Coating

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CPC
H01J2237/332

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/332Coating

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,368,024
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- Abdullah Zafar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for forming metal-insulator-metal capacitors
- Patent number 12,369,336
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Liang Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for improved high pressure plasma processing
- Patent number 12,368,028
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- William R. Johanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lamellar ceramic structure
- Patent number 12,368,029
- Issue date Jul 22, 2025
- Lam Research Corporation
- Joel Philip Hollingsworth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus and CVD mask coating method using the same
- Patent number 12,365,975
- Issue date Jul 22, 2025
- Samsung Display Co., Ltd.
- Sungmin Hur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ closed-loop management of radio frequency power generator
- Patent number 12,368,023
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei Ting Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 12,368,030
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas analyzer apparatus
- Patent number 12,368,032
- Issue date Jul 22, 2025
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,143
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, temperature control method of subst...
- Patent number 12,362,155
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Toshiharu Hirata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming thermally stable carbon film
- Patent number 12,362,181
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 12,362,149
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,151
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,362,156
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Atsushi Kubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for measuring pedestal voltage uniformity in p...
- Patent number 12,362,136
- Issue date Jul 15, 2025
- Stephen Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and substrate processing apparatus
- Patent number 12,362,142
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Takashi Chiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for spindle mechanism monitoring and maintenance in process...
- Patent number 12,362,157
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten suboxide ceramic target
- Patent number 12,359,304
- Issue date Jul 15, 2025
- SOLERAS ADVANCED COATINGS BV
- Ignacio Caretti Giangaspro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma based film modification for semiconductor devices
- Patent number 12,351,900
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Timothy J. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio-frequency antenna and plasma processing device
- Patent number 12,354,839
- Issue date Jul 8, 2025
- EMD CORPORATION
- Akinori Ebe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch with infinite selectivity
- Patent number 12,354,880
- Issue date Jul 8, 2025
- Lam Research Corporation
- Leonid Belau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 12,354,856
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Junichi Takei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 12,354,871
- Issue date Jul 8, 2025
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of non-stoichiometric metal compound layer
- Patent number 12,351,901
- Issue date Jul 8, 2025
- SOLERAS ADVANCED COATINGS BV
- Wilmert De Bosscher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate processing method, method...
- Patent number 12,354,848
- Issue date Jul 8, 2025
- Kokusai Electric Corporation
- Yasunori Ejiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform in situ cleaning and deposition
- Patent number 12,347,653
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Saket Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor assembly for plasma apparatus
- Patent number 12,347,644
- Issue date Jul 1, 2025
- ASM IP Holding B.V.
- Sam Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming plasma coating
- Patent number 12,347,652
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Lance A. Scudder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Directional selective deposition
- Patent number 12,347,674
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphene functionalization method, apparatus, and functionalized gr...
- Patent number 12,344,527
- Issue date Jul 1, 2025
- MEDICAL RESEARCH COUNCIL AS PART OF UNITED KINGDOM RESEARCH AND INNOVATION
- Christopher Russo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
EDGE RING AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20250239439
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Jaebin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR PROTECTING OXYGEN-SENSITIVE TARGET MATERIALS...
- Publication number 20250239442
- Publication date Jul 24, 2025
- FHR Anlagenbau GmbH
- Sven HAEBERLEIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS
- Publication number 20250239476
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF)...
- Publication number 20250230541
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
- Publication number 20250232964
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAP-FILLING METHOD FOR A SEMICONDUCTOR DEVICE AND METHOD OF MANUFAC...
- Publication number 20250233017
- Publication date Jul 17, 2025
- WONIK IPS CO., LTD.
- Chang Gyu SONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226210
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD STRUCTURE AND APPARATUS FOR TREATING SUBSTRATE
- Publication number 20250223699
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Tae Seung YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20250226207
- Publication date Jul 10, 2025
- Kokusai Electric Corporation
- Yasunobu KOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Treatment Device and Plasma Treatment Method
- Publication number 20250226180
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Hiroshi OTOMO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATERS AND PLASMA GENERATORS FOR GAS ACTIVATION, AND RELATED CHAMB...
- Publication number 20250226186
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWER HEAD ASSEMBLY AND SUBSTRATE TREATING APPARATUS INCLUDING THE...
- Publication number 20250218728
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Tae Guen PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218843
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Iksu BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218733
- Publication date Jul 3, 2025
- TES CO., LTD.
- Woo-Young CHUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF BLOCKER FOR UNIFORMITY CONTROL
- Publication number 20250218742
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING SYSTEM
- Publication number 20250207261
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Ryota IFUKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250210328
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode and Coil Configurations For Processing Chambers and Relat...
- Publication number 20250210304
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...
- Publication number 20250210315
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF TREATING A SEMICONDUCTOR SUBSTRATE AND APPARATUS
- Publication number 20250210362
- Publication date Jun 26, 2025
- SPTS TECHNOLOGIES LIMITED
- Eloise BOND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...
- Publication number 20250210314
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING C...
- Publication number 20250210319
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING DEVICE
- Publication number 20250210320
- Publication date Jun 26, 2025
- National University Corporation TOYOHASHI UNIVERSITY OF TECHNOLOGY
- Hirofumi TAKIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHUTTER SYSTEM FOR GAP-FREE SHIELDING OF A COATING SOURCE, AND ASSO...
- Publication number 20250210332
- Publication date Jun 26, 2025
- FHR Anlagenbau GmbH
- Sven HAEBERLEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250210327
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takahiro YONEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250210371
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Akihiro ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING PHOTORESIST AND CARBON ETCH RATES IN AN ICP PR...
- Publication number 20250201573
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Sonam Dorje SHERPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR DEPOSITING A LAYER
- Publication number 20250201526
- Publication date Jun 19, 2025
- ASM IP HOLDING B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
- Publication number 20250201539
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Colin John DICKINSON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...
- Publication number 20250201594
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and apparatus for processing a substrate

Method and system for forming metal-insulator-metal capacitors

Apparatus for improved high pressure plasma processing

Lamellar ceramic structure

Sputtering apparatus and CVD mask coating method using the same

In-situ closed-loop management of radio frequency power generator

Deposition method and deposition apparatus

Gas analyzer apparatus

Plasma processing apparatus and plasma processing method

Substrate processing apparatus, temperature control method of subst...

Methods of forming thermally stable carbon film

Film stress control for plasma enhanced chemical vapor deposition

Plasma processing apparatus and plasma processing method

Substrate processing method and substrate processing apparatus

Apparatus and method for measuring pedestal voltage uniformity in p...

Plasma processing method and substrate processing apparatus

Methods for spindle mechanism monitoring and maintenance in process...

Tungsten suboxide ceramic target

Plasma based film modification for semiconductor devices

Radio-frequency antenna and plasma processing device

High aspect ratio etch with infinite selectivity

Film forming apparatus

Ultrathin atomic layer deposition film accuracy thickness control

Deposition of non-stoichiometric metal compound layer

Substrate processing apparatus, substrate processing method, method...

Uniform in situ cleaning and deposition

Susceptor assembly for plasma apparatus

Method for forming plasma coating

Directional selective deposition

Graphene functionalization method, apparatus, and functionalized gr...

Patents Applicationslast 30 patents

EDGE RING AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

METHOD AND DEVICE FOR PROTECTING OXYGEN-SENSITIVE TARGET MATERIALS...

ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS

Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF)...

VERTICALLY ADJUSTABLE PLASMA SOURCE

GAP-FILLING METHOD FOR A SEMICONDUCTOR DEVICE AND METHOD OF MANUFAC...

FILM FORMATION METHOD AND SUBSTRATE PROCESSING APPARATUS

SHOWERHEAD STRUCTURE AND APPARATUS FOR TREATING SUBSTRATE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

Plasma Treatment Device and Plasma Treatment Method

HEATERS AND PLASMA GENERATORS FOR GAS ACTIVATION, AND RELATED CHAMB...

SHOWER HEAD ASSEMBLY AND SUBSTRATE TREATING APPARATUS INCLUDING THE...

SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

RF BLOCKER FOR UNIFORMITY CONTROL

FILM FORMING METHOD AND FILM FORMING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

Electrode and Coil Configurations For Processing Chambers and Relat...

MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...

METHODS OF TREATING A SEMICONDUCTOR SUBSTRATE AND APPARATUS

PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...

ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING C...

FILM-FORMING DEVICE

SHUTTER SYSTEM FOR GAP-FREE SHIELDING OF A COATING SOURCE, AND ASSO...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHODS FOR REDUCING PHOTORESIST AND CARBON ETCH RATES IN AN ICP PR...

METHODS AND SYSTEMS FOR DEPOSITING A LAYER

PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT

MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, MET...