Deposition of porous oxides or porous glassy oxides or oxide based porous glass

Industry

CPC
H01L21/31695

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/31695Deposition of porous oxides or porous glassy oxides or oxide based porous glass

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Materials and methods of forming controlled void
- Patent number 9,293,361
- Issue date Mar 22, 2016
- Air Products and Chemicals, Inc.
- Raymond Nicholas Vrtis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous organosilicate layers, and vapor deposition systems and meth...
- Patent number 9,234,279
- Issue date Jan 12, 2016
- Micron Technology, Inc.
- Eugene P. Marsh
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Low k porous SiCOH dielectric and integration with post film format...
- Patent number 9,219,037
- Issue date Dec 22, 2015
- GLOBALFOUNDRIES INC.
- Stephen M. Gates
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Toughness, adhesion and smooth metal lines of porous low K dielectr...
- Patent number RE45781
- Issue date Oct 27, 2015
- GLOBALFOUNDRIES, INC.
- Jeffrey C. Hedrick
- 001 -
Information Patent Grant
Thermal processing system for curing dielectric films
- Patent number 8,956,457
- Issue date Feb 17, 2015
- Tokyo Electron Limited
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for using porogens for low k porous organosilica glass films
- Patent number 8,951,342
- Issue date Feb 10, 2015
- Air Products and Chemicals, Inc.
- Raymond Nicholas Vrtis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing porous insulating film
- Patent number 8,937,023
- Issue date Jan 20, 2015
- Renesas Electronics Corporation
- Fuminori Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of self-forming barrier integration with pore stuffed ULK m...
- Patent number 8,932,934
- Issue date Jan 13, 2015
- Global Foundries Inc.
- Moosung M. Chae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices formed with dual damascene process
- Patent number 8,860,225
- Issue date Oct 14, 2014
- Infineon Technologies AG
- Philipp Riess
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Materials and methods of forming controlled void
- Patent number 8,846,522
- Issue date Sep 30, 2014
- Air Products and Chemicals, Inc.
- Raymond Nicholas Vrtis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous organosilicate layers, and vapor deposition systems and meth...
- Patent number 8,840,990
- Issue date Sep 23, 2014
- Micron Technology, Inc.
- Eugene P. Marsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a porous insulation film
- Patent number 8,790,785
- Issue date Jul 29, 2014
- Renesas Electronics Corporation
- Hironori Yamamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing porous structure and method for forming pa...
- Patent number 8,778,201
- Issue date Jul 15, 2014
- Kabushiki Kaisha Toshiba
- Koji Asakawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device having reinforced low-k insulating film and it...
- Patent number 8,772,182
- Issue date Jul 8, 2014
- Fujitsu Semiconductor Limited
- Yoshiyuki Ohkura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabrication of semiconductor device
- Patent number 8,759,222
- Issue date Jun 24, 2014
- Sony Corporation
- Tsutomu Shimayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ruthenium complex mixture, method of producing the same, compositio...
- Patent number 8,742,153
- Issue date Jun 3, 2014
- Tosoh Corporation
- Atsushi Maniwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve mechanical strength of low-K dielectric film usin...
- Patent number 8,715,788
- Issue date May 6, 2014
- Novellus Systems, Inc.
- Ananda K. Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming porous insulating film and semiconductor device
- Patent number 8,715,791
- Issue date May 6, 2014
- Renesas Electronics Corporation
- Munehiro Tada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices including porous insulators
- Patent number 8,680,680
- Issue date Mar 25, 2014
- Micron Technology, Inc.
- Warren M. Farnworth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing an oriented-porosity dielectric material on a...
- Patent number 8,623,466
- Issue date Jan 7, 2014
- Commissariat a l'Energie Atomique
- Aziz Zenasni
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Materials containing voids with void size controlled on the nanomet...
- Patent number 8,618,183
- Issue date Dec 31, 2013
- International Business Machines Corporation
- Stephen M. Gates
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition and method for production thereof, porous material and...
- Patent number 8,603,588
- Issue date Dec 10, 2013
- Mitsui Chemicals, Inc.
- Kazuo Kohmura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Wiring structure, semiconductor device and manufacturing method the...
- Patent number 8,592,283
- Issue date Nov 26, 2013
- Renesas Electronics Corporation
- Fuminori Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of a masking layer on a dielectric region to facilitate f...
- Patent number 8,575,036
- Issue date Nov 5, 2013
- Intermolecular, Inc.
- David E. Lazovsky
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming porous material in microcavity or micropassage b...
- Patent number 8,562,934
- Issue date Oct 22, 2013
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Jean-Christophe Coiffic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for preparing thin layers of nanoporous dielectric materials
- Patent number 8,524,332
- Issue date Sep 3, 2013
- Commissariat a l'Energie Atomique
- Vincent Jousseaume
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Template derivative for forming ultra-low dielectric layer and meth...
- Patent number 8,507,665
- Issue date Aug 13, 2013
- Hynix Semiconductor Inc.
- Sung Kyu Min
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor device having insulating film with surface modificati...
- Patent number 8,492,266
- Issue date Jul 23, 2013
- Renesas Electronics Corporation
- Makoto Ueki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making toughening agent materials
- Patent number 8,475,666
- Issue date Jul 2, 2013
- Honeywell International Inc.
- Teresa A. Ramos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous silica precursor composition and method for preparing the pr...
- Patent number 8,471,140
- Issue date Jun 25, 2013
- ULVAC, Inc.
- Takahiro Nakayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
Materials and Methods of Forming Controlled Void
- Publication number 20140363950
- Publication date Dec 11, 2014
- Raymond Nicholas Vrtis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF SELF-FORMING BARRIER INTEGRATION WITH PORE STUFFED ULK M...
- Publication number 20140353835
- Publication date Dec 4, 2014
- Moosung M. CHAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...
- Publication number 20140284306
- Publication date Sep 25, 2014
- Kabushiki Kaisha Toshiba
- Koji Asakawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS OF FORMING A PORUOUS INSULATOR, AND RELATED METHODS OF FORM...
- Publication number 20140206203
- Publication date Jul 24, 2014
- Micron Technology, Inc.
- Warren M. Farnworth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...
- Publication number 20140050860
- Publication date Feb 20, 2014
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Removal of Carbon from an Organosilicate Material
- Publication number 20130295334
- Publication date Nov 7, 2013
- Aiping Wu
- B32 - LAYERED PRODUCTS
Information Patent Application
Materials and Methods of Forming Controlled Void
- Publication number 20130157435
- Publication date Jun 20, 2013
- Air Products and Chemicals, Inc.
- RAYMOND NICHOLAS VRTIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of a Masking Layer on a Dielectric Region to Facilitate F...
- Publication number 20130072026
- Publication date Mar 21, 2013
- Intermolecular, Inc.
- David E. Lazovsky
- B82 - NANO-TECHNOLOGY
Information Patent Application
LOW k POROUS SiCOH DIELECTRIC AND INTEGRATION WITH POST FILM FORMAT...
- Publication number 20120329287
- Publication date Dec 27, 2012
- International Business Machines Corporation
- Stephen M. Gates
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...
- Publication number 20120328796
- Publication date Dec 27, 2012
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON PO...
- Publication number 20120301706
- Publication date Nov 29, 2012
- International Business Machines Corporation
- Andrew J. Kellock
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Using Porogens For Low K Porous Organosilica Glass Films
- Publication number 20120282415
- Publication date Nov 8, 2012
- Air Products and Chemicals, Inc.
- Raymond Nicholas Vrtis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of a Masking Layer on a Dielectric Region to Facilitate F...
- Publication number 20120258595
- Publication date Oct 11, 2012
- Intermolecular, Inc.
- David E. Lazovsky
- B82 - NANO-TECHNOLOGY
Information Patent Application
TEMPLATE DERIVATIVE FOR FORMING ULTRA-LOW DIELECTRIC LAYER AND METH...
- Publication number 20120231635
- Publication date Sep 13, 2012
- Hynix Semiconductor Inc.
- Sung Kyu MIN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TEMPLATE DERIVATIVE FOR FORMING ULTRA-LOW DIELECTRIC LAYER AND METH...
- Publication number 20120231634
- Publication date Sep 13, 2012
- Hynix Semiconductor Inc.
- Sung Kyu MIN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RUTHENIUM COMPLEX MIXTURE, METHOD OF PRODUCING THE SAME, COMPOSITIO...
- Publication number 20120227625
- Publication date Sep 13, 2012
- Atsushi Maniwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Increasing Deposition Rate of Silicon Dioxide on a Catalyst
- Publication number 20120202359
- Publication date Aug 9, 2012
- Chris W. Hill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING POROUS INSULATING FILM
- Publication number 20120135611
- Publication date May 31, 2012
- RENESAS ELECTRONICS CORPORATION
- Fuminori ITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PREPARING AN ORIENTED-POROSITY DIELECTRIC MATERIAL ON A...
- Publication number 20120135161
- Publication date May 31, 2012
- COMMISSARIAT A L'ENERGIE ATOMIQUE
- Aziz ZENASNI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL CAPACITOR AND METHOD OF MAKING THE SAME
- Publication number 20120115301
- Publication date May 10, 2012
- Chin-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL CAPACITOR AND METHOD OF MAKING THE SAME
- Publication number 20120098094
- Publication date Apr 26, 2012
- Chin-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING INSULATING FILM WITH SURFACE MODIFICATI...
- Publication number 20120070986
- Publication date Mar 22, 2012
- RENESAS ELECTRONICS CORPORATION
- Makoto UEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...
- Publication number 20120037595
- Publication date Feb 16, 2012
- Koji Asakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...
- Publication number 20120037594
- Publication date Feb 16, 2012
- Koji Asakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...
- Publication number 20120041121
- Publication date Feb 16, 2012
- Koji Asakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Devices Formed With Dual Damascene Process
- Publication number 20120025382
- Publication date Feb 2, 2012
- INFINEON TECHNOLOGIES AG
- Philipp Riess
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wiring structure, semiconductor device and manufacturing method the...
- Publication number 20110318926
- Publication date Dec 29, 2011
- NEC Corporation
- Fuminori Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING LOW-k FILM, SEMICONDUCTOR DEVICE, AND METHOD F...
- Publication number 20110309511
- Publication date Dec 22, 2011
- Elpida Memory, Inc.
- Yoshinori CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IM...
- Publication number 20110256713
- Publication date Oct 20, 2011
- International Business Machines Corporation
- Robert David Allen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Porous Organosilicate Layers, and Vapor Deposition Systems and Meth...
- Publication number 20110206921
- Publication date Aug 25, 2011
- Micron Technology, Inc.
- Eugene P. Marsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Deposition of porous oxides or porous glassy oxides or oxide based porous glass

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Materials and methods of forming controlled void

Porous organosilicate layers, and vapor deposition systems and meth...

Low k porous SiCOH dielectric and integration with post film format...

Toughness, adhesion and smooth metal lines of porous low K dielectr...

Thermal processing system for curing dielectric films

Methods for using porogens for low k porous organosilica glass films

Method of manufacturing porous insulating film

Methods of self-forming barrier integration with pore stuffed ULK m...

Devices formed with dual damascene process

Materials and methods of forming controlled void

Porous organosilicate layers, and vapor deposition systems and meth...

Method of forming a porous insulation film

Method for manufacturing porous structure and method for forming pa...

Semiconductor device having reinforced low-k insulating film and it...

Method for fabrication of semiconductor device

Ruthenium complex mixture, method of producing the same, compositio...

Method to improve mechanical strength of low-K dielectric film usin...

Method for forming porous insulating film and semiconductor device

Semiconductor devices including porous insulators

Method for preparing an oriented-porosity dielectric material on a...

Materials containing voids with void size controlled on the nanomet...

Composition and method for production thereof, porous material and...

Wiring structure, semiconductor device and manufacturing method the...

Formation of a masking layer on a dielectric region to facilitate f...

Method for forming porous material in microcavity or micropassage b...

Process for preparing thin layers of nanoporous dielectric materials

Template derivative for forming ultra-low dielectric layer and meth...

Semiconductor device having insulating film with surface modificati...

Method for making toughening agent materials

Porous silica precursor composition and method for preparing the pr...

Patents Applicationslast 30 patents

Materials and Methods of Forming Controlled Void

METHODS OF SELF-FORMING BARRIER INTEGRATION WITH PORE STUFFED ULK M...

METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...

METHODS OF FORMING A PORUOUS INSULATOR, AND RELATED METHODS OF FORM...

MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...

Method for Removal of Carbon from an Organosilicate Material

Materials and Methods of Forming Controlled Void

Formation of a Masking Layer on a Dielectric Region to Facilitate F...

LOW k POROUS SiCOH DIELECTRIC AND INTEGRATION WITH POST FILM FORMAT...

MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...

METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON PO...

Methods For Using Porogens For Low K Porous Organosilica Glass Films

Formation of a Masking Layer on a Dielectric Region to Facilitate F...

TEMPLATE DERIVATIVE FOR FORMING ULTRA-LOW DIELECTRIC LAYER AND METH...

TEMPLATE DERIVATIVE FOR FORMING ULTRA-LOW DIELECTRIC LAYER AND METH...

RUTHENIUM COMPLEX MIXTURE, METHOD OF PRODUCING THE SAME, COMPOSITIO...

Method of Increasing Deposition Rate of Silicon Dioxide on a Catalyst

METHOD OF MANUFACTURING POROUS INSULATING FILM

METHOD FOR PREPARING AN ORIENTED-POROSITY DIELECTRIC MATERIAL ON A...

METAL CAPACITOR AND METHOD OF MAKING THE SAME

METAL CAPACITOR AND METHOD OF MAKING THE SAME

SEMICONDUCTOR DEVICE HAVING INSULATING FILM WITH SURFACE MODIFICATI...

METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...

METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...

METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...

Devices Formed With Dual Damascene Process

Wiring structure, semiconductor device and manufacturing method the...

METHOD FOR PRODUCING LOW-k FILM, SEMICONDUCTOR DEVICE, AND METHOD F...

POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IM...

Porous Organosilicate Layers, and Vapor Deposition Systems and Meth...