Computer and memory organisation

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CPC
H01J2237/31762

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31762Computer and memory organisation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, devices, and methods for aligning a particle beam and perf...
- Patent number 12,020,897
- Issue date Jun 25, 2024
- PDF Solutions, Inc.
- Indranil De
- G01 - MEASURING TESTING
Information Patent Grant
Systems, devices, and methods for aligning a particle beam and perf...
- Patent number 11,605,526
- Issue date Mar 14, 2023
- PDF Solutions, Inc.
- Indranil De
- G01 - MEASURING TESTING
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,545,339
- Issue date Jan 3, 2023
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,508,553
- Issue date Nov 22, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,476,086
- Issue date Oct 18, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection of buried features by backscattered particles
- Patent number 11,443,915
- Issue date Sep 13, 2022
- ASML Netherlands B.V.
- Joe Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for aligning a particle beam and performing a non-contact e...
- Patent number 11,328,899
- Issue date May 10, 2022
- PDF Solutions, Inc.
- Indranil De
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing of electron beam lithography system
- Patent number 10,804,066
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jensen Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,784,081
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,747,115
- Issue date Aug 18, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, charged particle beam writing apparatus, an...
- Patent number 10,714,312
- Issue date Jul 14, 2020
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,685,809
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing data generating method
- Patent number 10,685,435
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Shigehiro Hara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number RE47922
- Issue date Mar 31, 2020
- NuFlare Technology, Inc.
- Hideo Inoue
Information Patent Grant
Ebeam universal cutter
- Patent number 10,578,970
- Issue date Mar 3, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of creating writing data
- Patent number 10,503,860
- Issue date Dec 10, 2019
- NuFlare Technology, Inc.
- Shigehiro Hara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Generating method of drawing data and charged particle beam drawing...
- Patent number 10,445,450
- Issue date Oct 15, 2019
- NuFlare Technology, Inc.
- Shigehiro Hara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Data processing of electron beam lithography system
- Patent number 10,446,358
- Issue date Oct 15, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jensen Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 10,431,422
- Issue date Oct 1, 2019
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,191,376
- Issue date Jan 29, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diagnosis method, charged particle beam lithography apparatus, and...
- Patent number 10,109,454
- Issue date Oct 23, 2018
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,074,516
- Issue date Sep 11, 2018
- NuFlare Technology, Inc.
- Hironobu Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam three beam aperture array
- Patent number 10,067,416
- Issue date Sep 4, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment and registration targets for charged particle beam substr...
- Patent number 10,020,166
- Issue date Jul 10, 2018
- Kevin M. Monahan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Unidirectional metal on layer with ebeam
- Patent number 10,014,256
- Issue date Jul 3, 2018
- Intel Corporation
- Donald W. Nelson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus and multi-charged par...
- Patent number 9,953,800
- Issue date Apr 24, 2018
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for transferring pixel data for electron beam...
- Patent number 9,899,190
- Issue date Feb 20, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam three beam aperture array
- Patent number 9,897,908
- Issue date Feb 20, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 9,859,100
- Issue date Jan 2, 2018
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...
- Publication number 20240304414
- Publication date Sep 12, 2024
- PDF Solutions, Inc.
- Indranil DE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA GENERATION APPARATUS, DATA GENERATION METHOD, AND COMPUTER-REA...
- Publication number 20240105420
- Publication date Mar 28, 2024
- KIOXIA Corporation
- Katsuyoshi KODERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COVERAGE CALCULATING METHOD, CHARGED PARTICLE BEAM WRITING METHOD,...
- Publication number 20230369015
- Publication date Nov 16, 2023
- NuFlare Technology, Inc.
- Kenichi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...
- Publication number 20230282444
- Publication date Sep 7, 2023
- PDF Solutions, Inc.
- Indranil DE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...
- Publication number 20230260749
- Publication date Aug 17, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230056463
- Publication date Feb 23, 2023
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...
- Publication number 20220336187
- Publication date Oct 20, 2022
- PDF Solutions, Inc.
- Indranil DE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...
- Publication number 20210098229
- Publication date Apr 1, 2021
- Indranil DE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20200266033
- Publication date Aug 20, 2020
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION OF BURIED FEATURES BY BACKSCATTERED PARTICLES
- Publication number 20200243299
- Publication date Jul 30, 2020
- ASML NETHERLANDS B.V.
- Joe WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20200135428
- Publication date Apr 30, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Data Processing of Electron Beam Lithography System
- Publication number 20200043692
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Jensen Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20190198293
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING OF ELECTRON BEAM LITHOGRAPHY SYSTEM
- Publication number 20190139733
- Publication date May 9, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Jensen Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
- Publication number 20190121236
- Publication date Apr 25, 2019
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM THREE BEAM APERTURE ARRAY
- Publication number 20180143526
- Publication date May 24, 2018
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...
- Publication number 20180108513
- Publication date Apr 19, 2018
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20170309450
- Publication date Oct 26, 2017
- NuFlare Technology, Inc.
- Hironobu MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSIS METHOD, CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS, AND...
- Publication number 20170243714
- Publication date Aug 24, 2017
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA COMPRESSION FOR EBEAM THROUGHPUT
- Publication number 20170069509
- Publication date Mar 9, 2017
- Intel Corporation
- Donald W. NELSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...
- Publication number 20160260581
- Publication date Sep 8, 2016
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Electron Beam Lithography
- Publication number 20160141144
- Publication date May 19, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20160005569
- Publication date Jan 7, 2016
- NuFlare Technology, Inc.
- Hironobu MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING DATA CREATING METHOD, DRAWING APPARATUS, DRAWING METHOD, AN...
- Publication number 20150144807
- Publication date May 28, 2015
- Canon Kabushiki Kaisha
- Satoru Oishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM EXPOSURE APPARATUS AND METHOD OF DETECTING ERROR USIN...
- Publication number 20150102236
- Publication date Apr 16, 2015
- Samsung Electronics Co., Ltd.
- Sang Yong YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...
- Publication number 20140361193
- Publication date Dec 11, 2014
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140302443
- Publication date Oct 9, 2014
- Canon Kabushiki Kaisha
- Shinji OHISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM LITHOGRAPHY SYSTEMS AND METHODS INCLUDING TIME DIVISI...
- Publication number 20140268078
- Publication date Sep 18, 2014
- Ming-Zhang Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM LITHOGRAPHY DEVICE AND LITHOGRAPHIC METHOD
- Publication number 20140231668
- Publication date Aug 21, 2014
- PARAM CORPORATION
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
System and Method for Compressed Data Transmission in a Maskless Li...
- Publication number 20140097362
- Publication date Apr 10, 2014
- KLA-Tencor Corporation
- Allen M. Carroll
- B82 - NANO-TECHNOLOGY

Computer and memory organisation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-charged particle beam writing apparatus, and multi-charged pa...

Systems, devices, and methods for aligning a particle beam and perf...

Systems, devices, and methods for aligning a particle beam and perf...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Multi-beam writing method and multi-beam writing apparatus

Detection of buried features by backscattered particles

Methods for aligning a particle beam and performing a non-contact e...

Data processing of electron beam lithography system

Charged particle beam lithography apparatus and charged particle be...

Cross scan proximity correction with ebeam universal cutter

Data processing method, charged particle beam writing apparatus, an...

Charged particle beam lithography apparatus and charged particle be...

Drawing data generating method

Charged particle beam writing apparatus and charged particle beam w...

Ebeam universal cutter

Method of creating writing data

Generating method of drawing data and charged particle beam drawing...

Data processing of electron beam lithography system

Method and system for dimensional uniformity using charged particle...

Cross scan proximity correction with ebeam universal cutter

Diagnosis method, charged particle beam lithography apparatus, and...

Charged particle beam writing apparatus and charged particle beam w...

Ebeam three beam aperture array

Alignment and registration targets for charged particle beam substr...

Unidirectional metal on layer with ebeam

Multi-charged particle beam writing apparatus and multi-charged par...

Method and apparatus for transferring pixel data for electron beam...

Ebeam three beam aperture array

Method and system for dimensional uniformity using charged particle...

Patents Applicationslast 30 patents

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...

DATA GENERATION APPARATUS, DATA GENERATION METHOD, AND COMPUTER-REA...

COVERAGE CALCULATING METHOD, CHARGED PARTICLE BEAM WRITING METHOD,...

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...

OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

DETECTION OF BURIED FEATURES BY BACKSCATTERED PARTICLES

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

Data Processing of Electron Beam Lithography System

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

DATA PROCESSING OF ELECTRON BEAM LITHOGRAPHY SYSTEM

CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER

EBEAM THREE BEAM APERTURE ARRAY

METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

DIAGNOSIS METHOD, CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS, AND...

DATA COMPRESSION FOR EBEAM THROUGHPUT

METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...

Method and Apparatus for Electron Beam Lithography

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

DRAWING DATA CREATING METHOD, DRAWING APPARATUS, DRAWING METHOD, AN...

ELECTRON BEAM EXPOSURE APPARATUS AND METHOD OF DETECTING ERROR USIN...

MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

ELECTRON BEAM LITHOGRAPHY SYSTEMS AND METHODS INCLUDING TIME DIVISI...

ELECTRON BEAM LITHOGRAPHY DEVICE AND LITHOGRAPHIC METHOD

System and Method for Compressed Data Transmission in a Maskless Li...