Constructional aspects of the reactor

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CPC
H01J37/3411

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3411Constructional aspects of the reactor

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Vacuum system and method to deposit a compound layer
- Patent number 12,209,302
- Issue date Jan 28, 2025
- EVATEC AG
- Kai Wenz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for physical vapor deposition and method for forming a layer
- Patent number 12,191,127
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsin-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover with a sensor system for a configurable measuring system for...
- Patent number 12,183,561
- Issue date Dec 31, 2024
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection process kit to eliminate arcing and improve uniform g...
- Patent number 12,183,560
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Kirankumar Neelasandra Savandaiah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 12,094,699
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multicathode deposition system and methods
- Patent number 12,051,576
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Sanjay Bhat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-patterned sputter traps and methods of making
- Patent number 12,051,573
- Issue date Jul 30, 2024
- Honeywell International Inc.
- James L. Koch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit having tall deposition ring for PVD chamber
- Patent number 11,961,723
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- David Gunther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for reducing sputtering of a grounded shield...
- Patent number 11,915,917
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Alan Ritchie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and method for reducing arcing
- Patent number 11,885,008
- Issue date Jan 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Wei Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for depositing a material
- Patent number 11,875,980
- Issue date Jan 16, 2024
- Stephen R Burgess
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Internally divisible process chamber using a shutter disk assembly
- Patent number 11,830,710
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- John Joseph Mazzocco
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 11,810,770
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
DC magnetron sputtering
- Patent number 11,718,908
- Issue date Aug 8, 2023
- SPTS Technologies Limited
- Scott Haymore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus
- Patent number 11,608,555
- Issue date Mar 21, 2023
- Tokyo Electron Limited
- Manabu Nakagawasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support and thin-film deposition apparatus using the same
- Patent number 11,598,006
- Issue date Mar 7, 2023
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection process kit to eliminate arcing and improve uniform g...
- Patent number 11,600,477
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Kirankumar Neelasandra Savandaiah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and method for reducing arcing
- Patent number 11,578,402
- Issue date Feb 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Wei Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Internally divisible process chamber using a shutter disk assembly
- Patent number 11,545,347
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- John Joseph Mazzocco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon coating on hard shields
- Patent number 11,486,042
- Issue date Nov 1, 2022
- VIAVI Solutions Inc.
- Adam Andrew Preuss
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor memory device and semiconductor memory manufacturing...
- Patent number 11,444,122
- Issue date Sep 13, 2022
- Samsung Electronics Co., Ltd.
- Jae hoon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition (PVD) chamber with reduced arcing
- Patent number 11,393,665
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Chao Du
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composite plasma modulator for plasma chamber
- Patent number 11,367,591
- Issue date Jun 21, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Wen Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus
- Patent number 11,358,168
- Issue date Jun 14, 2022
- VisEra Technologies Company Limited
- Shao-Wei Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming apparatus and method for manufacturing magnetic record...
- Patent number 11,232,813
- Issue date Jan 25, 2022
- Sony Corporation
- Takashi Aizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-patterned sputter traps and methods of making
- Patent number 11,183,373
- Issue date Nov 23, 2021
- Honeywell International Inc.
- James L. Koch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cryogenically cooled rotatable electrostatic chuck
- Patent number 11,149,345
- Issue date Oct 19, 2021
- Applied Materials, Inc.
- Shardul Patel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,127,574
- Issue date Sep 21, 2021
- Shibaura Mechatronics Corporation
- Yoshio Kawamata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and method of forming film
- Patent number 11,056,323
- Issue date Jul 6, 2021
- ULVAC, Inc.
- Shinya Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Biased cover ring for a substrate processing system
- Patent number 11,049,701
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Adolph Miller Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER
- Publication number 20240242947
- Publication date Jul 18, 2024
- Applied Materials, Inc.
- David GUNTHER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING
- Publication number 20240183025
- Publication date Jun 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- PO-WEI WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...
- Publication number 20240186128
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Alan RITCHIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION APPARATUS
- Publication number 20230407458
- Publication date Dec 21, 2023
- SHIBAURA MECHATRONICS CORPORATION
- Yoji TAKIZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20230402271
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INJECTION PROCESS KIT TO ELIMINATE ARCING AND IMPROVE UNIFORM G...
- Publication number 20230187191
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Kirankumar Neelasandra SAVANDAIAH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING
- Publication number 20230183855
- Publication date Jun 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- PO-WEI WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING LAYER
- Publication number 20220344133
- Publication date Oct 27, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- HSIN-LIANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNALLY DIVISIBLE PROCESS CHAMBER USING A SHUTTER DISK ASSEMBLY
- Publication number 20220319822
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- John Joseph MAZZOCCO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERNALLY DIVISIBLE PROCESS CHAMBER USING A SHUTTER DISK ASSEMBLY
- Publication number 20220139684
- Publication date May 5, 2022
- John Joseph MAZZOCCO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-PATTERNED SPUTTER TRAPS AND METHODS OF MAKING
- Publication number 20220044918
- Publication date Feb 10, 2022
- Honeywell International Inc.
- James L. Koch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20220020577
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DC Magnetron Sputtering
- Publication number 20210246545
- Publication date Aug 12, 2021
- SPTS TECHNOLOGIES LIMITED
- SCOTT HAYMORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing System For Small Substrates
- Publication number 20210087671
- Publication date Mar 25, 2021
- Massachusetts Institute of Technology
- Mitchell David Hsing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND SEMICONDUCTOR MEMORY MANUFACTURING...
- Publication number 20200373352
- Publication date Nov 26, 2020
- Samsung Electronics Co., Ltd.
- Jae hoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...
- Publication number 20200357616
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Adolph Miller ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...
- Publication number 20200312640
- Publication date Oct 1, 2020
- Applied Materials, Inc.
- Alan RITCHIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20200161095
- Publication date May 21, 2020
- Applied Materials, Inc.
- Bharath SWAMINATHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION ( PVD) CHAMBER WITH REDUCED ARCING
- Publication number 20200051795
- Publication date Feb 13, 2020
- Applied Materials, Inc.
- CHAO DU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FO...
- Publication number 20190284685
- Publication date Sep 19, 2019
- Shincron Co., LTD
- Mitsuhiro Miyauchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE-PLACING STAGE AND MANUFACTURING METHOD THEREOF
- Publication number 20190228953
- Publication date Jul 25, 2019
- NHK SPRING CO., LTD.
- Toshihiro TACHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS AND METHOD OF OPERATING THE SAME
- Publication number 20190144992
- Publication date May 16, 2019
- Samsung Electronics Co., Ltd.
- Dong-Il Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-PATTERNED SPUTTER TRAPS AND METHODS OF MAKING
- Publication number 20190108988
- Publication date Apr 11, 2019
- HONEYWELL INTERNATIONAL INC.
- James L. Koch
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND SEMICONDUCTOR MEMORY MANUFACTURING...
- Publication number 20190051700
- Publication date Feb 14, 2019
- Samsung Electronics Co., Ltd.
- Jae hoon KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING APPARATUS AND METHOD FOR MANUFACTURING MAGNETIC RECORD...
- Publication number 20180366150
- Publication date Dec 20, 2018
- SONY CORPORATION
- Takashi AIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180286644
- Publication date Oct 4, 2018
- SHIBAURA MECHATRONICS CORPORATION
- Yoshio KAWAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180286645
- Publication date Oct 4, 2018
- SHIBAURA MECHATRONICS CORPORATION
- Yoshio KAWAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR VACUUM DEPOSITION ON A SUBSTRATE AND METHOD FOR MASKI...
- Publication number 20180258519
- Publication date Sep 13, 2018
- Applied Materials, Inc.
- John M. White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION METHOD USING BACKSIDE GAS COOLING OF WORK...
- Publication number 20180202040
- Publication date Jul 19, 2018
- TANGO SYSTEMS, INC.
- Ravi Mullapudi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20180197721
- Publication date Jul 12, 2018
- Applied Materials, Inc.
- Bharath SWAMINATHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Constructional aspects of the reactor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Vacuum system and method to deposit a compound layer

Apparatus for physical vapor deposition and method for forming a layer

Cover with a sensor system for a configurable measuring system for...

Gas injection process kit to eliminate arcing and improve uniform g...

Methods and apparatus for controlling ion fraction in physical vapo...

Multicathode deposition system and methods

Multi-patterned sputter traps and methods of making

Process kit having tall deposition ring for PVD chamber

Methods and apparatus for reducing sputtering of a grounded shield...

Film forming apparatus and method for reducing arcing

Method and apparatus for depositing a material

Internally divisible process chamber using a shutter disk assembly

Methods and apparatus for controlling ion fraction in physical vapo...

DC magnetron sputtering

Sputtering apparatus

Wafer support and thin-film deposition apparatus using the same

Gas injection process kit to eliminate arcing and improve uniform g...

Film forming apparatus and method for reducing arcing

Internally divisible process chamber using a shutter disk assembly

Silicon coating on hard shields

Semiconductor memory device and semiconductor memory manufacturing...

Physical vapor deposition (PVD) chamber with reduced arcing

Composite plasma modulator for plasma chamber

Coating apparatus

Film-forming apparatus and method for manufacturing magnetic record...

Multi-patterned sputter traps and methods of making

Cryogenically cooled rotatable electrostatic chuck

Plasma processing apparatus

Sputtering apparatus and method of forming film

Biased cover ring for a substrate processing system

Patents Applicationslast 30 patents

PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER

FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING

METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...

FILM FORMATION APPARATUS

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

GAS INJECTION PROCESS KIT TO ELIMINATE ARCING AND IMPROVE UNIFORM G...

FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING

METHOD FOR FORMING LAYER

INTERNALLY DIVISIBLE PROCESS CHAMBER USING A SHUTTER DISK ASSEMBLY

INTERNALLY DIVISIBLE PROCESS CHAMBER USING A SHUTTER DISK ASSEMBLY

MULTI-PATTERNED SPUTTER TRAPS AND METHODS OF MAKING

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

DC Magnetron Sputtering

Processing System For Small Substrates

SEMICONDUCTOR MEMORY DEVICE AND SEMICONDUCTOR MEMORY MANUFACTURING...

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...

METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...

METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE

PHYSICAL VAPOR DEPOSITION ( PVD) CHAMBER WITH REDUCED ARCING

THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FO...

SUBSTRATE-PLACING STAGE AND MANUFACTURING METHOD THEREOF

SPUTTERING APPARATUS AND METHOD OF OPERATING THE SAME

MULTI-PATTERNED SPUTTER TRAPS AND METHODS OF MAKING

SEMICONDUCTOR MEMORY DEVICE AND SEMICONDUCTOR MEMORY MANUFACTURING...

FILM-FORMING APPARATUS AND METHOD FOR MANUFACTURING MAGNETIC RECORD...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

APPARATUS FOR VACUUM DEPOSITION ON A SUBSTRATE AND METHOD FOR MASKI...

PHYSICAL VAPOR DEPOSITION METHOD USING BACKSIDE GAS COOLING OF WORK...

METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE