Continuous moving of wafer

Industry

CPC
H01J2237/31766

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31766Continuous moving of wafer

Industries

Patents Grantslast 30 patents

Information Patent Grant
Blanking deflector, and multi charged particle beam writing apparat...
- Patent number 10,784,073
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device, manufacturing method, and exposure apparatus
- Patent number 10,573,491
- Issue date Feb 25, 2020
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gray-tone electron-beam lithography
- Patent number 10,534,115
- Issue date Jan 14, 2020
- Facebook Technologies, LLC
- Giuseppe Calafiore
- G02 - OPTICS
Information Patent Grant
Multi-beam writing using inclined exposure stripes
- Patent number 10,410,831
- Issue date Sep 10, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture size modulation to enhance ebeam patterning resolution
- Patent number 10,395,883
- Issue date Aug 27, 2019
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 10,256,074
- Issue date Apr 9, 2019
- Intel Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing data creation method and charged particle beam drawing appa...
- Patent number 10,199,199
- Issue date Feb 5, 2019
- NuFlare Technology, Inc.
- Shigehiro Hara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 10,020,165
- Issue date Jul 10, 2018
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective processing of a workpiece using ion beam implantation and...
- Patent number 9,899,188
- Issue date Feb 20, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Mark R. Amato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 9,859,099
- Issue date Jan 2, 2018
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 9,805,907
- Issue date Oct 31, 2017
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- G11 - INFORMATION STORAGE
Information Patent Grant
Bi-directional double-pass multi-beam writing
- Patent number 9,799,487
- Issue date Oct 24, 2017
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 9,734,988
- Issue date Aug 15, 2017
- Intel Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for electron beam lithography using array cat...
- Patent number 9,715,995
- Issue date Jul 25, 2017
- KLA-Tencor Corporation
- Keith Standiford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for calculating drawing speeds of a charged pa...
- Patent number 9,589,766
- Issue date Mar 7, 2017
- NuFlare Technology, Inc.
- Hideyuki Tsurumaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus, and method of manufacturing article
- Patent number 9,455,124
- Issue date Sep 27, 2016
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 9,343,268
- Issue date May 17, 2016
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus and irradiation time apport...
- Patent number 9,141,750
- Issue date Sep 22, 2015
- Nuflare Technology, Inc.
- Jun Yashima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for charged-particle multi-beam exposure
- Patent number 9,053,906
- Issue date Jun 9, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam exposure apparatus and method of manufacturin...
- Patent number 8,981,321
- Issue date Mar 17, 2015
- Canon Kabushiki Kaisha
- Hirohito Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 8,907,306
- Issue date Dec 9, 2014
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam drawing apparatus and article manufacturing m...
- Patent number 8,822,960
- Issue date Sep 2, 2014
- Canon Kabushiki Kaisha
- Kimitaka Ozawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 8,710,467
- Issue date Apr 29, 2014
- Nuflare Technology, Inc.
- Ryoichi Yoshikawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for controlled particle beam manufacturing
- Patent number 8,658,994
- Issue date Feb 25, 2014
- Nexgen Semi Holding, Inc.
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam exposure apparatus and method of manufacturin...
- Patent number 8,618,516
- Issue date Dec 31, 2013
- Canon Kabushiki Kaisha
- Hirohito Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Accelerator on a chip having a grid and plate cell
- Patent number 8,564,225
- Issue date Oct 22, 2013
- Transmute, Inc.
- Kim L. Hailey
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam pattern forming apparatus and charged particl...
- Patent number 8,502,175
- Issue date Aug 6, 2013
- Nuflare Technology, Inc.
- Noriaki Nakayamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus of an inspection system using an electron beam
- Patent number 8,134,125
- Issue date Mar 13, 2012
- Hitachi, Ltd.
- Yuko Iwabuchi
- G01 - MEASURING TESTING
Information Patent Grant
Lithography system and projection method
- Patent number 7,842,936
- Issue date Nov 30, 2010
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Particle-beam exposure apparatus with overall-modulation of a patte...
- Patent number 7,781,748
- Issue date Aug 24, 2010
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD
- Publication number 20170358426
- Publication date Dec 14, 2017
- Intel Corporation
- Akio YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140322653
- Publication date Oct 30, 2014
- Canon Kabushiki Kaisha
- Masato MURAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20140187056
- Publication date Jul 3, 2014
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED-PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...
- Publication number 20140070112
- Publication date Mar 13, 2014
- Canon Kabushiki Kaisha
- Hirohito Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND IRRADIATION TIME APPORT...
- Publication number 20140017349
- Publication date Jan 16, 2014
- Jun Yashima
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURE OF PRODUCT
- Publication number 20130344443
- Publication date Dec 26, 2013
- Takayuki Kawamoto
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRAWING APPARATUS, DRAWING METHOD, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20130264497
- Publication date Oct 10, 2013
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20130056647
- Publication date Mar 7, 2013
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING M...
- Publication number 20120228516
- Publication date Sep 13, 2012
- Canon Kabushiki Kaisha
- Kimitaka OZAWA
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRAWING APPARATUS, DRAWING METHOD AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20120219914
- Publication date Aug 30, 2012
- Canon Kabushiki Kaisha
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND AN APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON...
- Publication number 20120132801
- Publication date May 31, 2012
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED-PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...
- Publication number 20120126136
- Publication date May 24, 2012
- Canon Kabushiki Kaisha
- Hirohito Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20120112323
- Publication date May 10, 2012
- NEXGEN SEMI HOLDING, INC.
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM PATTERN FORMING APPARATUS AND CHARGED PARTICL...
- Publication number 20120007002
- Publication date Jan 12, 2012
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20100098922
- Publication date Apr 22, 2010
- NEXGEN SEMI HOLDING, INC.
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTE...
- Publication number 20090200495
- Publication date Aug 13, 2009
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM
- Publication number 20090057556
- Publication date Mar 5, 2009
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF
- Publication number 20090032738
- Publication date Feb 5, 2009
- NuFlare Technology, Inc.
- Hidekazu TAKEKOSHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography system and projection method
- Publication number 20080073588
- Publication date Mar 27, 2008
- Pieter Kruit
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070284695
- Publication date Dec 13, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070284537
- Publication date Dec 13, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070284538
- Publication date Dec 13, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus and method for controlled particle beam manufacturing
- Publication number 20070284527
- Publication date Dec 13, 2007
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070278419
- Publication date Dec 6, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070278418
- Publication date Dec 6, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
- Publication number 20070278428
- Publication date Dec 6, 2007
- NexGenSemi Holdings Corporation
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
Stage apparatus and exposure apparatus
- Publication number 20070252969
- Publication date Nov 1, 2007
- Advantest Corporation
- Masashi Ueno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and an apparatus of an inspection system using an electron beam
- Publication number 20070215803
- Publication date Sep 20, 2007
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Apparatus and method for controlled particle beam manufacturing
- Publication number 20070045534
- Publication date Mar 1, 2007
- Michael John Zani
- B82 - NANO-TECHNOLOGY
Information Patent Application
Systems, control subsystems, and methods for projecting an electron...
- Publication number 20070029506
- Publication date Feb 8, 2007
- Marek Zywno
- B82 - NANO-TECHNOLOGY

Continuous moving of wafer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Blanking deflector, and multi charged particle beam writing apparat...

Device, manufacturing method, and exposure apparatus

Gray-tone electron-beam lithography

Multi-beam writing using inclined exposure stripes

Aperture size modulation to enhance ebeam patterning resolution

Exposure apparatus and exposure method

Drawing data creation method and charged particle beam drawing appa...

Multi charged particle beam writing method, and multi charged parti...

Selective processing of a workpiece using ion beam implantation and...

Exposure apparatus and exposure method

Multi charged particle beam writing method, and multi charged parti...

Bi-directional double-pass multi-beam writing

Exposure apparatus and exposure method

Apparatus and methods for electron beam lithography using array cat...

Apparatus and method for calculating drawing speeds of a charged pa...

Drawing apparatus, and method of manufacturing article

Multi charged particle beam writing apparatus and multi charged par...

Charged particle beam writing apparatus and irradiation time apport...

Method for charged-particle multi-beam exposure

Charged-particle beam exposure apparatus and method of manufacturin...

Multi charged particle beam writing apparatus and multi charged par...

Charged particle beam drawing apparatus and article manufacturing m...

Multi charged particle beam writing apparatus and multi charged par...

Apparatus and method for controlled particle beam manufacturing

Charged-particle beam exposure apparatus and method of manufacturin...

Accelerator on a chip having a grid and plate cell

Charged particle beam pattern forming apparatus and charged particl...

Method and apparatus of an inspection system using an electron beam

Lithography system and projection method

Particle-beam exposure apparatus with overall-modulation of a patte...

Patents Applicationslast 30 patents

EXPOSURE APPARATUS AND EXPOSURE METHOD

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

CHARGED-PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...

CHARGED PARTICLE BEAM WRITING APPARATUS AND IRRADIATION TIME APPORT...

LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURE OF PRODUCT

DRAWING APPARATUS, DRAWING METHOD, AND METHOD OF MANUFACTURING ARTICLE

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING M...

DRAWING APPARATUS, DRAWING METHOD AND METHOD OF MANUFACTURING ARTICLE

METHOD AND AN APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON...

CHARGED-PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

CHARGED PARTICLE BEAM PATTERN FORMING APPARATUS AND CHARGED PARTICL...

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTE...

METHOD AND APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF

Lithography system and projection method

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

Apparatus and method for controlled particle beam manufacturing

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

Stage apparatus and exposure apparatus

Method and an apparatus of an inspection system using an electron beam

Apparatus and method for controlled particle beam manufacturing

Systems, control subsystems, and methods for projecting an electron...