detecting pattern defects

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CPC
H01J2237/31798

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31798detecting pattern defects

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Recovery of a hierarchical functional representation of an integrat...
- Patent number 11,651,126
- Issue date May 16, 2023
- Battelle Memorial Institute
- Adam G. Kimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Anomaly determination method and writing apparatus
- Patent number 11,275,044
- Issue date Mar 15, 2022
- NuFlare Technology, Inc.
- Shun Kanezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for bare wafer inspection
- Patent number 11,087,954
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Guided scanning electron microscopy metrology based on wafer topogr...
- Patent number 10,957,608
- Issue date Mar 23, 2021
- KLA-Tencor Corporation
- Arpit Yati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,937,628
- Issue date Mar 2, 2021
- HITACHI HIGH-TECH CORPORATION
- Chikako Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged particle beam writing apparatus, and multiple char...
- Patent number 10,784,080
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged particle beam inspection apparatus and multiple ch...
- Patent number 10,768,126
- Issue date Sep 8, 2020
- NuFlare Technology, Inc.
- Riki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process window analysis
- Patent number 10,720,367
- Issue date Jul 21, 2020
- Applied Materials Israel Ltd.
- Idan Kaizerman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for an imaging system
- Patent number 10,614,993
- Issue date Apr 7, 2020
- Frederick A. Flitsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of obtaining beam deflection shape and method of obtaining a...
- Patent number 10,586,682
- Issue date Mar 10, 2020
- NuFlare Technology, Inc.
- Shunsuke Isaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,504,696
- Issue date Dec 10, 2019
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,497,539
- Issue date Dec 3, 2019
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,483,088
- Issue date Nov 19, 2019
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi electron beam inspection apparatus
- Patent number 10,312,052
- Issue date Jun 4, 2019
- Technische Universiteit Delft
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining misalignment between a first and a second et...
- Patent number 10,211,162
- Issue date Feb 19, 2019
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Guido Rademaker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blanking aperture array apparatus, charged particle beam lithograph...
- Patent number 10,068,750
- Issue date Sep 4, 2018
- NuFlare Technology, Inc.
- Masayoshi Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining multi-patterning step overlay error
- Patent number 10,062,543
- Issue date Aug 28, 2018
- KLA-Tencor Corp.
- Ajay Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for structuring an object and associated particle beam system
- Patent number 9,960,012
- Issue date May 1, 2018
- Carl Zeiss Microscopy GmbH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for a high resolution imaging system
- Patent number 9,558,915
- Issue date Jan 31, 2017
- Frederick A. Flitsch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure apparatus and method of detecting error usin...
- Patent number 9,229,327
- Issue date Jan 5, 2016
- Samsung Electronics Co., Ltd.
- Sang Yong Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 9,159,535
- Issue date Oct 13, 2015
- NuFlare Technology, Inc.
- Takashi Kamikubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 9,070,607
- Issue date Jun 30, 2015
- Advantest Corp.
- Masahiro Ishida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and methods for electron beam detection
- Patent number 8,692,204
- Issue date Apr 8, 2014
- KLA-Tencor Corporation
- Shinichi Kojima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron microscope assembly for viewing the wafer plane image of a...
- Patent number 8,642,981
- Issue date Feb 4, 2014
- KLA-Tencor Corporation
- Paul Petric
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Write error verification method of writing apparatus and creation a...
- Patent number 8,307,314
- Issue date Nov 6, 2012
- Nuflare Technology, Inc.
- Akihito Anpo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Writing method and writing apparatus of charged particle beam, posi...
- Patent number 7,554,107
- Issue date Jun 30, 2009
- Nuflare Technology, Inc.
- Shusuke Yoshitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system
- Patent number 6,979,822
- Issue date Dec 27, 2005
- FEI Company
- Diane K. Stewart
- G01 - MEASURING TESTING
Information Patent Grant
Method of adjusting a lithography system to enhance image quality
- Patent number 6,476,400
- Issue date Nov 5, 2002
- International Business Machines Corporation
- Christopher F. Robinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam-projection-exposure apparatus with integrated mask in...
- Patent number 6,038,015
- Issue date Mar 14, 2000
- Nikon Corporation
- Shintaro Kawata
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for detecting defect in circuit pattern of a m...
- Patent number 4,814,615
- Issue date Mar 21, 1989
- Hitachi, Ltd.
- Satoru Fushimi
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR BARE WAFER INSPECTION
- Publication number 20220068592
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G01 - MEASURING TESTING
Information Patent Application
ANOMALY DETERMINATION METHOD AND WRITING APPARATUS
- Publication number 20200072777
- Publication date Mar 5, 2020
- NuFlare Technology, Inc.
- Shun KANEZAWA
- G01 - MEASURING TESTING
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM INSPECTION APPARATUS AND MULTIPLE CH...
- Publication number 20190360951
- Publication date Nov 28, 2019
- NuFlare Technology, Inc.
- Riki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20190362938
- Publication date Nov 28, 2019
- Hitachi High-Technologies Corporation
- Chikako ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS WINDOW ANALYSIS
- Publication number 20190355628
- Publication date Nov 21, 2019
- APPLIED MATERIALS ISRAEL LTD.
- Idan KAIZERMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHAR...
- Publication number 20190304749
- Publication date Oct 3, 2019
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...
- Publication number 20190172678
- Publication date Jun 6, 2019
- NuFlare Technology, Inc.
- Shunsuke ISAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20190043692
- Publication date Feb 7, 2019
- NuFlare Technology, Inc.
- Rumi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING MISALIGNMENT BETWEEN A FIRST AND A SECOND ET...
- Publication number 20180233456
- Publication date Aug 16, 2018
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Guido Rademaker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20180144905
- Publication date May 24, 2018
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20180138012
- Publication date May 17, 2018
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20180138013
- Publication date May 17, 2018
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY APPARATUS, CHARGED PARTICLE BEAM LITHOGRAPH...
- Publication number 20180076006
- Publication date Mar 15, 2018
- NuFlare Technology, Inc.
- Masayoshi ONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR STRUCTURING AN OBJECT AND ASSOCIATED PARTICLE BEAM SYSTEM
- Publication number 20170263416
- Publication date Sep 14, 2017
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI ELECTRON BEAM INSPECTION APPARATUS
- Publication number 20170243717
- Publication date Aug 24, 2017
- Technische Universiteit Delft
- Pieter KRUIT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM EXPOSURE APPARATUS AND METHOD OF DETECTING ERROR USIN...
- Publication number 20150102236
- Publication date Apr 16, 2015
- Samsung Electronics Co., Ltd.
- Sang Yong YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20150090896
- Publication date Apr 2, 2015
- Canon Kabushiki Kaisha
- Go TSUCHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SETTLING TIME ACQUISITION METHOD
- Publication number 20140284500
- Publication date Sep 25, 2014
- NuFlure Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140154629
- Publication date Jun 5, 2014
- Canon Kabushiki Kaisha
- Hiromi Kinebuchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of manufacturing semiconductor device and semiconductor manu...
- Publication number 20130115723
- Publication date May 9, 2013
- Advantest Corporation
- Masahiro Ishida
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHODS FOR ELECTRON BEAM DETECTION
- Publication number 20120273686
- Publication date Nov 1, 2012
- Shinichi KOJIMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
WRITE ERROR VERIFICATION METHOD OF WRITING APPARATUS AND CREATION A...
- Publication number 20100306721
- Publication date Dec 2, 2010
- NuFlare Technology, Inc.
- Akihito ANPO
- B82 - NANO-TECHNOLOGY
Information Patent Application
WRITING METHOD AND WRITING APPARATUS OF CHARGED PARTICLE BEAM, POSI...
- Publication number 20070103659
- Publication date May 10, 2007
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle beam apparatus and method for automatically correc...
- Publication number 20060060781
- Publication date Mar 23, 2006
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM
- Publication number 20050279934
- Publication date Dec 22, 2005
- FEI Company
- Diane K. Stewart
- G01 - MEASURING TESTING
Information Patent Application
System and method for inspecting a mask
- Publication number 20030132382
- Publication date Jul 17, 2003
- Michael R. Sogard
- G01 - MEASURING TESTING

detecting pattern defects

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Recovery of a hierarchical functional representation of an integrat...

Anomaly determination method and writing apparatus

System and method for bare wafer inspection

Guided scanning electron microscopy metrology based on wafer topogr...

Charged particle beam device

Multiple charged particle beam writing apparatus, and multiple char...

Multiple charged particle beam inspection apparatus and multiple ch...

Process window analysis

Method and apparatus for an imaging system

Method of obtaining beam deflection shape and method of obtaining a...

Multi charged particle beam writing apparatus and multi charged par...

Multi charged particle beam writing apparatus and multi charged par...

Multi charged particle beam writing apparatus and multi charged par...

Multi electron beam inspection apparatus

Method for determining misalignment between a first and a second et...

Blanking aperture array apparatus, charged particle beam lithograph...

Determining multi-patterning step overlay error

Method for structuring an object and associated particle beam system

Method and apparatus for a high resolution imaging system

Electron beam exposure apparatus and method of detecting error usin...

Multi charged particle beam writing method, and multi charged parti...

Method of manufacturing semiconductor device

Apparatus and methods for electron beam detection

Electron microscope assembly for viewing the wafer plane image of a...

Write error verification method of writing apparatus and creation a...

Writing method and writing apparatus of charged particle beam, posi...

Charged particle beam system

Method of adjusting a lithography system to enhance image quality

Electron-beam-projection-exposure apparatus with integrated mask in...

Method and apparatus for detecting defect in circuit pattern of a m...

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR BARE WAFER INSPECTION

ANOMALY DETERMINATION METHOD AND WRITING APPARATUS

MULTIPLE CHARGED PARTICLE BEAM INSPECTION APPARATUS AND MULTIPLE CH...

Charged Particle Beam Device

PROCESS WINDOW ANALYSIS

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHAR...

METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

METHOD FOR DETERMINING MISALIGNMENT BETWEEN A FIRST AND A SECOND ET...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

BLANKING APERTURE ARRAY APPARATUS, CHARGED PARTICLE BEAM LITHOGRAPH...

METHOD FOR STRUCTURING AN OBJECT AND ASSOCIATED PARTICLE BEAM SYSTEM

MULTI ELECTRON BEAM INSPECTION APPARATUS

ELECTRON BEAM EXPOSURE APPARATUS AND METHOD OF DETECTING ERROR USIN...

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

SETTLING TIME ACQUISITION METHOD

LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE

Method of manufacturing semiconductor device and semiconductor manu...

APPARATUS AND METHODS FOR ELECTRON BEAM DETECTION

WRITE ERROR VERIFICATION METHOD OF WRITING APPARATUS AND CREATION A...

WRITING METHOD AND WRITING APPARATUS OF CHARGED PARTICLE BEAM, POSI...

Charged-particle beam apparatus and method for automatically correc...

CHARGED PARTICLE BEAM SYSTEM

System and method for inspecting a mask