combining dry and wet cleaning steps

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CPC
H01L21/02054

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02054combining dry and wet cleaning steps

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for wafer backside polishing
- Patent number 12,131,896
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Kei-Wei Chen
- B08 - CLEANING
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,034,061
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rinse process after forming fin-shaped structure
- Patent number 11,735,646
- Issue date Aug 22, 2023
- United Microelectronics Corp.
- Po-Chang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and storage m...
- Patent number 11,600,499
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Meitoku Aibara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drying apparatus, substrate processing system, and drying method
- Patent number 11,515,182
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Katsuhiro Morikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus and rec...
- Patent number 11,508,589
- Issue date Nov 22, 2022
- Tokyo Electron Limited
- Akiko Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing device
- Patent number 11,501,985
- Issue date Nov 15, 2022
- SCREEN Holdings Co., Ltd.
- Koji Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a monocrystalline structure
- Patent number 11,380,543
- Issue date Jul 5, 2022
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Pierre-Edouard Raynal
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for forming fin field effect transistor device structure
- Patent number 11,271,096
- Issue date Mar 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,177,124
- Issue date Nov 16, 2021
- SCREEN Holdings Co., Ltd.
- Manabu Okutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gallium arsenide substrate comprising a surface oxide layer with im...
- Patent number 11,170,989
- Issue date Nov 9, 2021
- Freiberger Compound Materials GmbH
- Wolfram Fliegel
- G01 - MEASURING TESTING
Information Patent Grant
Sub-nanometer-level substrate cleaning mechanism
- Patent number 10,985,039
- Issue date Apr 20, 2021
- Planar Semiconductor, Inc.
- Rubinder S. Randhawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determination method and substrate processing equipment
- Patent number 10,985,038
- Issue date Apr 20, 2021
- SCREEN Holdings Co., Ltd.
- Hideji Naohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drying high aspect ratio features
- Patent number 10,971,354
- Issue date Apr 6, 2021
- Applied Materials, Inc.
- Eric J. Bergman
- B08 - CLEANING
Information Patent Grant
Composition for semiconductor process and semiconductor process
- Patent number 10,968,390
- Issue date Apr 6, 2021
- SKC Co., Ltd.
- Byoungsoo Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate processing method and substrate processing device
- Patent number 10,964,558
- Issue date Mar 30, 2021
- SCREEN Holdings Co., Ltd.
- Koji Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rinse process after forming fin-shaped structure
- Patent number 10,868,148
- Issue date Dec 15, 2020
- United Microelectronics Corp.
- Po-Chang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating layer structure for semiconductor product, and preparati...
- Patent number 10,748,989
- Issue date Aug 18, 2020
- Shenyang Silicon Technology Co., Ltd.
- Wenlin Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method and mem...
- Patent number 10,707,098
- Issue date Jul 7, 2020
- Tokyo Electron Limited
- Hiroshi Marumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus having cooling member
- Patent number 10,679,845
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Hiroaki Inadomi
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,576,493
- Issue date Mar 3, 2020
- Tokyo Electron Limited
- Keisuke Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning, passivation and functionalization of Si—Ge sem...
- Patent number 10,483,097
- Issue date Nov 19, 2019
- The Regents of the University of California
- Tobin Kaufman-Osborn
- B08 - CLEANING
Information Patent Grant
Process for producing a gallium arsenide substrate which includes m...
- Patent number 10,460,924
- Issue date Oct 29, 2019
- Freiberger Compound Materials GmbH
- Wolfram Fliegel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for reducing contamination for reliable bond pads
- Patent number 10,410,854
- Issue date Sep 10, 2019
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Honghui Mou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method and system using atmospheric pressure ato...
- Patent number 10,249,509
- Issue date Apr 2, 2019
- Tokyo Electron Limited
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus, processing method, and manufacturing method o...
- Patent number 10,242,861
- Issue date Mar 26, 2019
- Kabushiki Kaisha Toshiba
- Katsuhiro Sato
- B08 - CLEANING
Information Patent Grant
Substrate drying apparatus, substrate drying method and control pro...
- Patent number 10,008,380
- Issue date Jun 26, 2018
- Ebara Corporation
- Tomoatsu Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for rinsing and drying substrates
- Patent number 9,984,867
- Issue date May 29, 2018
- Applied Materials, Inc.
- Ekaterina Mikhaylichenko
- B08 - CLEANING
Information Patent Grant
Backside polisher with dry frontside design and method using the same
- Patent number 9,865,477
- Issue date Jan 9, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for in-situ dry cleaning, passivation and functionalization...
- Patent number 9,818,599
- Issue date Nov 14, 2017
- The Regents of the University of California
- Tobin Kaufman-Osborn
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR WAFER BACKSIDE POLISHING
- Publication number 20240387162
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- KEI-WEI CHEN
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBLIMATION DRYING PROCESSING AGENT
- Publication number 20240290608
- Publication date Aug 29, 2024
- SCREEN Holdings Co., Ltd.
- Yu YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RINSE PROCESS AFTER FORMING FIN-SHAPED STRUCTURE
- Publication number 20230335622
- Publication date Oct 19, 2023
- UNITED MICROELECTRONICS CORP.
- Po-Chang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR WAFER BACKSIDE POLISHING
- Publication number 20230064958
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- KEI-WEI CHEN
- B08 - CLEANING
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20220190139
- Publication date Jun 16, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Wei LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GALLIUM ARSENIDE SUBSTRATE COMPRISING A SURFACE OXIDE LAYER WITH IM...
- Publication number 20220028682
- Publication date Jan 27, 2022
- FREIBERGER COMPOUND MATERIALS GMBH
- Wolfram FLIEGEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS,...
- Publication number 20220013367
- Publication date Jan 13, 2022
- Toshiba Memory Corporation
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING FIN FIELD EFFECT TRANSISTOR DEVICE STRUCTURE
- Publication number 20210313443
- Publication date Oct 7, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Wei LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND STORAGE M...
- Publication number 20210265180
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Meitoku AIBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20210151334
- Publication date May 20, 2021
- SCREEN Holdings Co., Ltd.
- Koji HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20210057551
- Publication date Feb 25, 2021
- UNITED MICROELECTRONICS CORP.
- Po-Chang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRYING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND DRYING METHOD
- Publication number 20200365425
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Katsuhiro MORIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A MONOCRYSTALLINE STRUCTURE
- Publication number 20200194259
- Publication date Jun 18, 2020
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Pierre-Edouard RAYNAL
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20200135899
- Publication date Apr 30, 2020
- UNITED MICROELECTRONICS CORP.
- Po-Chang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUB-NANOMETER-LEVEL SUBSTRATE CLEANING MECHANISM
- Publication number 20190371629
- Publication date Dec 5, 2019
- Planar Semiconductor, Inc.
- Rubinder S. Randhawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCESS
- Publication number 20190276740
- Publication date Sep 12, 2019
- SKC CO., LTD.
- Byoungsoo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATING LAYER STRUCTURE FOR SEMICONDUCTOR PRODUCT, AND PREPARATI...
- Publication number 20190237540
- Publication date Aug 1, 2019
- Shenyang Silicon Technology Co., Ltd.
- Wenlin GAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190237322
- Publication date Aug 1, 2019
- SCREEN Holdings Co., Ltd.
- Manabu OKUTANI
- B08 - CLEANING
Information Patent Application
METHOD AND DEVICE FOR REDUCING CONTAMINATION FOR RELIABLE BOND PADS
- Publication number 20190206676
- Publication date Jul 4, 2019
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Honghui MOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINATION METHOD AND SUBSTRATE PROCESSING EQUIPMENT
- Publication number 20190172732
- Publication date Jun 6, 2019
- SCREEN Holdings Co., Ltd.
- Hideji NAOHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING LIQUID CRYSTAL PANEL
- Publication number 20190108996
- Publication date Apr 11, 2019
- Sharp Kabushiki Kaisha
- KOHSHIROH TANIIKE
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20190035652
- Publication date Jan 31, 2019
- SCREEN Holdings Co., Ltd.
- Koji HASHIMOTO
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING A HYBRID SUBSTRATE
- Publication number 20180330982
- Publication date Nov 15, 2018
- Nanyang Technological University
- Kwang Hong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180264504
- Publication date Sep 20, 2018
- TOKYO ELECTRON LIMITED
- Keisuke Egashira
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
GALLIUM ARSENIDE SUBSTRATE AND USE THEREOF
- Publication number 20180158673
- Publication date Jun 7, 2018
- FREIBERGER COMPOUND MATERIALS GMBH
- Wolfram FLIEGEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING, PASSIVATION AND FUNCTIONALIZATION OF SI-GE SEM...
- Publication number 20180138030
- Publication date May 17, 2018
- The Regents of the University of California
- Tobin Kaufman-Osborn
- B08 - CLEANING
Information Patent Application
Backside Polisher with Dry Frontside Design and Method Using The Same
- Publication number 20180138052
- Publication date May 17, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRYING HIGH ASPECT RATIO FEATURES
- Publication number 20180019119
- Publication date Jan 18, 2018
- Applied Materials Inc,
- Eric J. Bergman
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND MEM...
- Publication number 20170278725
- Publication date Sep 28, 2017
- TOKYO ELECTRON LIMITED
- Hiroshi MARUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20170256398
- Publication date Sep 7, 2017
- TOKYO ELECTRON LIMITED
- Hiroaki Inadomi
- B08 - CLEANING

combining dry and wet cleaning steps

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for wafer backside polishing

Method for forming semiconductor structure

Rinse process after forming fin-shaped structure

Substrate cleaning method, substrate cleaning system, and storage m...

Drying apparatus, substrate processing system, and drying method

Substrate processing method, substrate processing apparatus and rec...

Substrate processing method and substrate processing device

Method for fabricating a monocrystalline structure

Method for forming fin field effect transistor device structure

Substrate processing method and substrate processing apparatus

Gallium arsenide substrate comprising a surface oxide layer with im...

Sub-nanometer-level substrate cleaning mechanism

Determination method and substrate processing equipment

Drying high aspect ratio features

Composition for semiconductor process and semiconductor process

Substrate processing method and substrate processing device

Rinse process after forming fin-shaped structure

Insulating layer structure for semiconductor product, and preparati...

Substrate processing apparatus, substrate processing method and mem...

Substrate processing apparatus having cooling member

Substrate processing apparatus and substrate processing method

Method for cleaning, passivation and functionalization of Si—Ge sem...

Process for producing a gallium arsenide substrate which includes m...

Method and device for reducing contamination for reliable bond pads

Substrate cleaning method and system using atmospheric pressure ato...

Processing apparatus, processing method, and manufacturing method o...

Substrate drying apparatus, substrate drying method and control pro...

Systems and methods for rinsing and drying substrates

Backside polisher with dry frontside design and method using the same

Method for in-situ dry cleaning, passivation and functionalization...

Patents Applicationslast 30 patents

METHOD FOR WAFER BACKSIDE POLISHING

SUBSTRATE PROCESSING METHOD AND SUBLIMATION DRYING PROCESSING AGENT

RINSE PROCESS AFTER FORMING FIN-SHAPED STRUCTURE

METHOD FOR WAFER BACKSIDE POLISHING

METHOD FOR FORMING SEMICONDUCTOR STRUCTURE

GALLIUM ARSENIDE SUBSTRATE COMPRISING A SURFACE OXIDE LAYER WITH IM...

PLASMA TREATMENT APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS,...

METHOD FOR FORMING FIN FIELD EFFECT TRANSISTOR DEVICE STRUCTURE

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND STORAGE M...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

DRYING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND DRYING METHOD

METHOD FOR FABRICATING A MONOCRYSTALLINE STRUCTURE

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SUB-NANOMETER-LEVEL SUBSTRATE CLEANING MECHANISM

COMPOSITION FOR SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCESS

INSULATING LAYER STRUCTURE FOR SEMICONDUCTOR PRODUCT, AND PREPARATI...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD AND DEVICE FOR REDUCING CONTAMINATION FOR RELIABLE BOND PADS

DETERMINATION METHOD AND SUBSTRATE PROCESSING EQUIPMENT

METHOD OF PRODUCING LIQUID CRYSTAL PANEL

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

METHOD OF MANUFACTURING A HYBRID SUBSTRATE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

GALLIUM ARSENIDE SUBSTRATE AND USE THEREOF

METHOD FOR CLEANING, PASSIVATION AND FUNCTIONALIZATION OF SI-GE SEM...

Backside Polisher with Dry Frontside Design and Method Using The Same

DRYING HIGH ASPECT RATIO FEATURES

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND MEM...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...