Deflection calibration

Industry

CPC
H01J2237/3045

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3045Deflection calibration

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,798,780
- Issue date Oct 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam optical apparatus, exposure apparatus, exposu...
- Patent number 11,387,074
- Issue date Jul 12, 2022
- Nikon Corporation
- Hiroyuki Nagasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,239,052
- Issue date Feb 1, 2022
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam optical apparatus, exposure apparatus, exposu...
- Patent number 10,984,982
- Issue date Apr 20, 2021
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,930,469
- Issue date Feb 23, 2021
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,867,774
- Issue date Dec 15, 2020
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple beam image acquisition apparatus and multiple beam image a...
- Patent number 10,777,384
- Issue date Sep 15, 2020
- NuFlare Technology, Inc.
- Nobutaka Kikuiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,720,306
- Issue date Jul 21, 2020
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam writing apparatus and charged-particle beam w...
- Patent number 10,699,877
- Issue date Jun 30, 2020
- NuFlare Technology, Inc.
- Haruyuki Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for characterizing an electron beam
- Patent number 10,586,683
- Issue date Mar 10, 2020
- Arcam AB
- Tomas Lock
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,553,396
- Issue date Feb 4, 2020
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for sample orientation for TEM lamella preparation
- Patent number 10,504,689
- Issue date Dec 10, 2019
- FEI Company
- TomáTomá{hacek over (s)} Vystavel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for real-time overlay error reduction
- Patent number 10,495,982
- Issue date Dec 3, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for acquiring parameter for dose correction of charged parti...
- Patent number 10,488,760
- Issue date Nov 26, 2019
- NuFlare Technology, Inc.
- Haruyuki Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,483,088
- Issue date Nov 19, 2019
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation method, correction method, recording medium and electron...
- Patent number 10,483,082
- Issue date Nov 19, 2019
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,483,087
- Issue date Nov 19, 2019
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,468,232
- Issue date Nov 5, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and positional displacement correct...
- Patent number 10,410,830
- Issue date Sep 10, 2019
- NuFlare Technology, Inc.
- Noriaki Nakayamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ beam current monitoring and control in scanned ion implanta...
- Patent number 10,395,889
- Issue date Aug 27, 2019
- Axcelis Technologies, Inc.
- Alfred Mike Halling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining the changing location of the point of incide...
- Patent number 10,290,465
- Issue date May 14, 2019
- ALD Vacuum Technologies GmbH
- Georg Reiter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and control program for focused ion beam device
- Patent number 10,276,341
- Issue date Apr 30, 2019
- Hitachi, Ltd.
- Keiji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam exposure method, and multi charged part...
- Patent number 10,269,532
- Issue date Apr 23, 2019
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,249,474
- Issue date Apr 2, 2019
- Hitachi High-Technologies Corporation
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 10,217,607
- Issue date Feb 26, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation method, correction method, recording medium and electron...
- Patent number 9,997,329
- Issue date Jun 12, 2018
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus, and method of manufacturing an article
- Patent number 9,947,508
- Issue date Apr 17, 2018
- Canon Kabushiki Kaisha
- Daisuke Iwase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 9,899,187
- Issue date Feb 20, 2018
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling ion implanter
- Patent number 9,870,896
- Issue date Jan 16, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Feng Tsai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...
- Publication number 20250037968
- Publication date Jan 30, 2025
- CARL ZEISS MICROSCOPY GMBH
- Lucas Harmsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...
- Publication number 20240412945
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for Calibrating a Charged-Particle Beam
- Publication number 20240304407
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE
- Publication number 20240297012
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Atsuko Shintani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20230029715
- Publication date Feb 2, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...
- Publication number 20220359156
- Publication date Nov 10, 2022
- NuFlare Technology, Inc.
- Tsubasa NANAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20220122804
- Publication date Apr 21, 2022
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki YOKOSUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM OPTICAL APPARATUS, EXPOSURE APPARATUS, EXPOSU...
- Publication number 20210225611
- Publication date Jul 22, 2021
- Nikon Corporation
- Hiroyuki NAGASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20200312615
- Publication date Oct 1, 2020
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki YOKOSUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...
- Publication number 20190355553
- Publication date Nov 21, 2019
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE BEAM IMAGE A...
- Publication number 20190195815
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Nobutaka KIKUIRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20190180979
- Publication date Jun 13, 2019
- Hitachi High-Technologies Corporation
- Toshiyuki YOKOSUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190122858
- Publication date Apr 25, 2019
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190122859
- Publication date Apr 25, 2019
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20190035603
- Publication date Jan 31, 2019
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Writing Apparatus and Charged Particle Beam W...
- Publication number 20190027340
- Publication date Jan 24, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A Method for Determining the Changing Location of the Point of Inci...
- Publication number 20180308660
- Publication date Oct 25, 2018
- ALD Vacuum Technologies GmbH
- Georg REITER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...
- Publication number 20180269028
- Publication date Sep 20, 2018
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20180068829
- Publication date Mar 8, 2018
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20180005799
- Publication date Jan 4, 2018
- NuFlare Technology, Inc.
- Kei HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EXPOSURE METHOD, AND MULTI CHARGED PART...
- Publication number 20170352520
- Publication date Dec 7, 2017
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...
- Publication number 20170154755
- Publication date Jun 1, 2017
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROGRAM FOR CORRECTING CHARGED PARTICLE RADIATION LOCATION, DEVICE...
- Publication number 20160027611
- Publication date Jan 28, 2016
- Yohei Ookawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING METHOD USING ELECTRON BEAM AND EXPOSURE SYSTEM CONFIGURE...
- Publication number 20160004161
- Publication date Jan 7, 2016
- Yongseok Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM IRRADIATION APPARATUS AND BEAM IRRADIATION METHOD
- Publication number 20150364297
- Publication date Dec 17, 2015
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR IMPLEMENTING PREDICTED SYSTEMATIC ERROR C...
- Publication number 20150243476
- Publication date Aug 27, 2015
- TEL Epion Inc.
- Vincent Lagana-Gizzo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IRRADIATION APPARATUS FOR IRRADIATING CHARGED PARTICLE BEAM, METHOD...
- Publication number 20140322833
- Publication date Oct 30, 2014
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND SAMPLE PROCESSING METHOD USING...
- Publication number 20140291511
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Xin MAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20140168629
- Publication date Jun 19, 2014
- Canon Kabushiki Kaisha
- Toshihiko NISHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLANT-INDUCED DAMAGE CONTROL IN ION IMPLANTATION
- Publication number 20140065730
- Publication date Mar 6, 2014
- Axcelis Technologies, Inc.
- Ronald N. Reece
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Deflection calibration

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam writing apparatus, charged particle beam writ...

Charged particle beam device

Charged particle beam optical apparatus, exposure apparatus, exposu...

Charged particle beam device

Charged particle beam optical apparatus, exposure apparatus, exposu...

Charged particle beam writing apparatus and charged particle beam w...

Multi charged particle beam writing apparatus and multi charged par...

Multiple beam image acquisition apparatus and multiple beam image a...

Charged particle beam device

Charged-particle beam writing apparatus and charged-particle beam w...

Method and device for characterizing an electron beam

Charged particle beam writing apparatus and charged particle beam w...

Method for sample orientation for TEM lamella preparation

System and method for real-time overlay error reduction

Method for acquiring parameter for dose correction of charged parti...

Multi charged particle beam writing apparatus and multi charged par...

Evaluation method, correction method, recording medium and electron...

Multi charged particle beam writing apparatus and multi charged par...

Charged particle beam writing apparatus and charged particle beam w...

Charged particle beam apparatus and positional displacement correct...

In situ beam current monitoring and control in scanned ion implanta...

Method for determining the changing location of the point of incide...

Control method and control program for focused ion beam device

Multi charged particle beam exposure method, and multi charged part...

Charged particle beam device

Ion implantation apparatus and ion implantation method

Evaluation method, correction method, recording medium and electron...

Lithography apparatus, and method of manufacturing an article

Charged particle beam writing apparatus and charged particle beam w...

System and method for controlling ion implanter

Patents Applicationslast 30 patents

METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, C...

ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND...

Device and Method for Calibrating a Charged-Particle Beam

CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...

Charged Particle Beam Device

CHARGED PARTICLE BEAM OPTICAL APPARATUS, EXPOSURE APPARATUS, EXPOSU...

Charged Particle Beam Device

CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...

MULTIPLE BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE BEAM IMAGE A...

CHARGED PARTICLE BEAM DEVICE

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

Charged Particle Beam Writing Apparatus and Charged Particle Beam W...

A Method for Determining the Changing Location of the Point of Inci...

EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

MULTI CHARGED PARTICLE BEAM EXPOSURE METHOD, AND MULTI CHARGED PART...

EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...

PROGRAM FOR CORRECTING CHARGED PARTICLE RADIATION LOCATION, DEVICE...

PATTERNING METHOD USING ELECTRON BEAM AND EXPOSURE SYSTEM CONFIGURE...

BEAM IRRADIATION APPARATUS AND BEAM IRRADIATION METHOD

APPARATUS AND METHODS FOR IMPLEMENTING PREDICTED SYSTEMATIC ERROR C...

IRRADIATION APPARATUS FOR IRRADIATING CHARGED PARTICLE BEAM, METHOD...

CHARGED PARTICLE BEAM APPARATUS AND SAMPLE PROCESSING METHOD USING...

DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD

IMPLANT-INDUCED DAMAGE CONTROL IN ION IMPLANTATION