Deflection of neutralising particles

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CPC
H01J2237/0042

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0042Deflection of neutralising particles

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for neutral beam processing based on gas clust...
- Patent number 11,199,769
- Issue date Dec 14, 2021
- Sean R. Kirkpatrick
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and techniques for decelerated ion beam with no energy co...
- Patent number 10,692,697
- Issue date Jun 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint method, chip production process, and imprint apparatus
- Patent number 8,828,307
- Issue date Sep 9, 2014
- Canon Kabushiki Kaisha
- Shingo Okushima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion implantation apparatus
- Patent number 8,742,374
- Issue date Jun 3, 2014
- Nissin Ion Equipment Co., Ltd.
- Masao Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual beam system
- Patent number 8,399,864
- Issue date Mar 19, 2013
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual beam system
- Patent number 8,013,311
- Issue date Sep 6, 2011
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam processing apparatus
- Patent number 7,982,192
- Issue date Jul 19, 2011
- Sen Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnet with active field containment
- Patent number 7,800,082
- Issue date Sep 21, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for commensurate cusp-field for effective ion beam neutr...
- Patent number 7,692,139
- Issue date Apr 6, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Bon Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual beam system
- Patent number 7,601,976
- Issue date Oct 13, 2009
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope application apparatus and sample inspection method
- Patent number 7,501,625
- Issue date Mar 10, 2009
- Hitachi High-Technologies Corporation
- Hikaru Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron confinement inside magnet of ion implanter
- Patent number 7,459,692
- Issue date Dec 2, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam neutralization in low-energy high-current ribbon-beam implanters
- Patent number 7,439,526
- Issue date Oct 21, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Kenneth H. Purser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus using neutralized beam and method th...
- Patent number 7,385,183
- Issue date Jun 10, 2008
- Samsung Electronics Co., Ltd.
- Sung-Chan Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual beam system
- Patent number 7,161,159
- Issue date Jan 9, 2007
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermoelectron generating source and ion beam radiating apparatus w...
- Patent number 6,872,959
- Issue date Mar 29, 2005
- Nissin Electric Co., Ltd.
- Yasuaki Nishigami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation with charge neutralization
- Patent number 6,271,529
- Issue date Aug 7, 2001
- Ebara Corporation
- Marvin Farley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Secondary ion mass spectrometer with aperture mask
- Patent number 6,080,986
- Issue date Jun 27, 2000
- Atomika Instruments GmbH
- Mark Graeme Dowsett
- G01 - MEASURING TESTING
Information Patent Grant
Process for analysis of a sample
- Patent number 6,078,045
- Issue date Jun 20, 2000
- Atomika Instruments GmbH
- Johann L. Maul
- G01 - MEASURING TESTING
Information Patent Grant
Ion implanter and controlling method therefor
- Patent number 5,293,508
- Issue date Mar 8, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Shigeru Shiratake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Chicane Blanker Assemblies for Charged Particle Beam Systems and Me...
- Publication number 20160093470
- Publication date Mar 31, 2016
- FEI Company
- Kevin Kagarice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS
- Publication number 20140053778
- Publication date Feb 27, 2014
- NISSIN ION EQUIPMENT CO., LTD.
- Masao Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Beam System
- Publication number 20110309263
- Publication date Dec 22, 2011
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Beam System
- Publication number 20100025578
- Publication date Feb 4, 2010
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT METHOD, CHIP PRODUCTION PROCESS, AND IMPRINT APPARATUS
- Publication number 20090098688
- Publication date Apr 16, 2009
- Canon Kabushiki Kaisha
- Shingo Okushima
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
TECHNIQUES FOR COMMENSURATE CUSP-FIELD FOR EFFECTIVE ION BEAM NEUTR...
- Publication number 20090095894
- Publication date Apr 16, 2009
- Varian Semiconductor Equipment Associates Inc.
- Bon Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM PROCESSING APPARATUS
- Publication number 20080258074
- Publication date Oct 23, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsukuni TSUKIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual beam system
- Publication number 20080035860
- Publication date Feb 14, 2008
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT
- Publication number 20070187619
- Publication date Aug 16, 2007
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron microscope application apparatus and sample inspection method
- Publication number 20060289755
- Publication date Dec 28, 2006
- Hikaru Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam neutralization in low-energy high-current ribbon-beam implanters
- Publication number 20060197037
- Publication date Sep 7, 2006
- Kenneth H. Purser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron confinement inside magent of ion implanter
- Publication number 20060169911
- Publication date Aug 3, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus using neutralized beam and method th...
- Publication number 20060163466
- Publication date Jul 27, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Sung-Chan Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual beam system
- Publication number 20050035291
- Publication date Feb 17, 2005
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermoelectron generating source and ion beam radiating apparatus w...
- Publication number 20040031935
- Publication date Feb 19, 2004
- NISSIN ELECTRIC CO., LTD.
- Yasuaki Nishigami
- H01 - BASIC ELECTRIC ELEMENTS

Deflection of neutralising particles

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for neutral beam processing based on gas clust...

Apparatus and techniques for decelerated ion beam with no energy co...

Imprint method, chip production process, and imprint apparatus

Ion implantation apparatus

Dual beam system

Dual beam system

Beam processing apparatus

Electromagnet with active field containment

Techniques for commensurate cusp-field for effective ion beam neutr...

Dual beam system

Electron microscope application apparatus and sample inspection method

Electron confinement inside magnet of ion implanter

Beam neutralization in low-energy high-current ribbon-beam implanters

Substrate processing apparatus using neutralized beam and method th...

Dual beam system

Thermoelectron generating source and ion beam radiating apparatus w...

Ion implantation with charge neutralization

Secondary ion mass spectrometer with aperture mask

Process for analysis of a sample

Ion implanter and controlling method therefor

Patents Applicationslast 30 patents

Chicane Blanker Assemblies for Charged Particle Beam Systems and Me...

ION IMPLANTATION APPARATUS

Dual Beam System

Dual Beam System

IMPRINT METHOD, CHIP PRODUCTION PROCESS, AND IMPRINT APPARATUS

TECHNIQUES FOR COMMENSURATE CUSP-FIELD FOR EFFECTIVE ION BEAM NEUTR...

BEAM PROCESSING APPARATUS

Dual beam system

ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT

Electron microscope application apparatus and sample inspection method

Beam neutralization in low-energy high-current ribbon-beam implanters

Electron confinement inside magent of ion implanter

Substrate processing apparatus using neutralized beam and method th...

Dual beam system

Thermoelectron generating source and ion beam radiating apparatus w...