Coating

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CPC
H01J2237/332

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/332Coating

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Heat exchange method using fluorinated compounds having a low GWP
- Patent number 12,325,819
- Issue date Jun 10, 2025
- Solvay Specialty Polymers Italy S.p.A.
- Emanuela Antenucci
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antennas, circuits for generating plasma, plasma processing apparat...
- Patent number 12,327,709
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Dong-Hyub Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of manufacturing semiconductor device
- Patent number 12,327,710
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Jiye Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for processing substrate
- Patent number 12,325,919
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and method
- Patent number 12,327,748
- Issue date Jun 10, 2025
- PIOTECH INC.
- Zhuo Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film deposition process
- Patent number 12,322,591
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Naoki Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Helium-free silicon formation
- Patent number 12,315,724
- Issue date May 27, 2025
- Applied Materials, Inc.
- Zeqiong Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma enhanced chemical vapor deposition of graphene on optical fi...
- Patent number 12,312,680
- Issue date May 27, 2025
- California Institute of Technology
- Deepan Kishore Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Large-area high-density plasma processing chamber for flat panel di...
- Patent number 12,312,689
- Issue date May 27, 2025
- Applied Materials, Inc.
- Suhail Anwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table structure, substrate processing apparatus, and metho...
- Patent number 12,315,707
- Issue date May 27, 2025
- Tokyo Electron Limited
- Motoi Yamagata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 12,315,701
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,308,208
- Issue date May 20, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid tuning of critical dimension non-uniformity by modulating tem...
- Patent number 12,308,264
- Issue date May 20, 2025
- Lam Research Corporation
- Ravi Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 12,308,217
- Issue date May 20, 2025
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pre-etch treatment for metal etch
- Patent number 12,308,250
- Issue date May 20, 2025
- Tokyo Electron Limited
- Scott Lefevre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doped or undoped silicon carbide deposition and remote hydrogen pla...
- Patent number 12,300,488
- Issue date May 13, 2025
- Lam Research Corporation
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of low temperature plasma enhanced chemical va...
- Patent number 12,300,497
- Issue date May 13, 2025
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor substrate support power transmission components
- Patent number 12,300,474
- Issue date May 13, 2025
- Applied Materials, Inc.
- Paul L. Brillhart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, calculation method, and calculation pr...
- Patent number 12,300,469
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical film, sputtering target, and method of producing optical film
- Patent number 12,297,528
- Issue date May 13, 2025
- Sumitomo Metal Mining Co., Ltd.
- Hideharu Okami
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Plasma processing apparatus and method
- Patent number 12,300,472
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Pei-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,300,467
- Issue date May 13, 2025
- Tokyo Electron Limited
- Manabu Oie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced film formation method
- Patent number 12,300,466
- Issue date May 13, 2025
- Tokyo Electron Limited
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of uniformity control
- Patent number 12,300,468
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing gap filling fluids and related systems and d...
- Patent number 12,293,942
- Issue date May 6, 2025
- ASM IP Holding B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertically adjustable plasma source
- Patent number 12,288,677
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed DC power for deposition of film
- Patent number 12,288,670
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Abhijeet Laxman Sangle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,288,683
- Issue date Apr 29, 2025
- Kokusai Electric Corporation
- Yasunobu Koshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for carbon compound film deposition
- Patent number 12,288,672
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
RARE EARTH ROTARY TARGET AND PREPARATION METHOD THEREFOR
- Publication number 20250188593
- Publication date Jun 12, 2025
- GRIREM ADVANCED MATERIALS CO., LTD
- Dehong CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Device for Performing Plasma Treatment, and Method for Performing P...
- Publication number 20250188610
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Jianming HAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250191960
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Hyun Sun CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20250191888
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250191891
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM GAPFILL DEPOSITION ON SEMICONDUCTOR SUBSTRATES WITH VARYING...
- Publication number 20250191909
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Bharati Neelamraju
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER...
- Publication number 20250188594
- Publication date Jun 12, 2025
- Evatec AG
- Jurgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...
- Publication number 20250191926
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Jon HENRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON NITRIDE FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250188604
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Kazuki GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20250191898
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Akira TANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS
- Publication number 20250179625
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD FOR SUBSTRATE PROCESSING SYSTEMS
- Publication number 20250179637
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Simon CHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20250183020
- Publication date Jun 5, 2025
- SAMSUNG DISPLAY CO., LTD.
- Gi Woon SUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20250183021
- Publication date Jun 5, 2025
- SAMSUNG DISPLAY CO., LTD.
- HYUN-WOO KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEDESTAL THERMAL PROFILE TUNING USING MULTIPLE HEATED ZONES AND THE...
- Publication number 20250179633
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Gary B. LIND
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARDWARE DESIGN WITH INDEPENDENT CONTROL TO IMPROVE WIW UNIFORMITY
- Publication number 20250179639
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Rupankar CHOUDHURY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250174440
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...
- Publication number 20250174430
- Publication date May 29, 2025
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IGNITING AND SUPPLYING A LASER OR PLASMA WITH POWER, AND...
- Publication number 20250174438
- Publication date May 29, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Christian Thome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250174439
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Koji AKIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250174466
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT
- Publication number 20250166971
- Publication date May 22, 2025
- ASM IP HOLDING B.V.
- Songwhe Herr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST
- Publication number 20250166976
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
- Publication number 20250166978
- Publication date May 22, 2025
- Applied Materials, Inc.
- Colin John DICKINSON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS
- Publication number 20250163578
- Publication date May 22, 2025
- Applied Materials, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250154645
- Publication date May 15, 2025
- Tokyo Electron Limited
- Tadashi MITSUNARI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD OF DAMAGE MITIGATION AND STEP COVERAGE ENHANCE...
- Publication number 20250157790
- Publication date May 15, 2025
- Applied Materials, Inc.
- Bencherki MEBARKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HOUSING, MOBILE TERMINAL, AND SPUTTER COATING APPARATUS
- Publication number 20250155622
- Publication date May 15, 2025
- Huawei Technologies Co., Ltd
- Peiling Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250154649
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Kenichi KOTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS
- Publication number 20250157802
- Publication date May 15, 2025
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Heat exchange method using fluorinated compounds having a low GWP

Antennas, circuits for generating plasma, plasma processing apparat...

Apparatus for and method of manufacturing semiconductor device

Apparatus for processing substrate

Semiconductor processing apparatus and method

Thin film deposition process

Helium-free silicon formation

Plasma enhanced chemical vapor deposition of graphene on optical fi...

Large-area high-density plasma processing chamber for flat panel di...

Mounting table structure, substrate processing apparatus, and metho...

Film forming apparatus

Substrate processing method and substrate processing apparatus

Rapid tuning of critical dimension non-uniformity by modulating tem...

Apparatus for preventing contamination of self-plasma chamber

Pre-etch treatment for metal etch

Doped or undoped silicon carbide deposition and remote hydrogen pla...

Method and apparatus of low temperature plasma enhanced chemical va...

Semiconductor substrate support power transmission components

Plasma processing apparatus, calculation method, and calculation pr...

Optical film, sputtering target, and method of producing optical film

Plasma processing apparatus and method

Plasma processing method and plasma processing apparatus

Plasma enhanced film formation method

Method of uniformity control

Throughput improvement with interval conditioning purging

Methods for depositing gap filling fluids and related systems and d...

Vertically adjustable plasma source

Pulsed DC power for deposition of film

Method of manufacturing semiconductor device, substrate processing...

Methods and apparatus for carbon compound film deposition

Patents Applicationslast 30 patents

RARE EARTH ROTARY TARGET AND PREPARATION METHOD THEREFOR

Device for Performing Plasma Treatment, and Method for Performing P...

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

UNIFORM GAPFILL DEPOSITION ON SEMICONDUCTOR SUBSTRATES WITH VARYING...

VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER...

CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...

BORON NITRIDE FILM FORMING METHOD AND FILM FORMING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS

SHOWERHEAD FOR SUBSTRATE PROCESSING SYSTEMS

SPUTTERING APPARATUS

SPUTTERING APPARATUS

PEDESTAL THERMAL PROFILE TUNING USING MULTIPLE HEATED ZONES AND THE...

HARDWARE DESIGN WITH INDEPENDENT CONTROL TO IMPROVE WIW UNIFORMITY

SUBSTRATE PROCESSING APPARATUS

RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...

METHOD FOR IGNITING AND SUPPLYING A LASER OR PLASMA WITH POWER, AND...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT

DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST

PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT

PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS

FILM FORMING METHOD AND FILM FORMING APPARATUS

APPARATUS AND METHOD OF DAMAGE MITIGATION AND STEP COVERAGE ENHANCE...

HOUSING, MOBILE TERMINAL, AND SPUTTER COATING APPARATUS

SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS

ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS