Compounds having one or more tin-oxygen linkages

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CPC
C07F7/2224

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CCHEMISTRY METALLURGY C07Organic chemistry C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM C07F7/00Compounds containing elements of the 4th Group of the Periodic System

Current Industry

C07F7/2224Compounds having one or more tin-oxygen linkages

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor photoresist composition, method for preparing thereof...
- Patent number 12,242,189
- Issue date Mar 4, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Organometallic tin compounds as EUV photoresist
- Patent number 12,195,487
- Issue date Jan 14, 2025
- Feng Lu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Hydroximic acid-metal hydroxide coordination complex and preparatio...
- Patent number 12,180,236
- Issue date Dec 31, 2024
- Central South University
- Yuehua Hu
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Grant
Monoalkyl tin compounds with low polyalkyl contamination, their com...
- Patent number 12,180,240
- Issue date Dec 31, 2024
- Inpria Corporation
- Joseph B. Edson
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,158,699
- Issue date Dec 3, 2024
- Samsung SDI Co., Ltd.
- Changsoo Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin clusters, solutions of organotin clusters, and applicatio...
- Patent number 12,129,271
- Issue date Oct 29, 2024
- Inpria Corporation
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tin dodecamers and radiation patternable coatings with strong EUV a...
- Patent number 12,071,449
- Issue date Aug 27, 2024
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High purity tin compounds containing unsaturated substituent and me...
- Patent number 12,060,377
- Issue date Aug 13, 2024
- Gelest, Inc.
- Li Yang
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Reducing agents for atomic layer deposition
- Patent number 12,031,209
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,013,635
- Issue date Jun 18, 2024
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monoalkyl tin compounds with low polyalkyl contamination, their com...
- Patent number 11,897,906
- Issue date Feb 13, 2024
- Inpria Corporation
- Joseph B. Edson
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Organometallic tin compounds as EUV photoresist
- Patent number 11,827,659
- Issue date Nov 28, 2023
- Feng Lu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor resist composition, and method of forming patterns us...
- Patent number 11,789,361
- Issue date Oct 17, 2023
- Samsung SDI Co., Ltd.
- Kyung Soo Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic cluster photoresists for EUV lithography
- Patent number 11,767,336
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Kai Chang
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monoalkyl tin compounds with low polyalkyl contamination, their com...
- Patent number 11,673,903
- Issue date Jun 13, 2023
- Inpria Corporation
- Joseph B. Edson
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polycyclic aromatic compound
- Patent number 11,653,565
- Issue date May 16, 2023
- Kwansei Gakuin Educational Foundation
- Takuji Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Raw material for forming thin film by atomic layer deposition metho...
- Patent number 11,623,935
- Issue date Apr 11, 2023
- Adeka Corporation
- Atsushi Sakurai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 11,609,494
- Issue date Mar 21, 2023
- Samsung SDI Co., Ltd.
- Jaehyun Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Organometallic cluster photoresists for EUV lithography
- Patent number 11,579,531
- Issue date Feb 14, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Kai Chang
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor photoresist composition, and method of forming patter...
- Patent number 11,415,885
- Issue date Aug 16, 2022
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tin dodecamers and radiation patternable coatings with strong EUV a...
- Patent number 11,392,028
- Issue date Jul 19, 2022
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin clusters, solutions of organotin clusters, and applicatio...
- Patent number 11,098,070
- Issue date Aug 24, 2021
- Inpria Corporation
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor resist composition, and method of forming patterns us...
- Patent number 11,092,890
- Issue date Aug 17, 2021
- Samsung SDI Co., Ltd.
- Kyung Soo Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monoalkyl tin compounds with low polyalkyl contamination, their com...
- Patent number 10,975,109
- Issue date Apr 13, 2021
- Inpria Corporation
- Joseph B. Edson
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Metal precursor for making metal oxide
- Patent number 10,858,379
- Issue date Dec 8, 2020
- Korea Research Institute of Chemical Technology
- Bo Keun Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Monoalkyl tin compounds with low polyalkyl contamination, their com...
- Patent number 10,787,466
- Issue date Sep 29, 2020
- Inpria Corporation
- Joseph B. Edson
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polycyclic aromatic compound
- Patent number 10,686,141
- Issue date Jun 16, 2020
- Kwansei Gakuin Educational Foundation
- Takuji Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition containing naphthalocyanine derivative, photoelectric c...
- Patent number 10,297,766
- Issue date May 21, 2019
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Manabu Nakata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Paper coating material having environment-friendly, water-proof and...
- Patent number 10,184,067
- Issue date Jan 22, 2019
- REPAPER INC.
- Cheol Yoon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Stannous methanesulfonate solution with adjusted pH
- Patent number 10,174,433
- Issue date Jan 8, 2019
- Honeywell International Inc.
- Christian N. Werner
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Patents Applicationslast 30 patents

Information Patent Application
TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...
- Publication number 20250102909
- Publication date Mar 27, 2025
- INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY
- Hyun-Dam JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND...
- Publication number 20250102906
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Jinwon JEON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PH...
- Publication number 20250093772
- Publication date Mar 20, 2025
- Korea University Research and Business Foundation
- Chawon Koh
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250087495
- Publication date Mar 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Iwamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COM...
- Publication number 20250074931
- Publication date Mar 6, 2025
- Inpria Corporation
- Joseph B. Edson
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...
- Publication number 20250074930
- Publication date Mar 6, 2025
- INPRIA CORPORATION
- Alexander C. Marwitz
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250068066
- Publication date Feb 27, 2025
- Samsung SDI Co., Ltd.
- Young Keun KIM
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...
- Publication number 20250036023
- Publication date Jan 30, 2025
- The Research Foundation for the State University of New York
- Munsaf Ali
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...
- Publication number 20250020996
- Publication date Jan 16, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATIO...
- Publication number 20250011346
- Publication date Jan 9, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STANNOUS ALKOXIDES AND RELATED METHODS
- Publication number 20240425532
- Publication date Dec 26, 2024
- Entegris, Inc.
- David W. Ermert
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240402596
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF STABILIZATION
- Publication number 20240377729
- Publication date Nov 14, 2024
- Feng Lu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HIGH PURITY TIN COMPOUNDS CONTAINING UNSATURATED SUBSTITUENT AND ME...
- Publication number 20240376134
- Publication date Nov 14, 2024
- Gelest, Inc.
- Li YANG
- C07 - ORGANIC CHEMISTRY
Information Patent Application
TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV A...
- Publication number 20240376135
- Publication date Nov 14, 2024
- INPRIA CORPORATION
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANOTIN CLUSTER PHOTORESISTS AND STABILIZATION METHODS
- Publication number 20240353752
- Publication date Oct 24, 2024
- Feng Lu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240345478
- Publication date Oct 17, 2024
- Samsung SDI Co., Ltd.
- Soobin LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240295816
- Publication date Sep 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240255848
- Publication date Aug 1, 2024
- Samsung Electronics Co., Ltd.
- Chawon KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND...
- Publication number 20240239820
- Publication date Jul 18, 2024
- Samsung Electronics Co., Ltd.
- Sunghyun HAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20240231222
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Kyungoh KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL ORGANOTIN SILICATE COMPOUNDS, PREPARATION METHODS THEREOF AND...
- Publication number 20240228518
- Publication date Jul 11, 2024
- JSI Silicone Co.
- Yu Sun WON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
DIRECT SYNTHESIS OF ORGANOTIN ALKOXIDES
- Publication number 20240199658
- Publication date Jun 20, 2024
- INPRIA CORPORATION
- Robert E. Jilek
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COM...
- Publication number 20240182500
- Publication date Jun 6, 2024
- INPRIA CORPORATION
- Joseph B. Edson
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240176234
- Publication date May 30, 2024
- Samsung SDI Co., Ltd.
- Sangkyun IM
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERS...
- Publication number 20240168375
- Publication date May 23, 2024
- Samsung SDI Co., Ltd.
- Minyoung LEE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HIGH PURITY TIN COMPOUNDS CONTAINING UNSATURATED SUBSTITUENT AND ME...
- Publication number 20240158422
- Publication date May 16, 2024
- Gelest, Inc.
- Li YANG
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240134273
- Publication date Apr 25, 2024
- Samsung SDI Co., Ltd.
- Kyungsoo MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240116958
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IODOALKYL TIN COMPOUNDS AND PREPARATION METHODS THEREOF
- Publication number 20240116957
- Publication date Apr 11, 2024
- Gelest, Inc.
- Li YANG
- C07 - ORGANIC CHEMISTRY

Compounds having one or more tin-oxygen linkages

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor photoresist composition, method for preparing thereof...

Organometallic tin compounds as EUV photoresist

Hydroximic acid-metal hydroxide coordination complex and preparatio...

Monoalkyl tin compounds with low polyalkyl contamination, their com...

Semiconductor photoresist composition and method of forming pattern...

Organotin clusters, solutions of organotin clusters, and applicatio...

Tin dodecamers and radiation patternable coatings with strong EUV a...

High purity tin compounds containing unsaturated substituent and me...

Reducing agents for atomic layer deposition

Semiconductor photoresist composition and method of forming pattern...

Monoalkyl tin compounds with low polyalkyl contamination, their com...

Organometallic tin compounds as EUV photoresist

Semiconductor resist composition, and method of forming patterns us...

Organometallic cluster photoresists for EUV lithography

Monoalkyl tin compounds with low polyalkyl contamination, their com...

Polycyclic aromatic compound

Raw material for forming thin film by atomic layer deposition metho...

Semiconductor photoresist composition and method of forming pattern...

Organometallic cluster photoresists for EUV lithography

Semiconductor photoresist composition, and method of forming patter...

Tin dodecamers and radiation patternable coatings with strong EUV a...

Organotin clusters, solutions of organotin clusters, and applicatio...

Semiconductor resist composition, and method of forming patterns us...

Monoalkyl tin compounds with low polyalkyl contamination, their com...

Metal precursor for making metal oxide

Monoalkyl tin compounds with low polyalkyl contamination, their com...

Polycyclic aromatic compound

Composition containing naphthalocyanine derivative, photoelectric c...

Paper coating material having environment-friendly, water-proof and...

Stannous methanesulfonate solution with adjusted pH

Patents Applicationslast 30 patents

TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...

ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND...

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PH...

Compound For Forming Metal-Containing Film, Composition For Forming...

MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COM...

ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...

ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...

ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATIO...

STANNOUS ALKOXIDES AND RELATED METHODS

Compound For Forming Metal-Containing Film, Composition For Forming...

ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF STABILIZATION

HIGH PURITY TIN COMPOUNDS CONTAINING UNSATURATED SUBSTITUENT AND ME...

TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV A...

ORGANOTIN CLUSTER PHOTORESISTS AND STABILIZATION METHODS

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

Compound For Forming Metal-Containing Film, Composition For Forming...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND...

PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE

NOVEL ORGANOTIN SILICATE COMPOUNDS, PREPARATION METHODS THEREOF AND...

DIRECT SYNTHESIS OF ORGANOTIN ALKOXIDES

MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COM...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERS...

HIGH PURITY TIN COMPOUNDS CONTAINING UNSATURATED SUBSTITUENT AND ME...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

Compound For Forming Metal-Containing Film, Composition For Forming...

IODOALKYL TIN COMPOUNDS AND PREPARATION METHODS THEREOF