Coating

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CPC
H01J2237/332

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/332Coating

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Inductive broad-band sensors for electromagnetic waves
- Patent number 12,272,532
- Issue date Apr 8, 2025
- COMET Technologies USA, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Station-to-station control of backside bow compensation deposition
- Patent number 12,272,608
- Issue date Apr 8, 2025
- Lam Research Corporation
- Yanhui Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resonant filter for solid state RF impedance matching network
- Patent number 12,272,522
- Issue date Apr 8, 2025
- ASM America, Inc.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma sources and plasma processing apparatus thereof
- Patent number 12,272,521
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus for coating of 3D-objects
- Patent number 12,272,525
- Issue date Apr 8, 2025
- EVATEC AG
- Stephan Voser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for monitoring semiconductor processes
- Patent number 12,266,552
- Issue date Apr 1, 2025
- Inficon, Inc.
- Matan Lapidot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for adjusting the gap between a wafer and a top p...
- Patent number 12,266,579
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chan Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma coating solid fuels and coated soli...
- Patent number 12,264,289
- Issue date Apr 1, 2025
- The United States of America as represented by the Secretary of the Army
- Shaun M. Debow
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 12,266,508
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,266,522
- Issue date Apr 1, 2025
- Kokusai Electric Corporation
- Kazuyuki Okuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,266,562
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Hajime Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for producing layers with improved uniformity in...
- Patent number 12,258,661
- Issue date Mar 25, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nano-coating protection method for electrical devices
- Patent number 12,252,789
- Issue date Mar 18, 2025
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for depositing a layer
- Patent number 12,255,053
- Issue date Mar 18, 2025
- ASM IP Holding B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ PECVD cap layer
- Patent number 12,252,782
- Issue date Mar 18, 2025
- Lam Research Corporation
- Jeremy David Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods to eliminate of deposition on wafer bevel and backside
- Patent number 12,255,054
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus
- Patent number 12,249,497
- Issue date Mar 11, 2025
- Samsung Display Co., Ltd.
- Hyun-Woo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon based depositions used for critical dimension control during...
- Patent number 12,249,514
- Issue date Mar 11, 2025
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical device improvement
- Patent number 12,249,489
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Yue Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,716
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,243,718
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-dimensional electronic component and method of manufacturing same
- Patent number 12,237,152
- Issue date Feb 25, 2025
- National Central University
- Ching-Yuan Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch feedback for control of upstream process
- Patent number 12,237,158
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 12,237,148
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support device
- Patent number 12,233,501
- Issue date Feb 25, 2025
- Tes Co., Ltd.
- Sang-Jean Jeon
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Selective deposition of material comprising silicon and oxygen usin...
- Patent number 12,227,835
- Issue date Feb 18, 2025
- ASM IP Holding B.V.
- Viraj Madhiwala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Housing, mobile terminal, and sputter coating apparatus
- Patent number 12,228,759
- Issue date Feb 18, 2025
- Huawei Technologies Co., Ltd.
- Peiling Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ARC REDUCTION AND RF CONTROL FOR ELECTROSTATIC CHUCKS IN SEMICONDUC...
- Publication number 20250116001
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Allison Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE WAFER EDGE UNIFORMITY
- Publication number 20250118539
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM
- Publication number 20250118578
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Ajith Karonnan Ramapurath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK LAYER AND FORMATION METHOD THEREOF
- Publication number 20250118569
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS AND DEVICE FOR DIAMOND SYNTHESIS BY CVD
- Publication number 20250115991
- Publication date Apr 10, 2025
- DIAROTECH
- Horacio TELLEZ OLIVA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING PROCESSING METHOD AND ETCHING PROCESSING APPARATUS
- Publication number 20250112055
- Publication date Apr 3, 2025
- HITACHI HIGH-TECH CORPORATION
- Nobuya MIYOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROC...
- Publication number 20250112076
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING CARBON-CONTAINING FILM
- Publication number 20250112036
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave Capillary Nanodiamond Reactor
- Publication number 20250101577
- Publication date Mar 27, 2025
- Board of Trustees of Michigan State University
- Tanvi NIKHAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...
- Publication number 20250101580
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Tu HONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Device
- Publication number 20250104974
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SEMICONDUCTOR PROCESSING
- Publication number 20250105002
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Hunter Frost
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250095981
- Publication date Mar 20, 2025
- Hitachi High-Tech Corporation
- Jiahui LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PARTICLE CONTROL IN MRAM PROCESSING
- Publication number 20250095975
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Han KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS TRANSPORT SYSTEM
- Publication number 20250092892
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jheng-Syun LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF MATERIAL COMPRISING SILICON AND OXYGEN USIN...
- Publication number 20250092515
- Publication date Mar 20, 2025
- ASM IP HOLDING B.V.
- Viraj Madhiwala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR...
- Publication number 20250087509
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Jitae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC WAVE SUPPLY MECHANISM AND PLASMA PROCESSING APPARATUS
- Publication number 20250087463
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Mitsutoshi ASHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250084530
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Yohei MATSUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250084535
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT APPARATUS
- Publication number 20250079126
- Publication date Mar 6, 2025
- SHIBAURA MACHINE CO., LTD.
- Rintaro SUEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME
- Publication number 20250079230
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Ikuhisa MORIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PASSIVE LIFT PIN ASSEMBLY
- Publication number 20250079137
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Thomas BREZOCZKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION APPARATUS AND METHOD OF OPERATING THE SAME
- Publication number 20250079135
- Publication date Mar 6, 2025
- SAMSUNG DISPLAY CO., LTD.
- Jun Hyeuk KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IGNITION CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250079139
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250079134
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL
- Publication number 20250066913
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Supriya Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTILAYER COATING FOR CORROSION RESISTANCE
- Publication number 20250069857
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Amir H. Tavakoli
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20250069860
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Lun KE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE-AREA DOUBLE-FREQUENCY THIN FILM DEPOSITION METHOD AND APPARAT...
- Publication number 20250066919
- Publication date Feb 27, 2025
- SUZHOU MAXWELL TECHNOLOGIES CO., LTD.
- Dengzhi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Inductive broad-band sensors for electromagnetic waves

Station-to-station control of backside bow compensation deposition

Resonant filter for solid state RF impedance matching network

Plasma sources and plasma processing apparatus thereof

Sputtering apparatus for coating of 3D-objects

System and method for monitoring semiconductor processes

Method and system for adjusting the gap between a wafer and a top p...

Apparatus and method for plasma coating solid fuels and coated soli...

Plasma processing apparatus and method for venting a processing cha...

Substrate processing apparatus, method of manufacturing semiconduct...

Substrate processing method and substrate processing apparatus

Method and apparatus for revitalizing plasma processing tools

Device and method for producing layers with improved uniformity in...

Nano-coating protection method for electrical devices

Methods and systems for depositing a layer

In-situ PECVD cap layer

Methods to eliminate of deposition on wafer bevel and backside

Method for manufacturing semiconductor wafer with wafer chuck havin...

Sputtering apparatus

Carbon based depositions used for critical dimension control during...

Optical device improvement

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma generating device and process executing apparatus including...

Two-dimensional electronic component and method of manufacturing same

Etch feedback for control of upstream process

Plasma processing assembly using pulsed-voltage and radio-frequency...

Substrate support device

Selective deposition of material comprising silicon and oxygen usin...

Housing, mobile terminal, and sputter coating apparatus

Patents Applicationslast 30 patents

ARC REDUCTION AND RF CONTROL FOR ELECTROSTATIC CHUCKS IN SEMICONDUC...

METHOD TO IMPROVE WAFER EDGE UNIFORMITY

PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM

HARD MASK LAYER AND FORMATION METHOD THEREOF

PROCESS AND DEVICE FOR DIAMOND SYNTHESIS BY CVD

ETCHING PROCESSING METHOD AND ETCHING PROCESSING APPARATUS

GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROC...

METHOD OF FORMING CARBON-CONTAINING FILM

Microwave Capillary Nanodiamond Reactor

UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...

Plasma Processing Device

METHOD FOR SEMICONDUCTOR PROCESSING

PLASMA PROCESSING METHOD

SYSTEM AND METHOD FOR PARTICLE CONTROL IN MRAM PROCESSING

GAS TRANSPORT SYSTEM

SELECTIVE DEPOSITION OF MATERIAL COMPRISING SILICON AND OXYGEN USIN...

SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR...

ELECTROMAGNETIC WAVE SUPPLY MECHANISM AND PLASMA PROCESSING APPARATUS

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

SURFACE TREATMENT APPARATUS

WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME

PASSIVE LIFT PIN ASSEMBLY

DEPOSITION APPARATUS AND METHOD OF OPERATING THE SAME

IGNITION CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL

MULTILAYER COATING FOR CORROSION RESISTANCE

PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

LARGE-AREA DOUBLE-FREQUENCY THIN FILM DEPOSITION METHOD AND APPARAT...