Coiled antennas

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CPC
H05H2001/4667

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HELECTRICITY H05Electric techniques H05HPLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS

Current Industry

H05H2001/4667Coiled antennas

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Inductive coil structure and inductively coupled plasma generation...
- Patent number 10,896,806
- Issue date Jan 19, 2021
- EN2CORE technology, Inc.
- Sae Hoon Uhm
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Muscle optimization device and method
- Patent number 10,888,707
- Issue date Jan 12, 2021
- GENOVUS BIOTECHNOLOGIES INC.
- Kimberly S. Gangwish
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Device intrinsically designed to resonate, suitable for RF power tr...
- Patent number 10,879,043
- Issue date Dec 29, 2020
- Antonio Franco Selmo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for reducing radioactive nuclear waste and toxic waste vo...
- Patent number 10,847,277
- Issue date Nov 24, 2020
- PlasmaNano Corporation
- Jaeyoung Park
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Symmetrical plural-coil plasma source with side RF feeds and RF dis...
- Patent number 10,811,226
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma generator
- Patent number 10,798,809
- Issue date Oct 6, 2020
- SHIMADZU COPORATION
- Hidemiki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for modifying and enhancing pyrotechnic emissio...
- Patent number 10,760,881
- Issue date Sep 1, 2020
- The United States of America, as represented by the Secretary of the Navy
- Eric J Miklaszewski
- F42 - AMMUNITION BLASTING
Information Patent Grant
Method and apparatus for gas abatement
- Patent number 10,757,797
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Rongping Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma apparatus
- Patent number 10,720,308
- Issue date Jul 21, 2020
- SPTS Technologies Limited
- Paul Bennett
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System, method and apparatus for an inductively coupled plasma arc...
- Patent number 10,638,592
- Issue date Apr 28, 2020
- Foret Plasma Labs, LLC
- Todd Foret
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Self-neutralized radio frequency plasma ion source
- Patent number 10,573,495
- Issue date Feb 25, 2020
- DENTON VACUUM, LLC
- Craig A. Outten
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma accelerating apparatus and plasma accelerating method
- Patent number 10,539,122
- Issue date Jan 21, 2020
- Mitsubishi Heavy Industries, Ltd.
- Takuya Yamazaki
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Grant
Inductive coil structure and inductively coupled plasma generation...
- Patent number 10,541,114
- Issue date Jan 21, 2020
- EN2CORE technology, Inc.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing systems including side coils and methods related...
- Patent number 10,340,121
- Issue date Jul 2, 2019
- Lam Research Corporation
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radical generator and molecular beam epitaxy apparatus
- Patent number 10,312,054
- Issue date Jun 4, 2019
- National University Corporation Nagoya University
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced plasma source for a plasma reactor
- Patent number 10,290,469
- Issue date May 14, 2019
- Applied Materials, Inc.
- Valentin N. Todorow
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High efficiency triple-coil inductively coupled plasma source with...
- Patent number 10,271,416
- Issue date Apr 23, 2019
- Applied Materials, Inc.
- Samer Banna
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
MPD thruster that accelerates electrodeless plasma and electrodeles...
- Patent number 10,260,487
- Issue date Apr 16, 2019
- Mitsubishi Heavy Industries, Ltd.
- Takuya Yamazaki
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Grant
Symmetrical inductively coupled plasma source with coaxial RF feed...
- Patent number 10,249,470
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Jason A. Kenney
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Near-substrate supplemental plasma density generation with low bias...
- Patent number 10,242,845
- Issue date Mar 26, 2019
- Lam Research Corporation
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for gas abatement
- Patent number 10,187,966
- Issue date Jan 22, 2019
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,170,284
- Issue date Jan 1, 2019
- Tokyo Electron Limited
- Kenta Yasuda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multiple coil inductively coupled plasma source with offset frequen...
- Patent number 10,170,279
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Jason A. Kenney
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,115,565
- Issue date Oct 30, 2018
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Antenna and plasma processing apparatus
- Patent number 10,083,819
- Issue date Sep 25, 2018
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,074,545
- Issue date Sep 11, 2018
- Tokyo Electron Limited
- Takashi Kondo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Melting glass materials using RF plasma
- Patent number 10,059,614
- Issue date Aug 28, 2018
- Corning Incorporated
- Daniel Robert Boughton
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Remote plasma system and method
- Patent number 10,011,532
- Issue date Jul 3, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fei-Fan Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Toroidal plasma abatement apparatus and method
- Patent number 9,991,098
- Issue date Jun 5, 2018
- MKS Instruments, Inc.
- Xing Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma source with symmetrical RF feed
- Patent number 9,928,987
- Issue date Mar 27, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...
- Publication number 20210142981
- Publication date May 13, 2021
- EN2CORE technology, Inc
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL SYSTEM AND PLASMA CONTROL SYSTEM PROGRAM
- Publication number 20210022236
- Publication date Jan 21, 2021
- NISSIN ELECTRIC CO., LTD.
- Tsubasa IWAKOKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20200168434
- Publication date May 28, 2020
- Kokusai Electric Corporation
- Masaki MUROBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...
- Publication number 20200111641
- Publication date Apr 9, 2020
- EN2CORE technology, Inc
- Sae Hoon Uhm
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA APPARATUS
- Publication number 20200058466
- Publication date Feb 20, 2020
- SPTS TECHNOLOGIES LIMITED
- PAUL BENNETT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
INDUCTIVELY COUPLED PLASMA GENERATOR
- Publication number 20200022244
- Publication date Jan 16, 2020
- Shimadzu Corporation
- Hidemiki HAYASHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR GAS ABATEMENT
- Publication number 20190246481
- Publication date Aug 8, 2019
- Applied Materials, Inc.
- Rongping WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190098740
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
A DEVICE INTRINSICALLY DESIGNED TO RESONATE, SUITABLE FOR RF POWER...
- Publication number 20180269035
- Publication date Sep 20, 2018
- Antonio Franco SELMO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TOROIDAL PLASMA ABATEMENT APPARATUS AND METHOD
- Publication number 20180233333
- Publication date Aug 16, 2018
- MKS Instruments, Inc.
- Xing Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED AND REAC...
- Publication number 20180218873
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH SYMMETRICAL RF FEED
- Publication number 20180211811
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of CVD Plasma Processing with a Toroidal Plasma Processing A...
- Publication number 20180155839
- Publication date Jun 7, 2018
- PLASMABILITY, LLC
- William Holber
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Dis...
- Publication number 20180138014
- Publication date May 17, 2018
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTERNAL PLASMA SYSTEM
- Publication number 20180130639
- Publication date May 10, 2018
- Michael Nicholas Vranich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...
- Publication number 20180122619
- Publication date May 3, 2018
- EN2CORE technology, Inc
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SURFACE DECONTAMINATION: METHOD AND APPARATUS FOR REDUCING R...
- Publication number 20180096745
- Publication date Apr 5, 2018
- PlasmaNano Corporation
- Jaeyoung Park
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD AND APPARATUS FOR GENERATING HIGHLY REPETITIVE PULSED PLASMAS
- Publication number 20170311431
- Publication date Oct 26, 2017
- PlasmaNano Corporation
- Jaeyoung Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Toroidal Plasma Processing Apparatus
- Publication number 20170298513
- Publication date Oct 19, 2017
- PLASMABILITY, LLC
- William Holber
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Method for Sintering Proppants
- Publication number 20170257937
- Publication date Sep 7, 2017
- Foret Plasma labs, LLC
- Todd Foret
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MPD THRUSTER THAT ACCELERATES ELECTRODELESS PLASMA AND ELECTRODELES...
- Publication number 20170198683
- Publication date Jul 13, 2017
- Mitsubishi Heavy Industries, Ltd.
- Takuya YAMAZAKI
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Application
PLASMA ACCELERATING APPARATUS AND PLASMA ACCELERATING METHOD
- Publication number 20170152840
- Publication date Jun 1, 2017
- Mitsubishi Heavy Industries, Ltd.
- Takuya YAMAZAKI
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Application
Plasma Processing Apparatus and Coil Used Therein
- Publication number 20160358748
- Publication date Dec 8, 2016
- SPP TECHNOLOGIES CO., LTD.
- Toshihiro Hayami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20160240346
- Publication date Aug 18, 2016
- Hitachi High-Technologies Corporation
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING APPARATUS AND ON-LIQUID MELTING METHOD
- Publication number 20160157331
- Publication date Jun 2, 2016
- PLUSWARE CORPORATION
- Yasuyuki Matsumaru
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE
- Publication number 20160150629
- Publication date May 26, 2016
- SEMES CO., LTD.
- Yong Kwan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE
- Publication number 20160150628
- Publication date May 26, 2016
- SEMES CO., LTD.
- Yong Kwan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID PLASMA SOURCE
- Publication number 20150342020
- Publication date Nov 26, 2015
- KING ABDULAZIZ CITY FOR SCIENCE AND TECHNOLOGY
- Ahmed M. HALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Generator
- Publication number 20150271907
- Publication date Sep 24, 2015
- Jack Hunt
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ENHANCED PLASMA SOURCE FOR A PLASMA REACTOR
- Publication number 20140367046
- Publication date Dec 18, 2014
- Applied Materials, Inc.
- Valentin N. TODOROW
- H01 - BASIC ELECTRIC ELEMENTS

Coiled antennas

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Inductive coil structure and inductively coupled plasma generation...

Muscle optimization device and method

Device intrinsically designed to resonate, suitable for RF power tr...

Apparatus for reducing radioactive nuclear waste and toxic waste vo...

Symmetrical plural-coil plasma source with side RF feeds and RF dis...

Inductively coupled plasma generator

Systems and methods for modifying and enhancing pyrotechnic emissio...

Method and apparatus for gas abatement

Plasma apparatus

System, method and apparatus for an inductively coupled plasma arc...

Self-neutralized radio frequency plasma ion source

Plasma accelerating apparatus and plasma accelerating method

Inductive coil structure and inductively coupled plasma generation...

Plasma processing systems including side coils and methods related...

Radical generator and molecular beam epitaxy apparatus

Enhanced plasma source for a plasma reactor

High efficiency triple-coil inductively coupled plasma source with...

MPD thruster that accelerates electrodeless plasma and electrodeles...

Symmetrical inductively coupled plasma source with coaxial RF feed...

Near-substrate supplemental plasma density generation with low bias...

Method and apparatus for gas abatement

Plasma processing method and plasma processing apparatus

Multiple coil inductively coupled plasma source with offset frequen...

Plasma processing apparatus and plasma processing method

Antenna and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Melting glass materials using RF plasma

Remote plasma system and method

Toroidal plasma abatement apparatus and method

Inductively coupled plasma source with symmetrical RF feed

Patents Applicationslast 30 patents

INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...

PLASMA CONTROL SYSTEM AND PLASMA CONTROL SYSTEM PROGRAM

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...

PLASMA APPARATUS

INDUCTIVELY COUPLED PLASMA GENERATOR

METHOD AND APPARATUS FOR GAS ABATEMENT

PLASMA PROCESSING APPARATUS

A DEVICE INTRINSICALLY DESIGNED TO RESONATE, SUITABLE FOR RF POWER...

TOROIDAL PLASMA ABATEMENT APPARATUS AND METHOD

INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED AND REAC...

PLASMA SOURCE WITH SYMMETRICAL RF FEED

Method of CVD Plasma Processing with a Toroidal Plasma Processing A...

Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Dis...

EXTERNAL PLASMA SYSTEM

INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...

PLASMA SURFACE DECONTAMINATION: METHOD AND APPARATUS FOR REDUCING R...

METHOD AND APPARATUS FOR GENERATING HIGHLY REPETITIVE PULSED PLASMAS

Toroidal Plasma Processing Apparatus

Apparatus and Method for Sintering Proppants

MPD THRUSTER THAT ACCELERATES ELECTRODELESS PLASMA AND ELECTRODELES...

PLASMA ACCELERATING APPARATUS AND PLASMA ACCELERATING METHOD

Plasma Processing Apparatus and Coil Used Therein

PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS

PLASMA GENERATING APPARATUS AND ON-LIQUID MELTING METHOD

ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE

ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE

HYBRID PLASMA SOURCE

Plasma Generator

ENHANCED PLASMA SOURCE FOR A PLASMA REACTOR