controlling of the discharge by modulation of energy

Industry

CPC
H01J37/32137

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32137controlling of the discharge by modulation of energy

Industries

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,546
- Issue date Dec 31, 2024
- ASM IP Holding B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus to control a waveform
- Patent number 12,154,759
- Issue date Nov 26, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface charge and power feedback and control using a switch mode b...
- Patent number 12,125,674
- Issue date Oct 22, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic polymer film and manufacturing method thereof
- Patent number 11,969,752
- Issue date Apr 30, 2024
- Feng Chia University
- Ping-Yen Hsieh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Inductive coil structure and inductively coupled plasma generation...
- Patent number 11,935,725
- Issue date Mar 19, 2024
- EN2CORE TECHNOLOGY INC.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to modulate film stress
- Patent number 11,887,818
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,887,817
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for coating and in particular plasma coating o...
- Patent number 11,776,790
- Issue date Oct 3, 2023
- Krones AG
- Jochen Krueger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD apparatus for in-situ deposition of film stacks
- Patent number 11,746,420
- Issue date Sep 5, 2023
- Novellus Systems, Inc.
- Pramod Subramonium
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,651,966
- Issue date May 16, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for selective ion mass segregation in pulsed pl...
- Patent number 11,651,970
- Issue date May 16, 2023
- Tokyo Electron Limited
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for selectively etching first region made of silicon nitr...
- Patent number 11,637,025
- Issue date Apr 25, 2023
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply devices for plasma systems and method of use
- Patent number 11,600,467
- Issue date Mar 7, 2023
- TRUMPF Huettinger GmbH + Co. KG
- Christian Bock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 11,581,170
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive coil structure and inductively coupled plasma generation...
- Patent number 11,521,829
- Issue date Dec 6, 2022
- EN2CORE technology, Inc.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Initiation modulation for plasma deposition
- Patent number 11,430,654
- Issue date Aug 30, 2022
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for controlling plasma instability in semicondu...
- Patent number 11,393,729
- Issue date Jul 19, 2022
- Lam Research Corporation
- Yukinori Sakiyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composite plasma modulator for plasma chamber
- Patent number 11,367,591
- Issue date Jun 21, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Wen Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustment of power and frequency based on three or more states
- Patent number 11,361,942
- Issue date Jun 14, 2022
- Lam Research Corporation
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter for impedance matching
- Patent number 11,342,160
- Issue date May 24, 2022
- RENO TECHNOLOGIES, INC.
- Michael Gilliam Ulrich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,315,765
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Jun Yamawaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas showerhead, manufacturing method, and plasma apparatus includin...
- Patent number 11,309,165
- Issue date Apr 19, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling uniformity of plasma and plasma processing sy...
- Patent number 11,282,678
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Dong-Hyeon Na
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid electron beam and RF plasma system for controlled content of...
- Patent number 11,205,562
- Issue date Dec 21, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to modulate film stress
- Patent number 11,158,489
- Issue date Oct 26, 2021
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Impedance matching network and method
- Patent number 11,081,316
- Issue date Aug 3, 2021
- RENO TECHNOLOGIES, INC.
- Michael Gilliam Ulrich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,043,387
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming metal oxide layer, and plasma-enhanced chemical...
- Patent number 11,004,677
- Issue date May 11, 2021
- Samsung Display Co., Ltd.
- Dong Kyun Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode for plasma processing chamber
- Patent number 10,964,514
- Issue date Mar 30, 2021
- Lam Research Corporation
- Evan Edward Patton
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
POWER DELIVERY USING MICROWAVE SOURCE
- Publication number 20240404791
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Imran Ahmed BHUTTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Method, Apparatus, and System
- Publication number 20240363405
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Masato SAKAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240355583
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Naohiko OKUNISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH ENERGY ATOMIC LAYER ETCHING
- Publication number 20240274408
- Publication date Aug 15, 2024
- LAM RESEARCH CORPORATION
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...
- Publication number 20240162004
- Publication date May 16, 2024
- EN2CORE technology, Inc
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240145218
- Publication date May 2, 2024
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240063053
- Publication date Feb 22, 2024
- ASM IP HOLDING B.V.
- SangHeon Yong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADAPTIVE PID CONTROLLER
- Publication number 20240019818
- Publication date Jan 18, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESTIMATION LAW MODULES FOR AN ADAPTIVE ENGINE
- Publication number 20240006151
- Publication date Jan 4, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADAPTIVE ENGINE WITH PRE-PROCESSED CONTROL LAWS
- Publication number 20240004354
- Publication date Jan 4, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, PRESSURE VAL...
- Publication number 20230395360
- Publication date Dec 7, 2023
- TOKYO ELECTRON LIMITED
- Kota SHIHOMMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230386787
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Atsutoshi INOKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQU...
- Publication number 20230369019
- Publication date Nov 16, 2023
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
- Publication number 20230366094
- Publication date Nov 16, 2023
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...
- Publication number 20230080526
- Publication date Mar 16, 2023
- EN2CORE technology, Inc
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230050506
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTMENT OF POWER AND FREQUENCY BASED ON THREE OR MORE STATES
- Publication number 20220277934
- Publication date Sep 1, 2022
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC POLYMER FILM AND MANUFACTURING METHOD THEREOF
- Publication number 20220193719
- Publication date Jun 23, 2022
- Feng Chia University
- PING-YEN HSIEH
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTO...
- Publication number 20220172926
- Publication date Jun 2, 2022
- Samsung Electronics Co., Ltd.
- Dong Wan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SELECTIVE ION MASS SEGREGATION IN PULSED PL...
- Publication number 20210366723
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE B...
- Publication number 20210351007
- Publication date Nov 11, 2021
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210296131
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210287907
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20210287878
- Publication date Sep 16, 2021
- ASM IP HOLDING B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPACT HIGH DENSITY PLASMA SOURCE
- Publication number 20210183619
- Publication date Jun 17, 2021
- LAM RESEARCH CORPORATION
- Roger Patrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INITIATION MODULATION FOR PLASMA DEPOSITION
- Publication number 20210159073
- Publication date May 27, 2021
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...
- Publication number 20210142981
- Publication date May 13, 2021
- EN2CORE technology, Inc
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY DEVICES FOR PLASMA SYSTEMS AND METHOD OF USE
- Publication number 20210134563
- Publication date May 6, 2021
- TRUMPF Huettinger GmbH + Co. KG
- Christian Bock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210134599
- Publication date May 6, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SHOWERHEAD, MANUFACTURING METHOD, AND PLASMA APPARATUS INCLUDIN...
- Publication number 20200321193
- Publication date Oct 8, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS

controlling of the discharge by modulation of energy

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus

Apparatus to control a waveform

Surface charge and power feedback and control using a switch mode b...

Plasma processing apparatus and plasma processing method

Organic polymer film and manufacturing method thereof

Inductive coil structure and inductively coupled plasma generation...

Methods and systems to modulate film stress

Plasma processing apparatus and plasma processing method

Apparatus and method for coating and in particular plasma coating o...

PECVD apparatus for in-situ deposition of film stacks

Methods and apparatus for processing a substrate

Systems and methods for selective ion mass segregation in pulsed pl...

Apparatus for selectively etching first region made of silicon nitr...

Power supply devices for plasma systems and method of use

Plasma processing apparatus and processing method

Inductive coil structure and inductively coupled plasma generation...

Initiation modulation for plasma deposition

Systems and methods for controlling plasma instability in semicondu...

Composite plasma modulator for plasma chamber

Adjustment of power and frequency based on three or more states

Filter for impedance matching

Plasma processing apparatus and plasma processing method

Gas showerhead, manufacturing method, and plasma apparatus includin...

Method of controlling uniformity of plasma and plasma processing sy...

Hybrid electron beam and RF plasma system for controlled content of...

Methods and systems to modulate film stress

Impedance matching network and method

Methods and apparatus for processing a substrate

Method for forming metal oxide layer, and plasma-enhanced chemical...

Electrode for plasma processing chamber

Patents Applicationslast 30 patents

POWER DELIVERY USING MICROWAVE SOURCE

Substrate Processing Method, Apparatus, and System

PLASMA PROCESSING APPARATUS

HIGH ENERGY ATOMIC LAYER ETCHING

INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

ADAPTIVE PID CONTROLLER

ESTIMATION LAW MODULES FOR AN ADAPTIVE ENGINE

ADAPTIVE ENGINE WITH PRE-PROCESSED CONTROL LAWS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, PRESSURE VAL...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQU...

PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS

INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ADJUSTMENT OF POWER AND FREQUENCY BASED ON THREE OR MORE STATES

ORGANIC POLYMER FILM AND MANUFACTURING METHOD THEREOF

PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTO...

SYSTEMS AND METHODS FOR SELECTIVE ION MASS SEGREGATION IN PULSED PL...

SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE B...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

SUBSTRATE PROCESSING APPARATUS

COMPACT HIGH DENSITY PLASMA SOURCE

INITIATION MODULATION FOR PLASMA DEPOSITION

INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...

POWER SUPPLY DEVICES FOR PLASMA SYSTEMS AND METHOD OF USE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

GAS SHOWERHEAD, MANUFACTURING METHOD, AND PLASMA APPARATUS INCLUDIN...