Detecting or monitoring foreign particles

Industry

CPC
H01J2237/0225

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0225Detecting or monitoring foreign particles

Industries

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Patents Grantslast 30 patents

Information Patent Grant
System and method for residual gas analysis
- Patent number 12,176,193
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Etching apparatus and methods of cleaning thereof
- Patent number 12,080,582
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for residual gas analysis
- Patent number 11,791,141
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Etching apparatus and methods of cleaning thereof
- Patent number 11,222,805
- Issue date Jan 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,011,345
- Issue date May 18, 2021
- HITACHI HIGH-TECH CORPORATION
- Takumi Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for dust emitting of foreign matter and dust emission cause...
- Patent number 10,748,742
- Issue date Aug 18, 2020
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, subs...
- Patent number 10,724,137
- Issue date Jul 28, 2020
- KOKUSAI ELETRIC CORPORATION
- Osamu Morita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Handheld material analyser
- Patent number 10,712,296
- Issue date Jul 14, 2020
- ORION ENGINEERING LIMITED
- Vladimir Vishnyakov
- G01 - MEASURING TESTING
Information Patent Grant
Detecting arcing using processing chamber data
- Patent number 9,653,269
- Issue date May 16, 2017
- Applied Materials, Inc.
- Shuo Na
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Platen clamping surface monitoring
- Patent number 8,592,786
- Issue date Nov 26, 2013
- Varian Semiconductor Equipment Associates, Inc.
- David E. Suuronen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of detecting defects on an object
- Patent number 7,940,383
- Issue date May 10, 2011
- Hitachi, Ltd.
- Minori Noguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Measuring energy contamination using time-of-flight techniques
- Patent number 7,888,636
- Issue date Feb 15, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Bon Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for testing defects
- Patent number 7,692,779
- Issue date Apr 6, 2010
- Hitachi, Ltd.
- Minori Noguchi
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for testing defects
- Patent number 7,639,350
- Issue date Dec 29, 2009
- Hitachi, Ltd.
- Minori Noguchi
- G01 - MEASURING TESTING
Information Patent Grant
Manufacturing equipment using ION beam or electron beam
- Patent number 7,592,606
- Issue date Sep 22, 2009
- Hitachi High-Technologies Corporation
- Koji Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for detecting ion beam contamination in an ion implantat...
- Patent number 7,586,110
- Issue date Sep 8, 2009
- Varian Semiconductor Equpment Associates, INc.
- Russell John Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analyzing chamber including a leakage ion beam detector and mass an...
- Patent number 7,531,792
- Issue date May 12, 2009
- Samsung Electronics Co., Ltd.
- Hyun-Sub Earm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,449,692
- Issue date Nov 11, 2008
- Hitachi High-Technologies Corporation
- Takashi Onishi
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for testing defects
- Patent number 7,443,496
- Issue date Oct 28, 2008
- Hitachi, Ltd.
- Minori Noguchi
- G01 - MEASURING TESTING
Information Patent Grant
Processing apparatus and method for removing particles therefrom
- Patent number 7,347,006
- Issue date Mar 25, 2008
- Tokyo Electron Limited
- Tsuyoshi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for monitoring particles contamination in semicon...
- Patent number 7,282,111
- Issue date Oct 16, 2007
- Samsung Electronics Co., Ltd.
- Bong-Jin Park
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor device manufacturing apparatus and a method of contro...
- Patent number 7,235,795
- Issue date Jun 26, 2007
- Applied Materials, Inc.
- Jonathon Yancey Simmons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,223,976
- Issue date May 29, 2007
- Hitachi, Ltd.
- Takashi Onishi
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,208,731
- Issue date Apr 24, 2007
- Hitachi, Ltd.
- Takashi Onishi
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for analyzing the state of generation of forei...
- Patent number 7,177,020
- Issue date Feb 13, 2007
- Renesas Technology Corp.
- Hiroshi Morioka
- G01 - MEASURING TESTING
Information Patent Grant
Particle control device and particle control method for vacuum proc...
- Patent number 7,166,480
- Issue date Jan 23, 2007
- Hitachi High-Technologies Corporation
- Daisuke Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for testing defects
- Patent number 7,098,055
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Minori Noguchi
- G01 - MEASURING TESTING
Information Patent Grant
In-situ monitoring on an ion implanter
- Patent number 7,078,712
- Issue date Jul 18, 2006
- Axcelis Technologies, Inc.
- Alexander S. Perel
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,064,324
- Issue date Jun 20, 2006
- Hitachi, Ltd.
- Takashi Onishi
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for testing defects
- Patent number 7,037,735
- Issue date May 2, 2006
- Hitachi, Ltd.
- Minori Noguchi
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20240355663
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386807
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386808
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERMITTENT STAGNANT FLOW
- Publication number 20230230820
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Douglas L. KEIL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CLEANING CHAMBER
- Publication number 20230178345
- Publication date Jun 8, 2023
- Kyoungran Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS
- Publication number 20220319814
- Publication date Oct 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hsing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20220130706
- Publication date Apr 28, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20220037137
- Publication date Feb 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20210313212
- Publication date Oct 7, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20200294758
- Publication date Sep 17, 2020
- Hitachi High-Technologies Corporation
- Takumi HATAKEYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HANDHELD MATERIAL ANALYSER
- Publication number 20200088660
- Publication date Mar 19, 2020
- ORION ENGINEERING LIMITED
- Vladimir VISHNYAKOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED PARTICLE BEAMS WITH MULTI-AXIS MAGNETIC...
- Publication number 20150060662
- Publication date Mar 5, 2015
- HERMES MICROVISION, INC.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTING ARCING USING PROCESSING CHAMBER DATA
- Publication number 20150048862
- Publication date Feb 19, 2015
- Applied Materials, Inc.
- Shuo NA
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20140190632
- Publication date Jul 10, 2014
- Applied Materials, Inc.
- Ajay KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CLEANING RESIDUE FROM AN ION SOURCE COMPONENT
- Publication number 20130305989
- Publication date Nov 21, 2013
- Axcelis Technologies, Inc.
- Aseem K. Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and Apparatus for Actively Monitoring an Inductively-Coupled...
- Publication number 20130250293
- Publication date Sep 26, 2013
- FEI Company
- Mark W. Utlaut
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLATEN CLAMPING SURFACE MONITORING
- Publication number 20130248738
- Publication date Sep 26, 2013
- Varian Semiconductor Equipment Associates, Inc.
- David E. Suuronen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CLEANING RESIDUE FROM AN ION SOURCE COMPONENT
- Publication number 20110108058
- Publication date May 12, 2011
- Axcelis Technologies, Inc.
- Aseem K. Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus And Method For Testing Defects
- Publication number 20100088042
- Publication date Apr 8, 2010
- Minori NOGUCHI
- G01 - MEASURING TESTING
Information Patent Application
MEASURING ENERGY CONTAMINATION USING TIME-OF-FLIGHT TECHNIQUES
- Publication number 20090114813
- Publication date May 7, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Bon Woong KOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing Equipment Using ION Beam or Electron Beam
- Publication number 20080018460
- Publication date Jan 24, 2008
- Hitachi High-Technologies Corporation
- Koji Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam apparatus
- Publication number 20070152150
- Publication date Jul 5, 2007
- Hitachi, Ltd
- Takashi Onishi
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR TESTING DEFECTS
- Publication number 20070146696
- Publication date Jun 28, 2007
- Minori Noguchi
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR TESTING DEFECTS
- Publication number 20070146697
- Publication date Jun 28, 2007
- Minori Noguchi
- G01 - MEASURING TESTING
Information Patent Application
Analyzing chamber including a leakage ion beam detector and mass an...
- Publication number 20070018093
- Publication date Jan 25, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Hyun-Sub Earm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20070017898
- Publication date Jan 25, 2007
- Ajay Kumar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged particle beam apparatus
- Publication number 20060289753
- Publication date Dec 28, 2006
- Hitachi, Ltd
- Takashi Onishi
- G01 - MEASURING TESTING
Information Patent Application
Charged particle beam apparatus
- Publication number 20060289754
- Publication date Dec 28, 2006
- Hitachi, Ltd
- Takashi Onishi
- G01 - MEASURING TESTING
Information Patent Application
Methods and apparatus for processing wafers
- Publication number 20060260645
- Publication date Nov 23, 2006
- Nicholas John Appleyard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing apparatus and a method of contro...
- Publication number 20060035396
- Publication date Feb 16, 2006
- APPLIED MATERIALS, INC.
- Jonathon Yancey Simmons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Detecting or monitoring foreign particles

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System and method for residual gas analysis

Etching apparatus and methods of cleaning thereof

System and method for residual gas analysis

Etching apparatus and methods of cleaning thereof

Charged particle beam device

Device for dust emitting of foreign matter and dust emission cause...

Cleaning method, method of manufacturing semiconductor device, subs...

Handheld material analyser

Detecting arcing using processing chamber data

Platen clamping surface monitoring

Method of detecting defects on an object

Measuring energy contamination using time-of-flight techniques

Apparatus and method for testing defects

Apparatus and method for testing defects

Manufacturing equipment using ION beam or electron beam

Techniques for detecting ion beam contamination in an ion implantat...

Analyzing chamber including a leakage ion beam detector and mass an...

Charged particle beam apparatus

Apparatus and method for testing defects

Processing apparatus and method for removing particles therefrom

System and method for monitoring particles contamination in semicon...

Semiconductor device manufacturing apparatus and a method of contro...

Charged particle beam apparatus

Charged particle beam apparatus

Method and apparatus for analyzing the state of generation of forei...

Particle control device and particle control method for vacuum proc...

Apparatus and method for testing defects

In-situ monitoring on an ion implanter

Charged particle beam apparatus

Apparatus and method for testing defects

Patents Applicationslast 30 patents

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

INTERMITTENT STAGNANT FLOW

METHOD OF CLEANING CHAMBER

METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

Charged Particle Beam Device

HANDHELD MATERIAL ANALYSER

APPARATUS OF PLURAL CHARGED PARTICLE BEAMS WITH MULTI-AXIS MAGNETIC...

DETECTING ARCING USING PROCESSING CHAMBER DATA

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

METHOD AND APPARATUS FOR CLEANING RESIDUE FROM AN ION SOURCE COMPONENT

Method and Apparatus for Actively Monitoring an Inductively-Coupled...

PLATEN CLAMPING SURFACE MONITORING

METHOD AND APPARATUS FOR CLEANING RESIDUE FROM AN ION SOURCE COMPONENT

Apparatus And Method For Testing Defects

MEASURING ENERGY CONTAMINATION USING TIME-OF-FLIGHT TECHNIQUES

Manufacturing Equipment Using ION Beam or Electron Beam

Charged particle beam apparatus

APPARATUS AND METHOD FOR TESTING DEFECTS

APPARATUS AND METHOD FOR TESTING DEFECTS

Analyzing chamber including a leakage ion beam detector and mass an...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Charged particle beam apparatus

Charged particle beam apparatus

Methods and apparatus for processing wafers

Semiconductor device manufacturing apparatus and a method of contro...