Correction during exposure

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CPC
H01J2237/30455

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/30455Correction during exposure

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,930,469
- Issue date Feb 23, 2021
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,867,774
- Issue date Dec 15, 2020
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam writing apparatus and charged-particle beam w...
- Patent number 10,699,877
- Issue date Jun 30, 2020
- NuFlare Technology, Inc.
- Haruyuki Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,553,396
- Issue date Feb 4, 2020
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for sample orientation for TEM lamella preparation
- Patent number 10,504,689
- Issue date Dec 10, 2019
- FEI Company
- TomáTomá{hacek over (s)} Vystavel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for real-time overlay error reduction
- Patent number 10,495,982
- Issue date Dec 3, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for acquiring parameter for dose correction of charged parti...
- Patent number 10,488,760
- Issue date Nov 26, 2019
- NuFlare Technology, Inc.
- Haruyuki Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Evaluation method, correction method, recording medium and electron...
- Patent number 10,483,082
- Issue date Nov 19, 2019
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,483,087
- Issue date Nov 19, 2019
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,468,232
- Issue date Nov 5, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ beam current monitoring and control in scanned ion implanta...
- Patent number 10,395,889
- Issue date Aug 27, 2019
- Axcelis Technologies, Inc.
- Alfred Mike Halling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining the changing location of the point of incide...
- Patent number 10,290,465
- Issue date May 14, 2019
- ALD Vacuum Technologies GmbH
- Georg Reiter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and control program for focused ion beam device
- Patent number 10,276,341
- Issue date Apr 30, 2019
- Hitachi, Ltd.
- Keiji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam exposure method, and multi charged part...
- Patent number 10,269,532
- Issue date Apr 23, 2019
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 10,217,607
- Issue date Feb 26, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation method, correction method, recording medium and electron...
- Patent number 9,997,329
- Issue date Jun 12, 2018
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus, and method of manufacturing an article
- Patent number 9,947,508
- Issue date Apr 17, 2018
- Canon Kabushiki Kaisha
- Daisuke Iwase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 9,899,187
- Issue date Feb 20, 2018
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling ion implanter
- Patent number 9,870,896
- Issue date Jan 16, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Feng Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 9,859,099
- Issue date Jan 2, 2018
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 9,583,310
- Issue date Feb 28, 2017
- NuFlare Technology, Inc.
- Tomoo Motosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for correcting drift of charged particle beam, and charged p...
- Patent number 9,536,705
- Issue date Jan 3, 2017
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implant-induced damage control in ion implantation
- Patent number 9,490,185
- Issue date Nov 8, 2016
- Axcelis Technologies, Inc.
- Ronald N. Reece
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for monitoring ion implantation
- Patent number 9,449,889
- Issue date Sep 20, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam irradiation apparatus and beam irradiation method
- Patent number 9,449,791
- Issue date Sep 20, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Program for correcting charged particle radiation location, device...
- Patent number 9,355,816
- Issue date May 31, 2016
- DAI NIPPONI PRINTING CO., LTD.
- Yohei Ookawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for electron beam lithography
- Patent number 9,245,708
- Issue date Jan 26, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi Che
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged-particle beam drawing method, computer-readable recording m...
- Patent number 9,236,154
- Issue date Jan 12, 2016
- NuFlare Technology, Inc.
- Sumito Nakada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure apparatus and method of detecting error usin...
- Patent number 9,229,327
- Issue date Jan 5, 2016
- Samsung Electronics Co., Ltd.
- Sang Yong Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 9,159,555
- Issue date Oct 13, 2015
- Nuflare Technology, Inc.
- Hiroshi Matsumoto
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...
- Publication number 20240412945
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...
- Publication number 20190355553
- Publication date Nov 21, 2019
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190122858
- Publication date Apr 25, 2019
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190122859
- Publication date Apr 25, 2019
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Writing Apparatus and Charged Particle Beam W...
- Publication number 20190027340
- Publication date Jan 24, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A Method for Determining the Changing Location of the Point of Inci...
- Publication number 20180308660
- Publication date Oct 25, 2018
- ALD Vacuum Technologies GmbH
- Georg REITER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...
- Publication number 20180269028
- Publication date Sep 20, 2018
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20180068829
- Publication date Mar 8, 2018
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20180005799
- Publication date Jan 4, 2018
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EXPOSURE METHOD, AND MULTI CHARGED PART...
- Publication number 20170352520
- Publication date Dec 7, 2017
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...
- Publication number 20170154755
- Publication date Jun 1, 2017
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROGRAM FOR CORRECTING CHARGED PARTICLE RADIATION LOCATION, DEVICE...
- Publication number 20160027611
- Publication date Jan 28, 2016
- Yohei Ookawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM IRRADIATION APPARATUS AND BEAM IRRADIATION METHOD
- Publication number 20150364297
- Publication date Dec 17, 2015
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR IMPLEMENTING PREDICTED SYSTEMATIC ERROR C...
- Publication number 20150243476
- Publication date Aug 27, 2015
- TEL Epion Inc.
- Vincent Lagana-Gizzo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND SAMPLE PROCESSING METHOD USING...
- Publication number 20140291511
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Xin MAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20140168629
- Publication date Jun 19, 2014
- Canon Kabushiki Kaisha
- Toshihiko NISHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLANT-INDUCED DAMAGE CONTROL IN ION IMPLANTATION
- Publication number 20140065730
- Publication date Mar 6, 2014
- Axcelis Technologies, Inc.
- Ronald N. Reece
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, DRAWING APPARATUS, AND METHOD OF M...
- Publication number 20140065547
- Publication date Mar 6, 2014
- Canon Kabushiki Kaisha
- Keiichi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACQUIRING SETTLING TIME
- Publication number 20140054469
- Publication date Feb 27, 2014
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Monitoring Ion Implantation
- Publication number 20130280823
- Publication date Oct 24, 2013
- Chun-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEFLECTION METHOD WITH SEPARATE STAGE TRACKIN...
- Publication number 20130266894
- Publication date Oct 10, 2013
- Multibeam Corporation
- John C. Wiesner
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20130253688
- Publication date Sep 26, 2013
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
SAMPLE PREPARATION METHOD AND APPARATUS
- Publication number 20130214458
- Publication date Aug 22, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hidekazu SUZUKI
- G01 - MEASURING TESTING
Information Patent Application
CHARGED-PARTICLE BEAM DRAWING METHOD, COMPUTER-READABLE RECORDING M...
- Publication number 20130177855
- Publication date Jul 11, 2013
- NuFlare Technology, Inc.
- Sumito NAKADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus for Monitoring Ion Implantation
- Publication number 20130068960
- Publication date Mar 21, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER
- Publication number 20130042809
- Publication date Feb 21, 2013
- NISSIN ION EQUIPMENT CO., LTD.
- Masao Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20130037724
- Publication date Feb 14, 2013
- NuFlare Technology, Inc.
- Kaoru TSURUTA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of Processing of an Object
- Publication number 20120145895
- Publication date Jun 14, 2012
- CARL ZEISS NTS GMBH
- Josef BIBERGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Versatile Beam Glitch Detection System
- Publication number 20120025107
- Publication date Feb 2, 2012
- Axcelis Technologies, Inc.
- Shu Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Throughput Enhancement for Scanned Beam Ion Implanters
- Publication number 20110272567
- Publication date Nov 10, 2011
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS

Correction during exposure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam writing apparatus and charged particle beam w...

Multi charged particle beam writing apparatus and multi charged par...

Charged-particle beam writing apparatus and charged-particle beam w...

Charged particle beam writing apparatus and charged particle beam w...

Method for sample orientation for TEM lamella preparation

System and method for real-time overlay error reduction

Method for acquiring parameter for dose correction of charged parti...

Evaluation method, correction method, recording medium and electron...

Multi charged particle beam writing apparatus and multi charged par...

Charged particle beam writing apparatus and charged particle beam w...

In situ beam current monitoring and control in scanned ion implanta...

Method for determining the changing location of the point of incide...

Control method and control program for focused ion beam device

Multi charged particle beam exposure method, and multi charged part...

Ion implantation apparatus and ion implantation method

Evaluation method, correction method, recording medium and electron...

Lithography apparatus, and method of manufacturing an article

Charged particle beam writing apparatus and charged particle beam w...

System and method for controlling ion implanter

Exposure apparatus and exposure method

Charged particle beam writing apparatus, charged particle beam writ...

Method for correcting drift of charged particle beam, and charged p...

Implant-induced damage control in ion implantation

Method for monitoring ion implantation

Beam irradiation apparatus and beam irradiation method

Program for correcting charged particle radiation location, device...

Method and apparatus for electron beam lithography

Charged-particle beam drawing method, computer-readable recording m...

Electron beam exposure apparatus and method of detecting error usin...

Multi charged particle beam writing apparatus and multi charged par...

Patents Applicationslast 30 patents

ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...

CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

Charged Particle Beam Writing Apparatus and Charged Particle Beam W...

A Method for Determining the Changing Location of the Point of Inci...

EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

MULTI CHARGED PARTICLE BEAM EXPOSURE METHOD, AND MULTI CHARGED PART...

EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...

PROGRAM FOR CORRECTING CHARGED PARTICLE RADIATION LOCATION, DEVICE...

BEAM IRRADIATION APPARATUS AND BEAM IRRADIATION METHOD

APPARATUS AND METHODS FOR IMPLEMENTING PREDICTED SYSTEMATIC ERROR C...

CHARGED PARTICLE BEAM APPARATUS AND SAMPLE PROCESSING METHOD USING...

DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD

IMPLANT-INDUCED DAMAGE CONTROL IN ION IMPLANTATION

CHARGED PARTICLE BEAM APPARATUS, DRAWING APPARATUS, AND METHOD OF M...

METHOD FOR ACQUIRING SETTLING TIME

Apparatus for Monitoring Ion Implantation

CHARGED PARTICLE BEAM DEFLECTION METHOD WITH SEPARATE STAGE TRACKIN...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

SAMPLE PREPARATION METHOD AND APPARATUS

CHARGED-PARTICLE BEAM DRAWING METHOD, COMPUTER-READABLE RECORDING M...

Apparatus for Monitoring Ion Implantation

ION IMPLANTER

CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...

Method of Processing of an Object

Versatile Beam Glitch Detection System

Throughput Enhancement for Scanned Beam Ion Implanters