Cleaning

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CPC
H01J2237/335

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/335Cleaning

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,154,767
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 12,148,597
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stress treatments for cover wafers
- Patent number 12,142,468
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- B24 - GRINDING POLISHING
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Semiconductor processing preclean methods and apparatus
- Patent number 12,112,938
- Issue date Oct 8, 2024
- ASM IP Holding B.V.
- Chuang Wei
- B08 - CLEANING
Information Patent Grant
High conductance inner shield for process chamber
- Patent number 12,100,577
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Valve module and substrate processing device comprising the same
- Patent number 12,092,235
- Issue date Sep 17, 2024
- PRESYS. CO., LTD.
- Sang Min Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 12,080,529
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selective in-situ cleaning of high-k films from processing chamber...
- Patent number 12,076,763
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Yujia Zhai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Situ clean for bevel and edge ring
- Patent number 12,068,153
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Kaushik Alayavalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for manufacturing metal gate structures
- Patent number 12,054,823
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for selective removal of contact oxides
- Patent number 12,057,299
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Tuck Foong Koh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process and related device for removing by-product on semiconductor...
- Patent number 12,027,350
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing-Cheng Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular high-frequency source
- Patent number 12,002,654
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer plasma resistant coating by atomic layer deposition
- Patent number 12,002,657
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,002,664
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Masahiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast response pedestal assembly for selective preclean
- Patent number 11,990,321
- Issue date May 21, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Method and apparatus for parts cleaning
- Patent number 11,967,491
- Issue date Apr 23, 2024
- Semes Co., Ltd.
- Soon-Cheon Cho
- B08 - CLEANING
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 11,955,319
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for blocking plasma backflow in process chamber to protect a...
- Patent number 11,955,323
- Issue date Apr 9, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas analyzer apparatus
- Patent number 11,942,312
- Issue date Mar 26, 2024
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,913,107
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Yueh Sheng Ow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning plasma processing apparatus and plasma processin...
- Patent number 11,887,824
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Yasutaka Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic modular microwave source with integrated process gas dis...
- Patent number 11,881,384
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- James Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for reducing defects in preclean chambers
- Patent number 11,881,385
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Yueh Sheng Ow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and protecting member
- Patent number 11,869,755
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Akira Nagayama
- B08 - CLEANING
Information Patent Grant
Semiconductor manufacturing apparatus and manufacturing method of s...
- Patent number 11,859,286
- Issue date Jan 2, 2024
- Kioxia Corporation
- Yuya Matsubara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and methods using an inline surface engineering source
- Patent number 11,862,433
- Issue date Jan 2, 2024
- Varlan Semiconductor Equipment Associates, Inc.
- Christopher Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Valve apparatuses and related methods for reactive process gas isol...
- Patent number 11,854,839
- Issue date Dec 26, 2023
- MKS Instruments, Inc.
- Andrew B. Cowe
- B08 - CLEANING
Information Patent Grant
Medical device with plasma modified oxide layer and method of formi...
- Patent number 11,846,016
- Issue date Dec 19, 2023
- Cook Medical Technologies LLC
- John Neilan
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE SELF-ASSEMBLED MONOLAYER (SAM) REMOVAL
- Publication number 20240420996
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Jiajie Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...
- Publication number 20240412948
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Shuran SHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUXLESS DIE BONDING USING IN-SITU PLASMA TREATMENT AND APPARATUS F...
- Publication number 20240404988
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Hui-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404801
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404800
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARALLEL PLASMA TREATMENT AND THERMOCOMPRESSION BONDING AND APPARAT...
- Publication number 20240404989
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Hui-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING CHAMBER FOR METAL OXIDE REMOVAL
- Publication number 20240371685
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Method, Apparatus, and System
- Publication number 20240363405
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Masato SAKAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20240355615
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Tadahiro ISHIZAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES
- Publication number 20240337012
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...
- Publication number 20240331988
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing-Cheng Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PLASMA SURFACE TREATMENT
- Publication number 20240331983
- Publication date Oct 3, 2024
- PLASMAPP CO., LTD.
- You Bong LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, SUBSTRATE PROCESSI...
- Publication number 20240321597
- Publication date Sep 26, 2024
- Kokusai Electric Corporation
- Kaoru YAMAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
- Publication number 20240282556
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- B08 - CLEANING
Information Patent Application
MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20240282554
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Thai Cheng CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240274415
- Publication date Aug 15, 2024
- TOKYO ELECTRON LIMITED
- Masahiro YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ANALYZER APPARATUS
- Publication number 20240266155
- Publication date Aug 8, 2024
- ATONARP INC.
- Naoki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing Chamber With Multiple Plasma Units
- Publication number 20240249918
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...
- Publication number 20240222085
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Koichiro NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED DRY DESMEAR EQUIPMENT WITH PROTECTIVE FILM PEELING CAPABIL...
- Publication number 20240222089
- Publication date Jul 4, 2024
- Intel Corporation
- Ala OMER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE METAL SELECTIVITY IMPROVEMENT WITH RF PULSING
- Publication number 20240222192
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Yi Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240203709
- Publication date Jun 20, 2024
- Jusung Engineering Co., Ltd.
- Kyung Ran PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU DIAGNOSIS OF PLASMA SYSTEM
- Publication number 20240203713
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT LAYER FORMATION WITH MICROWAVE ANNEALING FOR NMOS DEVICES
- Publication number 20240203742
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAVITY SHAPING AND SELECTIVE METAL SILICIDE FORMATION FOR CMOS DEVICES
- Publication number 20240203741
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-TREATMENT FOR REMOVING RESIDUES FROM DIELECTRIC SURFACE
- Publication number 20240194605
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Mohammad Mahdi TAVAKOLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...
- Publication number 20240186118
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- JAMES CARDUCCI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Operating a PVD Apparatus
- Publication number 20240177997
- Publication date May 30, 2024
- SPTS TECHNOLOGIES LIMITED
- Scott Haymore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPROCESS SUBSTRATE TREATMENT FOR ENHANCED SUBSTRATE DOPING
- Publication number 20240153774
- Publication date May 9, 2024
- Applied Materials, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Multi-zone gas distribution systems and methods

Stress treatments for cover wafers

Integrated epitaxy and preclean system

Semiconductor processing preclean methods and apparatus

High conductance inner shield for process chamber

Valve module and substrate processing device comprising the same

Plasma processing apparatus and prediction method of the condition...

Selective in-situ cleaning of high-k films from processing chamber...

Situ clean for bevel and edge ring

Apparatus and method for manufacturing metal gate structures

Methods for selective removal of contact oxides

Process and related device for removing by-product on semiconductor...

Modular high-frequency source

Multi-layer plasma resistant coating by atomic layer deposition

Cleaning method and plasma processing apparatus

Fast response pedestal assembly for selective preclean

Method and apparatus for parts cleaning

Processing chamber with multiple plasma units

Device for blocking plasma backflow in process chamber to protect a...

Gas analyzer apparatus

Methods and apparatus for processing a substrate

Method of cleaning plasma processing apparatus and plasma processin...

Monolithic modular microwave source with integrated process gas dis...

Methods and apparatus for reducing defects in preclean chambers

Cleaning method and protecting member

Semiconductor manufacturing apparatus and manufacturing method of s...

System and methods using an inline surface engineering source

Valve apparatuses and related methods for reactive process gas isol...

Medical device with plasma modified oxide layer and method of formi...

Patents Applicationslast 30 patents

SELECTIVE SELF-ASSEMBLED MONOLAYER (SAM) REMOVAL

METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

FLUXLESS DIE BONDING USING IN-SITU PLASMA TREATMENT AND APPARATUS F...

PLASMA TREATMENT APPARATUS

PLASMA TREATMENT APPARATUS

PARALLEL PLASMA TREATMENT AND THERMOCOMPRESSION BONDING AND APPARAT...

CLEANING CHAMBER FOR METAL OXIDE REMOVAL

Substrate Processing Method, Apparatus, and System

METHOD AND APPARATUS FOR PROCESSING SUBSTRATE

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...

APPARATUS FOR PLASMA SURFACE TREATMENT

SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, SUBSTRATE PROCESSI...

FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN

MODULAR HIGH-FREQUENCY SOURCE

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

GAS ANALYZER APPARATUS

Processing Chamber With Multiple Plasma Units

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...

ENHANCED DRY DESMEAR EQUIPMENT WITH PROTECTIVE FILM PEELING CAPABIL...

SELECTIVE METAL SELECTIVITY IMPROVEMENT WITH RF PULSING

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

IN-SITU DIAGNOSIS OF PLASMA SYSTEM

CONTACT LAYER FORMATION WITH MICROWAVE ANNEALING FOR NMOS DEVICES

CAVITY SHAPING AND SELECTIVE METAL SILICIDE FORMATION FOR CMOS DEVICES

POST-TREATMENT FOR REMOVING RESIDUES FROM DIELECTRIC SURFACE

MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...

Method of Operating a PVD Apparatus

MULTIPROCESS SUBSTRATE TREATMENT FOR ENHANCED SUBSTRATE DOPING