Density

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CPC
H01J2237/0656

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0656Density

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Gun lens design in a charged particle microscope
- Patent number 10,410,827
- Issue date Sep 10, 2019
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for increasing electron density levels in a plasm...
- Patent number 10,147,588
- Issue date Dec 4, 2018
- Lam Research Corporation
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for independent control of radical density, ion...
- Patent number 9,767,991
- Issue date Sep 19, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particles beam apparatus and charged particles beam apparat...
- Patent number 8,809,799
- Issue date Aug 19, 2014
- Mamoru Nakasuji
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam apparatus, and method of controlling the same
- Patent number 8,319,193
- Issue date Nov 27, 2012
- Hitachi High-Technologies Corporation
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Crossover point regulation method for electro-static focusing systems
- Patent number 8,253,315
- Issue date Aug 28, 2012
- ATTI International Services Company, Inc.
- Artush A. Abgaryan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multiple device shaping uniform distribution of current density in...
- Patent number 8,084,929
- Issue date Dec 27, 2011
- ATTI International Services Company, Inc.
- Artush A. Abgaryan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multiple device shaping uniform distribution of current density in...
- Patent number 8,084,930
- Issue date Dec 27, 2011
- ATTI International Services Company, Inc.
- Artush A. Abgaryan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for measurement of beam emittance in a charged particle tran...
- Patent number 6,763,316
- Issue date Jul 13, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Louis Edward Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for suppressing space charge induced aberrations...
- Patent number 6,528,799
- Issue date Mar 4, 2003
- Lucent Technologies, Inc.
- Victor Katsap
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Charged Particle Beam Device
- Publication number 20240062986
- Publication date Feb 22, 2024
- Hitachi High-Tech Corporation
- Naho TERAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR CONTROLLING PLASMA DENSITY DISTRIBUTION PROFILES INCLUD...
- Publication number 20230352272
- Publication date Nov 2, 2023
- LAM RESEARCH CORPORATION
- Juline SHOEB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device for the Extraction of Electrical Charge Carriers from a Char...
- Publication number 20180294135
- Publication date Oct 11, 2018
- MEYER BURGER (GERMANY) AG
- Joachim Mai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Independent Control of Radical Density, Ion...
- Publication number 20180005803
- Publication date Jan 4, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR INCREASING ELECTRON DENSITY LEVELS IN A PLASM...
- Publication number 20170236694
- Publication date Aug 17, 2017
- LAM RESEARCH CORPORATION
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Independent Control of Radical Density, Ion...
- Publication number 20170125216
- Publication date May 4, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESONANT STRUCTURE FOR A PLASMA PROCESSING SYSTEM
- Publication number 20160071701
- Publication date Mar 10, 2016
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Device
- Publication number 20150170883
- Publication date Jun 18, 2015
- SPP TECHNOLOGIES CO., LTD.
- Takashi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Treating Apparatus and Method
- Publication number 20150136734
- Publication date May 21, 2015
- PSK INC.
- Hee Sun Chae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged practicles beam apparatus and charged particles beam appara...
- Publication number 20140097352
- Publication date Apr 10, 2014
- Mamoru Nakasuji
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME
- Publication number 20130063029
- Publication date Mar 14, 2013
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSSOVER POINT REGULATION METHOD FOR ELECTRO-STATIC FOCUSING SYSTEMS
- Publication number 20120126697
- Publication date May 24, 2012
- ATTI INTERNATIONAL SERVICES COMPANY, INC
- Artush A. Abgaryan
- B82 - NANO-TECHNOLOGY
Information Patent Application
ION BEAM DISTRIBUTION
- Publication number 20120080307
- Publication date Apr 5, 2012
- VEECO INSTRUMENTS, INC.
- Ikuya Kameyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME
- Publication number 20110089336
- Publication date Apr 21, 2011
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple Device Shaping Uniform Distribution of Current Density in...
- Publication number 20110068675
- Publication date Mar 24, 2011
- ATTI INTERNATIONAL SERVICES COMPANY, INC
- Artush A. Abgaryan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multiple Device Shaping Uniform Distribution of Current Density in...
- Publication number 20100277053
- Publication date Nov 4, 2010
- ATTI INTERNATIONAL SERVICES COMPANY, INC
- Artush A. Abgaryan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for measurement of beam emittance in a charged particle tran...
- Publication number 20030191899
- Publication date Oct 9, 2003
- Louis Edward Evans
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Gun lens design in a charged particle microscope

System and method for increasing electron density levels in a plasm...

Methods and systems for independent control of radical density, ion...

Charged particles beam apparatus and charged particles beam apparat...

Charged particle beam apparatus, and method of controlling the same

Crossover point regulation method for electro-static focusing systems

Multiple device shaping uniform distribution of current density in...

Multiple device shaping uniform distribution of current density in...

Method for measurement of beam emittance in a charged particle tran...

Device and method for suppressing space charge induced aberrations...

Patents Applicationslast 30 patents

Charged Particle Beam Device

SYSTEMS FOR CONTROLLING PLASMA DENSITY DISTRIBUTION PROFILES INCLUD...

Device for the Extraction of Electrical Charge Carriers from a Char...

Methods and Systems for Independent Control of Radical Density, Ion...

SYSTEM AND METHOD FOR INCREASING ELECTRON DENSITY LEVELS IN A PLASM...

Methods and Systems for Independent Control of Radical Density, Ion...

RESONANT STRUCTURE FOR A PLASMA PROCESSING SYSTEM

Plasma Etching Device

Substrate Treating Apparatus and Method

Charged practicles beam apparatus and charged particles beam appara...

CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME

CROSSOVER POINT REGULATION METHOD FOR ELECTRO-STATIC FOCUSING SYSTEMS

ION BEAM DISTRIBUTION

CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME

Multiple Device Shaping Uniform Distribution of Current Density in...

Multiple Device Shaping Uniform Distribution of Current Density in...

Method for measurement of beam emittance in a charged particle tran...