Cleaning

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CPC
H01J2237/335

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/335Cleaning

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Integrated cleaning process for substrate etching
- Patent number 12,255,055
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Yi Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for processing substrate using plasma
- Patent number 12,237,151
- Issue date Feb 25, 2025
- SEMES CO, LTD.
- Seong Gil Lee
- B08 - CLEANING
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 12,230,479
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
FinFET device and method of forming same
- Patent number 12,218,222
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon dry etching method
- Patent number 12,217,969
- Issue date Feb 4, 2025
- ULVAC, Inc.
- Kenta Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and plasma processing method
- Patent number 12,217,941
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- B08 - CLEANING
Information Patent Grant
Cleaning chamber for metal oxide removal
- Patent number 12,211,737
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic modular microwave source with integrated process gas dis...
- Patent number 12,191,118
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- James Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,154,767
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 12,148,597
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stress treatments for cover wafers
- Patent number 12,142,468
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- B24 - GRINDING POLISHING
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Semiconductor processing preclean methods and apparatus
- Patent number 12,112,938
- Issue date Oct 8, 2024
- ASM IP Holding B.V.
- Chuang Wei
- B08 - CLEANING
Information Patent Grant
High conductance inner shield for process chamber
- Patent number 12,100,577
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Valve module and substrate processing device comprising the same
- Patent number 12,092,235
- Issue date Sep 17, 2024
- PRESYS. CO., LTD.
- Sang Min Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective in-situ cleaning of high-k films from processing chamber...
- Patent number 12,076,763
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Yujia Zhai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 12,080,529
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Situ clean for bevel and edge ring
- Patent number 12,068,153
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Kaushik Alayavalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for manufacturing metal gate structures
- Patent number 12,054,823
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for selective removal of contact oxides
- Patent number 12,057,299
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Tuck Foong Koh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process and related device for removing by-product on semiconductor...
- Patent number 12,027,350
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing-Cheng Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular high-frequency source
- Patent number 12,002,654
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer plasma resistant coating by atomic layer deposition
- Patent number 12,002,657
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,002,664
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Masahiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fast response pedestal assembly for selective preclean
- Patent number 11,990,321
- Issue date May 21, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Method and apparatus for parts cleaning
- Patent number 11,967,491
- Issue date Apr 23, 2024
- Semes Co., Ltd.
- Soon-Cheon Cho
- B08 - CLEANING
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 11,955,319
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for blocking plasma backflow in process chamber to protect a...
- Patent number 11,955,323
- Issue date Apr 9, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Na Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas analyzer apparatus
- Patent number 11,942,312
- Issue date Mar 26, 2024
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...
- Publication number 20250098248
- Publication date Mar 20, 2025
- Kioxia Corporation
- Masaya NAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL
- Publication number 20250079199
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Shiyu YUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250079193
- Publication date Mar 6, 2025
- TES CO., LTD.
- In-Il JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER
- Publication number 20250062106
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Danae Nicole Kay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE
- Publication number 20250054767
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Qihao ZHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...
- Publication number 20250052272
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Rohit Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA VESSEL CLEANING FOR ION BEAM SYSTEM
- Publication number 20250046586
- Publication date Feb 6, 2025
- VEECO INSTRUMENTS INC.
- Mohammad SAGHAYEZHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCE...
- Publication number 20250029835
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Ryan Ley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...
- Publication number 20250022696
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Xin Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250006473
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Yuki ONODERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
- Publication number 20250006474
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Naomi YOSHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS ANALYSIS DEVICE AND CONTROL METHOD
- Publication number 20250006476
- Publication date Jan 2, 2025
- ATONARP INC.
- Hirofumi NAGAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT APPARATUS
- Publication number 20250006472
- Publication date Jan 2, 2025
- Ushio Denki Kabushiki Kaisha
- Takashi SAWADA
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS
- Publication number 20240429038
- Publication date Dec 26, 2024
- ASM IP HOLDING B.V.
- Chuang Wei
- B08 - CLEANING
Information Patent Application
SELECTIVE SELF-ASSEMBLED MONOLAYER (SAM) REMOVAL
- Publication number 20240420996
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Jiajie Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...
- Publication number 20240412948
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Shuran SHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUXLESS DIE BONDING USING IN-SITU PLASMA TREATMENT AND APPARATUS F...
- Publication number 20240404988
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Hui-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404801
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404800
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARALLEL PLASMA TREATMENT AND THERMOCOMPRESSION BONDING AND APPARAT...
- Publication number 20240404989
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Hui-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING CHAMBER FOR METAL OXIDE REMOVAL
- Publication number 20240371685
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Method, Apparatus, and System
- Publication number 20240363405
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Masato SAKAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20240355615
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Tadahiro ISHIZAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES
- Publication number 20240337012
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...
- Publication number 20240331988
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing-Cheng Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PLASMA SURFACE TREATMENT
- Publication number 20240331983
- Publication date Oct 3, 2024
- PLASMAPP CO., LTD.
- You Bong LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, SUBSTRATE PROCESSI...
- Publication number 20240321597
- Publication date Sep 26, 2024
- Kokusai Electric Corporation
- Kaoru YAMAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
- Publication number 20240282556
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- B08 - CLEANING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor processing apparatus and dielectric window cleaning m...

Integrated cleaning process for substrate etching

Apparatus and method for processing substrate using plasma

Processing chamber with multiple plasma units

FinFET device and method of forming same

Silicon dry etching method

Plasma processing apparatus, and plasma processing method

Cleaning chamber for metal oxide removal

Monolithic modular microwave source with integrated process gas dis...

Substrate processing apparatus and substrate processing method

Multi-zone gas distribution systems and methods

Stress treatments for cover wafers

Integrated epitaxy and preclean system

Semiconductor processing preclean methods and apparatus

High conductance inner shield for process chamber

Valve module and substrate processing device comprising the same

Selective in-situ cleaning of high-k films from processing chamber...

Plasma processing apparatus and prediction method of the condition...

Situ clean for bevel and edge ring

Apparatus and method for manufacturing metal gate structures

Methods for selective removal of contact oxides

Process and related device for removing by-product on semiconductor...

Modular high-frequency source

Multi-layer plasma resistant coating by atomic layer deposition

Cleaning method and plasma processing apparatus

Fast response pedestal assembly for selective preclean

Method and apparatus for parts cleaning

Processing chamber with multiple plasma units

Device for blocking plasma backflow in process chamber to protect a...

Gas analyzer apparatus

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...

ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL

SUBSTRATE PROCESSING APPARATUS

REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER

SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE

MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...

PLASMA VESSEL CLEANING FOR ION BEAM SYSTEM

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCE...

APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...

PLASMA PROCESSING APPARATUS

INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS

GAS ANALYSIS DEVICE AND CONTROL METHOD

TREATMENT APPARATUS

SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS

SELECTIVE SELF-ASSEMBLED MONOLAYER (SAM) REMOVAL

METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

FLUXLESS DIE BONDING USING IN-SITU PLASMA TREATMENT AND APPARATUS F...

PLASMA TREATMENT APPARATUS

PLASMA TREATMENT APPARATUS

PARALLEL PLASMA TREATMENT AND THERMOCOMPRESSION BONDING AND APPARAT...

CLEANING CHAMBER FOR METAL OXIDE REMOVAL

Substrate Processing Method, Apparatus, and System

METHOD AND APPARATUS FOR PROCESSING SUBSTRATE

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...

APPARATUS FOR PLASMA SURFACE TREATMENT

SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, SUBSTRATE PROCESSI...

FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN