Controlling the beam

Industry

CPC
H01J2237/30472

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/30472Controlling the beam

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Specimen machining device and information provision method
- Patent number 11,837,437
- Issue date Dec 5, 2023
- Jeol Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray calibration standard object
- Patent number 11,806,800
- Issue date Nov 7, 2023
- Arcam AB
- Johan Backlund
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion focusing device
- Patent number 11,605,531
- Issue date Mar 14, 2023
- Battelle Memorial Institute
- Yehia M. Ibrahim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle yield via beam-line pressure control
- Patent number 11,562,885
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Thomas Stacy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,545,339
- Issue date Jan 3, 2023
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,508,553
- Issue date Nov 22, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implant apparatus and method of controlling the ion implant app...
- Patent number 11,462,382
- Issue date Oct 4, 2022
- NANYA TECHNOLOGY CORPORATION
- Hsun-Po Wen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus and multi-charged par...
- Patent number 11,270,865
- Issue date Mar 8, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for repairing a photolithographic mask
- Patent number 11,256,168
- Issue date Feb 22, 2022
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 11,114,277
- Issue date Sep 7, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Depth-controllable ion milling
- Patent number 11,049,690
- Issue date Jun 29, 2021
- SELA—SOLUTIONS ENABLING NANO ANALYSIS LTD.
- Vladimir Zheleznyak
- G01 - MEASURING TESTING
Information Patent Grant
Multiple charged particle beam writing method and apparatus using b...
- Patent number 10,978,273
- Issue date Apr 13, 2021
- NuFlare Technology, Inc.
- Hideo Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensated location specific processing apparatus and method
- Patent number 10,861,674
- Issue date Dec 8, 2020
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and method
- Patent number 10,854,421
- Issue date Dec 1, 2020
- Carl Zeiss Microscopy GmbH
- Daniela Donhauser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing technique
- Patent number 10,847,372
- Issue date Nov 24, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray calibration standard object
- Patent number 10,807,187
- Issue date Oct 20, 2020
- Arcam AB
- Johan Backlund
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 10,790,115
- Issue date Sep 29, 2020
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam charged particle imaging apparatus
- Patent number 10,790,113
- Issue date Sep 29, 2020
- FEI Company
- Bohuslav Sed'a
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged particle beam writing apparatus, and multiple char...
- Patent number 10,784,080
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 10,741,361
- Issue date Aug 11, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical transistor with trench gate insulator having varying thick...
- Patent number 10,679,857
- Issue date Jun 9, 2020
- Infineon Technologies AG
- Johannes Georg Laven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterned atomic layer etching and deposition using miniature-colum...
- Patent number 10,607,845
- Issue date Mar 31, 2020
- Kevin M. Monahan
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and device for characterizing an electron beam
- Patent number 10,586,683
- Issue date Mar 10, 2020
- Arcam AB
- Tomas Lock
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Three-dimensional layer-by-layer shaping apparatus, three-dimension...
- Patent number 10,566,171
- Issue date Feb 18, 2020
- TECHNOLOGY RESEARCH ASSOCIATION FOR FUTURE ADDITIVE MANUFACTURING
- Zhixiong Yuan
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Microstructure manufacturing method and microstructure manufacturin...
- Patent number 10,546,721
- Issue date Jan 28, 2020
- Hitachi, Ltd.
- Keiji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ELECTRON GUN, ELECTRON RAY APPLYING DEVICE, AND ELECTRON BEAM PROJE...
- Publication number 20230230794
- Publication date Jul 20, 2023
- PHOTO ELECTRON SOUL INC.
- Tomohiro Nishitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230056463
- Publication date Feb 23, 2023
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Specimen Machining Device and Information Provision Method
- Publication number 20220392744
- Publication date Dec 8, 2022
- JEOL Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANT APPARATUS AND METHOD OF CONTROLLING THE ION IMPLANT APP...
- Publication number 20220270846
- Publication date Aug 25, 2022
- NANYA TECHNOLOGY CORPORATION
- Hsun-Po WEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
X-RAY REFERENCE OBJECT, X-RAY DETECTOR, ADDITIVE MANUFACTURING APPA...
- Publication number 20220143709
- Publication date May 12, 2022
- Arcam AB
- Christian Ekberg
- B22 - CASTING POWDER METALLURGY
Information Patent Application
PARTICLE YIELD VIA BEAM-LINE PRESSURE CONTROL
- Publication number 20220037114
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Thomas Stacy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED PAR...
- Publication number 20210257185
- Publication date Aug 19, 2021
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
X-RAY CALIBRATION STANDARD OBJECT
- Publication number 20200406389
- Publication date Dec 31, 2020
- Arcam AB
- Johan Backlund
- B22 - CASTING POWDER METALLURGY
Information Patent Application
ION FOCUSING DEVICE
- Publication number 20200321190
- Publication date Oct 8, 2020
- Battelle Memorial Institute
- Yehia M. Ibrahim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Cathode Ion Source
- Publication number 20200294765
- Publication date Sep 17, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20200194141
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20200135428
- Publication date Apr 30, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIE STACK TEST ARCHITECTURE AND METHOD
- Publication number 20200116779
- Publication date Apr 16, 2020
- TEXAS INSTRUMENTS INCORPORATED
- Lee D. Whetsel
- G01 - MEASURING TESTING
Information Patent Application
Compensated Location Specific Processing Apparatus And Method
- Publication number 20200066485
- Publication date Feb 27, 2020
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE IMAGING APPARATUS
- Publication number 20190393013
- Publication date Dec 26, 2019
- FEI Company
- Bohuslav Sed'a
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Cathode Ion Source
- Publication number 20190385811
- Publication date Dec 19, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM AND METHOD
- Publication number 20190304743
- Publication date Oct 3, 2019
- CARL ZEISS MICROSCOPY GMBH
- Daniela Donhauser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHAR...
- Publication number 20190304749
- Publication date Oct 3, 2019
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED...
- Publication number 20190198294
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Hideo INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION FOCUSING DEVICE
- Publication number 20190189393
- Publication date Jun 20, 2019
- Battelle Memorial Institute
- Yehia M. Ibrahim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM AND METHODS
- Publication number 20190189392
- Publication date Jun 20, 2019
- Carl Zeiss Microscopy, LLC
- Chuong Huynh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPTH-CONTROLLABLE ION MILLING
- Publication number 20190103251
- Publication date Apr 4, 2019
- SELA – Solutions EnabLing nano Analysis LTD.
- Vladimir Zheleznyak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20190066975
- Publication date Feb 28, 2019
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Writing Apparatus and Charged Particle Beam W...
- Publication number 20190027340
- Publication date Jan 24, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER, ION BEAM IRRADIATED TARGET, AND ION IMPLANTATION METHOD
- Publication number 20180350557
- Publication date Dec 6, 2018
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIE STACK TEST ARCHITECTURE AND METHOD
- Publication number 20180335468
- Publication date Nov 22, 2018
- TEXAS INSTRUMENTS INCORPORATED
- Lee D. Whetsel
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
A Method for Determining the Changing Location of the Point of Inci...
- Publication number 20180308660
- Publication date Oct 25, 2018
- ALD Vacuum Technologies GmbH
- Georg REITER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microstructure Manufacturing Method and Microstructure Manufacturin...
- Publication number 20180261427
- Publication date Sep 13, 2018
- Hitachi, Ltd
- Keiji WATANABE
- H01 - BASIC ELECTRIC ELEMENTS

Controlling the beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-charged particle beam writing apparatus, and multi-charged pa...

Vacuum chamber arrangement for charged particle beam generator

Specimen machining device and information provision method

X-ray calibration standard object

Vacuum chamber arrangement for charged particle beam generator

Ion focusing device

Particle yield via beam-line pressure control

Multi-charged particle beam writing apparatus, and multi-charged pa...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Ion implant apparatus and method of controlling the ion implant app...

Multi-charged particle beam writing apparatus and multi-charged par...

Apparatus and method for repairing a photolithographic mask

Dual cathode ion source

Vacuum chamber arrangement for charged particle beam generator

Depth-controllable ion milling

Multiple charged particle beam writing method and apparatus using b...

Compensated location specific processing apparatus and method

Charged particle beam system and method

Workpiece processing technique

X-ray calibration standard object

Multi charged particle beam writing method, and multi charged parti...

Multi-beam charged particle imaging apparatus

Multiple charged particle beam writing apparatus, and multiple char...

Dual cathode ion source

Vertical transistor with trench gate insulator having varying thick...

Patterned atomic layer etching and deposition using miniature-colum...

Vacuum chamber arrangement for charged particle beam generator

Method and device for characterizing an electron beam

Three-dimensional layer-by-layer shaping apparatus, three-dimension...

Microstructure manufacturing method and microstructure manufacturin...

Patents Applicationslast 30 patents

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

ELECTRON GUN, ELECTRON RAY APPLYING DEVICE, AND ELECTRON BEAM PROJE...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

Specimen Machining Device and Information Provision Method

ION IMPLANT APPARATUS AND METHOD OF CONTROLLING THE ION IMPLANT APP...

X-RAY REFERENCE OBJECT, X-RAY DETECTOR, ADDITIVE MANUFACTURING APPA...

PARTICLE YIELD VIA BEAM-LINE PRESSURE CONTROL

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED PAR...

X-RAY CALIBRATION STANDARD OBJECT

ION FOCUSING DEVICE

Dual Cathode Ion Source

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

DIE STACK TEST ARCHITECTURE AND METHOD

Compensated Location Specific Processing Apparatus And Method

MULTI-BEAM CHARGED PARTICLE IMAGING APPARATUS

Dual Cathode Ion Source

CHARGED PARTICLE BEAM SYSTEM AND METHOD

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHAR...

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED...

ION FOCUSING DEVICE

CHARGED PARTICLE BEAM SYSTEM AND METHODS

DEPTH-CONTROLLABLE ION MILLING

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

Charged Particle Beam Writing Apparatus and Charged Particle Beam W...

ION IMPLANTER, ION BEAM IRRADIATED TARGET, AND ION IMPLANTATION METHOD

DIE STACK TEST ARCHITECTURE AND METHOD

A Method for Determining the Changing Location of the Point of Inci...

Microstructure Manufacturing Method and Microstructure Manufacturin...