Cleaning of wafer edges

Industry

CPC
H01L21/02087

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02087Cleaning of wafer edges

Industries

Patents Grantslast 30 patents

Information Patent Grant
Rinse and method of use thereof for removing edge protection layers...
- Patent number 12,099,305
- Issue date Sep 24, 2024
- Merck Patent GmbH
- M. Dalil Rahman
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Substrate cleaning apparatus and cleaning method of substrate
- Patent number 12,100,587
- Issue date Sep 24, 2024
- Ebara Corporation
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Grant
Semiconductor substrate bevel cleaning
- Patent number 12,068,152
- Issue date Aug 20, 2024
- Lam Research Corporation
- Saravanapriyan Sriraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Situ clean for bevel and edge ring
- Patent number 12,068,153
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Kaushik Alayavalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning module, substrate processing apparatus including cleaning...
- Patent number 12,033,847
- Issue date Jul 9, 2024
- Ebara Corporation
- Toshio Mizuno
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for electro-chemical plating
- Patent number 12,020,922
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Lung Hou
- B08 - CLEANING
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 11,972,939
- Issue date Apr 30, 2024
- Semes Co., Ltd.
- Ohyeol Kwon
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Heater support kit for bevel etch chamber
- Patent number 11,948,790
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Tuan Anh Nguyen
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,935,739
- Issue date Mar 19, 2024
- Tokyo Electron Limited
- Akira Fujita
- B08 - CLEANING
Information Patent Grant
Wafer cleaning apparatus
- Patent number 11,881,418
- Issue date Jan 23, 2024
- Disco Corporation
- Shohei Takeda
- B08 - CLEANING
Information Patent Grant
Apparatus and system for treating substrate
- Patent number 11,869,763
- Issue date Jan 9, 2024
- Semes Co., Ltd.
- Jun Keon Ahn
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method of substrate edge cleaning and substrate carri...
- Patent number 11,823,916
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel portion treatment agent composition and method of manufacturi...
- Patent number 11,817,310
- Issue date Nov 14, 2023
- Central Glass Company, Limited
- Yuki Fukui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method and substrate cleaning apparatus
- Patent number 11,817,311
- Issue date Nov 14, 2023
- Ebara Corporation
- Tomoatsu Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and substrate processing system
- Patent number 11,784,054
- Issue date Oct 10, 2023
- Tokyo Electron Limited
- Nobuhiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable upper plasma-exclusion-zone ring for a bevel etcher
- Patent number 11,756,771
- Issue date Sep 12, 2023
- Lam Research Corporation
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses for reducing metal residue in edge bead region from met...
- Patent number 11,740,559
- Issue date Aug 29, 2023
- Inpria Corporation
- Mollie Waller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated wafer cleaning
- Patent number 11,735,440
- Issue date Aug 22, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yu Lee
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,710,629
- Issue date Jul 25, 2023
- SCREEN Holdings Co., Ltd.
- Tomonori Fujiwara
- B08 - CLEANING
Information Patent Grant
Apparatus and method for wafer cleaning
- Patent number 11,705,324
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Hsien Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning device and substrate cleaning method
- Patent number 11,660,643
- Issue date May 30, 2023
- Ebara Corporation
- Tomoatsu Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel edge removal methods, tools, and systems
- Patent number 11,664,213
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hui-Chi Huang
- B08 - CLEANING
Information Patent Grant
Substrate treatment device
- Patent number 11,646,212
- Issue date May 9, 2023
- SCREEN Holdings Co., Ltd.
- Hideji Naohara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate processing method, substrate processing apparatus and cle...
- Patent number 11,631,590
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Muneyuki Omi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method
- Patent number 11,621,170
- Issue date Apr 4, 2023
- Disco Corporation
- Karen Chang
- B24 - GRINDING POLISHING
Information Patent Grant
Particle prevention in wafer edge trimming
- Patent number 11,605,534
- Issue date Mar 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-He Chou
- B08 - CLEANING
Information Patent Grant
Wafer cleaning apparatus based on light irradiation and wafer clean...
- Patent number 11,527,399
- Issue date Dec 13, 2022
- Samsung Electronics Co., Ltd.
- Byungkwon Cho
- B08 - CLEANING
Information Patent Grant
Optimal exposure of a bottom surface of a substrate material and/or...
- Patent number 11,495,451
- Issue date Nov 8, 2022
- Thanh Truong
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus, and substrate processing method
- Patent number 11,469,117
- Issue date Oct 11, 2022
- SCREEN Holdings Co. Ltd.
- Yasunori Kanematsu
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,437,252
- Issue date Sep 6, 2022
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES...
- Publication number 20240361693
- Publication date Oct 31, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takumi OKADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT PLATE, SUBSTRATE PROCESSING APPARATUS INCLUDING T...
- Publication number 20240363331
- Publication date Oct 31, 2024
- ASM IP HOLDING B.V.
- DaeYoun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING DEVICE
- Publication number 20240282596
- Publication date Aug 22, 2024
- HUAYING RESEARCH CO., LTD
- Sophia WEN
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240246122
- Publication date Jul 25, 2024
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240222157
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Song yun Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR A SURFACE TREATMENT OF A SUBSTRATE WITH A LIQUID
- Publication number 20240145231
- Publication date May 2, 2024
- Semsysco GmbH
- Georg Hofer
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD OF SUBSTRATE EDGE CLEANING AND SUBSTRATE CARRI...
- Publication number 20240047238
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- Wei LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER
- Publication number 20230402257
- Publication date Dec 14, 2023
- Jack CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ELECTRO-CHEMICAL PLATING
- Publication number 20230386824
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Lung HOU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SITU CLEAN FOR BEVEL AND EDGE RING
- Publication number 20230386823
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Kaushik ALAYAVALLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD THEREOF
- Publication number 20230367233
- Publication date Nov 16, 2023
- SEMES CO., LTD.
- Ick Kyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATED OVERLAY REMOVAL DURING WAFER SINGULATION
- Publication number 20230238234
- Publication date Jul 27, 2023
- TEXAS INSTRUMENTS INCORPORATED
- Andrew NELSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20230223239
- Publication date Jul 13, 2023
- Satoru KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING LIQUID USED FOR CLEANING METAL RESISTS, AND CLEANING METHO...
- Publication number 20230183617
- Publication date Jun 15, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Mai SUGAWARA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
COMPOSITION FOR TREATING SEMICONDUCTOR SUBSTRATE
- Publication number 20230086417
- Publication date Mar 23, 2023
- ENF TECHNOLOGY CO., LTD.
- Jeong Sik OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220384183
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Wakako ISHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE BEVEL CLEANING
- Publication number 20220375746
- Publication date Nov 24, 2022
- LAM RESEARCH CORPORATION
- Saravanapriyan SRIRAMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEVEL EDGE REMOVAL METHODS, TOOLS, AND SYSTEMS
- Publication number 20220359191
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hui-Chi Huang
- A46 - BRUSHWARE
Information Patent Application
APPARATUS FOR ELECTRO-CHEMICAL PLATING
- Publication number 20220336211
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Lung HOU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...
- Publication number 20220325205
- Publication date Oct 13, 2022
- Tokuyama Corporation
- Takafumi Shimoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RINSE AND METHOD OF USE THEREOF FOR REMOVING EDGE PROTECTION LAYERS...
- Publication number 20220308455
- Publication date Sep 29, 2022
- Merck Patent GmbH
- M. Dalil RAHMAN
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
COMPOSITION AND METHOD FOR TREATING SUBSTRATE
- Publication number 20220282156
- Publication date Sep 8, 2022
- FUJIFILM CORPORATION
- Moe NARITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATED WAFER CLEANING
- Publication number 20220262654
- Publication date Aug 18, 2022
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Chun-Yu LEE
- B08 - CLEANING
Information Patent Application
CLEANING METHOD AND CLEANING DEVICE FOR WAFER EDGE
- Publication number 20220230873
- Publication date Jul 21, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Xiaobo MEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT DEVICE
- Publication number 20220216117
- Publication date Jul 7, 2022
- SCREEN Holdings Co., Ltd.
- Hideji NAOHARA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220189782
- Publication date Jun 16, 2022
- SCREEN Holdings Co, Ltd.
- Tomonori FUJIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF SUBSTRATE EDGE CLEANING AND SUBSTRATE CARRI...
- Publication number 20220148892
- Publication date May 12, 2022
- Applied Materials, Inc.
- Wei LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20220139699
- Publication date May 5, 2022
- SCREEN Holdings Co., Ltd.
- Hiroaki ISHII
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND STORA...
- Publication number 20220130662
- Publication date Apr 28, 2022
- EBARA CORPORATION
- Satoru Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING METHOD
- Publication number 20220051897
- Publication date Feb 17, 2022
- Disco Corporation
- Karen CHANG
- H01 - BASIC ELECTRIC ELEMENTS

Cleaning of wafer edges

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Rinse and method of use thereof for removing edge protection layers...

Substrate cleaning apparatus and cleaning method of substrate

Semiconductor substrate bevel cleaning

Situ clean for bevel and edge ring

Cleaning module, substrate processing apparatus including cleaning...

Apparatus for electro-chemical plating

Method and apparatus for treating substrate

Heater support kit for bevel etch chamber

Substrate processing apparatus and substrate processing method

Wafer cleaning apparatus

Apparatus and system for treating substrate

Apparatus and method of substrate edge cleaning and substrate carri...

Bevel portion treatment agent composition and method of manufacturi...

Substrate cleaning method and substrate cleaning apparatus

Etching method and substrate processing system

Tunable upper plasma-exclusion-zone ring for a bevel etcher

Apparatuses for reducing metal residue in edge bead region from met...

Automated wafer cleaning

Substrate processing apparatus and substrate processing method

Apparatus and method for wafer cleaning

Substrate cleaning device and substrate cleaning method

Bevel edge removal methods, tools, and systems

Substrate treatment device

Substrate processing method, substrate processing apparatus and cle...

Wafer processing method

Particle prevention in wafer edge trimming

Wafer cleaning apparatus based on light irradiation and wafer clean...

Optimal exposure of a bottom surface of a substrate material and/or...

Substrate processing apparatus, and substrate processing method

Substrate processing apparatus and substrate processing method

Patents Applicationslast 30 patents

THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES...

SUBSTRATE SUPPORT PLATE, SUBSTRATE PROCESSING APPARATUS INCLUDING T...

SEMICONDUCTOR PROCESSING DEVICE

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SYSTEM AND METHOD FOR A SURFACE TREATMENT OF A SUBSTRATE WITH A LIQUID

APPARATUS AND METHOD OF SUBSTRATE EDGE CLEANING AND SUBSTRATE CARRI...

TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER

APPARATUS FOR ELECTRO-CHEMICAL PLATING

SITU CLEAN FOR BEVEL AND EDGE RING

SUBSTRATE PROCESSING APPARATUS AND METHOD THEREOF

AUTOMATED OVERLAY REMOVAL DURING WAFER SINGULATION

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

CLEANING LIQUID USED FOR CLEANING METAL RESISTS, AND CLEANING METHO...

COMPOSITION FOR TREATING SEMICONDUCTOR SUBSTRATE

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

SEMICONDUCTOR SUBSTRATE BEVEL CLEANING

BEVEL EDGE REMOVAL METHODS, TOOLS, AND SYSTEMS

APPARATUS FOR ELECTRO-CHEMICAL PLATING

Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlor...

RINSE AND METHOD OF USE THEREOF FOR REMOVING EDGE PROTECTION LAYERS...

COMPOSITION AND METHOD FOR TREATING SUBSTRATE

AUTOMATED WAFER CLEANING

CLEANING METHOD AND CLEANING DEVICE FOR WAFER EDGE

SUBSTRATE TREATMENT DEVICE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

APPARATUS AND METHOD OF SUBSTRATE EDGE CLEANING AND SUBSTRATE CARRI...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND STORA...

WAFER PROCESSING METHOD