aug 16, 2022
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave plasma source
- Patent number 11,404,248
- Issue date Aug 2, 2022
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote modular high-frequency source
- Patent number 11,393,661
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Hanh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for dynamical control of radial uniformity in...
- Patent number 11,355,317
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for dynamical control of radial uniformity wi...
- Patent number 11,348,783
- Issue date May 31, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphene structure forming method and graphene structure forming ap...
- Patent number 11,091,836
- Issue date Aug 17, 2021
- TOKYO ELECTRONICS LIMITED
- Ryota Ifuku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular high-frequency source
- Patent number 11,081,317
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method, and ECR heig...
- Patent number 11,081,320
- Issue date Aug 3, 2021
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source, microwave plasma processing apparatus and...
- Patent number 11,056,317
- Issue date Jul 6, 2021
- Tokyo Electron Limited
- Yasuaki Taniike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20240282554
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Thai Cheng CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...
- Publication number 20240222085
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Koichiro NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240014007
- Publication date Jan 11, 2024
- Hitachi High-Tech Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386804
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Toshimasa KOBAYASHI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386791
- Publication date Nov 30, 2023
- Tokyo Electron Limited
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230352274
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...
- Publication number 20230326716
- Publication date Oct 12, 2023
- Tokyo Electron Limited
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE TREATMENT DEVICE
- Publication number 20230207273
- Publication date Jun 29, 2023
- Muegge GmbH
- Moritz Johann GORATH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20230081182
- Publication date Mar 16, 2023
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR...
- Publication number 20230054452
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220359162
- Publication date Nov 10, 2022
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE PLASMA SOURCE
- Publication number 20220344131
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Philip Allan KRAUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20220319812
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Hanh NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR MEASURING PLASMA ION DENSITY AND APPARATUS FOR DIAGNOSIN...
- Publication number 20220270852
- Publication date Aug 25, 2022
- Korea Research Institute of Standards and Science
- Hyo Chang LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220230848
- Publication date Jul 21, 2022
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE SUPPLY MECHANISM, PLASMA TREATMENT APPARATUS, AND PLASMA...
- Publication number 20220223380
- Publication date Jul 14, 2022
- Tokyo Electron Limited
- Makoto ISHITSUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220130643
- Publication date Apr 28, 2022
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220068606
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220037124
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Satoshi ITOH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210398777
- Publication date Dec 23, 2021
- HITACHI HIGH-TECH CORPORATION
- Masayuki SHIINA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20210351012
- Publication date Nov 11, 2021
- TOKYO ELECTRON LIMITED
- Yuji ONUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20210327685
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Thai Cheng CHUA
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
INSPECTION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210280401
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Yusuke HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA SYNTHESIS OF CARBON NANOTUBES
- Publication number 20210257189
- Publication date Aug 19, 2021
- FGV CAMBRIDGE NANOSYSTEMS LIMITED
- Catharina PAUKNER
- B82 - NANO-TECHNOLOGY
Information Patent Application
MICROWAVE HEATING DEVICE
- Publication number 20210249229
- Publication date Aug 12, 2021
- Mitsubishi Electric Corporation
- Hiroshi SUENOBU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Plasma Source, Microwave Plasma Processing Apparatus and...
- Publication number 20210233742
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Yasuaki Taniike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE COUPLING/COMBINING DEVICE AND ASSOCIATED MICROWAVE GENERATOR
- Publication number 20210202212
- Publication date Jul 1, 2021
- SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQ...
- Louis LATRASSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210111002
- Publication date Apr 15, 2021
- Hitachi High-Technologies Corporation
- Yuki KONDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF POWER GENERATION WITH PHASE LINKED SOLID-STATE...
- Publication number 20200381219
- Publication date Dec 3, 2020
- MKS Instruments, Inc.
- Kenneth Trenholm
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
MODULAR MICROWAVE PLASMA SOURCE
- Publication number 20200381217
- Publication date Dec 3, 2020
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Circuits specially adapted for controlling the microwave discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Modular high-frequency source

Microwave coupling/combining device and associated microwave generator

Plasma processing apparatus

Microwave plasma source, microwave plasma processing apparatus and...

Plasma processing apparatus

Microwave heating device

Methods and apparatus for microwave plasma assisted chemical vapor...

Plasma processing apparatus

Device for measuring plasma ion density and apparatus for diagnosin...

System and method of power generation with phase linked solid-state...

Inspection method and plasma processing apparatus

Apparatus for plasma processing

High-power solid-state microwave generator for RF energy applications

Plasma processing apparatus

System and method of power generation with phase linked solid-state...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Modular microwave plasma source

Remote modular high-frequency source

Methods and apparatus for dynamical control of radial uniformity in...

Methods and apparatus for dynamical control of radial uniformity wi...

Graphene structure forming method and graphene structure forming ap...

Modular high-frequency source

Plasma processing apparatus, plasma processing method, and ECR heig...

Microwave plasma source, microwave plasma processing apparatus and...

Patents Applicationslast 30 patents

MODULAR HIGH-FREQUENCY SOURCE

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...

MICROWAVE TREATMENT DEVICE

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR...

PLASMA PROCESSING APPARATUS

MODULAR MICROWAVE PLASMA SOURCE

REMOTE MODULAR HIGH-FREQUENCY SOURCE

DEVICE FOR MEASURING PLASMA ION DENSITY AND APPARATUS FOR DIAGNOSIN...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

MICROWAVE SUPPLY MECHANISM, PLASMA TREATMENT APPARATUS, AND PLASMA...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

APPARATUS AND METHOD FOR PLASMA PROCESSING

MODULAR HIGH-FREQUENCY SOURCE

INSPECTION METHOD AND PLASMA PROCESSING APPARATUS

APPARATUS AND METHOD FOR PLASMA SYNTHESIS OF CARBON NANOTUBES

MICROWAVE HEATING DEVICE

Microwave Plasma Source, Microwave Plasma Processing Apparatus and...

MICROWAVE COUPLING/COMBINING DEVICE AND ASSOCIATED MICROWAVE GENERATOR

PLASMA PROCESSING APPARATUS

SYSTEM AND METHOD OF POWER GENERATION WITH PHASE LINKED SOLID-STATE...

MODULAR MICROWAVE PLASMA SOURCE