Coaxial inlets for each gas

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    ADJUSTABLE CROSS-FLOW PROCESS CHAMBER LID

    • Publication number 20240247373
    • Publication date Jul 25, 2024
    • Applied Materials, Inc.
    • Muhannad Mustafa
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    CUTTING TOOL AND METHOD FOR MANUFACTURING THE SAME

    • Publication number 20230234141
    • Publication date Jul 27, 2023
    • Sumitomo Electric Industries, Ltd.
    • Haruko HARADA
    • B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
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    METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER WITH WAFER CHUCK HAVIN...

    • Publication number 20230197421
    • Publication date Jun 22, 2023
    • Taiwan Semiconductor Manufacturing Co., Ltd.
    • Sheng-Chun YANG
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    ATMOSPHERIC COLD PLASMA JET COATING AND SURFACE TREATMENT

    • Publication number 20230160067
    • Publication date May 25, 2023
    • Starfire Industires, LLC
    • Brian Edward Jurczyk
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    SUBSTRATE PROCESSING METHOD AND APPARATUS

    • Publication number 20230040728
    • Publication date Feb 9, 2023
    • ASM IP HOLDING B.V.
    • Akinori Nakano
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    GAS INLET DEVICE FOR A CVD REACTOR

    • Publication number 20230002902
    • Publication date Jan 5, 2023
    • AIXTRON SE
    • Martin EICKELKAMP
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    WALL-COOLED GAS-INLET ELEMENT FOR A CVD REACTOR

    • Publication number 20220396877
    • Publication date Dec 15, 2022
    • AIXTRON SE
    • Marcel KOLLBERG
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    METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER WITH WAFER CHUCK HAVIN...

    • Publication number 20220384239
    • Publication date Dec 1, 2022
    • Taiwan Semiconductor Manufacturing Co., Ltd.
    • Sheng-Chun YANG
    • H01 - BASIC ELECTRIC ELEMENTS
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    MANIFOLDS FOR UNIFORM VAPOR DEPOSITION

    • Publication number 20220349060
    • Publication date Nov 3, 2022
    • ASM IP HOLDING B.V.
    • David Marquardt
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    MANIFOLDS FOR UNIFORM VAPOR DEPOSITION

    • Publication number 20200248308
    • Publication date Aug 6, 2020
    • ASM IP HOLDING B.V.
    • David Marquardt
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    MONOLITHIC CERAMIC GAS DISTRIBUTION PLATE

    • Publication number 20190032211
    • Publication date Jan 31, 2019
    • LAM RESEARCH CORPORATION
    • Jeremy Tucker
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    GAS DISTRIBUTING INJECTOR APPLIED IN MOCVD REACTOR

    • Publication number 20170314131
    • Publication date Nov 2, 2017
    • HERMES-EPITEK CORPORATION
    • Po-Jung Lin
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    PROCESS CHAMBER FOR DIELECTRIC GAPFILL

    • Publication number 20170226637
    • Publication date Aug 10, 2017
    • Applied Materials, Inc.
    • Dmitry Lubomirsky
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    STACKABLE MULTI-PORT GAS NOZZLES

    • Publication number 20150176127
    • Publication date Jun 25, 2015
    • SILEVO, INC.
    • Steve Poppe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    SILICON CARBIDE CRYSTAL GROWTH IN A CVD REACTOR USING CHLORINATED C...

    • Publication number 20150013595
    • Publication date Jan 15, 2015
    • Erik Janzén
    • C30 - CRYSTAL GROWTH
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    PROCESS CHAMBER FOR DIELECTRIC GAPFILL

    • Publication number 20140083362
    • Publication date Mar 27, 2014
    • Applied Materials, Inc.
    • Dmitry Lubomirsky
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    Thin film processing equipment and the processing method thereof

    • Publication number 20130071567
    • Publication date Mar 21, 2013
    • Ying-Shih HSIAO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    MULTI-GAS CENTRALLY COOLED SHOWERHEAD DESIGN

    • Publication number 20130052804
    • Publication date Feb 28, 2013
    • Applied Materials, Imn,
    • Eddy J. Song
    • B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
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    DEPOSITION SOURCE ASSEMBLY, ORGANIC LAYER DEPOSITION APPARATUS, AND...

    • Publication number 20130032829
    • Publication date Feb 7, 2013
    • Un-Cheol Sung
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    FLUID BED REACTOR

    • Publication number 20120263874
    • Publication date Oct 18, 2012
    • E. Wayne Osborne
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    ELECTRODE HAVING GAS DISCHARGE FUNCTION AND PLASMA PROCESSING APPAR...

    • Publication number 20120247673
    • Publication date Oct 4, 2012
    • TOKYO ELECTRON LIMITED
    • Daisuke HAYASHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    Apparatus and Process for Atomic Layer Deposition

    • Publication number 20120225203
    • Publication date Sep 6, 2012
    • Applied Materials, Inc.
    • Joseph Yudovsky
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    Apparatus And Process For Atomic Layer Deposition

    • Publication number 20120225219
    • Publication date Sep 6, 2012
    • Applied Materials, Inc.
    • Joseph Yudovsky
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    FILM FORMING APPARATUS

    • Publication number 20120180727
    • Publication date Jul 19, 2012
    • TOKYO ELECTRON LIMITED
    • Harunari HASEGAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    METHOD FOR FORMING AN ALUMINUM NITRIDE THIN FILM

    • Publication number 20120100698
    • Publication date Apr 26, 2012
    • Shin-Etsu Chemical Co., Ltd.
    • Koji Kato
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    PROCESS CHAMBER FOR DIELECTRIC GAPFILL

    • Publication number 20120073501
    • Publication date Mar 29, 2012
    • Applied Materials, Inc.
    • Dmitry Lubomirsky
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    SHOWERHEAD FOR FILM DEPOSITING VACUUM EQUIPMENT

    • Publication number 20120067971
    • Publication date Mar 22, 2012
    • Korea Institute of Industrial Tedhnology
    • Chulsoo Byun
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    MULTIPLE SECTION SHOWERHEAD ASSEMBLY

    • Publication number 20120064698
    • Publication date Mar 15, 2012
    • Applied Materials, Inc.
    • Donald J.K. Olgado
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    Plasma Processing Chamber with Dual Axial Gas Injection and Exhaust

    • Publication number 20120034786
    • Publication date Feb 9, 2012
    • LAM RESEARCH CORPORATION
    • Rajinder Dhindsa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    METHODS FOR ENHANCED PROCESSING CHAMBER CLEANING

    • Publication number 20120000490
    • Publication date Jan 5, 2012
    • Applied Materials, Inc.
    • HUA CHUNG
    • B08 - CLEANING