containing a fluorine compound

Industry

CPC
C09K13/08

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Parent Industries

CCHEMISTRY METALLURGY C09Paints, dyes C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE C09K13/00Etching, surface-brightening or pickling compositions

Current Industry

C09K13/08containing a fluorine compound

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing device and etching liquid
- Patent number 12,203,021
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Koukichi Hiroshiro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Formulations for high selective silicon nitride etch
- Patent number 12,203,022
- Issue date Jan 21, 2025
- Entegris, Inc.
- Daniela White
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Wet etching method
- Patent number 12,183,588
- Issue date Dec 31, 2024
- Semiconductor Manufacturing International (Shanghai) Corporation
- Tianyang Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etchant composition for semiconductor substrates
- Patent number 12,173,216
- Issue date Dec 24, 2024
- ENF Technology CO., LTD.
- Jeong Sik Oh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
MXene with excellent mechanical strength and fast and high-yield an...
- Patent number 12,173,215
- Issue date Dec 24, 2024
- Korea Institute of Science and Technology
- Chong Min Koo
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Dry etching method and method for producing semiconductor device
- Patent number 12,154,791
- Issue date Nov 26, 2024
- Central Glass Company, Limited
- Hiroyuki Oomori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride etchant composition and method
- Patent number 12,152,187
- Issue date Nov 26, 2024
- Entegris, Inc.
- Eric Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching composition, method for etching insulating film of semicond...
- Patent number 12,146,092
- Issue date Nov 19, 2024
- SK Innovation Co., Ltd.
- Cheol Woo Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Etching composition
- Patent number 12,134,723
- Issue date Nov 5, 2024
- ENF Technology CO., LTD.
- Tae Ho Kim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Etching composition
- Patent number 12,134,724
- Issue date Nov 5, 2024
- Jeong Sik Oh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method and device for etching silicon oxide
- Patent number 12,125,709
- Issue date Oct 22, 2024
- Central Glass Company, Limited
- Shoi Suzuki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor smoothing apparatus and method
- Patent number 12,119,435
- Issue date Oct 15, 2024
- Intel Corporation
- Khaled Ahmed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Co/Cu selective wet etchant
- Patent number 12,110,436
- Issue date Oct 8, 2024
- VERSUM MATERIALS US, LLC
- Chung-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method, and dry etching agent and storage container the...
- Patent number 12,100,600
- Issue date Sep 24, 2024
- Central Glass Company, Limited
- Hiroyuki Oomori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process to manufacture novel inhibited hydrofluoric acid composition
- Patent number 12,091,601
- Issue date Sep 17, 2024
- Dorf Ketal Chemicals FZE
- Clay Purdy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Etchant compositions
- Patent number 12,074,034
- Issue date Aug 27, 2024
- Entegris, Inc.
- Chia-Jung Hsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method to control the etching rate of materials
- Patent number 12,024,436
- Issue date Jul 2, 2024
- Battelle Memorial Institute
- Ran Yi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Substrate processing method and film forming system
- Patent number 11,984,319
- Issue date May 14, 2024
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition, its use and a process for selectively etching silicon-...
- Patent number 11,970,647
- Issue date Apr 30, 2024
- BASF SE
- Francisco Javier Lopez Villanueva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching composition and application thereof
- Patent number 11,920,073
- Issue date Mar 5, 2024
- PhiChem Corporation
- Xiaoyi Gao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Textured glass articles and methods of making same
- Patent number 11,912,619
- Issue date Feb 27, 2024
- Corning Incorporated
- Xinyu Cao
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Etching compositions
- Patent number 11,912,921
- Issue date Feb 27, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Mick Bjelopavlic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for fabricating photonic device elements
- Patent number 11,881,408
- Issue date Jan 23, 2024
- Paul Scherrer Institut
- Lucia Romano
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for improving etching rate of wet etching
- Patent number 11,869,774
- Issue date Jan 9, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Nannan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching compositions
- Patent number 11,820,929
- Issue date Nov 21, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Mick Bjelopavlic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing liquid and method for processing substrate
- Patent number 11,807,792
- Issue date Nov 7, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Eto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor processing liquid and method for processing substrate
- Patent number 11,773,324
- Issue date Oct 3, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Eto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Dry non-plasma treatment system
- Patent number 11,745,202
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Martin Kent
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal atomic layer etching processes
- Patent number 11,739,428
- Issue date Aug 29, 2023
- ASM IP Holding B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal atomic layer etching processes
- Patent number 11,739,427
- Issue date Aug 29, 2023
- ASM IP Holding B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CYCLIC ETCH OF SILICON OXIDE AND SILICON NITRIDE
- Publication number 20250022714
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NITRIDE ETCHANT COMPOSITION AND METHOD
- Publication number 20250019590
- Publication date Jan 16, 2025
- Entegris, Inc.
- Eric Hong
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD AND DEVICE FOR ETCHING SILICON OXIDE
- Publication number 20250014906
- Publication date Jan 9, 2025
- Central Glass Company, Limited
- Shoi SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MOLYBDENUM FILM ETCHANT COMPOSITION AND ETCHING METHOD USING SAME
- Publication number 20240417620
- Publication date Dec 19, 2024
- YCCHEM CO., LTD.
- Jun Han KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID
- Publication number 20240409812
- Publication date Dec 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Eto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Post-Dry Etching Photoresist And Metal Containing Residue Removal F...
- Publication number 20240392194
- Publication date Nov 28, 2024
- VERSUM MATERIALS US, LLC
- Chung-Yi Chang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...
- Publication number 20240384169
- Publication date Nov 21, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuya Tajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...
- Publication number 20240384170
- Publication date Nov 21, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Choitsu Go
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Compositions
- Publication number 20240336840
- Publication date Oct 10, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Atsushi Mizutani
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PICKLE FOR POLYAMIDE
- Publication number 20240301557
- Publication date Sep 12, 2024
- HSO HERBERT SCHMIDT GmbH & Co. KG
- Almedina FETAHOVIC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENT...
- Publication number 20240287385
- Publication date Aug 29, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING COMPOSITIONS
- Publication number 20240279549
- Publication date Aug 22, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Kohei Hayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Etching Solution For Selectively Removing Silicon-Germanium Alloy F...
- Publication number 20240271040
- Publication date Aug 15, 2024
- VERSUM MATERIALS US, LLC
- WEN DAR LIU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHANT COMPOSITION FOR ETCHING SILICON AND SILICON GERMANIUM, AND...
- Publication number 20240263072
- Publication date Aug 8, 2024
- Samsung Electronics Co., Ltd.
- Heesuk WOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING SOLUTION, METHOD OF MANUFACTURING SILICON DEVICE AND METHOD...
- Publication number 20240240083
- Publication date Jul 18, 2024
- Tokuyama Corporation
- Manami OSHIO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MICROPROCESSING TREATMENT AGENT AND MICROPROCESSING TREATMENT METHOD
- Publication number 20240240084
- Publication date Jul 18, 2024
- STELLA CHEMIFA CORPORATION
- Yosuke YAMAZAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHANT COMPOSITION FOR SILICON LAYER AND ETCHING METHOD USING THE...
- Publication number 20240199953
- Publication date Jun 20, 2024
- ENF TECHNOLOGY CO., LTD.
- Jeong Sik OH
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR REACTIVE ION ETCHING
- Publication number 20240191135
- Publication date Jun 13, 2024
- National Cheng Kung University
- Tse-Ming Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR ETCHING SOLUTION
- Publication number 20240166948
- Publication date May 23, 2024
- FUJIFILM CORPORATION
- Atsushi MIZUTANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR THE SELECTIVE ETCHING OF SILICON
- Publication number 20240150654
- Publication date May 9, 2024
- ENF TECHNOLOGY CO., LTD.
- Gi Young KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR SURFACE TREATMENT AND SURFACE TREATMENT METHOD USIN...
- Publication number 20240076550
- Publication date Mar 7, 2024
- Samsung Electronics Co., Ltd.
- Hyeunwoong HONG
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
WET ETCHING SOLUTION COMPOSITION, WET ETCHING METHOD OF GLASS, AND...
- Publication number 20240045108
- Publication date Feb 8, 2024
- Sang-Ro LEE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
THERMAL ATOMIC LAYER ETCHING PROCESSES
- Publication number 20240026548
- Publication date Jan 25, 2024
- ASM IP HOLDING B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etching Solution For Titanium Nitride And Molybdenum Conductive Met...
- Publication number 20240010915
- Publication date Jan 11, 2024
- VERSUM MATERIALS US, LLC
- CHAO-HSIANG CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTORESIST DEVELOPMENT WITH ORGANIC VAPOR
- Publication number 20230416606
- Publication date Dec 28, 2023
- LAM RESEARCH CORPORATION
- Dries DICTUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROMACHINING PROCESSING AGENT AND MICROMACHINING PROCESSING METHOD
- Publication number 20230407178
- Publication date Dec 21, 2023
- STELLA CHEMIFA CORPORATION
- Kazuya DATE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHANT COMPOSITION AND METHOD
- Publication number 20230383185
- Publication date Nov 30, 2023
- Entegris, Inc.
- JeongYeol Yang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
THERMAL ATOMIC LAYER ETCHING PROCESSES
- Publication number 20230374671
- Publication date Nov 23, 2023
- ASM IP HOLDING B.V.
- Tom E. Blomberg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING
- Publication number 20230326761
- Publication date Oct 12, 2023
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE ETCHING COMPOSITION AND METHOD
- Publication number 20230295502
- Publication date Sep 21, 2023
- Entegris, Inc.
- Steven Michael BILODEAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

containing a fluorine compound

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing device and etching liquid

Formulations for high selective silicon nitride etch

Wet etching method

Etchant composition for semiconductor substrates

MXene with excellent mechanical strength and fast and high-yield an...

Dry etching method and method for producing semiconductor device

Nitride etchant composition and method

Etching composition, method for etching insulating film of semicond...

Etching composition

Etching composition

Method and device for etching silicon oxide

Semiconductor smoothing apparatus and method

Co/Cu selective wet etchant

Dry etching method, and dry etching agent and storage container the...

Process to manufacture novel inhibited hydrofluoric acid composition

Etchant compositions

Method to control the etching rate of materials

Substrate processing method and film forming system

Composition, its use and a process for selectively etching silicon-...

Etching composition and application thereof

Textured glass articles and methods of making same

Etching compositions

System and method for fabricating photonic device elements

Method for improving etching rate of wet etching

Etching compositions

Semiconductor processing liquid and method for processing substrate

Semiconductor processing liquid and method for processing substrate

Dry non-plasma treatment system

Thermal atomic layer etching processes

Thermal atomic layer etching processes

Patents Applicationslast 30 patents

CYCLIC ETCH OF SILICON OXIDE AND SILICON NITRIDE

NITRIDE ETCHANT COMPOSITION AND METHOD

METHOD AND DEVICE FOR ETCHING SILICON OXIDE

MOLYBDENUM FILM ETCHANT COMPOSITION AND ETCHING METHOD USING SAME

TREATMENT LIQUID

Post-Dry Etching Photoresist And Metal Containing Residue Removal F...

ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...

ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMI...

Etching Compositions

PICKLE FOR POLYAMIDE

ETCHING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENT...

ETCHING COMPOSITIONS

Etching Solution For Selectively Removing Silicon-Germanium Alloy F...

ETCHANT COMPOSITION FOR ETCHING SILICON AND SILICON GERMANIUM, AND...

ETCHING SOLUTION, METHOD OF MANUFACTURING SILICON DEVICE AND METHOD...

MICROPROCESSING TREATMENT AGENT AND MICROPROCESSING TREATMENT METHOD

ETCHANT COMPOSITION FOR SILICON LAYER AND ETCHING METHOD USING THE...

METHOD FOR REACTIVE ION ETCHING

SEMICONDUCTOR ETCHING SOLUTION

COMPOSITION FOR THE SELECTIVE ETCHING OF SILICON

COMPOSITION FOR SURFACE TREATMENT AND SURFACE TREATMENT METHOD USIN...

WET ETCHING SOLUTION COMPOSITION, WET ETCHING METHOD OF GLASS, AND...

THERMAL ATOMIC LAYER ETCHING PROCESSES

Etching Solution For Titanium Nitride And Molybdenum Conductive Met...

PHOTORESIST DEVELOPMENT WITH ORGANIC VAPOR

MICROMACHINING PROCESSING AGENT AND MICROMACHINING PROCESSING METHOD

ETCHANT COMPOSITION AND METHOD

THERMAL ATOMIC LAYER ETCHING PROCESSES

ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING

SILICON NITRIDE ETCHING COMPOSITION AND METHOD