TREA

CMP chemical mechanical polishing of wafer

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Industry

  • CPC
  • G05B2219/45232
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Parent Industries

GPHYSICS G05Controlling systems G05BCONTROL OR REGULATING SYSTEMS IN GENERAL FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS G05B2219/00Program-control systems

Current Industry

G05B2219/45232CMP chemical mechanical polishing of wafer
Industries