Details

Industry

CPC
H01J2237/30405

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/30405Details

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Specimen machining device and information provision method
- Patent number 11,837,437
- Issue date Dec 5, 2023
- Jeol Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and control method thereof
- Patent number 11,742,177
- Issue date Aug 29, 2023
- Hitachi High-Tech Science Corporation
- Ayana Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multibeam scanning apparatus and multibeam scanning method
- Patent number 11,569,061
- Issue date Jan 31, 2023
- Kioxia Corporation
- Osamu Nagano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and control method thereof
- Patent number 11,177,113
- Issue date Nov 16, 2021
- Hitachi High-Tech Science Corporation
- Ayana Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for improved ion beam current
- Patent number 10,074,514
- Issue date Sep 11, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for implantation of semiconductor wafers having high bulk re...
- Patent number 9,824,857
- Issue date Nov 21, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Michael W. Osborne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mirror array in digital pattern generator (DPG)
- Patent number 9,690,208
- Issue date Jun 27, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Hsin Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arc chamber with multiple cathodes for an ion source
- Patent number 9,620,326
- Issue date Apr 11, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chin-Tsung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced defect detection in electron beam inspection and review
- Patent number 9,449,788
- Issue date Sep 20, 2016
- KLA-Tencor Corporation
- Gary G. Fan
- G01 - MEASURING TESTING
Information Patent Grant
System and method of performing uniform dose implantation under adv...
- Patent number 8,071,964
- Issue date Dec 6, 2011
- Axcelis Technologies, Inc.
- Shu Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring ion beam position
- Patent number 7,417,242
- Issue date Aug 26, 2008
- Axcelis Technologies, Inc.
- Andrew M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-energy ion implanter and method of operation thereof
- Patent number 7,019,316
- Issue date Mar 28, 2006
- Samsung Electronics Co., Ltd.
- Yeon-Ha Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for applying feedback control to a magnetic lens
- Patent number 6,891,167
- Issue date May 10, 2005
- KLA Tencor Technologies
- John A. Notte, IV
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...
- Publication number 20240281952
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Thomas Korb
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MICROSCOPY FEEDBACK FOR IMPROVED MILLING ACCURACY
- Publication number 20230197403
- Publication date Jun 22, 2023
- FEI Company
- Thomas Gary Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Specimen Machining Device and Information Provision Method
- Publication number 20220392744
- Publication date Dec 8, 2022
- JEOL Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIBEAM SCANNING APPARATUS AND MULTIBEAM SCANNING METHOD
- Publication number 20220301814
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Osamu NAGANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20220084785
- Publication date Mar 17, 2022
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Ayana MURAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220020569
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20200312617
- Publication date Oct 1, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Ayana MURAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPLANTATION OF SEMICONDUCTOR WAFERS HAVING HIGH BULK RE...
- Publication number 20170207063
- Publication date Jul 20, 2017
- Michael W. Osborne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Fabricating an Integrated Circuit with a Pattern Density-...
- Publication number 20150371821
- Publication date Dec 24, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE
- Publication number 20150130353
- Publication date May 14, 2015
- Taiwan Semiconductor Manufacturing Co., LTD
- Chin-Tsung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE
- Publication number 20140167614
- Publication date Jun 19, 2014
- Taiwan Semiconductor Manufacturing Co., LTD
- Chin-Tsung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF PERFORMING UNIFORM DOSE IMPLANTATION UNDER ADV...
- Publication number 20090272918
- Publication date Nov 5, 2009
- Axcelis Technologies, Inc.
- Shu Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of measuring ion beam position
- Publication number 20060219955
- Publication date Oct 5, 2006
- Axcelis Technologies, Inc.
- Andrew M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-ENERGY ION IMPLANTER AND METHOD OF OPERATION THEREOF
- Publication number 20060011866
- Publication date Jan 19, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Yeon-Ha Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for applying feedback control to a magnetic lens
- Publication number 20030205678
- Publication date Nov 6, 2003
- John A. Notte
- B82 - NANO-TECHNOLOGY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Specimen machining device and information provision method

Charged particle beam apparatus and control method thereof

Multibeam scanning apparatus and multibeam scanning method

Charged particle beam apparatus and control method thereof

Apparatus and method for improved ion beam current

Method for implantation of semiconductor wafers having high bulk re...

Mirror array in digital pattern generator (DPG)

Arc chamber with multiple cathodes for an ion source

Enhanced defect detection in electron beam inspection and review

System and method of performing uniform dose implantation under adv...

Method of measuring ion beam position

High-energy ion implanter and method of operation thereof

Apparatus and method for applying feedback control to a magnetic lens

Patents Applicationslast 30 patents

3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUM...

MICROSCOPY FEEDBACK FOR IMPROVED MILLING ACCURACY

Specimen Machining Device and Information Provision Method

MULTIBEAM SCANNING APPARATUS AND MULTIBEAM SCANNING METHOD

CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF

METHOD FOR IMPLANTATION OF SEMICONDUCTOR WAFERS HAVING HIGH BULK RE...

Method of Fabricating an Integrated Circuit with a Pattern Density-...

ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE

ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE

SYSTEM AND METHOD OF PERFORMING UNIFORM DOSE IMPLANTATION UNDER ADV...

Method of measuring ion beam position

HIGH-ENERGY ION IMPLANTER AND METHOD OF OPERATION THEREOF

Apparatus and method for applying feedback control to a magnetic lens