Devices having a multilayer structure

Industry

CPC
G21K1/062

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GPHYSICS G21Nuclear engineering G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR IRRADIATION DEVICES GAMMA RAY OR X-RAY MICROSCOPES G21K1/00Arrangements for handling particles or ionizing radiation

Current Industry

G21K1/062Devices having a multilayer structure

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Soft x-ray optics with improved filtering
- Patent number 12,025,575
- Issue date Jul 2, 2024
- KLA Corporation
- Alexander Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron diffraction intensity from single crystal silicon in a pho...
- Patent number 11,915,837
- Issue date Feb 27, 2024
- Arizona Board of Regents on behalf of Arizona State University
- William Graves
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Light field X-ray optics
- Patent number 11,894,160
- Issue date Feb 6, 2024
- Lawrence Livermore National Security, LLC
- Bernard J. Kozioziemski
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus for reflecting an incident ray of electromagnetic radiation
- Patent number 11,872,321
- Issue date Jan 16, 2024
- 12180235 Canada Ltd.
- David Allan Prystupa
- A62 - LIFE-SAVING FIRE-FIGHTING
Information Patent Grant
Interferometer for x-ray phase contrast imaging
- Patent number 11,813,102
- Issue date Nov 14, 2023
- Houxun Miao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Nanopatterned electron beams for temporal coherence and determinist...
- Patent number 11,798,706
- Issue date Oct 24, 2023
- Arizona Board of Regents on behalf of Arizona State University
- William Graves
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for producing a multilayer Laue lens
- Patent number 11,789,187
- Issue date Oct 17, 2023
- Deutsches Elektronen-Synchrotron DESY
- Henry Chapman
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Residual gain monitoring and reduction for EUV drive laser
- Patent number 11,737,200
- Issue date Aug 22, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Lin Louis Chang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Coupled ring anode with scanning electron beam bremsstrahlung photo...
- Patent number 11,728,064
- Issue date Aug 15, 2023
- EMPYREAN MEDICAL SYSTEMS, INC.
- Kalman Fishman
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Mirror for extreme ultraviolet light and extreme ultraviolet light...
- Patent number 11,614,572
- Issue date Mar 28, 2023
- Gigaphoton Inc.
- Osamu Wakabayashi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Microscopic system for testing structures and defects on EUV lithog...
- Patent number 11,615,897
- Issue date Mar 28, 2023
- RI Research Institute GmbH
- Rainer Lebert
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of reducing roughness and/or defects on an optical surface a...
- Patent number 11,605,478
- Issue date Mar 14, 2023
- Zygo Corporation
- John Matthew Kincade
- G02 - OPTICS
Information Patent Grant
Multilayer mirror for reflecting EUV radiation and method for produ...
- Patent number 11,500,137
- Issue date Nov 15, 2022
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Philipp Naujok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Laser apparatus for generating extreme ultraviolet light
- Patent number 11,477,877
- Issue date Oct 18, 2022
- Gigaphoton Inc.
- Hitoshi Nagano
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Computationally efficient x-ray based overlay measurement
- Patent number 11,428,650
- Issue date Aug 30, 2022
- KLA Corporation
- John Hench
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Extreme ultraviolet light concentrating mirror and electronic devic...
- Patent number 11,410,785
- Issue date Aug 9, 2022
- Gigaphoton Inc.
- Yoshiyuki Honda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Undercut EUV absorber reflective contrast enhancement
- Patent number 11,402,742
- Issue date Aug 2, 2022
- Synopsys, Inc.
- Lawrence S. Melvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,366,395
- Issue date Jun 21, 2022
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Extreme ultraviolet light condensation mirror, extreme ultraviolet...
- Patent number 11,355,257
- Issue date Jun 7, 2022
- Gigaphoton Inc.
- Masahiko Ando
- G02 - OPTICS
Information Patent Grant
Tunable side-bounce x-ray monochromator
- Patent number 11,348,703
- Issue date May 31, 2022
- UChicago Argonne, LLC
- Hawoong Hong
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Spectral selection component for XUV radiation
- Patent number 11,270,808
- Issue date Mar 8, 2022
- Centre National de la Recherche Scientifique
- Franck Delmotte
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray apparatus including x-ray reflector and method for operating...
- Patent number 11,229,411
- Issue date Jan 25, 2022
- Siemens Healthcare GmbH
- Michael Wiets
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
X-ray mirror optics with multiple hyperboloidal/hyperbolic surface...
- Patent number 11,217,357
- Issue date Jan 4, 2022
- Sigray, Inc.
- Wenbing Yun
- G01 - MEASURING TESTING
Information Patent Grant
EUV optical element having blister-resistant multilayer cap
- Patent number 11,215,736
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Norbert Bowering
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Soft x-ray optics with improved filtering
- Patent number 11,143,604
- Issue date Oct 12, 2021
- KLA Corporation
- Alexander Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Diffraction grating for X-ray phase contrast and/or dark-field imaging
- Patent number 11,107,599
- Issue date Aug 31, 2021
- Koninklijke Philips N.V.
- Thomas Koehler
- G01 - MEASURING TESTING
Information Patent Grant
Metal X-ray grid, X-ray imaging device, and production method for m...
- Patent number 11,101,051
- Issue date Aug 24, 2021
- Hamamatsu Photonics K.K.
- Masahiro Kotani
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Method for repairing reflective optical elements for EUV lithography
- Patent number 11,099,484
- Issue date Aug 24, 2021
- Carl Zeiss SMT GmbH
- Robert Meier
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element
- Patent number 11,099,308
- Issue date Aug 24, 2021
- Carl Zeiss SMT GmbH
- Frank Weigl
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
MULTI-LAYER HIGH-ASPECT RATIO X-RAY GRATING AND METHOD OF MANUFACTURE
- Publication number 20240353353
- Publication date Oct 24, 2024
- Karim S. KARIM
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Soft X-Ray Optics With Improved Filtering
- Publication number 20240288388
- Publication date Aug 29, 2024
- KLA Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Application
X-RAY DETECTOR SYSTEM WITH AT LEAST TWO STACKED FLAT BRAGG DIFFRACTORS
- Publication number 20240280515
- Publication date Aug 22, 2024
- Sigray, Inc.
- Wenbing Yun
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PROCESS FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR THE EXTREME...
- Publication number 20230417961
- Publication date Dec 28, 2023
- Carl Zeiss SMT GMBH
- Thomas SCHICKETANZ
- B24 - GRINDING POLISHING
Information Patent Application
X-RAY RADIATION SOURCE SYSTEM AND METHOD FOR DESIGN OF THE SAME
- Publication number 20230369004
- Publication date Nov 16, 2023
- Technion Research & Development Foundation Ltd.
- Ido KAMINER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR PRODUCING REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELE...
- Publication number 20230253129
- Publication date Aug 10, 2023
- Carl Zeiss SMT GMBH
- Vitaliy SHKLOVER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
X-RAY SOURCE AND SYSTEM AND METHOD FOR GENERATING X-RAY RADIATION
- Publication number 20230145938
- Publication date May 11, 2023
- Georg-August-Universitat Gottingen Stiftung Offentlichen Rechts
- Malte VASSHOLZ
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM
- Publication number 20230126018
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MIRROR, IN PARTICULAR FOR MICROLITHOGRAPHY
- Publication number 20230088791
- Publication date Mar 23, 2023
- Carl Zeiss SMT GMBH
- Jan HORN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGR...
- Publication number 20230041588
- Publication date Feb 9, 2023
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MICROSCOPIC SYSTEM FOR TESTING STRUCTURES AND DEFECTS ON EUV LITHOG...
- Publication number 20220392660
- Publication date Dec 8, 2022
- RI Research Instruments GmbH
- Rainer LEBERT
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
THIN FILM-ATTACHED SUBSTRATE, MULTILAYERED REFLECTIVE FILM-ATTACHED...
- Publication number 20220244630
- Publication date Aug 4, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
LIGHT FIELD X-RAY OPTICS
- Publication number 20220223311
- Publication date Jul 14, 2022
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Bernard J. Kozioziemski
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT AND EUV LITHOGRAPHIC SYSTEM
- Publication number 20220179329
- Publication date Jun 9, 2022
- Carl Zeiss SMT GMBH
- Anastasia Gonchar
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ENHANCED GRATING ALIGNED PATTERNING FOR EUV DIRECT PRINT PROCESSES
- Publication number 20220172857
- Publication date Jun 2, 2022
- Intel Corporation
- Seyedhamed M BARGHI
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR PRODUCING A MULTILAYER LAUE LENS
- Publication number 20220146721
- Publication date May 12, 2022
- DEUTSCHES ELEKTRONEN-SYNCHROTRON DESY
- Henry Chapman
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
TUNABLE SIDE-BOUNCE X-RAY MONOCHROMATOR
- Publication number 20220084711
- Publication date Mar 17, 2022
- UChicago Argonne, LLC
- Hawoong Hong
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS FOR REFLECTING AN INCIDENT RAY OF ELECTROMAGNETIC RADIATION
- Publication number 20220016301
- Publication date Jan 20, 2022
- David Allan Prystupa
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Soft X-Ray Optics With Improved Filtering
- Publication number 20210404979
- Publication date Dec 30, 2021
- KLA Corporation
- Alexander Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT CONCENTRATING MIRROR AND ELECTRONIC DEVIC...
- Publication number 20210407700
- Publication date Dec 30, 2021
- Gigaphoton Inc.
- Yoshiyuki Honda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
NANOPATTERNED ELECTRON BEAMS FOR TEMPORAL COHERENCE AND DETERMINIST...
- Publication number 20210343444
- Publication date Nov 4, 2021
- Arizona Board of Regents on behalf of Arizona State University
- William Graves
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Soft X-Ray Optics With Improved Filtering
- Publication number 20210310968
- Publication date Oct 7, 2021
- KLA Corporation
- Alexander Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Residual gain monitoring and reduction for EUV drive laser
- Publication number 20210235572
- Publication date Jul 29, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Chun-Lin Louis Chang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT CONDENSATION MIRROR, EXTREME ULTRAVIOLET...
- Publication number 20210193344
- Publication date Jun 24, 2021
- Gigaphoton Inc.
- Masahiko ANDO
- G02 - OPTICS
Information Patent Application
X-RAY REFLECTIVE LENS ARRANGEMENT
- Publication number 20210193345
- Publication date Jun 24, 2021
- CONVERGENT R.N.R. LTD
- Aharon Bar-David
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
METHOD OF REDUCING ROUGHNESS AND/OR DEFECTS ON AN OPTICAL SURFACE A...
- Publication number 20210158989
- Publication date May 27, 2021
- Zygo Corporation
- John Matthew Kincade
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR
- Publication number 20210149093
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Claudia EKSTEIN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...
- Publication number 20210055662
- Publication date Feb 25, 2021
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EUV Mask Blanks And Methods Of Manufacture
- Publication number 20210041781
- Publication date Feb 11, 2021
- Applied Materials, Inc., Santa Clara, CA
- Wen Xiao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Wave-Front Aberration Metrology of Extreme Ultraviolet Mask Inspect...
- Publication number 20200379336
- Publication date Dec 3, 2020
- KLA Corporation
- Dmitriy Zusin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Devices having a multilayer structure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Soft x-ray optics with improved filtering

Electron diffraction intensity from single crystal silicon in a pho...

Light field X-ray optics

Apparatus for reflecting an incident ray of electromagnetic radiation

Interferometer for x-ray phase contrast imaging

Nanopatterned electron beams for temporal coherence and determinist...

Method for producing a multilayer Laue lens

Residual gain monitoring and reduction for EUV drive laser

Coupled ring anode with scanning electron beam bremsstrahlung photo...

Mirror for extreme ultraviolet light and extreme ultraviolet light...

Microscopic system for testing structures and defects on EUV lithog...

Method of reducing roughness and/or defects on an optical surface a...

Multilayer mirror for reflecting EUV radiation and method for produ...

Laser apparatus for generating extreme ultraviolet light

Computationally efficient x-ray based overlay measurement

Extreme ultraviolet light concentrating mirror and electronic devic...

Undercut EUV absorber reflective contrast enhancement

Mirror, in particular for a microlithographic projection exposure s...

Extreme ultraviolet light condensation mirror, extreme ultraviolet...

Tunable side-bounce x-ray monochromator

Method for treating a reflective optical element for the EUV wavele...

Spectral selection component for XUV radiation

X-ray apparatus including x-ray reflector and method for operating...

X-ray mirror optics with multiple hyperboloidal/hyperbolic surface...

EUV optical element having blister-resistant multilayer cap

Soft x-ray optics with improved filtering

Diffraction grating for X-ray phase contrast and/or dark-field imaging

Metal X-ray grid, X-ray imaging device, and production method for m...

Method for repairing reflective optical elements for EUV lithography

Reflective optical element

Patents Applicationslast 30 patents

MULTI-LAYER HIGH-ASPECT RATIO X-RAY GRATING AND METHOD OF MANUFACTURE

Soft X-Ray Optics With Improved Filtering

X-RAY DETECTOR SYSTEM WITH AT LEAST TWO STACKED FLAT BRAGG DIFFRACTORS

PROCESS FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR THE EXTREME...

X-RAY RADIATION SOURCE SYSTEM AND METHOD FOR DESIGN OF THE SAME

METHOD FOR PRODUCING REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELE...

X-RAY SOURCE AND SYSTEM AND METHOD FOR GENERATING X-RAY RADIATION

OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM

MIRROR, IN PARTICULAR FOR MICROLITHOGRAPHY

METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGR...

MICROSCOPIC SYSTEM FOR TESTING STRUCTURES AND DEFECTS ON EUV LITHOG...

THIN FILM-ATTACHED SUBSTRATE, MULTILAYERED REFLECTIVE FILM-ATTACHED...

LIGHT FIELD X-RAY OPTICS

OPTICAL ELEMENT AND EUV LITHOGRAPHIC SYSTEM

ENHANCED GRATING ALIGNED PATTERNING FOR EUV DIRECT PRINT PROCESSES

METHOD FOR PRODUCING A MULTILAYER LAUE LENS

TUNABLE SIDE-BOUNCE X-RAY MONOCHROMATOR

APPARATUS FOR REFLECTING AN INCIDENT RAY OF ELECTROMAGNETIC RADIATION

Soft X-Ray Optics With Improved Filtering

EXTREME ULTRAVIOLET LIGHT CONCENTRATING MIRROR AND ELECTRONIC DEVIC...

NANOPATTERNED ELECTRON BEAMS FOR TEMPORAL COHERENCE AND DETERMINIST...

Soft X-Ray Optics With Improved Filtering

Residual gain monitoring and reduction for EUV drive laser

EXTREME ULTRAVIOLET LIGHT CONDENSATION MIRROR, EXTREME ULTRAVIOLET...

X-RAY REFLECTIVE LENS ARRANGEMENT

METHOD OF REDUCING ROUGHNESS AND/OR DEFECTS ON AN OPTICAL SURFACE A...

SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...

EUV Mask Blanks And Methods Of Manufacture

Wave-Front Aberration Metrology of Extreme Ultraviolet Mask Inspect...